AU8562298A - Scanning exposure method, scanning aligner, method of manufacturing the scanningaligner, and synchronization error analysing method - Google Patents

Scanning exposure method, scanning aligner, method of manufacturing the scanningaligner, and synchronization error analysing method

Info

Publication number
AU8562298A
AU8562298A AU85622/98A AU8562298A AU8562298A AU 8562298 A AU8562298 A AU 8562298A AU 85622/98 A AU85622/98 A AU 85622/98A AU 8562298 A AU8562298 A AU 8562298A AU 8562298 A AU8562298 A AU 8562298A
Authority
AU
Australia
Prior art keywords
scanning
scanningaligner
manufacturing
synchronization error
aligner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU85622/98A
Inventor
Osamu Furukawa
Susumu Makinouchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU8562298A publication Critical patent/AU8562298A/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70358Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU85622/98A 1997-08-11 1998-08-11 Scanning exposure method, scanning aligner, method of manufacturing the scanningaligner, and synchronization error analysing method Abandoned AU8562298A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-228837 1997-08-11
JP9228837A JPH1167655A (en) 1997-08-11 1997-08-11 Scanning-type exposing apparatus and synchronous error analysis method
PCT/JP1998/003558 WO1999008315A1 (en) 1997-08-11 1998-08-11 Scanning exposure method, scanning aligner, method of manufacturing the scanning aligner, and synchronization error analysing method

Publications (1)

Publication Number Publication Date
AU8562298A true AU8562298A (en) 1999-03-01

Family

ID=16882644

Family Applications (1)

Application Number Title Priority Date Filing Date
AU85622/98A Abandoned AU8562298A (en) 1997-08-11 1998-08-11 Scanning exposure method, scanning aligner, method of manufacturing the scanningaligner, and synchronization error analysing method

Country Status (3)

Country Link
JP (1) JPH1167655A (en)
AU (1) AU8562298A (en)
WO (1) WO1999008315A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5002704B2 (en) * 1999-11-30 2012-08-15 キヤノン株式会社 Projection exposure apparatus, projection exposure method, and semiconductor device manufacturing method
JP2001223157A (en) * 1999-11-30 2001-08-17 Canon Inc Projection aligner, projection aligning method and method of fabricating semiconductor device
JP2001166456A (en) 1999-12-07 2001-06-22 Mitsubishi Electric Corp Method of factor analysis for water pattern error and apparatus for manufacturing photographic plate making mask
WO2005008752A1 (en) * 2003-07-23 2005-01-27 Nikon Corporation Exposure device, exposure method, and device manufacturing method
EP1796145A4 (en) 2004-08-30 2010-10-06 Nikon Corp Exposure device, operation decision method, substrate treatment system and maintenance management method, and device manufacturing method
EP1879217A4 (en) * 2005-03-18 2010-06-09 Nikon Corp Exposure method, exposure apparatus, device manufacturing method and exposure apparatus evaluating method
NL2005719A (en) 2009-12-18 2011-06-21 Asml Netherlands Bv Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product.

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3372725B2 (en) * 1995-08-31 2003-02-04 キヤノン株式会社 Synchronous scan control device
JP3320276B2 (en) * 1995-09-04 2002-09-03 キヤノン株式会社 Precision control device
JPH09115799A (en) * 1995-10-16 1997-05-02 Nikon Corp Scanning-type exposure system
JP3408048B2 (en) * 1996-01-05 2003-05-19 キヤノン株式会社 Scanning exposure equipment
JPH09199399A (en) * 1996-01-12 1997-07-31 Canon Inc Synchronization control apparatus and method

Also Published As

Publication number Publication date
JPH1167655A (en) 1999-03-09
WO1999008315A1 (en) 1999-02-18

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase