JPS5476136A - Resist material for microprocessing - Google Patents
Resist material for microprocessingInfo
- Publication number
- JPS5476136A JPS5476136A JP14228277A JP14228277A JPS5476136A JP S5476136 A JPS5476136 A JP S5476136A JP 14228277 A JP14228277 A JP 14228277A JP 14228277 A JP14228277 A JP 14228277A JP S5476136 A JPS5476136 A JP S5476136A
- Authority
- JP
- Japan
- Prior art keywords
- resist material
- far ultraviolet
- resist
- microprocessing
- micropattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
PURPOSE: To form a micropattern superior in sensitivity, resolution, and adhesivity in far ultraviolet lithography, by using a resist of an acrylic polymer having an alkyl group substituted by bromine.
CONSTITUTION: A resist material is made of a polyacrylic acid ester represented by the formula in which R is brominated alkyl and n is a polymerization degree. For example, a polymer obtained by radical polymerization of 2, 3-dibromo-1-n-propyl acrylate is dissolved in a solvent, such as methoxyethyl acetate to form a resist material, and this is coated on a oxidized silicon film by a spin coating method, dried, and then, irradiated with far ultraviolet rays through a mask to form a desired pattern.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14228277A JPS5476136A (en) | 1977-11-29 | 1977-11-29 | Resist material for microprocessing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14228277A JPS5476136A (en) | 1977-11-29 | 1977-11-29 | Resist material for microprocessing |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5476136A true JPS5476136A (en) | 1979-06-18 |
JPS5514413B2 JPS5514413B2 (en) | 1980-04-16 |
Family
ID=15311731
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14228277A Granted JPS5476136A (en) | 1977-11-29 | 1977-11-29 | Resist material for microprocessing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5476136A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57179851A (en) * | 1981-04-30 | 1982-11-05 | Tokyo Ohka Kogyo Co Ltd | Formation of pattern |
-
1977
- 1977-11-29 JP JP14228277A patent/JPS5476136A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57179851A (en) * | 1981-04-30 | 1982-11-05 | Tokyo Ohka Kogyo Co Ltd | Formation of pattern |
Also Published As
Publication number | Publication date |
---|---|
JPS5514413B2 (en) | 1980-04-16 |
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