JPS55110244A - Production of resist image - Google Patents

Production of resist image

Info

Publication number
JPS55110244A
JPS55110244A JP1821779A JP1821779A JPS55110244A JP S55110244 A JPS55110244 A JP S55110244A JP 1821779 A JP1821779 A JP 1821779A JP 1821779 A JP1821779 A JP 1821779A JP S55110244 A JPS55110244 A JP S55110244A
Authority
JP
Japan
Prior art keywords
methanol
resist
high molecular
image
developer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1821779A
Other languages
Japanese (ja)
Inventor
Yoshitake Onishi
Hideo Ochi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
NEC Corp
Original Assignee
Somar Corp
Somar Manufacturing Co Ltd
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp, Somar Manufacturing Co Ltd, NEC Corp, Nippon Electric Co Ltd filed Critical Somar Corp
Priority to JP1821779A priority Critical patent/JPS55110244A/en
Publication of JPS55110244A publication Critical patent/JPS55110244A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To form a sharp resist image with no residual resist by using methanol or a methanol-containing solution as a developer for a resist made of high molecular material having alpha,beta-unsaturated carboxylic acid derivative groups. CONSTITUTION:A latent image is formed using a resist made of high molecular material having alpha,beta-unsaturated carboxylic acid derivative groups in its molecule and inducing cross linkage on being irradiated with far ultraviolet rays, electron beams, X-rays, etc., e.g. high molecular substance having an MW of about 60,000 and containing two kinds of monomer units of formulae I, II. This image is then developed by dipping in methanol or a methanol-containing solution as a developer.
JP1821779A 1979-02-19 1979-02-19 Production of resist image Pending JPS55110244A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1821779A JPS55110244A (en) 1979-02-19 1979-02-19 Production of resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1821779A JPS55110244A (en) 1979-02-19 1979-02-19 Production of resist image

Publications (1)

Publication Number Publication Date
JPS55110244A true JPS55110244A (en) 1980-08-25

Family

ID=11965473

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1821779A Pending JPS55110244A (en) 1979-02-19 1979-02-19 Production of resist image

Country Status (1)

Country Link
JP (1) JPS55110244A (en)

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