GB1516511A - Curable epoxide compositions - Google Patents

Curable epoxide compositions

Info

Publication number
GB1516511A
GB1516511A GB1570175A GB1570175A GB1516511A GB 1516511 A GB1516511 A GB 1516511A GB 1570175 A GB1570175 A GB 1570175A GB 1570175 A GB1570175 A GB 1570175A GB 1516511 A GB1516511 A GB 1516511A
Authority
GB
United Kingdom
Prior art keywords
epoxy
fluoroborate
photo
resin
salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1570175A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of GB1516511A publication Critical patent/GB1516511A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66—Arsenic compounds
    • C07F9/68—Arsenic compounds without As—C bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/90—Antimony compounds
    • C07F9/902—Compounds without antimony-carbon linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Reinforced Plastic Materials (AREA)
  • Paints Or Removers (AREA)
GB1570175A 1974-05-02 1975-04-16 Curable epoxide compositions Expired GB1516511A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46637474A 1974-05-02 1974-05-02

Publications (1)

Publication Number Publication Date
GB1516511A true GB1516511A (en) 1978-07-05

Family

ID=23851510

Family Applications (2)

Application Number Title Priority Date Filing Date
GB1570175A Expired GB1516511A (en) 1974-05-02 1975-04-16 Curable epoxide compositions
GB49978A Expired GB1516512A (en) 1974-05-02 1975-04-16 Chalcogenium salts

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB49978A Expired GB1516512A (en) 1974-05-02 1975-04-16 Chalcogenium salts

Country Status (5)

Country Link
JP (1) JPS5214278B2 (enrdf_load_stackoverflow)
BE (1) BE828670A (enrdf_load_stackoverflow)
DE (3) DE2559718C2 (enrdf_load_stackoverflow)
FR (1) FR2269551B1 (enrdf_load_stackoverflow)
GB (2) GB1516511A (enrdf_load_stackoverflow)

Cited By (21)

* Cited by examiner, † Cited by third party
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EP0022081A1 (de) * 1979-06-19 1981-01-07 Ciba-Geigy Ag Sulphoxoniumsalze enthaltende polymerisierbare Mischungen sowie Verfahren zur Herstellung hochmolekularer Produkte aus diesen Mischungen durch Bestrahlung
DE3115241A1 (de) 1980-04-21 1982-04-15 General Electric Co., Schenectady, N.Y. "haertbare zubereitungen und verwendung dafuer"
US4387216A (en) 1981-05-06 1983-06-07 Ciba-Geigy Corporation Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants
US4406764A (en) 1981-01-27 1983-09-27 Tokyo Shibaura Denki Kabushiki Kaisha Photo-curable epoxy resin composition with organic aluminum and α-ketosilyl compounds
GB2139369A (en) * 1983-05-06 1984-11-07 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
US4684671A (en) * 1985-01-25 1987-08-04 Asahi Denka Kogyo K.K. Energy beam curable composition
US4734444A (en) * 1986-02-14 1988-03-29 Basf Aktiengesellschaft Curable mixtures containing N-sulfonylaminosulfonium salts as cationically active catalysts
US5101053A (en) * 1989-01-25 1992-03-31 Basf Aktiengesellschaft Radiation-sensitive, ethylenically unsaturated, copolymerizable sulfonium salts and their preparation
US5108859A (en) * 1990-04-16 1992-04-28 Eastman Kodak Company Photoelectrographic elements and imaging method
US5335004A (en) * 1989-12-15 1994-08-02 Canon Kabushiki Kaisha Active energy-ray-curable resin composition, ink jet head having ink path wall formed by use of the composition, process for preparing the head, and ink jet apparatus provided with the head
US5356698A (en) * 1990-03-27 1994-10-18 Hitachi, Ltd. Adhesive agent for substrate of electroless plating, printed circuit board using same, and method of producing same
US5713835A (en) * 1993-05-05 1998-02-03 Smith & Nephew Plc Orthopaedic material
US6313188B1 (en) 1996-09-19 2001-11-06 Nippon Soda Co., Ltd. Photocationically polymerizable composition comprising a polycyclic aromatic compound
WO2003074509A1 (fr) * 2002-03-04 2003-09-12 Wako Pure Chemical Industries, Ltd. Sels d'onium comportant des heterocycles
EP1348727A2 (en) 2002-03-29 2003-10-01 Brother Kogyo Kabushiki Kaisha Image-receiving layer composition and overcoat layer composition for ink-jet recording
US6805439B2 (en) 2001-09-06 2004-10-19 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
US6866376B2 (en) 2001-09-28 2005-03-15 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
EP1826206A1 (en) * 2006-02-23 2007-08-29 Fujifilm Corporation Sulfonium salt, curable composition, ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate
US9416220B2 (en) 2012-05-18 2016-08-16 Cmet Inc. Resin composition for optical stereolithography
US10450266B2 (en) 2014-11-07 2019-10-22 San-Apro Limited Sulfonate compound, photoacid generator, and resin composition for photolithography
CN113286781A (zh) * 2019-01-10 2021-08-20 三亚普罗股份有限公司 锍盐、光产酸剂、固化性组合物和抗蚀剂组合物

Families Citing this family (90)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
AU517415B2 (en) * 1976-07-09 1981-07-30 General Electric Company Curable polymer composition
US4108747A (en) * 1976-07-14 1978-08-22 General Electric Company Curable compositions and method for curing such compositions
US4090936A (en) 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4101513A (en) * 1977-02-02 1978-07-18 Minnesota Mining And Manufacturing Company Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof
US4102687A (en) * 1977-02-14 1978-07-25 General Electric Company UV Curable composition of a thermosetting condensation resin and Group VIa onium salt
GB1604953A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
GB1604954A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
GB1596000A (en) * 1977-09-14 1981-08-19 Gen Electric Heterocyclic onium salts their preparation and their use for photopolymerisable organic materials
US4246298A (en) * 1979-03-14 1981-01-20 American Can Company Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application
DE3135636A1 (de) 1981-09-09 1983-03-17 Basf Ag, 6700 Ludwigshafen Haertbare epoxidharze
JPS61242615A (ja) * 1985-04-18 1986-10-28 Nippon Air Filter Kk 集塵方法及びその装置
JPS61261365A (ja) * 1985-05-14 1986-11-19 Nippon Oil Co Ltd 光硬化性被覆組成物
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
US5399596A (en) * 1988-03-03 1995-03-21 Sanshin Kagaku Kogyo Co., Ltd. Polyfluoride sulfonium compounds and polymerization initiator thereof
US4882201A (en) * 1988-03-21 1989-11-21 General Electric Company Non-toxic aryl onium salts, UV curable coating compositions and food packaging use
US4871786A (en) * 1988-10-03 1989-10-03 Minnesota Mining And Manufacturing Company Organic fluoride sources
US5047568A (en) * 1988-11-18 1991-09-10 International Business Machines Corporation Sulfonium salts and use and preparation thereof
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
JPH0347573A (ja) * 1989-07-12 1991-02-28 Ishigaki Kiko Kk 微粉体の分級方法並びにその装置
DE3933420C1 (enrdf_load_stackoverflow) * 1989-10-06 1991-03-07 Th. Goldschmidt Ag, 4300 Essen, De
DE4027437C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds.
DE4027438C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp.
DE69219649T2 (de) * 1991-02-16 1997-10-23 Canon Kk Optisches Aufzeichnungsmedium
US5166125A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Method of forming color filter array element with patternable overcoat layer
US5166126A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Color filter array element with protective overcoat layer and method of forming same
DE4219376A1 (de) * 1992-06-12 1993-12-16 Wacker Chemie Gmbh Sulfoniumsalze und Verfahren zu deren Herstellung
US5502083A (en) * 1993-06-18 1996-03-26 Nippon Kayaku Kabushiki Kaisha Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
JPH1087963A (ja) * 1996-09-20 1998-04-07 Japan Synthetic Rubber Co Ltd 樹脂組成物および繊維質材料成形型
JP3786480B2 (ja) * 1996-10-14 2006-06-14 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3626302B2 (ja) * 1996-12-10 2005-03-09 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物
FR2794126B1 (fr) * 1999-05-26 2003-07-18 Gemplus Card Int Nouvelle composition adhesive et conductrice, procede de connexion, procede de constitution de composants electriques ou electroniques, utilisation de cette composition, element conducteur
JP4701231B2 (ja) * 2002-02-13 2011-06-15 富士フイルム株式会社 電子線、ｅｕｖ又はｘ線用ネガ型レジスト組成物及びそれを用いたパターン形成方法
JP4533639B2 (ja) * 2003-07-22 2010-09-01 富士フイルム株式会社 感刺激性組成物、化合物及び該感刺激性組成物を用いたパターン形成方法
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EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
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EP0022081A1 (de) * 1979-06-19 1981-01-07 Ciba-Geigy Ag Sulphoxoniumsalze enthaltende polymerisierbare Mischungen sowie Verfahren zur Herstellung hochmolekularer Produkte aus diesen Mischungen durch Bestrahlung
DE3153680A1 (enrdf_load_stackoverflow) * 1980-04-21 1989-11-30
DE3115241A1 (de) 1980-04-21 1982-04-15 General Electric Co., Schenectady, N.Y. "haertbare zubereitungen und verwendung dafuer"
US4406764A (en) 1981-01-27 1983-09-27 Tokyo Shibaura Denki Kabushiki Kaisha Photo-curable epoxy resin composition with organic aluminum and α-ketosilyl compounds
US4387216A (en) 1981-05-06 1983-06-07 Ciba-Geigy Corporation Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants
GB2139369A (en) * 1983-05-06 1984-11-07 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
US4659649A (en) * 1983-05-06 1987-04-21 Sericol Group Limited Photosensitive systems showing visible indication of exposure
US4684671A (en) * 1985-01-25 1987-08-04 Asahi Denka Kogyo K.K. Energy beam curable composition
US4734444A (en) * 1986-02-14 1988-03-29 Basf Aktiengesellschaft Curable mixtures containing N-sulfonylaminosulfonium salts as cationically active catalysts
US5101053A (en) * 1989-01-25 1992-03-31 Basf Aktiengesellschaft Radiation-sensitive, ethylenically unsaturated, copolymerizable sulfonium salts and their preparation
US5335004A (en) * 1989-12-15 1994-08-02 Canon Kabushiki Kaisha Active energy-ray-curable resin composition, ink jet head having ink path wall formed by use of the composition, process for preparing the head, and ink jet apparatus provided with the head
US5356698A (en) * 1990-03-27 1994-10-18 Hitachi, Ltd. Adhesive agent for substrate of electroless plating, printed circuit board using same, and method of producing same
US5108859A (en) * 1990-04-16 1992-04-28 Eastman Kodak Company Photoelectrographic elements and imaging method
US5713835A (en) * 1993-05-05 1998-02-03 Smith & Nephew Plc Orthopaedic material
US6313188B1 (en) 1996-09-19 2001-11-06 Nippon Soda Co., Ltd. Photocationically polymerizable composition comprising a polycyclic aromatic compound
US6805439B2 (en) 2001-09-06 2004-10-19 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
US6866376B2 (en) 2001-09-28 2005-03-15 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
KR100933343B1 (ko) 2002-03-04 2009-12-22 와코 쥰야꾸 고교 가부시키가이샤 헤테로환 함유 오늄염
US7318991B2 (en) 2002-03-04 2008-01-15 Wako Pure Chemical Industries, Ltd. Heterocycle-bearing onium salts
WO2003074509A1 (fr) * 2002-03-04 2003-09-12 Wako Pure Chemical Industries, Ltd. Sels d'onium comportant des heterocycles
US7833691B2 (en) 2002-03-04 2010-11-16 Wako Pure Chemical Industries, Ltd. Heterocycle-bearing onium salts
EP1348727A2 (en) 2002-03-29 2003-10-01 Brother Kogyo Kabushiki Kaisha Image-receiving layer composition and overcoat layer composition for ink-jet recording
EP1826206A1 (en) * 2006-02-23 2007-08-29 Fujifilm Corporation Sulfonium salt, curable composition, ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate
US9416220B2 (en) 2012-05-18 2016-08-16 Cmet Inc. Resin composition for optical stereolithography
US10450266B2 (en) 2014-11-07 2019-10-22 San-Apro Limited Sulfonate compound, photoacid generator, and resin composition for photolithography
CN113286781A (zh) * 2019-01-10 2021-08-20 三亚普罗股份有限公司 锍盐、光产酸剂、固化性组合物和抗蚀剂组合物
EP3909943A4 (en) * 2019-01-10 2022-10-12 San-Apro Ltd. SULFONIUM SALT, PHOTO ACID GENERATOR, CURING COMPOSITION AND RESIST COMPOSITION
CN113286781B (zh) * 2019-01-10 2023-08-08 三亚普罗股份有限公司 锍盐、光产酸剂、固化性组合物和抗蚀剂组合物

Also Published As

Publication number Publication date
DE2518652C2 (de) 1983-05-11
FR2269551A1 (enrdf_load_stackoverflow) 1975-11-28
DE2518652A1 (de) 1975-11-06
JPS50151997A (enrdf_load_stackoverflow) 1975-12-06
DE2559718C2 (de) 1983-08-04
GB1516512A (en) 1978-07-05
FR2269551B1 (enrdf_load_stackoverflow) 1978-09-01
JPS5214278B2 (enrdf_load_stackoverflow) 1977-04-20
DE2559718A1 (de) 1977-08-18
BE828670A (fr) 1975-09-01
DE2559833C2 (de) 1983-12-22

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