JPS54110857A - Optical production of sawtooth photo-sensitive resin flim - Google Patents
Optical production of sawtooth photo-sensitive resin flimInfo
- Publication number
- JPS54110857A JPS54110857A JP1779478A JP1779478A JPS54110857A JP S54110857 A JPS54110857 A JP S54110857A JP 1779478 A JP1779478 A JP 1779478A JP 1779478 A JP1779478 A JP 1779478A JP S54110857 A JPS54110857 A JP S54110857A
- Authority
- JP
- Japan
- Prior art keywords
- photo
- thin film
- angle
- film
- resin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
Landscapes
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
PURPOSE:To obtain resin film easily and in a short time, by radiating parallel beams to a photo-sensitive resin film coated with nontransparent thin film of desired pattern by varying the angle of radiation to harden the resin film. CONSTITUTION:A photo-sensitive resin film 2 of thickness (d) using negative type photo resist, a nontransparent thin film (chrome thin film) 3 of film thickness of about 2000Angstrom , and a photo resist film 4 are laminated on a glass substrate 1. By etching the chrome thin film 3 through a photo resist mask 21 formed by ordinary method, a chrome thin film pattern 22 having the same form as the mask 21 is made. Changing the angle from the substrate vertical direction 23 by angle alpha from the vertical direction up to direction 24, the exit light is used to radiate so as to form sawtooth photo-sensitive region 25. Then, etching the chrome, only the region 25 is left over to obtain a blaze grating 26. Meanwhile, the thickness (d) of the photo- sensitive resin film is determined by the formula d=Ptantheta(P: pitch of diffraction grating, theta: blaze angle), and the angle alpha is alpha=90 degrees - theta.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1779478A JPS54110857A (en) | 1978-02-17 | 1978-02-17 | Optical production of sawtooth photo-sensitive resin flim |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1779478A JPS54110857A (en) | 1978-02-17 | 1978-02-17 | Optical production of sawtooth photo-sensitive resin flim |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54110857A true JPS54110857A (en) | 1979-08-30 |
Family
ID=11953609
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1779478A Pending JPS54110857A (en) | 1978-02-17 | 1978-02-17 | Optical production of sawtooth photo-sensitive resin flim |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54110857A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0271002A2 (en) * | 1986-12-06 | 1988-06-15 | Kuraray Co., Ltd. | Transmittance modulation photomask, process for producing the same and process for producing diffraction grating |
US5283690A (en) * | 1989-04-04 | 1994-02-01 | Sharp Kabushiki Kaisha | Optical diffraction grating element |
US5436764A (en) * | 1992-04-21 | 1995-07-25 | Matsushita Electric Industrial Co., Ltd. | Die for forming a micro-optical element, manufacturing method therefor, micro-optical element and manufacturing method therefor |
US8711482B2 (en) | 2009-12-04 | 2014-04-29 | Panasonic Corporation | Pressing mold for optical lenses and method for manufacturing glass optical lenses |
-
1978
- 1978-02-17 JP JP1779478A patent/JPS54110857A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0271002A2 (en) * | 1986-12-06 | 1988-06-15 | Kuraray Co., Ltd. | Transmittance modulation photomask, process for producing the same and process for producing diffraction grating |
US5283690A (en) * | 1989-04-04 | 1994-02-01 | Sharp Kabushiki Kaisha | Optical diffraction grating element |
US5436764A (en) * | 1992-04-21 | 1995-07-25 | Matsushita Electric Industrial Co., Ltd. | Die for forming a micro-optical element, manufacturing method therefor, micro-optical element and manufacturing method therefor |
US8711482B2 (en) | 2009-12-04 | 2014-04-29 | Panasonic Corporation | Pressing mold for optical lenses and method for manufacturing glass optical lenses |
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