JPS5786832A - Pattern forming material - Google Patents

Pattern forming material

Info

Publication number
JPS5786832A
JPS5786832A JP16360480A JP16360480A JPS5786832A JP S5786832 A JPS5786832 A JP S5786832A JP 16360480 A JP16360480 A JP 16360480A JP 16360480 A JP16360480 A JP 16360480A JP S5786832 A JPS5786832 A JP S5786832A
Authority
JP
Japan
Prior art keywords
cross
linking
forming material
pattern forming
peroxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16360480A
Other languages
Japanese (ja)
Inventor
Tateo Kitamura
Yasuhiro Yoneda
Jiro Naito
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16360480A priority Critical patent/JPS5786832A/en
Publication of JPS5786832A publication Critical patent/JPS5786832A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

PURPOSE:To enhance photosensitivity without impairing resolution, dry etching resistance, etc., by adding an organic peroxide together with a cross-linking agent to an organic polymer capable of cross-linking on irradiation of radiation. CONSTITUTION:A pattern forming material using electron beams, ultraviolet rays, etc. is prepared by adding an organic peroxide, such as benzoyl peroxide or tertiary butyl peroxide, and a cross-linking agent, such as diallyl adipate or bisphenol A-diacrylate to an organic polymer causing cross-linking on irradiation of radiation, such as polydiallyl phthalate, polystyrene, or polyglycidyl methacrylate each in 0.01-30% amount per said polymer, thus permitting the obtained negative type pattern forming material to accelerate generation of free radicals and cross-linking reactions, to enhance sensitivity without deteriorating resolution, dry etching resistance, etc., and to be suitable for fabrication of integrated circuits.
JP16360480A 1980-11-20 1980-11-20 Pattern forming material Pending JPS5786832A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16360480A JPS5786832A (en) 1980-11-20 1980-11-20 Pattern forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16360480A JPS5786832A (en) 1980-11-20 1980-11-20 Pattern forming material

Publications (1)

Publication Number Publication Date
JPS5786832A true JPS5786832A (en) 1982-05-31

Family

ID=15777077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16360480A Pending JPS5786832A (en) 1980-11-20 1980-11-20 Pattern forming material

Country Status (1)

Country Link
JP (1) JPS5786832A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4540650A (en) * 1982-09-13 1985-09-10 Merck Patent Gesellschaft Mit Beschrankter Haftung Photoresists suitable for forming relief structures of highly heat-resistant polymers
JPH02973A (en) * 1988-03-15 1990-01-05 Sumitomo Chem Co Ltd Curable resin composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4540650A (en) * 1982-09-13 1985-09-10 Merck Patent Gesellschaft Mit Beschrankter Haftung Photoresists suitable for forming relief structures of highly heat-resistant polymers
JPH02973A (en) * 1988-03-15 1990-01-05 Sumitomo Chem Co Ltd Curable resin composition

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