JPS5513340B2 - - Google Patents

Info

Publication number
JPS5513340B2
JPS5513340B2 JP2711875A JP2711875A JPS5513340B2 JP S5513340 B2 JPS5513340 B2 JP S5513340B2 JP 2711875 A JP2711875 A JP 2711875A JP 2711875 A JP2711875 A JP 2711875A JP S5513340 B2 JPS5513340 B2 JP S5513340B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2711875A
Other languages
Japanese (ja)
Other versions
JPS51105353A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2711875A priority Critical patent/JPS51105353A/en
Priority to DE19762609218 priority patent/DE2609218A1/en
Priority to NL7602429A priority patent/NL7602429A/en
Publication of JPS51105353A publication Critical patent/JPS51105353A/en
Publication of JPS5513340B2 publication Critical patent/JPS5513340B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2711875A 1975-03-07 1975-03-07 DENSHISENKANNOSEIKOBUNSHISOSEIBUTSU Granted JPS51105353A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2711875A JPS51105353A (en) 1975-03-07 1975-03-07 DENSHISENKANNOSEIKOBUNSHISOSEIBUTSU
DE19762609218 DE2609218A1 (en) 1975-03-07 1976-03-05 Masks for mfr of sub-micro integrated circuits - using copolymers of alkyl-and glycidyl-methacrylates exposed by electron beams
NL7602429A NL7602429A (en) 1975-03-07 1976-03-08 PROCESS FOR PREPARING CATHODE RAY SENSITIVE POLYMERS.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2711875A JPS51105353A (en) 1975-03-07 1975-03-07 DENSHISENKANNOSEIKOBUNSHISOSEIBUTSU

Publications (2)

Publication Number Publication Date
JPS51105353A JPS51105353A (en) 1976-09-17
JPS5513340B2 true JPS5513340B2 (en) 1980-04-08

Family

ID=12212138

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2711875A Granted JPS51105353A (en) 1975-03-07 1975-03-07 DENSHISENKANNOSEIKOBUNSHISOSEIBUTSU

Country Status (3)

Country Link
JP (1) JPS51105353A (en)
DE (1) DE2609218A1 (en)
NL (1) NL7602429A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
JPS5466776A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Fine pattern forming method
JPS54118776A (en) * 1978-03-08 1979-09-14 Fujitsu Ltd Pattern forming method
JPS55117239A (en) * 1979-03-02 1980-09-09 Fujitsu Ltd Making method of microminiature pattern
JPS55133042A (en) * 1979-04-04 1980-10-16 Fujitsu Ltd Pattern forming method
CA1207099A (en) * 1981-12-19 1986-07-02 Tsuneo Fujii Resist material and process for forming fine resist pattern
GB2163435B (en) * 1984-07-11 1987-07-22 Asahi Chemical Ind Image-forming materials sensitive to high-energy beam
US5204425A (en) * 1988-10-12 1993-04-20 Tosoh Corporation Polyalicyclic polyacrylic acid ester derivatives
JP3202792B2 (en) * 1992-06-19 2001-08-27 日本ペイント株式会社 Resist composition
US5587274A (en) * 1992-06-19 1996-12-24 Nippon Paint Co., Ltd. Resist composition

Also Published As

Publication number Publication date
DE2609218A1 (en) 1976-09-09
NL7602429A (en) 1976-09-09
JPS51105353A (en) 1976-09-17

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