JPH0447976B2 - - Google Patents

Info

Publication number
JPH0447976B2
JPH0447976B2 JP58050806A JP5080683A JPH0447976B2 JP H0447976 B2 JPH0447976 B2 JP H0447976B2 JP 58050806 A JP58050806 A JP 58050806A JP 5080683 A JP5080683 A JP 5080683A JP H0447976 B2 JPH0447976 B2 JP H0447976B2
Authority
JP
Japan
Prior art keywords
storage box
wafer
light beam
wafers
storage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58050806A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59175740A (ja
Inventor
Tetsuya Utsunomya
Haruhiko Yoshioka
Wataru Mochizuki
Yasuto Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP5080683A priority Critical patent/JPS59175740A/ja
Publication of JPS59175740A publication Critical patent/JPS59175740A/ja
Publication of JPH0447976B2 publication Critical patent/JPH0447976B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
JP5080683A 1983-03-25 1983-03-25 ウエハ検出装置 Granted JPS59175740A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5080683A JPS59175740A (ja) 1983-03-25 1983-03-25 ウエハ検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5080683A JPS59175740A (ja) 1983-03-25 1983-03-25 ウエハ検出装置

Related Child Applications (5)

Application Number Title Priority Date Filing Date
JP1071185A Division JPH02333A (ja) 1989-03-23 1989-03-23 半導体ウエハ測定方法
JP1071184A Division JPH01280332A (ja) 1989-03-23 1989-03-23 半導体ウエハ配列検出装置
JP8359991A Division JP2500205B2 (ja) 1991-03-23 1991-03-23 ウエハ移送装置
JP8359891A Division JP2537310B2 (ja) 1991-03-23 1991-03-23 ウエハ検出装置
JP3083600A Division JPH0817199B2 (ja) 1991-03-23 1991-03-23 ウエハ移送装置

Publications (2)

Publication Number Publication Date
JPS59175740A JPS59175740A (ja) 1984-10-04
JPH0447976B2 true JPH0447976B2 (de) 1992-08-05

Family

ID=12869010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5080683A Granted JPS59175740A (ja) 1983-03-25 1983-03-25 ウエハ検出装置

Country Status (1)

Country Link
JP (1) JPS59175740A (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61188331A (ja) * 1985-02-15 1986-08-22 Nippon Texas Instr Kk 物体取出装置
JPH0652753B2 (ja) * 1985-05-13 1994-07-06 キヤノン株式会社 基板搬出入装置
JPH0641323B2 (ja) * 1985-07-17 1994-06-01 キヤノン株式会社 ウエハ位置検知装置
JPH0642506B2 (ja) * 1985-08-30 1994-06-01 キヤノン株式会社 ウエハ処理システム
JPS62263647A (ja) * 1986-05-12 1987-11-16 Tokyo Electron Ltd ウエハプロ−バ
JPH0333062Y2 (de) * 1986-07-28 1991-07-12
JPS63308928A (ja) * 1987-06-11 1988-12-16 Fuji Electric Co Ltd ウエハ搬送装置
JP2519096B2 (ja) * 1988-02-12 1996-07-31 東京エレクトロン株式会社 処理装置及びレジスト処理装置及び処理方法及びレジスト処理方法
JPH01244634A (ja) * 1988-03-25 1989-09-29 Teru Barian Kk 半導体ウエハの製造装置
US4941800A (en) * 1988-10-21 1990-07-17 Tokyo Electron Limited Transfer apparatus for plate-like member
JPH02142157A (ja) * 1988-11-22 1990-05-31 Nippon M R C Kk ウェハーの有無・傾き判別装置
JP2615171B2 (ja) * 1988-12-19 1997-05-28 東京エレクトロン株式会社 半導体製造装置
JP2859655B2 (ja) * 1989-09-19 1999-02-17 株式会社ニデック ウェーハ検出装置
JPH0642505B2 (ja) * 1992-05-22 1994-06-01 株式会社東京精密 ウエハの抜取方法
JPH1067428A (ja) * 1997-03-28 1998-03-10 Texas Instr Japan Ltd ウエハスライス収納・取出方法
JP3936030B2 (ja) * 1997-06-23 2007-06-27 東京エレクトロン株式会社 被処理体の回収方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5764928A (en) * 1980-10-07 1982-04-20 Nippon Kogaku Kk <Nikon> Carrying apparatus for photo mask or reticle

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5764928A (en) * 1980-10-07 1982-04-20 Nippon Kogaku Kk <Nikon> Carrying apparatus for photo mask or reticle

Also Published As

Publication number Publication date
JPS59175740A (ja) 1984-10-04

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