JPS57108851A - Formation of resist image - Google Patents

Formation of resist image

Info

Publication number
JPS57108851A
JPS57108851A JP18458880A JP18458880A JPS57108851A JP S57108851 A JPS57108851 A JP S57108851A JP 18458880 A JP18458880 A JP 18458880A JP 18458880 A JP18458880 A JP 18458880A JP S57108851 A JPS57108851 A JP S57108851A
Authority
JP
Japan
Prior art keywords
benzyl acetate
polymer
resist
beams
aromatic rings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18458880A
Other languages
Japanese (ja)
Other versions
JPS647651B2 (en
Inventor
Yoshitake Onishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP18458880A priority Critical patent/JPS57108851A/en
Publication of JPS57108851A publication Critical patent/JPS57108851A/en
Publication of JPS647651B2 publication Critical patent/JPS647651B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To form a resist image superior in resolution and shape without swelling, by processing a resist polymer with a developing solvent containing benzyl acetate. CONSTITUTION:A resist film made of a polymer material containing aromatic rings formed on a substrate is irradiated with radiation, such as electron beams, X-rays, ultraviolet rays, or deep ultraviolet rays, or corpuscular beams, such as ion or neutron beams, and developed with a single solvent of benzyl acetate or a solution containing this. A polymer having aromatic rings in the molecule is high in etching resistance, and polyvinylnaphthalene is superior to polystyrene. It is important to select a developing solution, and benzyl acetate is suitable.
JP18458880A 1980-12-25 1980-12-25 Formation of resist image Granted JPS57108851A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18458880A JPS57108851A (en) 1980-12-25 1980-12-25 Formation of resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18458880A JPS57108851A (en) 1980-12-25 1980-12-25 Formation of resist image

Publications (2)

Publication Number Publication Date
JPS57108851A true JPS57108851A (en) 1982-07-07
JPS647651B2 JPS647651B2 (en) 1989-02-09

Family

ID=16155827

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18458880A Granted JPS57108851A (en) 1980-12-25 1980-12-25 Formation of resist image

Country Status (1)

Country Link
JP (1) JPS57108851A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6055630A (en) * 1983-09-06 1985-03-30 Oki Electric Ind Co Ltd Method for forming resist pattern
EP0365987A2 (en) * 1988-10-26 1990-05-02 Hoechst Aktiengesellschaft Developing solvent for layers which are crosslinkable by photopolymerization, and process for the production of relief printing forms
EP2309331A1 (en) * 2009-10-09 2011-04-13 Flexoclean Engineering B.V. A polymer washout solvent and the use thereof for developing a flexographic printing plate
WO2011093980A1 (en) * 2010-01-28 2011-08-04 Eastman Kodak Company Flexographic processing solution and use

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6055630A (en) * 1983-09-06 1985-03-30 Oki Electric Ind Co Ltd Method for forming resist pattern
JPH0335654B2 (en) * 1983-09-06 1991-05-29 Oki Electric Ind Co Ltd
EP0365987A2 (en) * 1988-10-26 1990-05-02 Hoechst Aktiengesellschaft Developing solvent for layers which are crosslinkable by photopolymerization, and process for the production of relief printing forms
EP2309331A1 (en) * 2009-10-09 2011-04-13 Flexoclean Engineering B.V. A polymer washout solvent and the use thereof for developing a flexographic printing plate
WO2011042225A1 (en) * 2009-10-09 2011-04-14 Flexoclean Engineering B.V. A polymer washout solvent, and the use thereof for developing a flexographic printing plate
US8921035B2 (en) 2009-10-09 2014-12-30 Flexoclean Engineering B.V. Polymer washout solvent, and the use thereof for developing a flexographic printing plate
WO2011093980A1 (en) * 2010-01-28 2011-08-04 Eastman Kodak Company Flexographic processing solution and use
US8632961B2 (en) 2010-01-28 2014-01-21 Eastman Kodak Company Flexographic processing solution and use

Also Published As

Publication number Publication date
JPS647651B2 (en) 1989-02-09

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