JPH06500621A - 高純度化学薬品を移送及び送出するための改良された装置及び方法 - Google Patents
高純度化学薬品を移送及び送出するための改良された装置及び方法Info
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- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F11/00—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it
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- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
- B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
- B67D7/00—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
- B67D7/02—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants
- B67D7/0277—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants using negative pressure
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- G—PHYSICS
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- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F11/00—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it
- G01F11/28—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with stationary measuring chambers having constant volume during measurement
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
- B01F2101/2204—Mixing chemical components in generals in order to improve chemical treatment or reactions, independently from the specific application
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- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/2931—Diverse fluid containing pressure systems
- Y10T137/3109—Liquid filling by evacuating container
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/2931—Diverse fluid containing pressure systems
- Y10T137/3115—Gas pressure storage over or displacement of liquid
- Y10T137/3124—Plural units
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/2931—Diverse fluid containing pressure systems
- Y10T137/3115—Gas pressure storage over or displacement of liquid
- Y10T137/3127—With gas maintenance or application
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Abstract
Description
Claims (36)
- 1.化学薬品を一括供給源から最終使用現場へ移送及び送出するための方法であ って、 リフティング容器を設け、 当該一括供給源とこのリフティング容器との間の導管をであって、この導管を通 る流体の流れを制御するための弁を含む供給源導管を設け、 上記リフティング容器に通じ、そしてそのリフティング容器から選択的にガスを 排気するための手段を含む真空系を設け、上記リフティング容器に通じ、そして そのリフティング容器を選択的に昇圧させるための手段を含む加圧系を設け、上 記リフティング容器に通じる送り出し容器を設け、この送り出し容器から最終使 用現場までの導管であって、この導管を通る流体の流れを制御するための弁を含 む送り出し導管を設けることを含み、 化学薬品を当該一括供給源から最終使用現場まで、上記真空系を使用して、上記 リフティング容器内を負圧にするようにリフティング容器からガスを排気し、化 学薬品を上記一括供給源から上記リフティング容器へ抜出させるように、上記一 括供給源と上記リフティング容器との間の供給源導管の弁を開け、 上記供給源導管の弁を閉じそして上記リフティング容器を昇圧し、このリフティ ング容器内の加圧下の化学薬品を上記送り出し容器へ移らせ、 この送り出し容器から加圧下の化学薬品を最終使用現場へ、上記送り出し導管の 弁を制御することにより必要に応じて分配することを含む操作により移送する方 法。
- 2.二つ以上の送り出し容器を設け、そして化学薬品を前記リフティング容器か ら当該送り出し容器のおのおのへ交互に移送する、請求の範囲第1項記載の方法 。
- 3.化学薬品を前記最終使用現場へ初めは第一の送り出し容器から分記し、そし てこの第一の送り出し容器が空に近づいたら、この第一の送り出し容器を再充填 しながら化学薬品を第二の送り出し容器から最終使用現場へ分配する、請求の範 囲第2項記載の方法。
- 4.当該化学物質を前記一括供給源と前記最終使用現場の間でフィルター手段に よりろ過する、請求の範囲第1項記載の方法。
- 5.前記フィルター手段が少なくとも0.1ミクロンのサブミクロンフィルター を含む、請求の範囲第4項記載の方法。
- 6.前記真空系により前記リフティング容器内に生じる真空が700〜50to rrである、請求の範囲第1項記載の方法。
- 7.前記加圧系が少なくとも0〜150psigの圧力で送り出される昇圧ガス を供給する、請求の範囲第6項記載の方法。
- 8.当該化学薬品を前記送り出し容器から前記一括供給源へ再循環させるための 手段が設けられ、 そして当該化学薬品が前記最終使用現場での要求量が少ない間は前記一括供給源 へ再循環させられる、請求の範囲第1項記載の方法。
- 9.当該化学薬品を前記リフティング容器から前記一括供給源へ再循環させるた めの手段が設けられ、 そして当該化学薬品が前記最終使用現場での要求量が少ない間は前記一括供給源 へ再循環させられる、請求の範囲第1項記載の方法。
- 10.化学薬品を一括供給源から最終使用現場へ移送及び送出するための装置で あって、 リフティング容器、 当該一括供給源とこのリフティング容器との間の導管であって、この導管を通る 流体の流れを制御するための弁を含む供給源導管、上記リフティング容器から選 択的にガスを排気するための、当該リフティング容器に通じる真空系、 上記リフティング容器を選択的に昇圧するための、当該リフティング容器に通じ る加圧系、 上記リフティング容器に通じる送り出し容器、この送り出し容器から最終使用現 場までの導管であって、この導管を通る流体の流れを制御するための弁を含む送 り出し導管を含んでなる装置。
- 11.前記リフティング容器と前記送り出し容器との間にサブミクロンフィルタ ー手段が設けられる。請求の範囲第10項記載の装置。
- 12.前記送り出し容器と前記最終使用現場との間にサブミクロンフィルター手 段が設けられる、請求の範囲第10項記載の装置。
- 13.前記真空系が、前記リフティング容器に流体を介して通じる真空ポンプと 、当該リフティング容器からのガスの排気を制御するための弁手段とを含んでな る、請求の範囲第10項記載の装置。
- 14.前記真空系が前記リフティング容器内を700〜50torrの真空にす る、請求の範囲第13項記載の装置。
- 15.前記加圧系が、前記リフティング容器に流体を介して通じる昇圧不活性ガ ス源と、昇圧ガスの当該リフティング容器への放出を制御するための弁手段とを 含んでなる、請求の範囲第10項記載の装置。
- 16.前記不活性ガスがヘリウム、アルゴン、ネオン及び窒素からなる群より選 ばれる、請求の範囲第15項記載の装置。
- 17.前記加圧系が前記リフティング容器内を少なくとも0〜150psigの 圧力にする、請求の範囲第15項記載の装置。
- 18.前記送り出し容器を少なくとも0〜150psigの圧力に昇圧するため の手段が当該容器に設けられる、請求の範囲第10項記載の装置。
- 19.前記リフティング容器内の化学薬品を前記一括供給源へ再循環させるため の手段を備えてなる、請求の範囲第10項記載の装置。
- 20.化学薬品を再循環させるための前記手段が、前記リフティング容器と前記 一括供給源との間を連絡する戻り導管と、これを通る流れを制御するための、当 該戻り導管にある少なくとも一つの弁とを含んでなる、請求の範囲第19項記載 の装置。
- 21.化学薬品を再循環させるための前記手段が前記戻り導管にあるフィルター 手段を含む、請求の範囲第20項記載の装置。
- 22.前記最終使用現場での化学薬品の要求量が少ない場合に前記送り出し導管 内の化学薬品を前記一括供給源へ再循環させるための手段を備えてなる、請求の 範囲第10項記載の装置。
- 23.化学薬品を再循環させるための前記手段が、前記最終使用現場での化学薬 品の要求量を監視するための流量検知手段、 前記送り出し導管と前記一括供給源との間の戻り導管、当該最終使用現場での化 学薬品の要求量が少ない間化学薬品の流れを上記戻り導管を通して方向を変える ため上記流量検知手段に応答する当該戻り導管の弁手段を含んでなる、請求の範 囲第22項記載の装置。
- 24.一つの容器が前記リフティング容器と前記送り出し容器の両方として働く 、請求の範囲第10項記載の装置。
- 25.二つ以上の送り出し容器を備え、化学薬品を前記リフティング容器から当 該送り出し容器のおのおのへ交互に移送する、請求の範囲第10項記載の装置。
- 26.各送り出し容器が当該送り出し容器内の化学薬品のレベルを検知するため の手段を備え、そして供給を行っている送り出し容器が空に近づいたら送り出し 容器を切換換えて前記送り出し導管に連続して供給するための手段が設けられて いる、請求の範囲第25項記載の装置。
- 27.前記容器のおのおのが前記供給源導管、前記加圧系、前記真空系及び前記 送り出し導管に通じており、そして各容器が必要に応じてリフティング容器と送 り出し容器の両方として働くことができる、請求の範囲第25項記載の装置。
- 28.前記送り出し導管がそれを通る流れの流量を制御するための手段を備えて なる、請求の範囲第10項記載の装置。
- 29.前記送り出し導管を通る流れの流量を制御するための前記手段が、 当該送り出し導管に通じる流量検知器、この流量検知器に応答する流量計、 この流量計により制御されて当該送り出し導管を通る流れを調整する、当該送り 出し導管にある調節可能制御弁を含んでなる、請求範囲第28項の装置。
- 30.化学薬品を一括供給源から最終使用現場へ移送及び送出するための装置で あって、 少なくとも一つの容器、 この容器内に負圧から正正に至る交替する圧力を生じさせ且つ制御するための手 段、 上記一括供給源と上記容器との間の供給源導管、上記容器と最終使用現場との間 の送り出し導管、を含んでなり、 真空ポンプを用いて上記容器内に実質的な負圧を生じさせ、そして化学薬品を上 記供給源導管を通して上記容器内へ抜出すことにより、当該化学薬品を上記一括 供給源と上記容器の間で移送し、そして上記容器内に正圧を生じさせ、そして化 学薬品を上記送り出し導管を通して上記最終使用現場へ押し進めることにより、 当該化学薬品を上記容器と上記最終使用現場との間で移送する装置。
- 31.前記容器内に負圧から正圧に至る交替する圧力を正じさせ且つ制御するた めの前記手段が、 前記真空ポンプ、前記容器とこの真空ポンプの間をつなぐガス排気導管、そして このガス排気導管を通るガスの流れを制御するための弁を含む真空系と、 昇圧ガス源、前記容器とこのガス源の間をつなぐ昇圧ガス導管、そしてこの昇圧 ガス導管を通るガスの流れを制御するための弁を含む加圧系とを含んでなる、請 求の範囲第30項記載の装置。
- 32.複数の容器を備え、そして容器間の流れを可能にし且つ制御するための手 段を備えてなる、請求の範囲第30項記載の装置。
- 33.前記複数の容器が第一の容器と第二の容器とを含み、この第一の容器が化 学薬品を前記一括供給源から前記供給源導管を通して持ち上げるのに使用され、 化学薬品がこの第一の容器から第二の容器へ移送され、そして化学薬品が第二の 容器により前記送り出し導管を経由して前記最終使用現場へ供給される、請求の 範囲第32項記載の装置。
- 34.前記送り出し導管が化学薬品を多数の最終使用現場へ供給するように多数 の送り出し導管に分けられ、分けられた各送り出し導管を通る流れが別々の弁手 段により制御される、請求の範囲第30項記載の装置。
- 35.高純度化学薬品を一括供給源から最終使用現場へ移送及び送出ずるための 装置であって、 当該一括供給源に接続し且つ化学薬品を第一の容器に移す供給源導管、 上記第一の容器に通じ、化学薬品を上記一括供給源からこの第一の容器へ抜出さ せるようにこの第一の容器からガスを排気してこの容器内に負圧を生じさせるこ とができる真空系、上記第一の容器に通じ、化学薬品をこの第一の容器からこの 容器に通じる第二の容器へ押し進めるようにこの第一の容器内に正圧を生じさせ ることができる加圧系、 上記第二の容器に通じ、化学薬品を当該第二の容器から送り出し導管を通して押 し進めて最終使用現場へ供給するようにこの第二の容器内に正圧を生じさせるこ とができる加圧系、を含んでなり、そして、最終使用現場での化学薬品の需要を 検知するための手段を備え、且つ化学薬品の需要が少ない間は化学薬品を再循環 させて上記一括供給源へ戻すための手段を備えてなる装置。
- 36.前記第一の容器と前記送り出し導管の両方に通じる第三の容器を備え、前 記第一の容器と前記第二の容器との間及び前記第一の容器とこの第三の容器との 間で化学薬品を交互に移送し、第二及び第三の容器の両方にレベル検知手段を備 え、且つ前記送り出し導管への化学薬品の流れを第二の容器からのものと第三の 容器からのものとに切換えるための手段を備えてなり、第二の容器で化学薬品の レベルが低いのが検知されるまでは最終使用現場へ送り出される化学薬品は第二 の容器からのものであり、次いで化学薬品の送り出しは第三の容器から抜出すた めに切換えられて、それから第二の容器を第一の容器から再充填し、そして第三 の容器で化学薬品のレベルが低いのが検知されるまでは最終使用現場への化学薬 品の送り出しは第三の容器からなされ、次いで化学薬品の送り出しは第二の容器 から抜出すために切換えられて、それから第三の容器を第一の容器から再充填す る、請求の範囲第35項記載の装置。
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US583,826 | 1990-09-17 | ||
US07583826 US5148945B1 (en) | 1990-09-17 | 1990-09-17 | Apparatus and method for the transfer and delivery of high purity chemicals |
PCT/US1991/006717 WO1992005406A1 (en) | 1990-09-17 | 1991-09-17 | Improved apparatus and method for the transfer and delivery of high purity chemicals |
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US (2) | US5148945B1 (ja) |
EP (1) | EP0549733B1 (ja) |
JP (1) | JP2911219B2 (ja) |
KR (1) | KR0171627B1 (ja) |
DE (1) | DE69123743T2 (ja) |
WO (1) | WO1992005406A1 (ja) |
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Cited By (8)
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JP2009135521A (ja) * | 1997-07-11 | 2009-06-18 | Advanced Technology Materials Inc | バルク化学物質供給システム |
JPH11294700A (ja) * | 1998-04-08 | 1999-10-29 | Nippon Sanso Kk | ガス供給設備 |
JP4646517B2 (ja) * | 2002-02-15 | 2011-03-09 | ラム リサーチ コーポレーション | Cmp/洗浄システム用の化学剤およびスラリをユースポイント方式で配送、制御、混合するためのシステムならびに方法 |
JP2005230819A (ja) * | 2004-02-20 | 2005-09-02 | Cs Clean Systems Ag | バブラーを再充填するための装置及び方法 |
JP2006130614A (ja) * | 2004-11-05 | 2006-05-25 | M Fsi Kk | スラリーの供給装置及びスラリーの供給方法 |
JP4486870B2 (ja) * | 2004-11-05 | 2010-06-23 | アプリシアテクノロジー株式会社 | スラリーの供給装置及びスラリーの供給方法 |
US9347616B2 (en) | 2011-05-28 | 2016-05-24 | Entegris, Inc. | Refillable ampoule with purge capability |
US10551004B2 (en) | 2011-05-28 | 2020-02-04 | Entegris, Inc. | Refillable ampoule with purge capability |
Also Published As
Publication number | Publication date |
---|---|
EP0549733A4 (en) | 1993-09-08 |
EP0549733B1 (en) | 1996-12-18 |
US5148945A (en) | 1992-09-22 |
KR930702661A (ko) | 1993-09-09 |
US5330072A (en) | 1994-07-19 |
DE69123743D1 (de) | 1997-01-30 |
EP0549733A1 (en) | 1993-07-07 |
KR0171627B1 (ko) | 1999-05-01 |
DE69123743T2 (de) | 1997-06-26 |
US5148945B1 (en) | 1996-07-02 |
WO1992005406A1 (en) | 1992-04-02 |
JP2911219B2 (ja) | 1999-06-23 |
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