JPS5320770A - Production of thin film fine patterns - Google Patents

Production of thin film fine patterns

Info

Publication number
JPS5320770A
JPS5320770A JP9511376A JP9511376A JPS5320770A JP S5320770 A JPS5320770 A JP S5320770A JP 9511376 A JP9511376 A JP 9511376A JP 9511376 A JP9511376 A JP 9511376A JP S5320770 A JPS5320770 A JP S5320770A
Authority
JP
Japan
Prior art keywords
thin film
production
fine patterns
film fine
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9511376A
Other languages
Japanese (ja)
Inventor
Kiyoshi Asakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP9511376A priority Critical patent/JPS5320770A/en
Publication of JPS5320770A publication Critical patent/JPS5320770A/en
Pending legal-status Critical Current

Links

Landscapes

  • Weting (AREA)

Abstract

PURPOSE: To control the rate of etching while measuring the intensity of reflected light.and performing desired under-cutting by utilizing the fact that the intensity of multiple reflected light by the thin film of laser light radiated to the thin transparent film which should become a spacer varies with the variations in thickness owing to etching of the thin film.
COPYRIGHT: (C)1978,JPO&Japio
JP9511376A 1976-08-10 1976-08-10 Production of thin film fine patterns Pending JPS5320770A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9511376A JPS5320770A (en) 1976-08-10 1976-08-10 Production of thin film fine patterns

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9511376A JPS5320770A (en) 1976-08-10 1976-08-10 Production of thin film fine patterns

Publications (1)

Publication Number Publication Date
JPS5320770A true JPS5320770A (en) 1978-02-25

Family

ID=14128782

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9511376A Pending JPS5320770A (en) 1976-08-10 1976-08-10 Production of thin film fine patterns

Country Status (1)

Country Link
JP (1) JPS5320770A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54121676A (en) * 1978-03-15 1979-09-20 Hitachi Ltd Semiconductor surface etching processor
JPS5627933A (en) * 1979-08-14 1981-03-18 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS6035520A (en) * 1984-04-25 1985-02-23 Hitachi Ltd Device for semiconductor surface etching process
JPH03202550A (en) * 1989-12-28 1991-09-04 Kurose Shoten:Kk Panel assembly
JP2007301719A (en) * 2004-09-27 2007-11-22 Idc Llc Process control monitor regarding interferometric modulator
CN103531501A (en) * 2013-10-21 2014-01-22 合肥京东方光电科技有限公司 Etching rate monitoring method and equipment

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54121676A (en) * 1978-03-15 1979-09-20 Hitachi Ltd Semiconductor surface etching processor
JPS5627933A (en) * 1979-08-14 1981-03-18 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS6035520A (en) * 1984-04-25 1985-02-23 Hitachi Ltd Device for semiconductor surface etching process
JPH03202550A (en) * 1989-12-28 1991-09-04 Kurose Shoten:Kk Panel assembly
JP2007301719A (en) * 2004-09-27 2007-11-22 Idc Llc Process control monitor regarding interferometric modulator
CN103531501A (en) * 2013-10-21 2014-01-22 合肥京东方光电科技有限公司 Etching rate monitoring method and equipment

Similar Documents

Publication Publication Date Title
JPS5252579A (en) Clearance adjusng method
JPS5320770A (en) Production of thin film fine patterns
JPS5210697A (en) Luminous signal plate
JPS52123824A (en) Solid pikup element
JPS53145564A (en) Production of semiconductor device
JPS51139787A (en) Semiconductor light emitting device
JPS5331108A (en) Information recording member
JPS53128288A (en) Semiconductor laser element and production of the same
JPS522547A (en) Optical method to measure displacement of plane
JPS5341976A (en) Measuring method of thickness of semiconducjtor wafer
JPS5338296A (en) Light reflecting plate for liquid crystal display device
JPS52108803A (en) Information recording element
JPS5399772A (en) Optical mask
JPS53143242A (en) Production of optical diffusing plate
JPS5379497A (en) Passive reflector for display unit of lightreception type
JPS547941A (en) Production of optical diffusive plate
JPS5352390A (en) Anti-reflective transparent materialand its production
JPS539473A (en) Photoetching process
JPS52119304A (en) Optical device
JPS52129469A (en) Wristwatch case
JPS548684A (en) Facing material
JPS52113651A (en) Quality information display unit
JPS539161A (en) Inorganic glassfor watch
JPS52111755A (en) Glass for watch
JPS5419574A (en) Tritium light