FR2269551A1 - - Google Patents

Info

Publication number
FR2269551A1
FR2269551A1 FR7513519A FR7513519A FR2269551A1 FR 2269551 A1 FR2269551 A1 FR 2269551A1 FR 7513519 A FR7513519 A FR 7513519A FR 7513519 A FR7513519 A FR 7513519A FR 2269551 A1 FR2269551 A1 FR 2269551A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7513519A
Other languages
French (fr)
Other versions
FR2269551B1 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of FR2269551A1 publication Critical patent/FR2269551A1/fr
Application granted granted Critical
Publication of FR2269551B1 publication Critical patent/FR2269551B1/fr
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08Saturated oxiranes
    • C08G65/10Saturated oxiranes characterised by the catalysts used
    • C08G65/105Onium compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66Arsenic compounds
    • C07F9/68Arsenic compounds without As—C bonds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/90Antimony compounds
    • C07F9/902Compounds without antimony-carbon linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/14Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F236/16Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Reinforced Plastic Materials (AREA)
FR7513519A 1974-05-02 1975-04-30 Expired FR2269551B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46637474A 1974-05-02 1974-05-02

Publications (2)

Publication Number Publication Date
FR2269551A1 true FR2269551A1 (enrdf_load_stackoverflow) 1975-11-28
FR2269551B1 FR2269551B1 (enrdf_load_stackoverflow) 1978-09-01

Family

ID=23851510

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7513519A Expired FR2269551B1 (enrdf_load_stackoverflow) 1974-05-02 1975-04-30

Country Status (5)

Country Link
JP (1) JPS5214278B2 (enrdf_load_stackoverflow)
BE (1) BE828670A (enrdf_load_stackoverflow)
DE (3) DE2559718C2 (enrdf_load_stackoverflow)
FR (1) FR2269551B1 (enrdf_load_stackoverflow)
GB (2) GB1516512A (enrdf_load_stackoverflow)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2322897A1 (fr) * 1975-09-02 1977-04-01 Minnesota Mining & Mfg Compositions photopolymerisables
FR2357931A1 (fr) * 1976-07-09 1978-02-03 Gen Electric Compositions durcissables utilisables comme materiaux photoresistants
FR2399443A1 (fr) * 1977-08-05 1979-03-02 Gen Electric Composition photodurcissable a base de materiau organique aliphatiquement insature
FR2399444A1 (fr) * 1977-08-05 1979-03-02 Gen Electric Compositions de resines organiques photodurcissables depourvues d'oxygene appartenant a un groupe oxirane et procede de durcissement
FR2403351A1 (fr) * 1977-09-14 1979-04-13 Gen Electric Photoinitiateurs formes de sels d'onium d'elements du groupe via
FR2451260A1 (fr) * 1979-03-14 1980-10-10 American Can Co Procede de revetement de substrats avec une resine epoxy
EP0369194A3 (en) * 1988-11-18 1990-12-27 International Business Machines Corporation Sulfonium salts and use and preparation thereof
EP0334056A3 (en) * 1988-03-21 1991-04-10 General Electric Company Non-toxic aryl onium salts, uv curable coating compositions and food packaging use
EP0363095A3 (en) * 1988-10-03 1991-07-31 Minnesota Mining And Manufacturing Company Organic fluoride sources
FR2794126A1 (fr) * 1999-05-26 2000-12-01 Gemplus Card Int Nouvelle composition adhesive et conductrice, procede de connexion, procede de constitution de composants electriques ou electroniques, utilisation de cette composition, element conducteur

Families Citing this family (100)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4108747A (en) * 1976-07-14 1978-08-22 General Electric Company Curable compositions and method for curing such compositions
US4090936A (en) 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4101513A (en) * 1977-02-02 1978-07-18 Minnesota Mining And Manufacturing Company Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof
US4102687A (en) * 1977-02-14 1978-07-25 General Electric Company UV Curable composition of a thermosetting condensation resin and Group VIa onium salt
US4299938A (en) * 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
US4319974A (en) 1980-04-21 1982-03-16 General Electric Company UV Curable compositions and substrates treated therewith
JPS57125212A (en) 1981-01-27 1982-08-04 Toshiba Corp Photo-polymerizable composition
US4387216A (en) 1981-05-06 1983-06-07 Ciba-Geigy Corporation Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants
DE3135636A1 (de) 1981-09-09 1983-03-17 Basf Ag, 6700 Ludwigshafen Haertbare epoxidharze
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS61190524A (ja) * 1985-01-25 1986-08-25 Asahi Denka Kogyo Kk エネルギ−線硬化性組成物
JPS61242615A (ja) * 1985-04-18 1986-10-28 Nippon Air Filter Kk 集塵方法及びその装置
JPS61261365A (ja) * 1985-05-14 1986-11-19 Nippon Oil Co Ltd 光硬化性被覆組成物
DE3604580A1 (de) * 1986-02-14 1987-08-20 Basf Ag Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
US5399596A (en) * 1988-03-03 1995-03-21 Sanshin Kagaku Kogyo Co., Ltd. Polyfluoride sulfonium compounds and polymerization initiator thereof
DE3902114A1 (de) * 1989-01-25 1990-08-02 Basf Ag Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare sulfoniumsalze und verfahren zu deren herstellung
EP0410606B1 (en) 1989-07-12 1996-11-13 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
JPH0347573A (ja) * 1989-07-12 1991-02-28 Ishigaki Kiko Kk 微粉体の分級方法並びにその装置
DE3933420C1 (enrdf_load_stackoverflow) * 1989-10-06 1991-03-07 Th. Goldschmidt Ag, 4300 Essen, De
JP2697937B2 (ja) * 1989-12-15 1998-01-19 キヤノン株式会社 活性エネルギー線硬化性樹脂組成物
KR960000980B1 (ko) * 1990-03-27 1996-01-15 가부시기가이샤 히다찌 세이사꾸쇼 무전해도금용 기재 접착제, 이 접착제를 사용한 프린트 회로판 및 이의 용도
US5108859A (en) * 1990-04-16 1992-04-28 Eastman Kodak Company Photoelectrographic elements and imaging method
DE4027437C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds.
DE4027438C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp.
US5354590A (en) * 1991-02-16 1994-10-11 Canon Kabushiki Kaisha Optical recording medium
US5166126A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Color filter array element with protective overcoat layer and method of forming same
US5166125A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Method of forming color filter array element with patternable overcoat layer
US5466845A (en) * 1992-06-12 1995-11-14 Wacker-Chemie Gmbh Sulfonium salts and process for their preparation
GB9309275D0 (en) * 1993-05-05 1993-06-16 Smith & Nephew Orthopaedic material
US5502083A (en) * 1993-06-18 1996-03-26 Nippon Kayaku Kabushiki Kaisha Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
EP0927726B1 (en) 1996-09-19 2004-11-10 Nippon Soda Co., Ltd. Photocatalytic composition
JPH1087963A (ja) * 1996-09-20 1998-04-07 Japan Synthetic Rubber Co Ltd 樹脂組成物および繊維質材料成形型
JP3786480B2 (ja) * 1996-10-14 2006-06-14 Jsr株式会社 光硬化性樹脂組成物
JP3626302B2 (ja) * 1996-12-10 2005-03-09 Jsr株式会社 光硬化性樹脂組成物
JP3765896B2 (ja) * 1996-12-13 2006-04-12 Jsr株式会社 光学的立体造形用光硬化性樹脂組成物
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物
JP2003073481A (ja) 2001-09-06 2003-03-12 Brother Ind Ltd 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ
JP2003105077A (ja) 2001-09-28 2003-04-09 Brother Ind Ltd 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ
JP4701231B2 (ja) * 2002-02-13 2011-06-15 富士フイルム株式会社 電子線、euv又はx線用ネガ型レジスト組成物及びそれを用いたパターン形成方法
WO2003074509A1 (fr) 2002-03-04 2003-09-12 Wako Pure Chemical Industries, Ltd. Sels d'onium comportant des heterocycles
EP1348727A3 (en) 2002-03-29 2003-12-03 Brother Kogyo Kabushiki Kaisha Image-receiving layer composition and overcoat layer composition for ink-jet recording
JP4533639B2 (ja) * 2003-07-22 2010-09-01 富士フイルム株式会社 感刺激性組成物、化合物及び該感刺激性組成物を用いたパターン形成方法
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Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3412046A (en) 1965-07-01 1968-11-19 Dexter Corp Catalyzed polyepoxide-anhydride resin systems

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2322897A1 (fr) * 1975-09-02 1977-04-01 Minnesota Mining & Mfg Compositions photopolymerisables
FR2357931A1 (fr) * 1976-07-09 1978-02-03 Gen Electric Compositions durcissables utilisables comme materiaux photoresistants
FR2545491A1 (fr) * 1977-08-05 1984-11-09 Gen Electric Compositions de resines organiques photodurcissables pourvues d'oxygene appartenant a un groupe oxirane et procede de durcisement
FR2399444A1 (fr) * 1977-08-05 1979-03-02 Gen Electric Compositions de resines organiques photodurcissables depourvues d'oxygene appartenant a un groupe oxirane et procede de durcissement
FR2399443A1 (fr) * 1977-08-05 1979-03-02 Gen Electric Composition photodurcissable a base de materiau organique aliphatiquement insature
FR2403351A1 (fr) * 1977-09-14 1979-04-13 Gen Electric Photoinitiateurs formes de sels d'onium d'elements du groupe via
FR2451260A1 (fr) * 1979-03-14 1980-10-10 American Can Co Procede de revetement de substrats avec une resine epoxy
EP0334056A3 (en) * 1988-03-21 1991-04-10 General Electric Company Non-toxic aryl onium salts, uv curable coating compositions and food packaging use
EP0363095A3 (en) * 1988-10-03 1991-07-31 Minnesota Mining And Manufacturing Company Organic fluoride sources
EP0369194A3 (en) * 1988-11-18 1990-12-27 International Business Machines Corporation Sulfonium salts and use and preparation thereof
US5047568A (en) * 1988-11-18 1991-09-10 International Business Machines Corporation Sulfonium salts and use and preparation thereof
FR2794126A1 (fr) * 1999-05-26 2000-12-01 Gemplus Card Int Nouvelle composition adhesive et conductrice, procede de connexion, procede de constitution de composants electriques ou electroniques, utilisation de cette composition, element conducteur
WO2000073371A1 (fr) * 1999-05-26 2000-12-07 Gemplus Nouvelle composition adhesive et conductrice, utilisation de cette composition, element conducteur

Also Published As

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DE2559833C2 (de) 1983-12-22
JPS5214278B2 (enrdf_load_stackoverflow) 1977-04-20
BE828670A (fr) 1975-09-01
GB1516511A (en) 1978-07-05
DE2559718A1 (de) 1977-08-18
DE2559718C2 (de) 1983-08-04
DE2518652C2 (de) 1983-05-11
GB1516512A (en) 1978-07-05
JPS50151997A (enrdf_load_stackoverflow) 1975-12-06
DE2518652A1 (de) 1975-11-06
FR2269551B1 (enrdf_load_stackoverflow) 1978-09-01

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