JPS5595945A - Production of negative type resist image - Google Patents

Production of negative type resist image

Info

Publication number
JPS5595945A
JPS5595945A JP264279A JP264279A JPS5595945A JP S5595945 A JPS5595945 A JP S5595945A JP 264279 A JP264279 A JP 264279A JP 264279 A JP264279 A JP 264279A JP S5595945 A JPS5595945 A JP S5595945A
Authority
JP
Japan
Prior art keywords
polymer
resist image
resist
negative type
type resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP264279A
Other languages
Japanese (ja)
Inventor
Katsumi Mori
Yoshitake Onishi
Hideo Ochi
Ichiro Sugawara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
NEC Corp
Original Assignee
Somar Corp
Somar Manufacturing Co Ltd
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp, Somar Manufacturing Co Ltd, NEC Corp, Nippon Electric Co Ltd filed Critical Somar Corp
Priority to JP264279A priority Critical patent/JPS5595945A/en
Publication of JPS5595945A publication Critical patent/JPS5595945A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Abstract

PURPOSE:To produce a resist image with superior resolution, pattern form, reproducibility, etc. by irradiating a polymer having specified groups as a resist with far ultraviolet rays through a mask followed by development. CONSTITUTION:A 1,2-ethylenedicarboxylic acid derivative is bonded to a stock polymer having an MW of about 10<4>-10<6> and narrow MW distribution, e.g. a (co)polymer of vinyl acetate, vinyl chloride, styrene, etc. by esterification, addition reaction, amidation or other reaction to obtain a polymer having groups represented by the general formula (where R is H, alkyl or aryl) in the molecules. On substrate 1 film 2 of the polymer (resist) is formed, covered with mask 3, irradiated with far ultraviolet rays 5 of 1850-3500Angstrom wavelengths, and developed with a developer such as a mixed solution of ethyl acetate and isopropyl acetate to form negative type resist image 6.
JP264279A 1979-01-12 1979-01-12 Production of negative type resist image Pending JPS5595945A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP264279A JPS5595945A (en) 1979-01-12 1979-01-12 Production of negative type resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP264279A JPS5595945A (en) 1979-01-12 1979-01-12 Production of negative type resist image

Publications (1)

Publication Number Publication Date
JPS5595945A true JPS5595945A (en) 1980-07-21

Family

ID=11535015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP264279A Pending JPS5595945A (en) 1979-01-12 1979-01-12 Production of negative type resist image

Country Status (1)

Country Link
JP (1) JPS5595945A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5730829A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Micropattern formation method
JPS58203438A (en) * 1982-05-24 1983-11-26 Hitachi Ltd Formation of fine pattern
JPH0539048A (en) * 1991-07-31 1993-02-19 Komatsu Forklift Co Ltd Idle-up device for industrial vehicle

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5730829A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Micropattern formation method
JPS58203438A (en) * 1982-05-24 1983-11-26 Hitachi Ltd Formation of fine pattern
JPH0539048A (en) * 1991-07-31 1993-02-19 Komatsu Forklift Co Ltd Idle-up device for industrial vehicle

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