JPH0385755A - 樹脂封止型半導体装置 - Google Patents

樹脂封止型半導体装置

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Publication number
JPH0385755A
JPH0385755A JP1223865A JP22386589A JPH0385755A JP H0385755 A JPH0385755 A JP H0385755A JP 1223865 A JP1223865 A JP 1223865A JP 22386589 A JP22386589 A JP 22386589A JP H0385755 A JPH0385755 A JP H0385755A
Authority
JP
Japan
Prior art keywords
connector
electrode
semiconductor device
lead frame
die stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1223865A
Other languages
English (en)
Other versions
JPH0671062B2 (ja
Inventor
Yoshimasa Kudo
工藤 好正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
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Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP1223865A priority Critical patent/JPH0671062B2/ja
Priority to US07/571,972 priority patent/US5218231A/en
Publication of JPH0385755A publication Critical patent/JPH0385755A/ja
Publication of JPH0671062B2 publication Critical patent/JPH0671062B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) 本発明は、電源整流用樹脂封止型半導体装置に係わり、
特に、ブリッジ([3ridge)回路を描或する樹脂
封止型半導体装置に好適する。
(従来の技術) ブリッジ回路を利用する電源整流樹脂封止型半導体装置
には、いわゆるメサ(Mesa)型ダイオード(Dio
de)またはブレイナー(Planer)型ダイオード
により形成するブリッジ回路を利用しており、その組立
方式は、幾多の変遷を経た上でリードフレーム(Lea
d Frame)を利用する手法も利用されている。こ
の電源整流用樹脂封止型半導体装置を、第1図の斜視図
及びこれをA−A線により切断した第2図の断面図更に
、半導体素子の構造を示す第3図断面図により説明する
。即ち、ブリッジ回路を構成する半導体素子として利用
するプレイナ型またはメサ型のダイオードが適用されて
いるが、順序不同であるが第3図断面図に示したブレイ
ナー型について説明する。
ダイオードに必要な、反対の極性を示すN及びP型の不
純物領域1.2が半導体素子を構成するシリコン半導体
基板(特に図示せず)に形成されており、更にN十領域
3も記載されている。このN十領域3は、半導体基板内
に多数のプレイナー型半導体素子を形成するのに必要な
分離領域として機能するものであると共に、N十領域3
に形成するダイシングライン(Dicing Line
図示せず)に沿ってプレイキング(Braking)処
理して個別の半導体素子を形成する役割も果たす。
図にあるように、P十領域2とN十領域3には、夫々導
電性金属層4.5を被覆して電極層4.5を形成してい
る外に、常法の熱酸化法により熱酸化膜6を被覆後、フ
ォトリソグラフィ(Phot。
Lj thography)法によりパターニング(P
atternjng)された状態が図示されており、半
導体基板表面に露出する接合端部7.8を被覆している
これに対してメサ型半導体素子では、図示していないが
接合端部をメサ状部分に露出しているのが特徴である。
即ち、半導体基板の厚さ方向に正または負ベベル(Be
vel)もしくは両方を備えた傾斜面を機械的または化
学的さらには両方を組合わせた手段によって形成する。
そして、上記のようにこの傾斜面に露出したダイオード
に不可欠な接合端部をシリコンゴムなとのエンキャップ
(cncape)材で被覆・保護するのが通常である。
ところで、このような構造を持ったダイオードの複数個
によりブリッジ回路を構成する電源整流樹脂封止型半導
体装置が市販されているが、その組立工程には、いわゆ
るリードフレームを利用する方式が採用されており、第
1図の斜視図及びこれをA−A線で切断した断面図によ
り説明する。
コネクター(Connecter) I Oは、インナ
ーリード(Inner Lead) 9に半田層12に
より固着して一体としており、ブリッジ回路に必要な4
個のブレイナーまたはメサ型半導体素子13・・・を半
田層12・・・を介してコネクターlOに固着する。更
に、このように半導体素子13・・・を取付けたコネク
ター10.10には、リードフレーム14に形成したダ
イステージ(DieStage)15に各半導体素子1
3.13の裏面電極5.5を半田層12を介して固着し
て互いに相対向するように取付ける。
次に、公知のトランスファーモールド(Transf−
er Mo1d)法により樹脂封止工程を施して封止樹
脂層16を被覆して、電源整流樹脂封止型半導体装を完
成している。
(発明が解決しようとする課題) このような構造の樹脂封止型半導体装置にあっては、半
田層12による取付工程が問題となる。
と言うのは、P+側電極4をダイステージ15に取付け
る際、半田層12が平坦なダイステージ15部分に広が
って、絶縁が必要なN十領域3、P領域2部分に接触す
る頻度が大きい。このため短絡不良が起こると共に、半
導体素子に必要な耐圧が取れない。
更に、半田層と半導体素子の接触面積が一定でないため
に応力バランスが崩れるためにしばしば割れる事故が発
生した。
本発明は、このような事情により成されたもので、特に
、半田の拡がりによるP+、N+側電極との短絡不良及
び半導体素子を形成する半導体基板と、ダイステージや
コネクター間の接合面積不均一によるクラックを防止す
ることを目的とするものである。
〔発明の構成〕
(課題を解決するための手段) 半導体基板内にPN接合を形成する複数の半導体素子と
、このPN接合を構成する相反する導電型の不純物領域
に夫々形成する電極と、この電極に対応するダイステー
ジの両面に形成するエンボス部と、この両エンボス部と
各電極間に形成する第1固着層と、エンボス部と固着し
ていない各電極とコネクター間に形成する第2固着層と
、このコネクターに接続するリードと、これらを被覆す
る封止樹脂層に本発明に係わる樹脂封止型半導体装置の
特徴がある。
(作 用) このように本発明では、半田層の拡がりをエンボス範囲
に抑制できるので、厚さを従来より大きくして、疲労特
性を改善できる。更に、半導体素子に形成する電極との
半田付面積を一定に維持することができるために、面積
差による応力も防止でき、ひいてはクラック発生も改善
できる。
(実施例) 以下本発明に係わる一実施例を第4図〜第6図を参照し
て説明するが、第4図にブレイナー型ダイオード20、
第6図にメサ型ダイオード21の使用例が示されており
、メサ型ダイオードについて先ず説明する。図に明らか
にされていないが、第3図に明らかなようにN−型シリ
コン半導体基板表面に常法により被着した熱酸化膜には
、フォトリソグラフィ法によるバターニング工程を施し
て窓を形成後反対導電型の不純物例えばBを拡散または
イオン注入法により導入してP生型領域を設置すると共
に接合を形成するが、メサ型構造の特徴として接合端部
をシリコン半導体基板の厚さ方向に導出する。更に、図
示していないが、シリコン半導体基板の厚さ方向には、
正、負または両者を併用した傾斜ベベル面を形式して接
合端部と交差させて素子の耐圧特性を満足させる。この
傾斜面にはシリコンゴムなどからなる材料をエンキャッ
プ処理して保護するのは勿論である。
傾斜面の角度及び方向は、素子特性即ち求める耐圧と各
領域の不純物濃度により決定されるのでいちがいには決
められない。これに対してブレイナー型ダイオード20
は、第3図に示した構造通りであるので説明は省略する
本発明では、半導体素子であるブレイナー型ダイオード
20またはメサ型ダイオード21を、リードフレームに
形成するダイステージ22と、コネクタ23の一部を構
成するインナーリード24に一体に取付けたフォーミン
グリード25とに半田層即ち第1固着層26を介して設
置するが、いずれも後述するエンボス(Emboss)
部30a 、 30bを形成するのが特徴である。即ち
、第5図に明らかにしたように、銅または銅合金などに
例えばプレス(Press)工程を施してDIP (D
ual In Line Package)用リードフ
レーム28を利用する。リードフレーム28の材質及び
形状は、これに限定されるものでなく、DIPまたはS
IP(Single In Line Package
)との混合形式や、鉄または鉄・ニッケル合金製でも良
いことは勿論である。このようなリードフレーム28に
おけるダイステージ22形成予定位置の外側を塑性加工
して金属材料が移動することによって環状の段差部27
とその内側に突出したエンボス部30a 、 30bが
形成される(第5図参照、以後突出したダイステージ部
分をダイステージと記載する)。
ところで、電源整流樹脂封止型半導体装置に必要なブリ
ッジ回路用としてブレイナー型ダイオド20をリードフ
レーム28とコネクター25により組立てるが、最小4
個のブレイナー型ダイオード20でブリッジ回路を形成
する。このために第4図にあるように単一のブレイナー
型ダイオード20を夫々半田層即ち第2の固着層26に
より固着したコネクター25を用意し、これをインナー
リード23.23によって一体とする。
このような組立工程を終えてからトランスファモールド
法により樹脂封止層29を被覆して、電源整流樹脂封止
型半導体装置を完成する。第6図には、メサ型ダイオー
ド21を4個利用して形成した電源整流樹脂封止型半導
体装置の断面図を示したが、第4図とダイオードの種類
を除いては全く同様なので説明は省略する。なお、完成
した状態は、第1図と同様である。
〔発明の効果〕
以上詳述したように、本発明ではダイステージにダイオ
ードを半田により固着する際、半田の拡がりをエンボス
部の範囲内に抑えられるので、半導体素子であるダイオ
ードのP側電極と一体となる半田層が流れてN中領域に
達する事故が防止できる。このために、半田層の量を多
くして、半導体素子即ち電源整流樹脂封止型半導体装置
に要求される熱疲労特性を改善することができる。
しかも、半導体基板を利用する半導体素子の両面に形式
した電極に固着する半田層間に形成される変成層範囲を
ほぼ一定に抑制できるので、その差により発生する応力
に起因するクラック(Crack)も防止できる。この
ような利点は、ブレイナー型とメサ型の違いによらず達
成されることを付記しておく。
【図面の簡単な説明】
第1図は、従来の車輌用電源整流樹脂封止型半導体装置
の斜視図、第2図は、第1図をA−A線で切断した断面
図、第3図は、ブレイナー型ダイオードの断面図、第4
図乃至第6図は、本発明0 に係わる車輌用電源整流樹脂封止型半導体装置の要部を
示す断面図である。 1〜3・・・不純物領域、 4.5・・・電極、 6・・・熱酸化膜、 7.8・・・接合端部、 9.14.23.28・・・インナーリード、10、2
5・・・コネクタ 12.26・・・第1、第2半田層、 13.20.21・・・半導体素子、 15.22・・・ダイステージ、 27・・・段差部、 30a 、 30b・・・エンボス。

Claims (1)

    【特許請求の範囲】
  1. 半導体基板内にPN接合を形成する複数の半導体素子と
    、このPN接合を構成する相反する導電形の不純物領域
    に夫々形成する電極と、この電極に対応するダイステー
    ジの両面に形成するエンボス部と、この両エンボス部と
    各電極間に形成する第1固着層と、エンボス部と固着し
    ていない各電極とコネクター間に形成する第2固着層と
    、このコネクターに接続するリードと、これらを被覆す
    る封止樹脂層を具備することを特徴とする樹脂封止型半
    導体装置。
JP1223865A 1989-08-30 1989-08-30 樹脂封止型半導体装置 Expired - Lifetime JPH0671062B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1223865A JPH0671062B2 (ja) 1989-08-30 1989-08-30 樹脂封止型半導体装置
US07/571,972 US5218231A (en) 1989-08-30 1990-08-24 Mold-type semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1223865A JPH0671062B2 (ja) 1989-08-30 1989-08-30 樹脂封止型半導体装置

Publications (2)

Publication Number Publication Date
JPH0385755A true JPH0385755A (ja) 1991-04-10
JPH0671062B2 JPH0671062B2 (ja) 1994-09-07

Family

ID=16804920

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (2)

Country Link
US (1) US5218231A (ja)
JP (1) JPH0671062B2 (ja)

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