JPS5341976A - Measuring method of thickness of semiconducjtor wafer - Google Patents

Measuring method of thickness of semiconducjtor wafer

Info

Publication number
JPS5341976A
JPS5341976A JP11681476A JP11681476A JPS5341976A JP S5341976 A JPS5341976 A JP S5341976A JP 11681476 A JP11681476 A JP 11681476A JP 11681476 A JP11681476 A JP 11681476A JP S5341976 A JPS5341976 A JP S5341976A
Authority
JP
Japan
Prior art keywords
wafer
thickness
semiconducjtor
measuring method
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11681476A
Other languages
Japanese (ja)
Inventor
Akira Taguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11681476A priority Critical patent/JPS5341976A/en
Publication of JPS5341976A publication Critical patent/JPS5341976A/en
Pending legal-status Critical Current

Links

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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE: The light of a fixed wavelength is projected on a wafer thin plate, so that the thickness of the wafer can be measured accruately without touching the wafer by the attenuation of light due to transmission.
COPYRIGHT: (C)1978,JPO&Japio
JP11681476A 1976-09-29 1976-09-29 Measuring method of thickness of semiconducjtor wafer Pending JPS5341976A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11681476A JPS5341976A (en) 1976-09-29 1976-09-29 Measuring method of thickness of semiconducjtor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11681476A JPS5341976A (en) 1976-09-29 1976-09-29 Measuring method of thickness of semiconducjtor wafer

Publications (1)

Publication Number Publication Date
JPS5341976A true JPS5341976A (en) 1978-04-15

Family

ID=14696293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11681476A Pending JPS5341976A (en) 1976-09-29 1976-09-29 Measuring method of thickness of semiconducjtor wafer

Country Status (1)

Country Link
JP (1) JPS5341976A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57207269A (en) * 1981-06-15 1982-12-18 Asahi Optical Co Ltd Copying machine having two drums
JPS5857856U (en) * 1981-10-14 1983-04-19 キヤノン株式会社 lighting equipment
JPS6165227A (en) * 1984-09-07 1986-04-03 Ushio Inc Optical instrument
US5255116A (en) * 1991-02-18 1993-10-19 Canon Kabushiki Kaisha Original scanning apparatus
KR100845778B1 (en) * 2008-03-21 2008-07-11 (주)엘립소테크놀러지 An apparatus for measuring thinkness of silicon wafer using light transmittance at light transmission edge range and a method therof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57207269A (en) * 1981-06-15 1982-12-18 Asahi Optical Co Ltd Copying machine having two drums
JPH0332064B2 (en) * 1981-06-15 1991-05-09 Asahi Optical Co Ltd
JPS5857856U (en) * 1981-10-14 1983-04-19 キヤノン株式会社 lighting equipment
JPS6165227A (en) * 1984-09-07 1986-04-03 Ushio Inc Optical instrument
US5255116A (en) * 1991-02-18 1993-10-19 Canon Kabushiki Kaisha Original scanning apparatus
KR100845778B1 (en) * 2008-03-21 2008-07-11 (주)엘립소테크놀러지 An apparatus for measuring thinkness of silicon wafer using light transmittance at light transmission edge range and a method therof

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