JPS50151997A - - Google Patents

Info

Publication number
JPS50151997A
JPS50151997A JP5211175A JP5211175A JPS50151997A JP S50151997 A JPS50151997 A JP S50151997A JP 5211175 A JP5211175 A JP 5211175A JP 5211175 A JP5211175 A JP 5211175A JP S50151997 A JPS50151997 A JP S50151997A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5211175A
Other languages
Japanese (ja)
Other versions
JPS5214278B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS50151997A publication Critical patent/JPS50151997A/ja
Publication of JPS5214278B2 publication Critical patent/JPS5214278B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66—Arsenic compounds
    • C07F9/68—Arsenic compounds without As—C bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/90—Antimony compounds
    • C07F9/902—Compounds without antimony-carbon linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Reinforced Plastic Materials (AREA)
JP5211175A 1974-05-02 1975-05-01 Expired JPS5214278B2 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46637474A 1974-05-02 1974-05-02

Publications (2)

Publication Number Publication Date
JPS50151997A true JPS50151997A (enrdf_load_stackoverflow) 1975-12-06
JPS5214278B2 JPS5214278B2 (enrdf_load_stackoverflow) 1977-04-20

Family

ID=23851510

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5211175A Expired JPS5214278B2 (enrdf_load_stackoverflow) 1974-05-02 1975-05-01

Country Status (5)

Country Link
JP (1) JPS5214278B2 (enrdf_load_stackoverflow)
BE (1) BE828670A (enrdf_load_stackoverflow)
DE (3) DE2559718C2 (enrdf_load_stackoverflow)
FR (1) FR2269551B1 (enrdf_load_stackoverflow)
GB (2) GB1516512A (enrdf_load_stackoverflow)

Cited By (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5453181A (en) * 1977-09-14 1979-04-26 Gen Electric Photoopolymerization initiator
JPS5495686A (en) * 1977-08-05 1979-07-28 Gen Electric Photocurable composition and curing method
JPS61261365A (ja) * 1985-05-14 1986-11-19 Nippon Oil Co Ltd 光硬化性被覆組成物
US5399596A (en) * 1988-03-03 1995-03-21 Sanshin Kagaku Kogyo Co., Ltd. Polyfluoride sulfonium compounds and polymerization initiator thereof
US5981616A (en) * 1996-12-13 1999-11-09 Dsm N.V. Photo-curable resin composition used for photo fabication of three-dimensional objects
US6013714A (en) * 1996-09-20 2000-01-11 Dsm N.V. Resin composition and fibrous material forming mold
US6096796A (en) * 1996-12-10 2000-08-01 Dsm N.V. Photo-curable resin composition
US6127085A (en) * 1996-10-14 2000-10-03 Dsm N.V. Photo-curable resin composition
US6313188B1 (en) 1996-09-19 2001-11-06 Nippon Soda Co., Ltd. Photocationically polymerizable composition comprising a polycyclic aromatic compound
EP1348727A2 (en) 2002-03-29 2003-10-01 Brother Kogyo Kabushiki Kaisha Image-receiving layer composition and overcoat layer composition for ink-jet recording
US6805439B2 (en) 2001-09-06 2004-10-19 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
JP2005055864A (ja) * 2003-07-22 2005-03-03 Fuji Photo Film Co Ltd 感刺激性組成物、化合物及び該感刺激性組成物を用いたパターン形成方法
US6866376B2 (en) 2001-09-28 2005-03-15 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
JP2008112186A (ja) * 2002-02-13 2008-05-15 Fujifilm Corp 電子線、ｅｕｖ又はｘ線用ネガ型レジスト組成物及びそれを用いたパターン形成方法
EP1983023A1 (en) 2007-02-02 2008-10-22 JSR Corporation Radiation-curable composition, composite and manufacturing method thereof
WO2009136482A1 (ja) * 2008-05-06 2009-11-12 サンアプロ株式会社 スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体
WO2010095385A1 (ja) 2009-02-20 2010-08-26 サンアプロ株式会社 スルホニウム塩，光酸発生剤及び感光性樹脂組成物
WO2011040531A1 (ja) 2009-10-01 2011-04-07 日立化成工業株式会社 有機エレクトロニクス用材料、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、及びそれを用いた表示素子、照明装置、表示装置
WO2011132702A1 (ja) 2010-04-22 2011-10-27 日立化成工業株式会社 有機エレクトロニクス材料、重合開始剤及び熱重合開始剤、インク組成物、有機薄膜及びその製造方法、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、照明装置、表示素子、並びに表示装置
EP2402818A1 (en) 2010-06-30 2012-01-04 FUJIFILM Corporation Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same
WO2014136900A1 (ja) 2013-03-08 2014-09-12 日立化成株式会社 イオン性化合物を含有する処理液、有機エレクトロニクス素子、及び有機エレクトロニクス素子の製造方法
WO2015001804A1 (ja) 2013-07-05 2015-01-08 サンアプロ株式会社 光酸発生剤及びフォトリソグラフィー用樹脂組成物
KR20150071026A (ko) 2012-10-18 2015-06-25 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물
KR20150092176A (ko) 2012-12-07 2015-08-12 디에스피 고쿄 후도 ＆ 케미카루 가부시키가이샤 신규한 술포늄염 화합물, 그 제조 방법 및 광산발생제
EP2915843A1 (en) 2014-03-05 2015-09-09 Shin-Etsu Chemical Co., Ltd. Radiation-curable silicone composition
KR20160089419A (ko) 2013-11-25 2016-07-27 와꼬 쥰야꾸 고교 가부시키가이샤 산 및 라디칼 발생제, 그리고 산 및 라디칼 발생 방법
JPWO2015125745A1 (ja) * 2014-02-19 2017-03-30 日本化薬株式会社 新規化合物、該化合物を含有する光酸発生剤及び該光酸発生剤を含有する感光性樹脂組成物
KR20170065560A (ko) 2014-09-26 2017-06-13 도쿄 오카 고교 가부시키가이샤 설포늄 염, 광산발생제 및 감광성 조성물
KR20170080574A (ko) 2014-11-07 2017-07-10 산아프로 가부시키가이샤 술포네이트 화합물, 광산 발생제 및 포토리소그래피용 수지 조성물
KR20180048561A (ko) 2015-09-03 2018-05-10 산아프로 가부시키가이샤 경화성 조성물 및 그것을 사용한 경화체
KR20190017757A (ko) 2016-06-09 2019-02-20 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물
KR20190022447A (ko) 2016-06-29 2019-03-06 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 광 경화성 조성물, 및 그 경화체
KR20190037230A (ko) 2016-07-28 2019-04-05 산아프로 가부시키가이샤 술포늄염, 열 또는 광산 발생제, 열 또는 광 경화성 조성물 및 그 경화체
KR20190091436A (ko) 2016-12-12 2019-08-06 산아프로 가부시키가이샤 광산 발생제 및 포토리소그래피용 수지 조성물
WO2020145043A1 (ja) 2019-01-10 2020-07-16 サンアプロ株式会社 スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物
KR20210092713A (ko) 2018-11-22 2021-07-26 산아프로 가부시키가이샤 광산 발생제 및 포토리소그래피용 수지 조성물
WO2021186846A1 (ja) 2020-03-17 2021-09-23 サンアプロ株式会社 スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物
US11926581B2 (en) 2018-05-25 2024-03-12 San-Apro Limited Sulfonium salt, photoacid generator, curable composition, and resist composition

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US4108747A (en) * 1976-07-14 1978-08-22 General Electric Company Curable compositions and method for curing such compositions
US4090936A (en) 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4101513A (en) * 1977-02-02 1978-07-18 Minnesota Mining And Manufacturing Company Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof
US4102687A (en) * 1977-02-14 1978-07-25 General Electric Company UV Curable composition of a thermosetting condensation resin and Group VIa onium salt
GB1604953A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
US4246298A (en) * 1979-03-14 1981-01-20 American Can Company Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application
US4299938A (en) * 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
US4319974A (en) 1980-04-21 1982-03-16 General Electric Company UV Curable compositions and substrates treated therewith
JPS57125212A (en) 1981-01-27 1982-08-04 Toshiba Corp Photo-polymerizable composition
US4387216A (en) 1981-05-06 1983-06-07 Ciba-Geigy Corporation Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants
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KR960000980B1 (ko) * 1990-03-27 1996-01-15 가부시기가이샤 히다찌 세이사꾸쇼 무전해도금용 기재 접착제, 이 접착제를 사용한 프린트 회로판 및 이의 용도
US5108859A (en) * 1990-04-16 1992-04-28 Eastman Kodak Company Photoelectrographic elements and imaging method
DE4027437C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds.
DE4027438C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp.
US5354590A (en) * 1991-02-16 1994-10-11 Canon Kabushiki Kaisha Optical recording medium
US5166126A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Color filter array element with protective overcoat layer and method of forming same
US5166125A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Method of forming color filter array element with patternable overcoat layer
US5466845A (en) * 1992-06-12 1995-11-14 Wacker-Chemie Gmbh Sulfonium salts and process for their preparation
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US5502083A (en) * 1993-06-18 1996-03-26 Nippon Kayaku Kabushiki Kaisha Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product
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JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物
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JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
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DE2559833C2 (de) 1983-12-22
JPS5214278B2 (enrdf_load_stackoverflow) 1977-04-20
BE828670A (fr) 1975-09-01
GB1516511A (en) 1978-07-05
DE2559718A1 (de) 1977-08-18
DE2559718C2 (de) 1983-08-04
FR2269551A1 (enrdf_load_stackoverflow) 1975-11-28
DE2518652C2 (de) 1983-05-11
GB1516512A (en) 1978-07-05
DE2518652A1 (de) 1975-11-06
FR2269551B1 (enrdf_load_stackoverflow) 1978-09-01

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