GB1516512A - Chalcogenium salts - Google Patents

Chalcogenium salts

Info

Publication number
GB1516512A
GB1516512A GB49978A GB49978A GB1516512A GB 1516512 A GB1516512 A GB 1516512A GB 49978 A GB49978 A GB 49978A GB 49978 A GB49978 A GB 49978A GB 1516512 A GB1516512 A GB 1516512A
Authority
GB
United Kingdom
Prior art keywords
chalcogenium
salts
chalcogenium salts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB49978A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of GB1516512A publication Critical patent/GB1516512A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08Saturated oxiranes
    • C08G65/10Saturated oxiranes characterised by the catalysts used
    • C08G65/105Onium compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66Arsenic compounds
    • C07F9/68Arsenic compounds without As—C bonds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/90Antimony compounds
    • C07F9/902Compounds without antimony-carbon linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/14Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F236/16Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Reinforced Plastic Materials (AREA)
GB49978A 1974-05-02 1975-04-16 Chalcogenium salts Expired GB1516512A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46637474A 1974-05-02 1974-05-02

Publications (1)

Publication Number Publication Date
GB1516512A true GB1516512A (en) 1978-07-05

Family

ID=23851510

Family Applications (2)

Application Number Title Priority Date Filing Date
GB49978A Expired GB1516512A (en) 1974-05-02 1975-04-16 Chalcogenium salts
GB1570175A Expired GB1516511A (en) 1974-05-02 1975-04-16 Curable epoxide compositions

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB1570175A Expired GB1516511A (en) 1974-05-02 1975-04-16 Curable epoxide compositions

Country Status (5)

Country Link
JP (1) JPS5214278B2 (enrdf_load_stackoverflow)
BE (1) BE828670A (enrdf_load_stackoverflow)
DE (3) DE2559718C2 (enrdf_load_stackoverflow)
FR (1) FR2269551B1 (enrdf_load_stackoverflow)
GB (2) GB1516512A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4734444A (en) * 1986-02-14 1988-03-29 Basf Aktiengesellschaft Curable mixtures containing N-sulfonylaminosulfonium salts as cationically active catalysts
US5335004A (en) * 1989-12-15 1994-08-02 Canon Kabushiki Kaisha Active energy-ray-curable resin composition, ink jet head having ink path wall formed by use of the composition, process for preparing the head, and ink jet apparatus provided with the head
WO2003074509A1 (fr) * 2002-03-04 2003-09-12 Wako Pure Chemical Industries, Ltd. Sels d'onium comportant des heterocycles

Families Citing this family (107)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
AU517415B2 (en) * 1976-07-09 1981-07-30 General Electric Company Curable polymer composition
US4108747A (en) * 1976-07-14 1978-08-22 General Electric Company Curable compositions and method for curing such compositions
US4090936A (en) 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4101513A (en) * 1977-02-02 1978-07-18 Minnesota Mining And Manufacturing Company Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof
US4102687A (en) * 1977-02-14 1978-07-25 General Electric Company UV Curable composition of a thermosetting condensation resin and Group VIa onium salt
GB1604954A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
GB1604953A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
GB1596000A (en) * 1977-09-14 1981-08-19 Gen Electric Heterocyclic onium salts their preparation and their use for photopolymerisable organic materials
US4246298A (en) * 1979-03-14 1981-01-20 American Can Company Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application
US4299938A (en) * 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
US4319974A (en) 1980-04-21 1982-03-16 General Electric Company UV Curable compositions and substrates treated therewith
JPS57125212A (en) 1981-01-27 1982-08-04 Toshiba Corp Photo-polymerizable composition
US4387216A (en) 1981-05-06 1983-06-07 Ciba-Geigy Corporation Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants
DE3135636A1 (de) 1981-09-09 1983-03-17 Basf Ag, 6700 Ludwigshafen Haertbare epoxidharze
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS61190524A (ja) * 1985-01-25 1986-08-25 Asahi Denka Kogyo Kk エネルギ−線硬化性組成物
JPS61242615A (ja) * 1985-04-18 1986-10-28 Nippon Air Filter Kk 集塵方法及びその装置
JPS61261365A (ja) * 1985-05-14 1986-11-19 Nippon Oil Co Ltd 光硬化性被覆組成物
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
US5399596A (en) * 1988-03-03 1995-03-21 Sanshin Kagaku Kogyo Co., Ltd. Polyfluoride sulfonium compounds and polymerization initiator thereof
US4882201A (en) * 1988-03-21 1989-11-21 General Electric Company Non-toxic aryl onium salts, UV curable coating compositions and food packaging use
US4871786A (en) * 1988-10-03 1989-10-03 Minnesota Mining And Manufacturing Company Organic fluoride sources
US5047568A (en) * 1988-11-18 1991-09-10 International Business Machines Corporation Sulfonium salts and use and preparation thereof
DE3902114A1 (de) * 1989-01-25 1990-08-02 Basf Ag Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare sulfoniumsalze und verfahren zu deren herstellung
EP0410606B1 (en) 1989-07-12 1996-11-13 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
JPH0347573A (ja) * 1989-07-12 1991-02-28 Ishigaki Kiko Kk 微粉体の分級方法並びにその装置
DE3933420C1 (enrdf_load_stackoverflow) * 1989-10-06 1991-03-07 Th. Goldschmidt Ag, 4300 Essen, De
KR960000980B1 (ko) * 1990-03-27 1996-01-15 가부시기가이샤 히다찌 세이사꾸쇼 무전해도금용 기재 접착제, 이 접착제를 사용한 프린트 회로판 및 이의 용도
US5108859A (en) * 1990-04-16 1992-04-28 Eastman Kodak Company Photoelectrographic elements and imaging method
DE4027437C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds.
DE4027438C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp.
US5354590A (en) * 1991-02-16 1994-10-11 Canon Kabushiki Kaisha Optical recording medium
US5166126A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Color filter array element with protective overcoat layer and method of forming same
US5166125A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Method of forming color filter array element with patternable overcoat layer
US5466845A (en) * 1992-06-12 1995-11-14 Wacker-Chemie Gmbh Sulfonium salts and process for their preparation
GB9309275D0 (en) * 1993-05-05 1993-06-16 Smith & Nephew Orthopaedic material
US5502083A (en) * 1993-06-18 1996-03-26 Nippon Kayaku Kabushiki Kaisha Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
EP0927726B1 (en) 1996-09-19 2004-11-10 Nippon Soda Co., Ltd. Photocatalytic composition
JPH1087963A (ja) * 1996-09-20 1998-04-07 Japan Synthetic Rubber Co Ltd 樹脂組成物および繊維質材料成形型
JP3786480B2 (ja) * 1996-10-14 2006-06-14 Jsr株式会社 光硬化性樹脂組成物
JP3626302B2 (ja) * 1996-12-10 2005-03-09 Jsr株式会社 光硬化性樹脂組成物
JP3765896B2 (ja) * 1996-12-13 2006-04-12 Jsr株式会社 光学的立体造形用光硬化性樹脂組成物
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物
FR2794126B1 (fr) * 1999-05-26 2003-07-18 Gemplus Card Int Nouvelle composition adhesive et conductrice, procede de connexion, procede de constitution de composants electriques ou electroniques, utilisation de cette composition, element conducteur
JP2003073481A (ja) 2001-09-06 2003-03-12 Brother Ind Ltd 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ
JP2003105077A (ja) 2001-09-28 2003-04-09 Brother Ind Ltd 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ
JP4701231B2 (ja) * 2002-02-13 2011-06-15 富士フイルム株式会社 電子線、euv又はx線用ネガ型レジスト組成物及びそれを用いたパターン形成方法
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EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
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TW200838967A (en) 2007-02-02 2008-10-01 Jsr Corp Composition for radiation-curable adhesive, composite, and method for producing the composite
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WO2018020974A1 (ja) 2016-07-28 2018-02-01 サンアプロ株式会社 スルホニウム塩、熱又は光酸発生剤、熱又は光硬化性組成物及びその硬化体
JP6591699B2 (ja) 2016-12-12 2019-10-16 サンアプロ株式会社 光酸発生剤及びフォトリソグラフィー用樹脂組成物
JP7174044B2 (ja) 2018-05-25 2022-11-17 サンアプロ株式会社 スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物
JP7116669B2 (ja) 2018-11-22 2022-08-10 サンアプロ株式会社 光酸発生剤及びフォトリソグラフィー用樹脂組成物
CN113286781B (zh) * 2019-01-10 2023-08-08 三亚普罗股份有限公司 锍盐、光产酸剂、固化性组合物和抗蚀剂组合物
JP7684278B2 (ja) 2020-03-17 2025-05-27 サンアプロ株式会社 スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3412046A (en) 1965-07-01 1968-11-19 Dexter Corp Catalyzed polyepoxide-anhydride resin systems

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4734444A (en) * 1986-02-14 1988-03-29 Basf Aktiengesellschaft Curable mixtures containing N-sulfonylaminosulfonium salts as cationically active catalysts
US5335004A (en) * 1989-12-15 1994-08-02 Canon Kabushiki Kaisha Active energy-ray-curable resin composition, ink jet head having ink path wall formed by use of the composition, process for preparing the head, and ink jet apparatus provided with the head
WO2003074509A1 (fr) * 2002-03-04 2003-09-12 Wako Pure Chemical Industries, Ltd. Sels d'onium comportant des heterocycles
US7318991B2 (en) 2002-03-04 2008-01-15 Wako Pure Chemical Industries, Ltd. Heterocycle-bearing onium salts
US7833691B2 (en) 2002-03-04 2010-11-16 Wako Pure Chemical Industries, Ltd. Heterocycle-bearing onium salts

Also Published As

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DE2559833C2 (de) 1983-12-22
JPS5214278B2 (enrdf_load_stackoverflow) 1977-04-20
BE828670A (fr) 1975-09-01
GB1516511A (en) 1978-07-05
DE2559718A1 (de) 1977-08-18
DE2559718C2 (de) 1983-08-04
FR2269551A1 (enrdf_load_stackoverflow) 1975-11-28
DE2518652C2 (de) 1983-05-11
JPS50151997A (enrdf_load_stackoverflow) 1975-12-06
DE2518652A1 (de) 1975-11-06
FR2269551B1 (enrdf_load_stackoverflow) 1978-09-01

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