ES2122916A1 - Esteres de acidos oximsulfonicos y su empleo como acidos sulfonicos latentes. - Google Patents

Esteres de acidos oximsulfonicos y su empleo como acidos sulfonicos latentes.

Info

Publication number
ES2122916A1
ES2122916A1 ES09602295A ES9602295A ES2122916A1 ES 2122916 A1 ES2122916 A1 ES 2122916A1 ES 09602295 A ES09602295 A ES 09602295A ES 9602295 A ES9602295 A ES 9602295A ES 2122916 A1 ES2122916 A1 ES 2122916A1
Authority
ES
Spain
Prior art keywords
acid esters
unsubstituted
phenyl
substituted
sulfonic acids
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES09602295A
Other languages
English (en)
Other versions
ES2122916B1 (es
Inventor
Kurt Dietliker
Martin Kunz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
BASF Schweiz AG
Original Assignee
Ciba Geigy AG
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG, Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Geigy AG
Publication of ES2122916A1 publication Critical patent/ES2122916A1/es
Application granted granted Critical
Publication of ES2122916B1 publication Critical patent/ES2122916B1/es
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C07C309/66—Methanesulfonates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/73—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton to carbon atoms of non-condensed six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/75—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing singly-bound oxygen atoms bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/62—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/04—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
    • C07D311/06—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2
    • C07D311/08—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring
    • C07D311/18—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring substituted otherwise than in position 3 or 7
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
    • C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
    • C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
    • C07C2603/18—Fluorenes; Hydrogenated fluorenes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

Abstract

ESTERES DE ACIDOS OXIMSULFONICOS Y SU EMPLEO COMO ACIDOS SULFONICOS LATENTES. LA INVENCION SE REFIERE AL EMPLEO DE ESTERES DE ACIDO OXIMSULFONICO DE ACUERDO CON LA FORMULA I EN LA CUAL M ES 0 O 1, X ES 1 O 2; R1 REPRESENTA POR EJEMPLO FENILO SUBSTITUIDO, R2 TIENE POR EJEMPLO, UNA DE LAS DEFINICIONES DE R1 O DENOTA FENILO INSUBSTITUIDO, ALCANOILO CON 1 A 6 ATOMOS DE CARBONO, BENZOILO INSUBSTITUIDO O BIEN SUBSTITUIDO, ALCOXICARBONILO CON 2 A 6 ATOMOS DE CARBONO O FENOXICARBONILO; O R1 Y R2, POR EJEMPLO, EN SU CASO EN CONJUNTO FORMAN UN ANILLO CON EL GRUPO CO, R3 CUANDO X EQUIVALE A 1 REPRESENTA POR EJEMPLO ALQUILO CON 1 A 18 ATOMOS DE CARBONO, FENILO O FENANTRILO, EN QUE LOS RADICALES FENILO Y FENANTRILO PUEDEN SER DE TIPO INSUBSTITUIDO O SUBSTITUIDO O R3 CUANDO X ES IGUAL A 2, DENOTA POR EJEMPLO ALQUILENO CON 2 A 12, FENILENO O BIEN OXIDIFENILENO, EN TANTO QUE LOS RADICALES FENILENO U OXIDIFENILENO SON DE TIPO INSUBSTITUIDO O SUBSTITUIDO, EN CALIDAD DE GASTADORES DE ACIDOS LATENTES, ESPECIALMENTE EN EL CASO DE LONGITUDES DE ONDA DE MAS DE 390 NM, CON INCLUSION DEL EMPLEO DE TALES COMPUESTOS PARA LA ELABORACION DE MATERIALES FOTORRESISTENTES.
ES09602295A 1995-10-31 1996-10-30 Esteres de acidos oximsulfonicos y su empleo como acidos sulfonicos latentes. Expired - Fee Related ES2122916B1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH308095 1995-10-31

Publications (2)

Publication Number Publication Date
ES2122916A1 true ES2122916A1 (es) 1998-12-16
ES2122916B1 ES2122916B1 (es) 1999-08-16

Family

ID=4248187

Family Applications (1)

Application Number Title Priority Date Filing Date
ES09602295A Expired - Fee Related ES2122916B1 (es) 1995-10-31 1996-10-30 Esteres de acidos oximsulfonicos y su empleo como acidos sulfonicos latentes.

Country Status (19)

Country Link
US (1) US6017675A (es)
JP (1) JP3975411B2 (es)
KR (1) KR100441135B1 (es)
CN (1) CN1088855C (es)
AT (1) AT407157B (es)
AU (1) AU709583B2 (es)
BE (1) BE1010726A5 (es)
BR (1) BR9605394A (es)
CA (1) CA2189110A1 (es)
CH (1) CH691630A5 (es)
DE (1) DE19644797A1 (es)
ES (1) ES2122916B1 (es)
FR (1) FR2740455B1 (es)
GB (1) GB2306958B (es)
IT (1) IT1286067B1 (es)
MX (1) MX9605258A (es)
MY (1) MY117352A (es)
NL (1) NL1004387C2 (es)
SG (1) SG49984A1 (es)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2168953A1 (es) * 1999-03-31 2002-06-16 Ciba Speciality Chemical Holdi Derivados de oxima y su uso como acidos latentes

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JP3665166B2 (ja) * 1996-07-24 2005-06-29 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
US6770420B2 (en) * 1996-09-02 2004-08-03 Ciba Specialty Chemicals Corporation Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity
TW550439B (en) * 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
RU2216565C2 (ru) 1998-03-13 2003-11-20 Акцо Нобель Н.В. Неводная лакокрасочная композиция на основе алкидной смолы, высыхающей в результате окисления, и фотоинициатора
JP3853967B2 (ja) * 1998-04-13 2006-12-06 富士写真フイルム株式会社 熱硬化性組成物およびこれを用いた平版印刷版用原版ならびにスルホン酸エステル化合物
TW575792B (en) * 1998-08-19 2004-02-11 Ciba Sc Holding Ag New unsaturated oxime derivatives and the use thereof as latent acids
CN1636971A (zh) * 1998-10-29 2005-07-13 西巴特殊化学品控股有限公司 肟衍生物及其作为潜酸的用途
EP1163553B1 (en) 1999-03-03 2006-06-14 Ciba SC Holding AG Oxime derivatives and the use thereof as photoinitiators
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
US6797451B2 (en) * 1999-07-30 2004-09-28 Hynix Semiconductor Inc. Reflection-inhibiting resin used in process for forming photoresist pattern
WO2001055789A2 (en) * 2000-01-25 2001-08-02 Infineon Technologies Ag Chemically amplified short wavelength resist
JP2001296666A (ja) * 2000-04-12 2001-10-26 Orc Mfg Co Ltd 基板露光方法および露光装置
US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
TWI272451B (en) 2000-09-25 2007-02-01 Ciba Sc Holding Ag Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition
JP4408220B2 (ja) 2001-06-01 2010-02-03 チバ ホールディング インコーポレーテッド 置換オキシム誘導体及びその潜在酸としての使用
JP3633595B2 (ja) * 2001-08-10 2005-03-30 富士通株式会社 レジストパターン膨潤化材料およびそれを用いた微小パターンの形成方法および半導体装置の製造方法
JP4951827B2 (ja) * 2001-08-17 2012-06-13 Ｊｓｒ株式会社 スルホニル構造を有する化合物、それを用いた感放射線性酸発生剤、ポジ型感放射線性樹脂組成物、及びネガ型感放射線性樹脂組成物
BR0307501A (pt) * 2002-02-06 2004-12-07 Ciba Sc Holding Ag Derivados de sulfonato e o uso destes como ácidos latentes
AT500298A1 (de) * 2002-06-14 2005-11-15 Agrolinz Melamin Gmbh Verfahren zur härtung von aminoplasten
WO2004074242A2 (en) * 2003-02-19 2004-09-02 Ciba Specialty Chemicals Holding Inc. Halogenated oxime derivatives and the use thereof as latent acids
JP2004333865A (ja) * 2003-05-07 2004-11-25 Osaka Gas Co Ltd 光酸発生剤及びそれを含む光重合性樹脂組成物
KR101193824B1 (ko) * 2004-07-20 2012-10-24 시바 홀딩 인크 옥심 유도체 및 잠산으로서의 이의 용도
JP4644464B2 (ja) * 2004-10-19 2011-03-02 株式会社トクヤマ 歯科用修復材料
JP4631059B2 (ja) * 2006-03-30 2011-02-16 国立大学法人 千葉大学 光酸発生材料、これを用いたフォトリソグラフィー材料、光パターニングまたは光リソグラフィー
EP2030081A2 (en) * 2006-06-20 2009-03-04 Ciba Holding Inc. Oxime sulfonates and the use therof as latent acids
WO2008022952A1 (en) * 2006-08-24 2008-02-28 Ciba Holding Inc. Uv-dosis indicators
KR101439951B1 (ko) 2007-02-15 2014-09-17 주식회사 동진쎄미켐 설포닐기를 포함하는 포토레지스트 모노머, 폴리머 및 이를 포함하는 포토레지스트 조성물
JP4637221B2 (ja) * 2007-09-28 2011-02-23 富士フイルム株式会社 ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法
JP5308657B2 (ja) * 2007-12-10 2013-10-09 東京応化工業株式会社 非イオン性感光性化合物、酸発生剤、レジスト組成物およびレジストパターン形成方法
JP5676179B2 (ja) * 2010-08-20 2015-02-25 富士フイルム株式会社 ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
JP5335045B2 (ja) * 2011-08-31 2013-11-06 富士フイルム株式会社 感光性樹脂組成物、オキシムスルホネート化合物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
WO2016124493A1 (en) 2015-02-02 2016-08-11 Basf Se Latent acids and their use
JP6605820B2 (ja) * 2015-03-11 2019-11-13 株式会社Ａｄｅｋａ オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物

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US4540598A (en) * 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
US4715883A (en) * 1978-09-01 1987-12-29 Ciba-Geigy Corporation Thiadiazolyl-glyoxylonitrile-2-oxime ether derivatives for protecting plant crops
US4736055A (en) * 1985-04-12 1988-04-05 Ciba-Geigy Corporation Oxime sulfonates containing reactive groups
EP0361907A2 (en) * 1988-09-29 1990-04-04 Hoechst Celanese Corporation Photoresist compositions for deep UV image reversal
EP0571330A1 (de) * 1992-05-22 1993-11-24 Ciba-Geigy Ag Hochauflösender I-Linien Photoresist mit höhere Empfindlichkeit
EP0592139A1 (en) * 1992-10-06 1994-04-13 Ciba-Geigy Ag Composition for priming and cleaning based on organosilane

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US4451286A (en) * 1977-03-02 1984-05-29 Ciba-Geigy Corporation Compositions, which influence plant growth and protect plants based on oxime ethers and oxime esters
US4715883A (en) * 1978-09-01 1987-12-29 Ciba-Geigy Corporation Thiadiazolyl-glyoxylonitrile-2-oxime ether derivatives for protecting plant crops
US4540598A (en) * 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
US4736055A (en) * 1985-04-12 1988-04-05 Ciba-Geigy Corporation Oxime sulfonates containing reactive groups
EP0361907A2 (en) * 1988-09-29 1990-04-04 Hoechst Celanese Corporation Photoresist compositions for deep UV image reversal
EP0571330A1 (de) * 1992-05-22 1993-11-24 Ciba-Geigy Ag Hochauflösender I-Linien Photoresist mit höhere Empfindlichkeit
EP0592139A1 (en) * 1992-10-06 1994-04-13 Ciba-Geigy Ag Composition for priming and cleaning based on organosilane

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2168953A1 (es) * 1999-03-31 2002-06-16 Ciba Speciality Chemical Holdi Derivados de oxima y su uso como acidos latentes

Also Published As

Publication number Publication date
AU709583B2 (en) 1999-09-02
JPH09222725A (ja) 1997-08-26
GB2306958A (en) 1997-05-14
KR970022553A (ko) 1997-05-30
GB9621798D0 (en) 1996-12-11
CA2189110A1 (en) 1997-05-01
BR9605394A (pt) 1998-07-28
ATA190596A (de) 2000-05-15
ITMI962251A1 (it) 1998-04-30
JP3975411B2 (ja) 2007-09-12
ES2122916B1 (es) 1999-08-16
AU7038296A (en) 1997-05-08
CH691630A5 (de) 2001-08-31
KR100441135B1 (ko) 2004-10-02
US6017675A (en) 2000-01-25
SG49984A1 (en) 2001-01-16
IT1286067B1 (it) 1998-07-07
NL1004387A1 (nl) 1997-05-02
BE1010726A5 (fr) 1998-12-01
CN1153926A (zh) 1997-07-09
FR2740455B1 (fr) 1999-01-29
FR2740455A1 (fr) 1997-04-30
CN1088855C (zh) 2002-08-07
MY117352A (en) 2004-06-30
NL1004387C2 (nl) 1998-05-19
DE19644797A1 (de) 1997-05-07
AT407157B (de) 2001-01-25
MX9605258A (es) 1997-04-30
GB2306958B (en) 1999-12-15

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