AU8562298A - Scanning exposure method, scanning aligner, method of manufacturing the scanningaligner, and synchronization error analysing method - Google Patents
Scanning exposure method, scanning aligner, method of manufacturing the scanningaligner, and synchronization error analysing methodInfo
- Publication number
- AU8562298A AU8562298A AU85622/98A AU8562298A AU8562298A AU 8562298 A AU8562298 A AU 8562298A AU 85622/98 A AU85622/98 A AU 85622/98A AU 8562298 A AU8562298 A AU 8562298A AU 8562298 A AU8562298 A AU 8562298A
- Authority
- AU
- Australia
- Prior art keywords
- scanning
- scanningaligner
- manufacturing
- synchronization error
- aligner
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9-228837 | 1997-08-11 | ||
JP9228837A JPH1167655A (en) | 1997-08-11 | 1997-08-11 | Scanning-type exposing apparatus and synchronous error analysis method |
PCT/JP1998/003558 WO1999008315A1 (en) | 1997-08-11 | 1998-08-11 | Scanning exposure method, scanning aligner, method of manufacturing the scanning aligner, and synchronization error analysing method |
Publications (1)
Publication Number | Publication Date |
---|---|
AU8562298A true AU8562298A (en) | 1999-03-01 |
Family
ID=16882644
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU85622/98A Abandoned AU8562298A (en) | 1997-08-11 | 1998-08-11 | Scanning exposure method, scanning aligner, method of manufacturing the scanningaligner, and synchronization error analysing method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPH1167655A (en) |
AU (1) | AU8562298A (en) |
WO (1) | WO1999008315A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5002704B2 (en) * | 1999-11-30 | 2012-08-15 | キヤノン株式会社 | Projection exposure apparatus, projection exposure method, and semiconductor device manufacturing method |
JP2001223157A (en) * | 1999-11-30 | 2001-08-17 | Canon Inc | Projection aligner, projection aligning method and method of fabricating semiconductor device |
JP2001166456A (en) | 1999-12-07 | 2001-06-22 | Mitsubishi Electric Corp | Method of factor analysis for water pattern error and apparatus for manufacturing photographic plate making mask |
WO2005008752A1 (en) * | 2003-07-23 | 2005-01-27 | Nikon Corporation | Exposure device, exposure method, and device manufacturing method |
EP1796145A4 (en) | 2004-08-30 | 2010-10-06 | Nikon Corp | Exposure device, operation decision method, substrate treatment system and maintenance management method, and device manufacturing method |
EP1879217A4 (en) * | 2005-03-18 | 2010-06-09 | Nikon Corp | Exposure method, exposure apparatus, device manufacturing method and exposure apparatus evaluating method |
NL2005719A (en) | 2009-12-18 | 2011-06-21 | Asml Netherlands Bv | Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product. |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3372725B2 (en) * | 1995-08-31 | 2003-02-04 | キヤノン株式会社 | Synchronous scan control device |
JP3320276B2 (en) * | 1995-09-04 | 2002-09-03 | キヤノン株式会社 | Precision control device |
JPH09115799A (en) * | 1995-10-16 | 1997-05-02 | Nikon Corp | Scanning-type exposure system |
JP3408048B2 (en) * | 1996-01-05 | 2003-05-19 | キヤノン株式会社 | Scanning exposure equipment |
JPH09199399A (en) * | 1996-01-12 | 1997-07-31 | Canon Inc | Synchronization control apparatus and method |
-
1997
- 1997-08-11 JP JP9228837A patent/JPH1167655A/en not_active Withdrawn
-
1998
- 1998-08-11 AU AU85622/98A patent/AU8562298A/en not_active Abandoned
- 1998-08-11 WO PCT/JP1998/003558 patent/WO1999008315A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JPH1167655A (en) | 1999-03-09 |
WO1999008315A1 (en) | 1999-02-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |