JPS50151997A - - Google Patents

Info

Publication number
JPS50151997A
JPS50151997A JP5211175A JP5211175A JPS50151997A JP S50151997 A JPS50151997 A JP S50151997A JP 5211175 A JP5211175 A JP 5211175A JP 5211175 A JP5211175 A JP 5211175A JP S50151997 A JPS50151997 A JP S50151997A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5211175A
Other languages
Japanese (ja)
Other versions
JPS5214278B2 (zh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS50151997A publication Critical patent/JPS50151997A/ja
Publication of JPS5214278B2 publication Critical patent/JPS5214278B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66—Arsenic compounds
    • C07F9/68—Arsenic compounds without As—C bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/90—Antimony compounds
    • C07F9/902—Compounds without antimony-carbon linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Reinforced Plastic Materials (AREA)
  • Paints Or Removers (AREA)
JP5211175A 1974-05-02 1975-05-01 Expired JPS5214278B2 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46637474A 1974-05-02 1974-05-02

Publications (2)

Publication Number Publication Date
JPS50151997A true JPS50151997A (zh) 1975-12-06
JPS5214278B2 JPS5214278B2 (zh) 1977-04-20

Family

ID=23851510

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5211175A Expired JPS5214278B2 (zh) 1974-05-02 1975-05-01

Country Status (5)

Country Link
JP (1) JPS5214278B2 (zh)
BE (1) BE828670A (zh)
DE (3) DE2559718C2 (zh)
FR (1) FR2269551B1 (zh)
GB (2) GB1516512A (zh)

Cited By (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5453181A (en) * 1977-09-14 1979-04-26 Gen Electric Photoopolymerization initiator
JPS5495686A (en) * 1977-08-05 1979-07-28 Gen Electric Photocurable composition and curing method
JPS61261365A (ja) * 1985-05-14 1986-11-19 Nippon Oil Co Ltd 光硬化性被覆組成物
EP0503774A2 (en) * 1991-02-16 1992-09-16 Canon Kabushiki Kaisha Optical recording medium
US5399596A (en) * 1988-03-03 1995-03-21 Sanshin Kagaku Kogyo Co., Ltd. Polyfluoride sulfonium compounds and polymerization initiator thereof
US5981616A (en) * 1996-12-13 1999-11-09 Dsm N.V. Photo-curable resin composition used for photo fabication of three-dimensional objects
US6013714A (en) * 1996-09-20 2000-01-11 Dsm N.V. Resin composition and fibrous material forming mold
US6096796A (en) * 1996-12-10 2000-08-01 Dsm N.V. Photo-curable resin composition
US6127085A (en) * 1996-10-14 2000-10-03 Dsm N.V. Photo-curable resin composition
US6313188B1 (en) 1996-09-19 2001-11-06 Nippon Soda Co., Ltd. Photocationically polymerizable composition comprising a polycyclic aromatic compound
EP1348727A2 (en) 2002-03-29 2003-10-01 Brother Kogyo Kabushiki Kaisha Image-receiving layer composition and overcoat layer composition for ink-jet recording
US6805439B2 (en) 2001-09-06 2004-10-19 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
JP2005055864A (ja) * 2003-07-22 2005-03-03 Fuji Photo Film Co Ltd 感刺激性組成物、化合物及び該感刺激性組成物を用いたパターン形成方法
US6866376B2 (en) 2001-09-28 2005-03-15 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
JP2008112186A (ja) * 2002-02-13 2008-05-15 Fujifilm Corp 電子線、ｅｕｖ又はｘ線用ネガ型レジスト組成物及びそれを用いたパターン形成方法
EP1983023A1 (en) 2007-02-02 2008-10-22 JSR Corporation Radiation-curable composition, composite and manufacturing method thereof
WO2009136482A1 (ja) * 2008-05-06 2009-11-12 サンアプロ株式会社 スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体
WO2010095385A1 (ja) 2009-02-20 2010-08-26 サンアプロ株式会社 スルホニウム塩，光酸発生剤及び感光性樹脂組成物
WO2011040531A1 (ja) 2009-10-01 2011-04-07 日立化成工業株式会社 有機エレクトロニクス用材料、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、及びそれを用いた表示素子、照明装置、表示装置
WO2011132702A1 (ja) 2010-04-22 2011-10-27 日立化成工業株式会社 有機エレクトロニクス材料、重合開始剤及び熱重合開始剤、インク組成物、有機薄膜及びその製造方法、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、照明装置、表示素子、並びに表示装置
EP2402818A1 (en) 2010-06-30 2012-01-04 FUJIFILM Corporation Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same
WO2014136900A1 (ja) 2013-03-08 2014-09-12 日立化成株式会社 イオン性化合物を含有する処理液、有機エレクトロニクス素子、及び有機エレクトロニクス素子の製造方法
WO2015001804A1 (ja) 2013-07-05 2015-01-08 サンアプロ株式会社 光酸発生剤及びフォトリソグラフィー用樹脂組成物
KR20150071026A (ko) 2012-10-18 2015-06-25 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물
KR20150092176A (ko) 2012-12-07 2015-08-12 디에스피 고쿄 후도 ＆ 케미카루 가부시키가이샤 신규한 술포늄염 화합물, 그 제조 방법 및 광산발생제
EP2915843A1 (en) 2014-03-05 2015-09-09 Shin-Etsu Chemical Co., Ltd. Radiation-curable silicone composition
KR20160089419A (ko) 2013-11-25 2016-07-27 와꼬 쥰야꾸 고교 가부시키가이샤 산 및 라디칼 발생제, 그리고 산 및 라디칼 발생 방법
JPWO2015125745A1 (ja) * 2014-02-19 2017-03-30 日本化薬株式会社 新規化合物、該化合物を含有する光酸発生剤及び該光酸発生剤を含有する感光性樹脂組成物
KR20170065560A (ko) 2014-09-26 2017-06-13 도쿄 오카 고교 가부시키가이샤 설포늄 염, 광산발생제 및 감광성 조성물
KR20170080574A (ko) 2014-11-07 2017-07-10 산아프로 가부시키가이샤 술포네이트 화합물, 광산 발생제 및 포토리소그래피용 수지 조성물
KR20180048561A (ko) 2015-09-03 2018-05-10 산아프로 가부시키가이샤 경화성 조성물 및 그것을 사용한 경화체
KR20190017757A (ko) 2016-06-09 2019-02-20 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물
KR20190022447A (ko) 2016-06-29 2019-03-06 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 광 경화성 조성물, 및 그 경화체
KR20190037230A (ko) 2016-07-28 2019-04-05 산아프로 가부시키가이샤 술포늄염, 열 또는 광산 발생제, 열 또는 광 경화성 조성물 및 그 경화체
KR20190091436A (ko) 2016-12-12 2019-08-06 산아프로 가부시키가이샤 광산 발생제 및 포토리소그래피용 수지 조성물
WO2020145043A1 (ja) 2019-01-10 2020-07-16 サンアプロ株式会社 スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物
KR20210092713A (ko) 2018-11-22 2021-07-26 산아프로 가부시키가이샤 광산 발생제 및 포토리소그래피용 수지 조성물
WO2021186846A1 (ja) 2020-03-17 2021-09-23 サンアプロ株式会社 スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物
US11926581B2 (en) 2018-05-25 2024-03-12 San-Apro Limited Sulfonium salt, photoacid generator, curable composition, and resist composition

Families Citing this family (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
AU517415B2 (en) * 1976-07-09 1981-07-30 General Electric Company Curable polymer composition
US4108747A (en) * 1976-07-14 1978-08-22 General Electric Company Curable compositions and method for curing such compositions
US4090936A (en) 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4101513A (en) * 1977-02-02 1978-07-18 Minnesota Mining And Manufacturing Company Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof
US4102687A (en) * 1977-02-14 1978-07-25 General Electric Company UV Curable composition of a thermosetting condensation resin and Group VIa onium salt
GB1604953A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
US4246298A (en) * 1979-03-14 1981-01-20 American Can Company Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application
US4299938A (en) * 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
US4319974A (en) * 1980-04-21 1982-03-16 General Electric Company UV Curable compositions and substrates treated therewith
US4387216A (en) 1981-05-06 1983-06-07 Ciba-Geigy Corporation Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants
DE3135636A1 (de) 1981-09-09 1983-03-17 Basf Ag, 6700 Ludwigshafen Haertbare epoxidharze
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS61190524A (ja) * 1985-01-25 1986-08-25 Asahi Denka Kogyo Kk エネルギ−線硬化性組成物
JPS61242615A (ja) * 1985-04-18 1986-10-28 Nippon Air Filter Kk 集塵方法及びその装置
DE3604580A1 (de) * 1986-02-14 1987-08-20 Basf Ag Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
US4882201A (en) * 1988-03-21 1989-11-21 General Electric Company Non-toxic aryl onium salts, UV curable coating compositions and food packaging use
US4871786A (en) * 1988-10-03 1989-10-03 Minnesota Mining And Manufacturing Company Organic fluoride sources
US5047568A (en) * 1988-11-18 1991-09-10 International Business Machines Corporation Sulfonium salts and use and preparation thereof
DE3902114A1 (de) * 1989-01-25 1990-08-02 Basf Ag Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare sulfoniumsalze und verfahren zu deren herstellung
JPH0347573A (ja) * 1989-07-12 1991-02-28 Ishigaki Kiko Kk 微粉体の分級方法並びにその装置
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
DE3933420C1 (zh) * 1989-10-06 1991-03-07 Th. Goldschmidt Ag, 4300 Essen, De
JP2697937B2 (ja) * 1989-12-15 1998-01-19 キヤノン株式会社 活性エネルギー線硬化性樹脂組成物
KR960000980B1 (ko) * 1990-03-27 1996-01-15 가부시기가이샤 히다찌 세이사꾸쇼 무전해도금용 기재 접착제, 이 접착제를 사용한 프린트 회로판 및 이의 용도
US5108859A (en) * 1990-04-16 1992-04-28 Eastman Kodak Company Photoelectrographic elements and imaging method
DE4027437C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds.
DE4027438C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp.
US5166125A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Method of forming color filter array element with patternable overcoat layer
US5166126A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Color filter array element with protective overcoat layer and method of forming same
US5466845A (en) * 1992-06-12 1995-11-14 Wacker-Chemie Gmbh Sulfonium salts and process for their preparation
GB9309275D0 (en) * 1993-05-05 1993-06-16 Smith & Nephew Orthopaedic material
US5502083A (en) * 1993-06-18 1996-03-26 Nippon Kayaku Kabushiki Kaisha Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物
FR2794126B1 (fr) * 1999-05-26 2003-07-18 Gemplus Card Int Nouvelle composition adhesive et conductrice, procede de connexion, procede de constitution de composants electriques ou electroniques, utilisation de cette composition, element conducteur
DE60230679D1 (de) 2002-03-04 2009-02-12 Wako Pure Chem Ind Ltd Heterocyclustragende oniumsalze
JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
JP4474317B2 (ja) 2005-03-31 2010-06-02 富士フイルム株式会社 平版印刷版の作製方法
JP2006335826A (ja) 2005-05-31 2006-12-14 Fujifilm Holdings Corp インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法
JP2007254454A (ja) * 2006-02-23 2007-10-04 Fujifilm Corp スルホニウム塩、硬化性組成物、インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
JP5276264B2 (ja) 2006-07-03 2013-08-28 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法
EP1955858B1 (en) 2007-02-06 2014-06-18 FUJIFILM Corporation Ink-jet recording method and device
US8240808B2 (en) 2007-02-07 2012-08-14 Fujifilm Corporation Ink-jet head maintenance device, ink-jet recording device and ink-jet head maintenance method
JP5227521B2 (ja) 2007-02-26 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、インクセット
JP5224699B2 (ja) 2007-03-01 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版
JP5243072B2 (ja) 2007-03-30 2013-07-24 富士フイルム株式会社 インク組成物、並びに、それを用いた画像記録方法及び画像記録物
JP5306681B2 (ja) 2007-03-30 2013-10-02 富士フイルム株式会社 重合性化合物、重合体、インク組成物、印刷物及びインクジェット記録方法
JP4898618B2 (ja) 2007-09-28 2012-03-21 富士フイルム株式会社 インクジェット記録方法
JP5265165B2 (ja) 2007-09-28 2013-08-14 富士フイルム株式会社 塗布装置及びこれを用いるインクジェット記録装置
JP5227560B2 (ja) 2007-09-28 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
JP5254632B2 (ja) 2008-02-07 2013-08-07 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物
US20090214797A1 (en) 2008-02-25 2009-08-27 Fujifilm Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
JP5583329B2 (ja) 2008-03-11 2014-09-03 富士フイルム株式会社 顔料組成物、インク組成物、印刷物、インクジェット記録方法、及びポリアリルアミン誘導体
JP4914862B2 (ja) 2008-03-26 2012-04-11 富士フイルム株式会社 インクジェット記録方法、及び、インクジェット記録装置
JP2010077228A (ja) 2008-09-25 2010-04-08 Fujifilm Corp インク組成物、インクジェット記録方法、及び、印刷物
JP2010180330A (ja) 2009-02-05 2010-08-19 Fujifilm Corp 非水系インク、インクセット、画像記録方法、画像記録装置、および記録物
JP5350827B2 (ja) 2009-02-09 2013-11-27 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5349095B2 (ja) 2009-03-17 2013-11-20 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5349097B2 (ja) 2009-03-19 2013-11-20 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
JP5383289B2 (ja) 2009-03-31 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット用であるインク組成物、インクジェット記録方法、およびインクジェット法による印刷物
JP2010241948A (ja) 2009-04-06 2010-10-28 Shin-Etsu Chemical Co Ltd 放射線硬化性シリコーン組成物
JP5572026B2 (ja) 2009-09-18 2014-08-13 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5530141B2 (ja) 2009-09-29 2014-06-25 富士フイルム株式会社 インク組成物及びインクジェット記録方法
EP2644664B1 (en) 2012-03-29 2015-07-29 Fujifilm Corporation Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article
WO2013172407A1 (ja) 2012-05-18 2013-11-21 シーメット株式会社 光学的立体造形用樹脂組成物
JP5980702B2 (ja) 2013-03-07 2016-08-31 富士フイルム株式会社 インクジェットインク組成物、インクジェット記録方法、及び、成型印刷物の製造方法
JP5939644B2 (ja) 2013-08-30 2016-06-22 富士フイルム株式会社 画像形成方法、インモールド成型品の製造方法、及び、インクセット

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3412046A (en) * 1965-07-01 1968-11-19 Dexter Corp Catalyzed polyepoxide-anhydride resin systems

Cited By (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5495686A (en) * 1977-08-05 1979-07-28 Gen Electric Photocurable composition and curing method
JPS55164204A (en) * 1977-08-05 1980-12-20 Gen Electric Photoinitiator
JPS5453181A (en) * 1977-09-14 1979-04-26 Gen Electric Photoopolymerization initiator
JPS61261365A (ja) * 1985-05-14 1986-11-19 Nippon Oil Co Ltd 光硬化性被覆組成物
US5399596A (en) * 1988-03-03 1995-03-21 Sanshin Kagaku Kogyo Co., Ltd. Polyfluoride sulfonium compounds and polymerization initiator thereof
EP0503774A2 (en) * 1991-02-16 1992-09-16 Canon Kabushiki Kaisha Optical recording medium
US6313188B1 (en) 1996-09-19 2001-11-06 Nippon Soda Co., Ltd. Photocationically polymerizable composition comprising a polycyclic aromatic compound
US6013714A (en) * 1996-09-20 2000-01-11 Dsm N.V. Resin composition and fibrous material forming mold
US6127085A (en) * 1996-10-14 2000-10-03 Dsm N.V. Photo-curable resin composition
US6096796A (en) * 1996-12-10 2000-08-01 Dsm N.V. Photo-curable resin composition
US5981616A (en) * 1996-12-13 1999-11-09 Dsm N.V. Photo-curable resin composition used for photo fabication of three-dimensional objects
US6365644B1 (en) 1996-12-13 2002-04-02 Dsm N.V. Photo-curable resin composition used for photo-fabrication of three-dimensional object
USRE42593E1 (en) 1996-12-13 2011-08-02 Dsm Ip Assets B.V. Photo-curable resin composition used for photo-fabrication of three-dimensional object
US6805439B2 (en) 2001-09-06 2004-10-19 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
US6866376B2 (en) 2001-09-28 2005-03-15 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
JP4701231B2 (ja) * 2002-02-13 2011-06-15 富士フイルム株式会社 電子線、ｅｕｖ又はｘ線用ネガ型レジスト組成物及びそれを用いたパターン形成方法
JP2008112186A (ja) * 2002-02-13 2008-05-15 Fujifilm Corp 電子線、ｅｕｖ又はｘ線用ネガ型レジスト組成物及びそれを用いたパターン形成方法
EP1348727A2 (en) 2002-03-29 2003-10-01 Brother Kogyo Kabushiki Kaisha Image-receiving layer composition and overcoat layer composition for ink-jet recording
JP4533639B2 (ja) * 2003-07-22 2010-09-01 富士フイルム株式会社 感刺激性組成物、化合物及び該感刺激性組成物を用いたパターン形成方法
JP2005055864A (ja) * 2003-07-22 2005-03-03 Fuji Photo Film Co Ltd 感刺激性組成物、化合物及び該感刺激性組成物を用いたパターン形成方法
EP1983023A1 (en) 2007-02-02 2008-10-22 JSR Corporation Radiation-curable composition, composite and manufacturing method thereof
WO2009136482A1 (ja) * 2008-05-06 2009-11-12 サンアプロ株式会社 スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体
JP2009269849A (ja) * 2008-05-06 2009-11-19 San Apro Kk スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体
US8278030B2 (en) 2008-05-06 2012-10-02 San-Apro Limited Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof
US8617787B2 (en) 2009-02-20 2013-12-31 San-Apro, Ltd. Sulfonium salt, photo-acid generator, and photosensitive resin composition
KR20110118821A (ko) 2009-02-20 2011-11-01 산아프로 가부시키가이샤 술포늄염, 광산 발생제 및 감광성 수지 조성물
WO2010095385A1 (ja) 2009-02-20 2010-08-26 サンアプロ株式会社 スルホニウム塩，光酸発生剤及び感光性樹脂組成物
WO2011040531A1 (ja) 2009-10-01 2011-04-07 日立化成工業株式会社 有機エレクトロニクス用材料、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、及びそれを用いた表示素子、照明装置、表示装置
WO2011132702A1 (ja) 2010-04-22 2011-10-27 日立化成工業株式会社 有機エレクトロニクス材料、重合開始剤及び熱重合開始剤、インク組成物、有機薄膜及びその製造方法、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、照明装置、表示素子、並びに表示装置
EP2402818A1 (en) 2010-06-30 2012-01-04 FUJIFILM Corporation Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same
KR20150071026A (ko) 2012-10-18 2015-06-25 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물
US9465288B2 (en) 2012-12-07 2016-10-11 Dsp Gokyo Food & Chemical Co., Ltd. Sulfonium salt compound, method for producing the same, and photoacid generator
KR20150092176A (ko) 2012-12-07 2015-08-12 디에스피 고쿄 후도 ＆ 케미카루 가부시키가이샤 신규한 술포늄염 화합물, 그 제조 방법 및 광산발생제
WO2014136900A1 (ja) 2013-03-08 2014-09-12 日立化成株式会社 イオン性化合物を含有する処理液、有機エレクトロニクス素子、及び有機エレクトロニクス素子の製造方法
WO2015001804A1 (ja) 2013-07-05 2015-01-08 サンアプロ株式会社 光酸発生剤及びフォトリソグラフィー用樹脂組成物
US10451967B2 (en) 2013-11-25 2019-10-22 Fujifilm Wako Pure Chemical Corporation Acid- and radical-generating agent and method for generating acid and radical
KR20160089419A (ko) 2013-11-25 2016-07-27 와꼬 쥰야꾸 고교 가부시키가이샤 산 및 라디칼 발생제, 그리고 산 및 라디칼 발생 방법
JPWO2015125745A1 (ja) * 2014-02-19 2017-03-30 日本化薬株式会社 新規化合物、該化合物を含有する光酸発生剤及び該光酸発生剤を含有する感光性樹脂組成物
US9834678B2 (en) 2014-03-05 2017-12-05 Shin-Etsu Chemical Co., Ltd. Radiation-curable silicone composition
KR20150104521A (ko) 2014-03-05 2015-09-15 신에쓰 가가꾸 고교 가부시끼가이샤 방사선 경화성 실리콘 조성물
EP2915843A1 (en) 2014-03-05 2015-09-09 Shin-Etsu Chemical Co., Ltd. Radiation-curable silicone composition
US10059662B2 (en) 2014-09-26 2018-08-28 Tokyo Ohka Kogyo Co., Ltd. Sulfonium salt, photoacid generator, and photosensitive composition
KR20170065560A (ko) 2014-09-26 2017-06-13 도쿄 오카 고교 가부시키가이샤 설포늄 염, 광산발생제 및 감광성 조성물
KR20170080574A (ko) 2014-11-07 2017-07-10 산아프로 가부시키가이샤 술포네이트 화합물, 광산 발생제 및 포토리소그래피용 수지 조성물
US10450266B2 (en) 2014-11-07 2019-10-22 San-Apro Limited Sulfonate compound, photoacid generator, and resin composition for photolithography
KR20180048561A (ko) 2015-09-03 2018-05-10 산아프로 가부시키가이샤 경화성 조성물 및 그것을 사용한 경화체
KR20190017757A (ko) 2016-06-09 2019-02-20 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물
KR20190022447A (ko) 2016-06-29 2019-03-06 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 광 경화성 조성물, 및 그 경화체
US10683266B2 (en) 2016-06-29 2020-06-16 San Apro Ltd. Sulfonium salt, photoacid generator, photocurable composition, and cured product thereof
US11370751B2 (en) 2016-07-28 2022-06-28 San Apro Ltd. Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof
KR20190037230A (ko) 2016-07-28 2019-04-05 산아프로 가부시키가이샤 술포늄염, 열 또는 광산 발생제, 열 또는 광 경화성 조성물 및 그 경화체
KR20190091436A (ko) 2016-12-12 2019-08-06 산아프로 가부시키가이샤 광산 발생제 및 포토리소그래피용 수지 조성물
US11926581B2 (en) 2018-05-25 2024-03-12 San-Apro Limited Sulfonium salt, photoacid generator, curable composition, and resist composition
KR20210092713A (ko) 2018-11-22 2021-07-26 산아프로 가부시키가이샤 광산 발생제 및 포토리소그래피용 수지 조성물
KR20210113185A (ko) 2019-01-10 2021-09-15 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물
WO2020145043A1 (ja) 2019-01-10 2020-07-16 サンアプロ株式会社 スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物
WO2021186846A1 (ja) 2020-03-17 2021-09-23 サンアプロ株式会社 スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物
KR20220154085A (ko) 2020-03-17 2022-11-21 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물

Also Published As

Publication number Publication date
DE2518652C2 (de) 1983-05-11
JPS5214278B2 (zh) 1977-04-20
FR2269551A1 (zh) 1975-11-28
DE2559718A1 (de) 1977-08-18
DE2559718C2 (de) 1983-08-04
DE2559833C2 (de) 1983-12-22
GB1516511A (en) 1978-07-05
GB1516512A (en) 1978-07-05
FR2269551B1 (zh) 1978-09-01
DE2518652A1 (de) 1975-11-06
BE828670A (fr) 1975-09-01

Similar Documents

Publication Publication Date Title
FR2269551B1 (zh)
FR2269552B1 (zh)
FR2269553A1 (zh)
AU495930B2 (zh)
JPS50102444A (zh)
JPS50101669A (zh)
JPS50103109U (zh)
JPS5129729U (zh)
AU480758A (zh)
BG22709A1 (zh)
BG20446A1 (zh)
BG19768A1 (zh)
BG22061A3 (zh)
BG22040A1 (zh)
BG21634A1 (zh)
CH566410A5 (zh)
AU480863A (zh)
CH564833A5 (zh)
CH1727074A4 (zh)
BG19847A1 (zh)
CH568134A5 (zh)
BG21526A1 (zh)
BG20950A1 (zh)
CH1163975A4 (zh)
BG20885A1 (zh)