JPH1167655A - 走査型露光装置及び同期誤差解析方法 - Google Patents

走査型露光装置及び同期誤差解析方法

Info

Publication number
JPH1167655A
JPH1167655A JP9228837A JP22883797A JPH1167655A JP H1167655 A JPH1167655 A JP H1167655A JP 9228837 A JP9228837 A JP 9228837A JP 22883797 A JP22883797 A JP 22883797A JP H1167655 A JPH1167655 A JP H1167655A
Authority
JP
Japan
Prior art keywords
synchronization error
mask
reticle
scanning
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9228837A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1167655A5 (enExample
Inventor
Susumu Makinouchi
進 牧野内
Osamu Furukawa
治 古川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9228837A priority Critical patent/JPH1167655A/ja
Priority to PCT/JP1998/003558 priority patent/WO1999008315A1/ja
Priority to AU85622/98A priority patent/AU8562298A/en
Publication of JPH1167655A publication Critical patent/JPH1167655A/ja
Publication of JPH1167655A5 publication Critical patent/JPH1167655A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9228837A 1997-08-11 1997-08-11 走査型露光装置及び同期誤差解析方法 Withdrawn JPH1167655A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP9228837A JPH1167655A (ja) 1997-08-11 1997-08-11 走査型露光装置及び同期誤差解析方法
PCT/JP1998/003558 WO1999008315A1 (en) 1997-08-11 1998-08-11 Scanning exposure method, scanning aligner, method of manufacturing the scanning aligner, and synchronization error analysing method
AU85622/98A AU8562298A (en) 1997-08-11 1998-08-11 Scanning exposure method, scanning aligner, method of manufacturing the scanningaligner, and synchronization error analysing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9228837A JPH1167655A (ja) 1997-08-11 1997-08-11 走査型露光装置及び同期誤差解析方法

Publications (2)

Publication Number Publication Date
JPH1167655A true JPH1167655A (ja) 1999-03-09
JPH1167655A5 JPH1167655A5 (enExample) 2005-06-02

Family

ID=16882644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9228837A Withdrawn JPH1167655A (ja) 1997-08-11 1997-08-11 走査型露光装置及び同期誤差解析方法

Country Status (3)

Country Link
JP (1) JPH1167655A (enExample)
AU (1) AU8562298A (enExample)
WO (1) WO1999008315A1 (enExample)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001223157A (ja) * 1999-11-30 2001-08-17 Canon Inc 投影露光装置、投影露光方法、及び半導体装置の製造方法
US6487711B1 (en) 1999-12-07 2002-11-26 Mitsubishi Denki Kabushiki Kaisha Method of analyzing factor responsible for errors in wafer pattern, and apparatus for producing photolithographic mask
WO2005008752A1 (ja) * 2003-07-23 2005-01-27 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
US7692764B2 (en) 2004-08-30 2010-04-06 Nikon Corporation Exposure apparatus, operation decision method, substrate processing system, maintenance management method, and device manufacturing method
JP2011097070A (ja) * 1999-11-30 2011-05-12 Canon Inc 投影露光装置、投影露光方法、及び半導体装置の製造方法
JP2011142319A (ja) * 2009-12-18 2011-07-21 Asml Netherlands Bv リソグラフィ装置における動的位置決め誤差の性質を測定する方法、データ処理装置、およびコンピュータプログラム製品
US8638422B2 (en) 2005-03-18 2014-01-28 Nikon Corporation Exposure method, exposure apparatus, method for producing device, and method for evaluating exposure apparatus
JP2022160187A (ja) * 2021-04-06 2022-10-19 キヤノン株式会社 露光装置、露光方法及び物品の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3372725B2 (ja) * 1995-08-31 2003-02-04 キヤノン株式会社 同期スキャン制御装置
JP3320276B2 (ja) * 1995-09-04 2002-09-03 キヤノン株式会社 精密制御装置
JPH09115799A (ja) * 1995-10-16 1997-05-02 Nikon Corp 走査型露光装置
JP3408048B2 (ja) * 1996-01-05 2003-05-19 キヤノン株式会社 走査型露光装置
JPH09199399A (ja) * 1996-01-12 1997-07-31 Canon Inc 同期制御装置および方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001223157A (ja) * 1999-11-30 2001-08-17 Canon Inc 投影露光装置、投影露光方法、及び半導体装置の製造方法
JP2011097070A (ja) * 1999-11-30 2011-05-12 Canon Inc 投影露光装置、投影露光方法、及び半導体装置の製造方法
US6487711B1 (en) 1999-12-07 2002-11-26 Mitsubishi Denki Kabushiki Kaisha Method of analyzing factor responsible for errors in wafer pattern, and apparatus for producing photolithographic mask
KR100375290B1 (ko) * 1999-12-07 2003-03-10 미쓰비시덴키 가부시키가이샤 웨이퍼 패턴 오차의 요인 해석 방법 및 사진 제판용마스크의 제조 장치
WO2005008752A1 (ja) * 2003-07-23 2005-01-27 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
US7692764B2 (en) 2004-08-30 2010-04-06 Nikon Corporation Exposure apparatus, operation decision method, substrate processing system, maintenance management method, and device manufacturing method
US8638422B2 (en) 2005-03-18 2014-01-28 Nikon Corporation Exposure method, exposure apparatus, method for producing device, and method for evaluating exposure apparatus
JP2011142319A (ja) * 2009-12-18 2011-07-21 Asml Netherlands Bv リソグラフィ装置における動的位置決め誤差の性質を測定する方法、データ処理装置、およびコンピュータプログラム製品
US8554510B2 (en) 2009-12-18 2013-10-08 Asml Netherlands B.V. Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product
JP2022160187A (ja) * 2021-04-06 2022-10-19 キヤノン株式会社 露光装置、露光方法及び物品の製造方法

Also Published As

Publication number Publication date
WO1999008315A1 (en) 1999-02-18
AU8562298A (en) 1999-03-01

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