JPS57108851A - Formation of resist image - Google Patents
Formation of resist imageInfo
- Publication number
- JPS57108851A JPS57108851A JP18458880A JP18458880A JPS57108851A JP S57108851 A JPS57108851 A JP S57108851A JP 18458880 A JP18458880 A JP 18458880A JP 18458880 A JP18458880 A JP 18458880A JP S57108851 A JPS57108851 A JP S57108851A
- Authority
- JP
- Japan
- Prior art keywords
- benzyl acetate
- polymer
- resist
- beams
- aromatic rings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To form a resist image superior in resolution and shape without swelling, by processing a resist polymer with a developing solvent containing benzyl acetate. CONSTITUTION:A resist film made of a polymer material containing aromatic rings formed on a substrate is irradiated with radiation, such as electron beams, X-rays, ultraviolet rays, or deep ultraviolet rays, or corpuscular beams, such as ion or neutron beams, and developed with a single solvent of benzyl acetate or a solution containing this. A polymer having aromatic rings in the molecule is high in etching resistance, and polyvinylnaphthalene is superior to polystyrene. It is important to select a developing solution, and benzyl acetate is suitable.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18458880A JPS57108851A (en) | 1980-12-25 | 1980-12-25 | Formation of resist image |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18458880A JPS57108851A (en) | 1980-12-25 | 1980-12-25 | Formation of resist image |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57108851A true JPS57108851A (en) | 1982-07-07 |
JPS647651B2 JPS647651B2 (en) | 1989-02-09 |
Family
ID=16155827
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18458880A Granted JPS57108851A (en) | 1980-12-25 | 1980-12-25 | Formation of resist image |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57108851A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6055630A (en) * | 1983-09-06 | 1985-03-30 | Oki Electric Ind Co Ltd | Method for forming resist pattern |
EP0365987A2 (en) * | 1988-10-26 | 1990-05-02 | Hoechst Aktiengesellschaft | Developing solvent for layers which are crosslinkable by photopolymerization, and process for the production of relief printing forms |
EP2309331A1 (en) * | 2009-10-09 | 2011-04-13 | Flexoclean Engineering B.V. | A polymer washout solvent and the use thereof for developing a flexographic printing plate |
WO2011093980A1 (en) * | 2010-01-28 | 2011-08-04 | Eastman Kodak Company | Flexographic processing solution and use |
-
1980
- 1980-12-25 JP JP18458880A patent/JPS57108851A/en active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6055630A (en) * | 1983-09-06 | 1985-03-30 | Oki Electric Ind Co Ltd | Method for forming resist pattern |
JPH0335654B2 (en) * | 1983-09-06 | 1991-05-29 | Oki Electric Ind Co Ltd | |
EP0365987A2 (en) * | 1988-10-26 | 1990-05-02 | Hoechst Aktiengesellschaft | Developing solvent for layers which are crosslinkable by photopolymerization, and process for the production of relief printing forms |
EP2309331A1 (en) * | 2009-10-09 | 2011-04-13 | Flexoclean Engineering B.V. | A polymer washout solvent and the use thereof for developing a flexographic printing plate |
WO2011042225A1 (en) * | 2009-10-09 | 2011-04-14 | Flexoclean Engineering B.V. | A polymer washout solvent, and the use thereof for developing a flexographic printing plate |
US8921035B2 (en) | 2009-10-09 | 2014-12-30 | Flexoclean Engineering B.V. | Polymer washout solvent, and the use thereof for developing a flexographic printing plate |
WO2011093980A1 (en) * | 2010-01-28 | 2011-08-04 | Eastman Kodak Company | Flexographic processing solution and use |
US8632961B2 (en) | 2010-01-28 | 2014-01-21 | Eastman Kodak Company | Flexographic processing solution and use |
Also Published As
Publication number | Publication date |
---|---|
JPS647651B2 (en) | 1989-02-09 |
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