JPH10270710A5 - - Google Patents

Info

Publication number
JPH10270710A5
JPH10270710A5 JP1998050332A JP5033298A JPH10270710A5 JP H10270710 A5 JPH10270710 A5 JP H10270710A5 JP 1998050332 A JP1998050332 A JP 1998050332A JP 5033298 A JP5033298 A JP 5033298A JP H10270710 A5 JPH10270710 A5 JP H10270710A5
Authority
JP
Japan
Prior art keywords
protective layer
organic protective
pfcb
perfluorocyclobutane
paraxylene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998050332A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10270710A (ja
JP4364952B2 (ja
Filing date
Publication date
Priority claimed from KR1019970009367A external-priority patent/KR100255592B1/ko
Application filed filed Critical
Publication of JPH10270710A publication Critical patent/JPH10270710A/ja
Publication of JPH10270710A5 publication Critical patent/JPH10270710A5/ja
Application granted granted Critical
Publication of JP4364952B2 publication Critical patent/JP4364952B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP05033298A 1997-03-19 1998-03-03 液晶表示装置の製造方法 Expired - Lifetime JP4364952B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1997-09367 1997-03-19
KR1019970009367A KR100255592B1 (ko) 1997-03-19 1997-03-19 액정 표시 장치 구조 및 그 제조 방법

Publications (3)

Publication Number Publication Date
JPH10270710A JPH10270710A (ja) 1998-10-09
JPH10270710A5 true JPH10270710A5 (enExample) 2005-04-14
JP4364952B2 JP4364952B2 (ja) 2009-11-18

Family

ID=19500124

Family Applications (1)

Application Number Title Priority Date Filing Date
JP05033298A Expired - Lifetime JP4364952B2 (ja) 1997-03-19 1998-03-03 液晶表示装置の製造方法

Country Status (6)

Country Link
US (1) US5883682A (enExample)
JP (1) JP4364952B2 (enExample)
KR (1) KR100255592B1 (enExample)
DE (1) DE19811624B4 (enExample)
FR (1) FR2761197B1 (enExample)
GB (1) GB2323472B (enExample)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3312083B2 (ja) 1994-06-13 2002-08-05 株式会社半導体エネルギー研究所 表示装置
JP3866783B2 (ja) 1995-07-25 2007-01-10 株式会社 日立ディスプレイズ 液晶表示装置
US5894136A (en) * 1996-01-15 1999-04-13 Lg Electronics Inc. Liquid crystal display having a bottom gate TFT switch having a wider active semiconductor layer than a conductive layer on same
US6275278B1 (en) 1996-07-19 2001-08-14 Hitachi, Ltd. Liquid crystal display device and method of making same
KR100244449B1 (ko) * 1997-02-11 2000-02-01 구본준 박막 트랜지스터 검사용 단락 배선을 갖는 액정 표시 장치와 그 제조 방법(liquid crystal display having shorting bar for testing tft and method for manufacturing the same)
US6949417B1 (en) * 1997-03-05 2005-09-27 Lg. Philips Lcd Co., Ltd. Liquid crystal display and method of manufacturing the same
TW375689B (en) * 1997-03-27 1999-12-01 Toshiba Corp Liquid crystal display device and method for manufacturing the same
JP3656076B2 (ja) * 1997-04-18 2005-06-02 シャープ株式会社 表示装置
KR100271039B1 (ko) * 1997-10-24 2000-11-01 구본준, 론 위라하디락사 액정표시장치의 기판의 제조방법(method of manufacturing liquid crystal display)
JPH11340462A (ja) * 1998-05-28 1999-12-10 Fujitsu Ltd 液晶表示装置およびその製造方法
US6900854B1 (en) * 1998-11-26 2005-05-31 Samsung Electronics Co., Ltd. Thin film transistor array panel for a liquid crystal display
KR100532025B1 (ko) * 1998-12-04 2006-03-14 엘지.필립스 엘시디 주식회사 박막트랜지스터 광센서 및 그 제조방법_
JP4709816B2 (ja) * 1999-03-16 2011-06-29 エルジー ディスプレイ カンパニー リミテッド 薄膜トランジスタ基板の製造方法
KR100338011B1 (ko) * 1999-06-30 2002-05-24 윤종용 액정 표시 장치용 기판의 제조 방법
KR100333271B1 (ko) * 1999-07-05 2002-04-24 구본준, 론 위라하디락사 배선의 단락 및 단선 테스트를 위한 박막트랜지스터-액정표시장치의 어레이기판과 그 제조방법.
JP2001053283A (ja) 1999-08-12 2001-02-23 Semiconductor Energy Lab Co Ltd 半導体装置及びその作製方法
KR100498630B1 (ko) 1999-09-01 2005-07-01 엘지.필립스 엘시디 주식회사 액정표시장치
CN1195243C (zh) * 1999-09-30 2005-03-30 三星电子株式会社 用于液晶显示器的薄膜晶体管阵列屏板及其制造方法
JP2001324725A (ja) * 2000-05-12 2001-11-22 Hitachi Ltd 液晶表示装置およびその製造方法
US6734924B2 (en) * 2000-09-08 2004-05-11 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device
KR100720095B1 (ko) * 2000-11-07 2007-05-18 삼성전자주식회사 박막 트랜지스터 어레이 기판 및 그 제조 방법
KR100390456B1 (ko) * 2000-12-13 2003-07-07 엘지.필립스 엘시디 주식회사 액정 디스플레이 패널 및 그 제조방법
US7095460B2 (en) 2001-02-26 2006-08-22 Samsung Electronics Co., Ltd. Thin film transistor array substrate using low dielectric insulating layer and method of fabricating the same
JP2002258768A (ja) * 2001-03-02 2002-09-11 Seiko Epson Corp 電気光学装置、その製造方法および電子機器
KR100476046B1 (ko) * 2001-05-25 2005-03-10 비오이 하이디스 테크놀로지 주식회사 프린지 필드 스위칭 모드 액정표시장치
KR100443831B1 (ko) * 2001-12-20 2004-08-09 엘지.필립스 엘시디 주식회사 액정표시소자의 제조 방법
US7102168B2 (en) * 2001-12-24 2006-09-05 Samsung Electronics Co., Ltd. Thin film transistor array panel for display and manufacturing method thereof
KR100869736B1 (ko) * 2001-12-29 2008-11-21 엘지디스플레이 주식회사 액정표시소자 및 그의 제조방법
KR100853219B1 (ko) * 2002-03-22 2008-08-20 삼성전자주식회사 표시 장치용 박막 트랜지스터 어레이 기판의 제조 방법
KR100859521B1 (ko) * 2002-07-30 2008-09-22 삼성전자주식회사 박막 트랜지스터 어레이 기판
TW560076B (en) * 2002-09-27 2003-11-01 Chi Mei Optoelectronics Corp Structure and manufacturing method of thin film transistor
JP3880568B2 (ja) * 2002-10-25 2007-02-14 鹿児島日本電気株式会社 液晶表示装置の製造方法
KR100498543B1 (ko) 2002-11-07 2005-07-01 엘지.필립스 엘시디 주식회사 액정표시장치용 어레이 기판 및 그 제조방법
KR101034181B1 (ko) * 2003-08-21 2011-05-12 엘지디스플레이 주식회사 액정표시장치용 어레이기판 제조방법
JP4737971B2 (ja) * 2003-11-14 2011-08-03 株式会社半導体エネルギー研究所 液晶表示装置および液晶表示装置の作製方法
TWI234043B (en) * 2003-11-26 2005-06-11 Hannstar Display Corp Method of manufacturing liquid crystal display
US7223641B2 (en) * 2004-03-26 2007-05-29 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, method for manufacturing the same, liquid crystal television and EL television
KR101016284B1 (ko) * 2004-04-28 2011-02-22 엘지디스플레이 주식회사 Ｃｏｇ 방식 액정표시소자 및 그 제조방법
JP4628040B2 (ja) * 2004-08-20 2011-02-09 株式会社半導体エネルギー研究所 半導体素子を備えた表示装置の製造方法
KR101200883B1 (ko) 2005-12-13 2012-11-13 엘지디스플레이 주식회사 박막 트랜지스터 어레이 기판의 제조 방법
KR101232063B1 (ko) * 2006-08-16 2013-02-12 삼성디스플레이 주식회사 표시 기판의 제조 방법
CN102034751B (zh) * 2009-09-24 2013-09-04 北京京东方光电科技有限公司 Tft-lcd阵列基板及其制造方法
KR101908113B1 (ko) * 2009-11-16 2018-10-15 삼성전자 주식회사 전기활성 폴리머 엑츄에이터 및 그 제조방법
JP5604087B2 (ja) * 2009-11-27 2014-10-08 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2012134519A (ja) * 2012-02-13 2012-07-12 Semiconductor Energy Lab Co Ltd 半導体装置
JP2014021170A (ja) * 2012-07-12 2014-02-03 Panasonic Liquid Crystal Display Co Ltd 液晶表示装置及びその製造方法
JP2014212337A (ja) * 2014-06-30 2014-11-13 株式会社半導体エネルギー研究所 半導体装置
CN110941124B (zh) * 2019-12-02 2021-06-01 Tcl华星光电技术有限公司 一种阵列基板、阵列基板制程方法及显示面板

Family Cites Families (11)

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Publication number Priority date Publication date Assignee Title
US5032883A (en) * 1987-09-09 1991-07-16 Casio Computer Co., Ltd. Thin film transistor and method of manufacturing the same
JP3241172B2 (ja) * 1993-06-28 2001-12-25 アルプス電気株式会社 抵抗体の製造方法
US5621556A (en) * 1994-04-28 1997-04-15 Xerox Corporation Method of manufacturing active matrix LCD using five masks
TW344901B (en) * 1995-02-15 1998-11-11 Handotai Energy Kenkyusho Kk Active matrix display device
KR100303134B1 (ko) * 1995-05-09 2002-11-23 엘지.필립스 엘시디 주식회사 액정표시소자및그제조방법.
US6372534B1 (en) * 1995-06-06 2002-04-16 Lg. Philips Lcd Co., Ltd Method of making a TFT array with photo-imageable insulating layer over address lines
KR100338480B1 (ko) * 1995-08-19 2003-01-24 엘지.필립스 엘시디 주식회사 액정표시장치및그제조방법
DE19712233C2 (de) * 1996-03-26 2003-12-11 Lg Philips Lcd Co Flüssigkristallanzeige und Herstellungsverfahren dafür
KR100223153B1 (ko) * 1996-05-23 1999-10-15 구자홍 액티브 매트릭스 액정표시장치의 제조방법 및 액티브매트릭스액정표시장치
FR2751468A1 (fr) * 1996-07-15 1998-01-23 Lgelectronics Procede d'attaque pour un dispositif presentant un materiau organique
KR100251091B1 (ko) * 1996-11-29 2000-04-15 구본준 액정표시장치의 제조방법 및 그 제조방법으로 제조되는 액정표시장치

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