JPH09222725A5 - - Google Patents
Info
- Publication number
- JPH09222725A5 JPH09222725A5 JP1996305834A JP30583496A JPH09222725A5 JP H09222725 A5 JPH09222725 A5 JP H09222725A5 JP 1996305834 A JP1996305834 A JP 1996305834A JP 30583496 A JP30583496 A JP 30583496A JP H09222725 A5 JPH09222725 A5 JP H09222725A5
- Authority
- JP
- Japan
- Prior art keywords
- phenyl
- unsubstituted
- group
- substituted
- substituents
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH308095 | 1995-10-31 | ||
| CH3080/95 | 1995-10-31 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH09222725A JPH09222725A (ja) | 1997-08-26 |
| JPH09222725A5 true JPH09222725A5 (enExample) | 2004-10-21 |
| JP3975411B2 JP3975411B2 (ja) | 2007-09-12 |
Family
ID=4248187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30583496A Expired - Lifetime JP3975411B2 (ja) | 1995-10-31 | 1996-10-31 | オキシムスルホン酸エステルおよび潜伏性スルホン酸としてのそれらの使用 |
Country Status (19)
| Country | Link |
|---|---|
| US (1) | US6017675A (enExample) |
| JP (1) | JP3975411B2 (enExample) |
| KR (1) | KR100441135B1 (enExample) |
| CN (1) | CN1088855C (enExample) |
| AT (1) | AT407157B (enExample) |
| AU (1) | AU709583B2 (enExample) |
| BE (1) | BE1010726A5 (enExample) |
| BR (1) | BR9605394A (enExample) |
| CA (1) | CA2189110A1 (enExample) |
| CH (1) | CH691630A5 (enExample) |
| DE (1) | DE19644797A1 (enExample) |
| ES (1) | ES2122916B1 (enExample) |
| FR (1) | FR2740455B1 (enExample) |
| GB (1) | GB2306958B (enExample) |
| IT (1) | IT1286067B1 (enExample) |
| MX (1) | MX9605258A (enExample) |
| MY (1) | MY117352A (enExample) |
| NL (1) | NL1004387C2 (enExample) |
| SG (1) | SG49984A1 (enExample) |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3665166B2 (ja) * | 1996-07-24 | 2005-06-29 | 東京応化工業株式会社 | 化学増幅型レジスト組成物及びそれに用いる酸発生剤 |
| US6770420B2 (en) * | 1996-09-02 | 2004-08-03 | Ciba Specialty Chemicals Corporation | Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity |
| TW550439B (en) * | 1997-07-01 | 2003-09-01 | Ciba Sc Holding Ag | New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates |
| ATE239063T1 (de) | 1998-03-13 | 2003-05-15 | Akzo Nobel Nv | Nicht-wässriges überzugsmittel auf basis eines lufttrocknenden alkydharzes und eines photoinitiators |
| JP3853967B2 (ja) * | 1998-04-13 | 2006-12-06 | 富士写真フイルム株式会社 | 熱硬化性組成物およびこれを用いた平版印刷版用原版ならびにスルホン酸エステル化合物 |
| US6280519B1 (en) * | 1998-05-05 | 2001-08-28 | Exxon Chemical Patents Inc. | Environmentally preferred fluids and fluid blends |
| TW575792B (en) | 1998-08-19 | 2004-02-11 | Ciba Sc Holding Ag | New unsaturated oxime derivatives and the use thereof as latent acids |
| EP1124832B1 (en) * | 1998-10-29 | 2002-11-20 | Ciba SC Holding AG | Oxime derivatives and the use thereof as latent acids |
| WO2000052530A1 (en) | 1999-03-03 | 2000-09-08 | Ciba Specialty Chemicals Holding Inc. | Oxime derivatives and the use thereof as photoinitiators |
| NL1014545C2 (nl) * | 1999-03-31 | 2002-02-26 | Ciba Sc Holding Ag | Oxim-derivaten en de toepassing daarvan als latente zuren. |
| SG78412A1 (en) | 1999-03-31 | 2001-02-20 | Ciba Sc Holding Ag | Oxime derivatives and the use thereof as latent acids |
| US6797451B2 (en) * | 1999-07-30 | 2004-09-28 | Hynix Semiconductor Inc. | Reflection-inhibiting resin used in process for forming photoresist pattern |
| WO2001055789A2 (en) * | 2000-01-25 | 2001-08-02 | Infineon Technologies Ag | Chemically amplified short wavelength resist |
| JP2001296666A (ja) * | 2000-04-12 | 2001-10-26 | Orc Mfg Co Ltd | 基板露光方法および露光装置 |
| US6482567B1 (en) * | 2000-08-25 | 2002-11-19 | Shipley Company, L.L.C. | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same |
| TWI272451B (en) | 2000-09-25 | 2007-02-01 | Ciba Sc Holding Ag | Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition |
| ATE288907T1 (de) | 2001-06-01 | 2005-02-15 | Ciba Sc Holding Ag | Substituierte oxim-derivate und ihre verwendung als latente säuren |
| JP3633595B2 (ja) * | 2001-08-10 | 2005-03-30 | 富士通株式会社 | レジストパターン膨潤化材料およびそれを用いた微小パターンの形成方法および半導体装置の製造方法 |
| JP4951827B2 (ja) * | 2001-08-17 | 2012-06-13 | Ｊｓｒ株式会社 | スルホニル構造を有する化合物、それを用いた感放射線性酸発生剤、ポジ型感放射線性樹脂組成物、及びネガ型感放射線性樹脂組成物 |
| CA2474532A1 (en) * | 2002-02-06 | 2003-08-14 | Peter Murer | Sulfonate derivatives and the use therof as latent acids |
| AT500298A1 (de) * | 2002-06-14 | 2005-11-15 | Agrolinz Melamin Gmbh | Verfahren zur härtung von aminoplasten |
| MXPA05008118A (es) * | 2003-02-19 | 2005-09-30 | Ciba Sc Holding Ag | Derivados de oxima halogenados y el uso de los mismos como acidos latentes. |
| JP2004333865A (ja) * | 2003-05-07 | 2004-11-25 | Osaka Gas Co Ltd | 光酸発生剤及びそれを含む光重合性樹脂組成物 |
| WO2006008250A2 (en) * | 2004-07-20 | 2006-01-26 | Ciba Specialty Chemicals Holding Inc. | Oxime derivatives and the use therof as latent acids |
| JP4644464B2 (ja) * | 2004-10-19 | 2011-03-02 | 株式会社トクヤマ | 歯科用修復材料 |
| JP4631059B2 (ja) * | 2006-03-30 | 2011-02-16 | 国立大学法人 千葉大学 | 光酸発生材料、これを用いたフォトリソグラフィー材料、光パターニングまたは光リソグラフィー |
| US20100167178A1 (en) * | 2006-06-20 | 2010-07-01 | Hitoshi Yamato | Oxime sulfonates and the use thereof as latent acids |
| JP2010501655A (ja) * | 2006-08-24 | 2010-01-21 | チバ ホールディング インコーポレーテッド | Ｕｖ線量インジケータ |
| KR101439951B1 (ko) | 2007-02-15 | 2014-09-17 | 주식회사 동진쎄미켐 | 설포닐기를 포함하는 포토레지스트 모노머, 폴리머 및 이를 포함하는 포토레지스트 조성물 |
| JP4637221B2 (ja) * | 2007-09-28 | 2011-02-23 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法 |
| JP5308657B2 (ja) * | 2007-12-10 | 2013-10-09 | 東京応化工業株式会社 | 非イオン性感光性化合物、酸発生剤、レジスト組成物およびレジストパターン形成方法 |
| JP5676179B2 (ja) * | 2010-08-20 | 2015-02-25 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置 |
| JP5335045B2 (ja) * | 2011-08-31 | 2013-11-06 | 富士フイルム株式会社 | 感光性樹脂組成物、オキシムスルホネート化合物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置 |
| WO2016124493A1 (en) | 2015-02-02 | 2016-08-11 | Basf Se | Latent acids and their use |
| JP6605820B2 (ja) * | 2015-03-11 | 2019-11-13 | 株式会社Ａｄｅｋａ | オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1110460B (it) * | 1977-03-02 | 1985-12-23 | Ciba Geigy Ag | Prodotti che favoriscono la crescita delle piante e prodotti che proteggono le piante a base di eteri di ossime e di esteri di ossime loro preparazione e loro impiego |
| US4347372A (en) * | 1978-09-01 | 1982-08-31 | Ciba-Geigy Corporation | Benzoxazolyl-glyoxylonitrile-2-oxime ether derivatives |
| US4346094A (en) * | 1980-09-22 | 1982-08-24 | Eli Lilly And Company | 3-Aryl-5-isothiazolecarboxylic acids and related compounds used to lower uric acid levels |
| US4540598A (en) * | 1983-08-17 | 1985-09-10 | Ciba-Geigy Corporation | Process for curing acid-curable finishes |
| DE3660255D1 (en) * | 1985-04-12 | 1988-07-07 | Ciba Geigy Ag | Oxime sulphonates containing reactive groups |
| GB8608528D0 (en) * | 1986-04-08 | 1986-05-14 | Ciba Geigy Ag | Production of positive images |
| KR900005226A (ko) * | 1988-09-29 | 1990-04-13 | 윌리엄 비이 해리스 | 감광성 조성물 및 양화 상과 음화 상의 생성방법 |
| DE59309494D1 (de) * | 1992-05-22 | 1999-05-12 | Ciba Geigy Ag | Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit |
| GB9220986D0 (en) * | 1992-10-06 | 1992-11-18 | Ciba Geigy Ag | Chemical composition |
| JP3830183B2 (ja) * | 1995-09-29 | 2006-10-04 | 東京応化工業株式会社 | オキシムスルホネート化合物及びレジスト用酸発生剤 |
-
1996
- 1996-10-17 MY MYPI96004312A patent/MY117352A/en unknown
- 1996-10-18 GB GB9621798A patent/GB2306958B/en not_active Expired - Fee Related
- 1996-10-23 CH CH02598/96A patent/CH691630A5/de not_active IP Right Cessation
- 1996-10-24 AU AU70382/96A patent/AU709583B2/en not_active Ceased
- 1996-10-28 DE DE19644797A patent/DE19644797A1/de not_active Withdrawn
- 1996-10-28 US US08/738,560 patent/US6017675A/en not_active Expired - Lifetime
- 1996-10-29 FR FR9613165A patent/FR2740455B1/fr not_active Expired - Fee Related
- 1996-10-29 SG SG1996011001A patent/SG49984A1/en unknown
- 1996-10-29 CA CA002189110A patent/CA2189110A1/en not_active Abandoned
- 1996-10-30 KR KR1019960051718A patent/KR100441135B1/ko not_active Expired - Lifetime
- 1996-10-30 IT IT96MI002251A patent/IT1286067B1/it active IP Right Grant
- 1996-10-30 ES ES09602295A patent/ES2122916B1/es not_active Expired - Fee Related
- 1996-10-30 NL NL1004387A patent/NL1004387C2/nl not_active IP Right Cessation
- 1996-10-30 CN CN96122763A patent/CN1088855C/zh not_active Expired - Lifetime
- 1996-10-30 AT AT0190596A patent/AT407157B/de not_active IP Right Cessation
- 1996-10-31 MX MX9605258A patent/MX9605258A/es not_active IP Right Cessation
- 1996-10-31 BE BE9600924A patent/BE1010726A5/fr not_active IP Right Cessation
- 1996-10-31 JP JP30583496A patent/JP3975411B2/ja not_active Expired - Lifetime
- 1996-10-31 BR BR9605394A patent/BR9605394A/pt active Search and Examination
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