GB2306958B - Oximesulfonic acid esters and the use thereof as latent sulfonic acids - Google Patents

Oximesulfonic acid esters and the use thereof as latent sulfonic acids

Info

Publication number
GB2306958B
GB2306958B GB9621798A GB9621798A GB2306958B GB 2306958 B GB2306958 B GB 2306958B GB 9621798 A GB9621798 A GB 9621798A GB 9621798 A GB9621798 A GB 9621798A GB 2306958 B GB2306958 B GB 2306958B
Authority
GB
United Kingdom
Prior art keywords
acid esters
unsubstituted
phenyl
substituted
sulfonic acids
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9621798A
Other languages
English (en)
Other versions
GB9621798D0 (en
GB2306958A (en
Inventor
Kurt Dietliker
Martin Kunz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
BASF Schweiz AG
Original Assignee
Ciba Geigy AG
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG, Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Geigy AG
Publication of GB9621798D0 publication Critical patent/GB9621798D0/en
Publication of GB2306958A publication Critical patent/GB2306958A/en
Application granted granted Critical
Publication of GB2306958B publication Critical patent/GB2306958B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C07C309/66—Methanesulfonates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/73—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton to carbon atoms of non-condensed six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/75—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing singly-bound oxygen atoms bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/62—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/04—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
    • C07D311/06—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2
    • C07D311/08—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring
    • C07D311/18—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring substituted otherwise than in position 3 or 7
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
    • C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
    • C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
    • C07C2603/18—Fluorenes; Hydrogenated fluorenes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Dental Preparations (AREA)
GB9621798A 1995-10-31 1996-10-18 Oximesulfonic acid esters and the use thereof as latent sulfonic acids Expired - Fee Related GB2306958B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH308095 1995-10-31

Publications (3)

Publication Number Publication Date
GB9621798D0 GB9621798D0 (en) 1996-12-11
GB2306958A GB2306958A (en) 1997-05-14
GB2306958B true GB2306958B (en) 1999-12-15

Family

ID=4248187

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9621798A Expired - Fee Related GB2306958B (en) 1995-10-31 1996-10-18 Oximesulfonic acid esters and the use thereof as latent sulfonic acids

Country Status (19)

Country Link
US (1) US6017675A (enExample)
JP (1) JP3975411B2 (enExample)
KR (1) KR100441135B1 (enExample)
CN (1) CN1088855C (enExample)
AT (1) AT407157B (enExample)
AU (1) AU709583B2 (enExample)
BE (1) BE1010726A5 (enExample)
BR (1) BR9605394A (enExample)
CA (1) CA2189110A1 (enExample)
CH (1) CH691630A5 (enExample)
DE (1) DE19644797A1 (enExample)
ES (1) ES2122916B1 (enExample)
FR (1) FR2740455B1 (enExample)
GB (1) GB2306958B (enExample)
IT (1) IT1286067B1 (enExample)
MX (1) MX9605258A (enExample)
MY (1) MY117352A (enExample)
NL (1) NL1004387C2 (enExample)
SG (1) SG49984A1 (enExample)

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JP3665166B2 (ja) * 1996-07-24 2005-06-29 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
US6770420B2 (en) * 1996-09-02 2004-08-03 Ciba Specialty Chemicals Corporation Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity
TW550439B (en) * 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
DE69907431T2 (de) 1998-03-13 2004-04-08 Akzo Nobel N.V. Nicht-wässriges überzugsmittel auf basis eines lufttrocknenden alkydharzes und eines photoinitiators
JP3853967B2 (ja) * 1998-04-13 2006-12-06 富士写真フイルム株式会社 熱硬化性組成物およびこれを用いた平版印刷版用原版ならびにスルホン酸エステル化合物
US6280519B1 (en) * 1998-05-05 2001-08-28 Exxon Chemical Patents Inc. Environmentally preferred fluids and fluid blends
TW575792B (en) * 1998-08-19 2004-02-11 Ciba Sc Holding Ag New unsaturated oxime derivatives and the use thereof as latent acids
US6485886B1 (en) 1998-10-29 2002-11-26 Ciba Specialty Chemicals Corporation Oxime derivatives and the use thereof as latent acids
DE60028738T2 (de) 1999-03-03 2007-05-24 Ciba Speciality Chemicals Holding Inc. Oximderivate und ihre verwendung als photoinitiatoren
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
NL1014545C2 (nl) 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim-derivaten en de toepassing daarvan als latente zuren.
US6797451B2 (en) * 1999-07-30 2004-09-28 Hynix Semiconductor Inc. Reflection-inhibiting resin used in process for forming photoresist pattern
WO2001055789A2 (en) * 2000-01-25 2001-08-02 Infineon Technologies Ag Chemically amplified short wavelength resist
JP2001296666A (ja) * 2000-04-12 2001-10-26 Orc Mfg Co Ltd 基板露光方法および露光装置
US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
TWI272451B (en) 2000-09-25 2007-02-01 Ciba Sc Holding Ag Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition
KR100875612B1 (ko) 2001-06-01 2008-12-24 시바 홀딩 인크 치환된 옥심 유도체 및 이를 포함하는 조성물
JP3633595B2 (ja) * 2001-08-10 2005-03-30 富士通株式会社 レジストパターン膨潤化材料およびそれを用いた微小パターンの形成方法および半導体装置の製造方法
JP4951827B2 (ja) * 2001-08-17 2012-06-13 Ｊｓｒ株式会社 スルホニル構造を有する化合物、それを用いた感放射線性酸発生剤、ポジ型感放射線性樹脂組成物、及びネガ型感放射線性樹脂組成物
EP1472576B1 (en) * 2002-02-06 2013-04-24 Basf Se Sulfonate derivatives and the use therof as latent acids
AT500298A1 (de) * 2002-06-14 2005-11-15 Agrolinz Melamin Gmbh Verfahren zur härtung von aminoplasten
CA2511979A1 (en) * 2003-02-19 2004-09-02 Akira Matsumoto Halogenated oxime derivatives and the use thereof as latent acids
JP2004333865A (ja) * 2003-05-07 2004-11-25 Osaka Gas Co Ltd 光酸発生剤及びそれを含む光重合性樹脂組成物
KR101193824B1 (ko) * 2004-07-20 2012-10-24 시바 홀딩 인크 옥심 유도체 및 잠산으로서의 이의 용도
JP4644464B2 (ja) * 2004-10-19 2011-03-02 株式会社トクヤマ 歯科用修復材料
JP4631059B2 (ja) * 2006-03-30 2011-02-16 国立大学法人 千葉大学 光酸発生材料、これを用いたフォトリソグラフィー材料、光パターニングまたは光リソグラフィー
CN101473268A (zh) * 2006-06-20 2009-07-01 西巴控股有限公司 肟磺酸酯和其作为潜伏酸的用途
RU2453886C2 (ru) * 2006-08-24 2012-06-20 Циба Холдинг Инк. Индикаторы дозы уф-излучения
KR101439951B1 (ko) 2007-02-15 2014-09-17 주식회사 동진쎄미켐 설포닐기를 포함하는 포토레지스트 모노머, 폴리머 및 이를 포함하는 포토레지스트 조성물
JP4637221B2 (ja) * 2007-09-28 2011-02-23 富士フイルム株式会社 ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法
JP5308657B2 (ja) * 2007-12-10 2013-10-09 東京応化工業株式会社 非イオン性感光性化合物、酸発生剤、レジスト組成物およびレジストパターン形成方法
JP5676179B2 (ja) * 2010-08-20 2015-02-25 富士フイルム株式会社 ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
JP5335045B2 (ja) * 2011-08-31 2013-11-06 富士フイルム株式会社 感光性樹脂組成物、オキシムスルホネート化合物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
CN107207456B (zh) * 2015-02-02 2021-05-04 巴斯夫欧洲公司 潜酸及其用途
JP6605820B2 (ja) * 2015-03-11 2019-11-13 株式会社Ａｄｅｋａ オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物

Citations (5)

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Publication number Priority date Publication date Assignee Title
EP0012158A2 (de) * 1978-09-01 1980-06-25 Ciba-Geigy Ag Oximderivate und ihre Anwendung zum Schutz von Pflanzenkulturen
GB2084573A (en) * 1980-09-22 1982-04-15 Lilly Co Eli Improvements in or relating to 3-aryl-5-isothiazole derivatives
EP0139609A1 (de) * 1983-08-17 1985-05-02 Ciba-Geigy Ag Verfahren zum Härten säurehärtbarer Lacke
EP0241423A2 (de) * 1986-04-08 1987-10-14 Ciba-Geigy Ag Verfahren zur Herstellung positiver Abbildungen
EP0571330A1 (de) * 1992-05-22 1993-11-24 Ciba-Geigy Ag Hochauflösender I-Linien Photoresist mit höhere Empfindlichkeit

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IT1110460B (it) * 1977-03-02 1985-12-23 Ciba Geigy Ag Prodotti che favoriscono la crescita delle piante e prodotti che proteggono le piante a base di eteri di ossime e di esteri di ossime loro preparazione e loro impiego
EP0199672B1 (de) * 1985-04-12 1988-06-01 Ciba-Geigy Ag Oximsulfonate mit reaktiven Gruppen
EP0361907A3 (en) * 1988-09-29 1991-05-02 Hoechst Celanese Corporation Photoresist compositions for deep uv image reversal
GB9220986D0 (en) * 1992-10-06 1992-11-18 Ciba Geigy Ag Chemical composition
JP3830183B2 (ja) * 1995-09-29 2006-10-04 東京応化工業株式会社 オキシムスルホネート化合物及びレジスト用酸発生剤

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0012158A2 (de) * 1978-09-01 1980-06-25 Ciba-Geigy Ag Oximderivate und ihre Anwendung zum Schutz von Pflanzenkulturen
GB2084573A (en) * 1980-09-22 1982-04-15 Lilly Co Eli Improvements in or relating to 3-aryl-5-isothiazole derivatives
EP0139609A1 (de) * 1983-08-17 1985-05-02 Ciba-Geigy Ag Verfahren zum Härten säurehärtbarer Lacke
EP0241423A2 (de) * 1986-04-08 1987-10-14 Ciba-Geigy Ag Verfahren zur Herstellung positiver Abbildungen
EP0571330A1 (de) * 1992-05-22 1993-11-24 Ciba-Geigy Ag Hochauflösender I-Linien Photoresist mit höhere Empfindlichkeit

Also Published As

Publication number Publication date
MX9605258A (es) 1997-04-30
FR2740455A1 (fr) 1997-04-30
NL1004387C2 (nl) 1998-05-19
CN1088855C (zh) 2002-08-07
CH691630A5 (de) 2001-08-31
US6017675A (en) 2000-01-25
AU709583B2 (en) 1999-09-02
BR9605394A (pt) 1998-07-28
GB9621798D0 (en) 1996-12-11
FR2740455B1 (fr) 1999-01-29
ATA190596A (de) 2000-05-15
KR970022553A (ko) 1997-05-30
GB2306958A (en) 1997-05-14
BE1010726A5 (fr) 1998-12-01
AU7038296A (en) 1997-05-08
KR100441135B1 (ko) 2004-10-02
AT407157B (de) 2001-01-25
DE19644797A1 (de) 1997-05-07
MY117352A (en) 2004-06-30
JPH09222725A (ja) 1997-08-26
SG49984A1 (en) 2001-01-16
JP3975411B2 (ja) 2007-09-12
NL1004387A1 (nl) 1997-05-02
CN1153926A (zh) 1997-07-09
IT1286067B1 (it) 1998-07-07
ES2122916A1 (es) 1998-12-16
ITMI962251A1 (it) 1998-04-30
ES2122916B1 (es) 1999-08-16
CA2189110A1 (en) 1997-05-01

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