JPS55123614A - Photosensitive resin and positive type-photosensitive resin composition - Google Patents

Photosensitive resin and positive type-photosensitive resin composition

Info

Publication number
JPS55123614A
JPS55123614A JP3157979A JP3157979A JPS55123614A JP S55123614 A JPS55123614 A JP S55123614A JP 3157979 A JP3157979 A JP 3157979A JP 3157979 A JP3157979 A JP 3157979A JP S55123614 A JPS55123614 A JP S55123614A
Authority
JP
Japan
Prior art keywords
photosensitive resin
phenol
positive type
resin composition
condensing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3157979A
Other languages
English (en)
Other versions
JPS6223788B2 (ja
Inventor
Keiji Kubo
Tetsuo Ishihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Corp
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Corp, Daicel Chemical Industries Ltd filed Critical Daicel Corp
Priority to JP3157979A priority Critical patent/JPS55123614A/ja
Priority to US06/130,372 priority patent/US4308368A/en
Priority to DE19803009873 priority patent/DE3009873A1/de
Publication of JPS55123614A publication Critical patent/JPS55123614A/ja
Priority to JP28495186A priority patent/JPS62149717A/ja
Publication of JPS6223788B2 publication Critical patent/JPS6223788B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP3157979A 1979-03-16 1979-03-16 Photosensitive resin and positive type-photosensitive resin composition Granted JPS55123614A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3157979A JPS55123614A (en) 1979-03-16 1979-03-16 Photosensitive resin and positive type-photosensitive resin composition
US06/130,372 US4308368A (en) 1979-03-16 1980-03-14 Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
DE19803009873 DE3009873A1 (de) 1979-03-16 1980-03-14 Photoempfindliche masse
JP28495186A JPS62149717A (ja) 1979-03-16 1986-11-29 感光性樹脂の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3157979A JPS55123614A (en) 1979-03-16 1979-03-16 Photosensitive resin and positive type-photosensitive resin composition

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP28495186A Division JPS62149717A (ja) 1979-03-16 1986-11-29 感光性樹脂の製造方法

Publications (2)

Publication Number Publication Date
JPS55123614A true JPS55123614A (en) 1980-09-24
JPS6223788B2 JPS6223788B2 (ja) 1987-05-25

Family

ID=12335086

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3157979A Granted JPS55123614A (en) 1979-03-16 1979-03-16 Photosensitive resin and positive type-photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS55123614A (ja)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61218616A (ja) * 1985-03-02 1986-09-29 チバ‐ガイギー　アクチエンゲゼルシヤフト 変性フエノール樹脂生成物、その製造方法及び該化合物を使用する画像形成方法
JPS62161146A (ja) * 1986-01-10 1987-07-17 Mitsubishi Petrochem Co Ltd ホトレジスト組成物
JPS62260145A (ja) * 1986-05-02 1987-11-12 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS62260147A (ja) * 1986-05-02 1987-11-12 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS62260146A (ja) * 1986-05-02 1987-11-12 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト用組成物
JPS63113451A (ja) * 1986-10-30 1988-05-18 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPS63116145A (ja) * 1986-11-04 1988-05-20 Konica Corp 着色画像形成材料
JPS63198046A (ja) * 1987-02-13 1988-08-16 Konica Corp 耐処理薬品性及びインキ着肉性に優れた感光性組成物
JPS63236030A (ja) * 1987-03-25 1988-09-30 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JPH0296164A (ja) * 1988-10-03 1990-04-06 Konica Corp 感光性組成物
US5407780A (en) * 1989-12-27 1995-04-18 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4924361A (ja) * 1972-06-27 1974-03-04
GB1367830A (en) * 1972-05-23 1974-09-25 Hunt Chem Corp Philip A Processes and materials for making photoresists
JPS505083A (ja) * 1973-04-27 1975-01-20
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1367830A (en) * 1972-05-23 1974-09-25 Hunt Chem Corp Philip A Processes and materials for making photoresists
JPS4924361A (ja) * 1972-06-27 1974-03-04
JPS505083A (ja) * 1973-04-27 1975-01-20
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61218616A (ja) * 1985-03-02 1986-09-29 チバ‐ガイギー　アクチエンゲゼルシヤフト 変性フエノール樹脂生成物、その製造方法及び該化合物を使用する画像形成方法
JPS62161146A (ja) * 1986-01-10 1987-07-17 Mitsubishi Petrochem Co Ltd ホトレジスト組成物
JPS62260145A (ja) * 1986-05-02 1987-11-12 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS62260147A (ja) * 1986-05-02 1987-11-12 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS62260146A (ja) * 1986-05-02 1987-11-12 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト用組成物
JPS63113451A (ja) * 1986-10-30 1988-05-18 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPS63116145A (ja) * 1986-11-04 1988-05-20 Konica Corp 着色画像形成材料
JPS63198046A (ja) * 1987-02-13 1988-08-16 Konica Corp 耐処理薬品性及びインキ着肉性に優れた感光性組成物
JPS63236030A (ja) * 1987-03-25 1988-09-30 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JPH0296164A (ja) * 1988-10-03 1990-04-06 Konica Corp 感光性組成物
US5407780A (en) * 1989-12-27 1995-04-18 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde

Also Published As

Publication number Publication date
JPS6223788B2 (ja) 1987-05-25

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