AU8562298A - Scanning exposure method, scanning aligner, method of manufacturing the scanningaligner, and synchronization error analysing method - Google Patents

Scanning exposure method, scanning aligner, method of manufacturing the scanningaligner, and synchronization error analysing method

Info

Publication number
AU8562298A
AU8562298A AU85622/98A AU8562298A AU8562298A AU 8562298 A AU8562298 A AU 8562298A AU 85622/98 A AU85622/98 A AU 85622/98A AU 8562298 A AU8562298 A AU 8562298A AU 8562298 A AU8562298 A AU 8562298A
Authority
AU
Australia
Prior art keywords
scanning
scanningaligner
manufacturing
synchronization error
aligner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU85622/98A
Other languages
English (en)
Inventor
Osamu Furukawa
Susumu Makinouchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU8562298A publication Critical patent/AU8562298A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU85622/98A 1997-08-11 1998-08-11 Scanning exposure method, scanning aligner, method of manufacturing the scanningaligner, and synchronization error analysing method Abandoned AU8562298A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9228837A JPH1167655A (ja) 1997-08-11 1997-08-11 走査型露光装置及び同期誤差解析方法
JP9-228837 1997-08-11
PCT/JP1998/003558 WO1999008315A1 (en) 1997-08-11 1998-08-11 Scanning exposure method, scanning aligner, method of manufacturing the scanning aligner, and synchronization error analysing method

Publications (1)

Publication Number Publication Date
AU8562298A true AU8562298A (en) 1999-03-01

Family

ID=16882644

Family Applications (1)

Application Number Title Priority Date Filing Date
AU85622/98A Abandoned AU8562298A (en) 1997-08-11 1998-08-11 Scanning exposure method, scanning aligner, method of manufacturing the scanningaligner, and synchronization error analysing method

Country Status (3)

Country Link
JP (1) JPH1167655A (enExample)
AU (1) AU8562298A (enExample)
WO (1) WO1999008315A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001223157A (ja) * 1999-11-30 2001-08-17 Canon Inc 投影露光装置、投影露光方法、及び半導体装置の製造方法
JP5002704B2 (ja) * 1999-11-30 2012-08-15 キヤノン株式会社 投影露光装置、投影露光方法、及び半導体装置の製造方法
JP2001166456A (ja) 1999-12-07 2001-06-22 Mitsubishi Electric Corp ウェハパターン誤差の要因解析方法および写真製版用マスクの製造装置
WO2005008752A1 (ja) * 2003-07-23 2005-01-27 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
KR20070048697A (ko) 2004-08-30 2007-05-09 가부시키가이샤 니콘 노광 장치, 동작 결정 방법, 기판 처리 시스템 및메인터넌스 관리 방법 및 디바이스 제조 방법
JP4946109B2 (ja) * 2005-03-18 2012-06-06 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法
NL2005719A (en) * 2009-12-18 2011-06-21 Asml Netherlands Bv Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product.
JP7699458B2 (ja) * 2021-04-06 2025-06-27 キヤノン株式会社 露光装置、露光方法及び物品の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3372725B2 (ja) * 1995-08-31 2003-02-04 キヤノン株式会社 同期スキャン制御装置
JP3320276B2 (ja) * 1995-09-04 2002-09-03 キヤノン株式会社 精密制御装置
JPH09115799A (ja) * 1995-10-16 1997-05-02 Nikon Corp 走査型露光装置
JP3408048B2 (ja) * 1996-01-05 2003-05-19 キヤノン株式会社 走査型露光装置
JPH09199399A (ja) * 1996-01-12 1997-07-31 Canon Inc 同期制御装置および方法

Also Published As

Publication number Publication date
WO1999008315A1 (en) 1999-02-18
JPH1167655A (ja) 1999-03-09

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase