JPH0313304B2 - - Google Patents
Info
- Publication number
- JPH0313304B2 JPH0313304B2 JP55099956A JP9995680A JPH0313304B2 JP H0313304 B2 JPH0313304 B2 JP H0313304B2 JP 55099956 A JP55099956 A JP 55099956A JP 9995680 A JP9995680 A JP 9995680A JP H0313304 B2 JPH0313304 B2 JP H0313304B2
- Authority
- JP
- Japan
- Prior art keywords
- thin plate
- pattern
- mask
- thin
- reinforcing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 claims description 18
- 239000012779 reinforcing material Substances 0.000 claims description 17
- 230000003014 reinforcing effect Effects 0.000 claims description 16
- 238000005530 etching Methods 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 7
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 238000007740 vapor deposition Methods 0.000 claims description 6
- 238000007747 plating Methods 0.000 claims description 4
- 239000007791 liquid phase Substances 0.000 claims description 3
- 239000011120 plywood Substances 0.000 claims description 3
- 238000001947 vapour-phase growth Methods 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 238000000034 method Methods 0.000 description 13
- 239000002184 metal Substances 0.000 description 10
- 239000000758 substrate Substances 0.000 description 8
- 239000010410 layer Substances 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 239000010408 film Substances 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9995680A JPS5726163A (en) | 1980-07-23 | 1980-07-23 | Mask for forming thin film and its manufacture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9995680A JPS5726163A (en) | 1980-07-23 | 1980-07-23 | Mask for forming thin film and its manufacture |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5726163A JPS5726163A (en) | 1982-02-12 |
JPH0313304B2 true JPH0313304B2 (US20030199744A1-20031023-C00003.png) | 1991-02-22 |
Family
ID=14261136
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9995680A Granted JPS5726163A (en) | 1980-07-23 | 1980-07-23 | Mask for forming thin film and its manufacture |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5726163A (US20030199744A1-20031023-C00003.png) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58170074A (ja) * | 1982-03-31 | 1983-10-06 | Hoxan Corp | 太陽電池のダイレクトマスキング方式による表面電極蒸着形成方法とその蒸着形成用具 |
JP4364957B2 (ja) * | 1998-10-22 | 2009-11-18 | 北陸電気工業株式会社 | 蒸着マスク |
KR100469252B1 (ko) * | 2002-04-12 | 2005-02-02 | 엘지전자 주식회사 | 쉐도우 마스크 및 그를 이용한 풀칼라 유기 el 표시소자 |
KR100813832B1 (ko) * | 2002-05-31 | 2008-03-17 | 삼성에스디아이 주식회사 | 증착용 마스크 프레임 조립체와 이의 제조방법 |
JP4126648B2 (ja) * | 2002-07-01 | 2008-07-30 | 日立金属株式会社 | メタルマスク用部材の製造方法 |
JP4170179B2 (ja) * | 2003-01-09 | 2008-10-22 | 株式会社 日立ディスプレイズ | 有機elパネルの製造方法および有機elパネル |
JP4547130B2 (ja) * | 2003-01-30 | 2010-09-22 | 株式会社アルバック | 蒸着マスクの製造方法 |
JP2008041327A (ja) * | 2006-08-02 | 2008-02-21 | Showa Denko Kk | マスクおよびマスクを使用した表示素子ならびにマスクを使用した表示素子の製造方法 |
JP5379717B2 (ja) * | 2010-02-24 | 2013-12-25 | 株式会社アルバック | 蒸着用マスク |
KR101442941B1 (ko) * | 2010-03-09 | 2014-09-22 | 샤프 가부시키가이샤 | 증착 마스크, 증착장치 및 증착방법 |
JP6051876B2 (ja) * | 2013-01-11 | 2016-12-27 | 大日本印刷株式会社 | メタルマスクおよびメタルマスクの製造方法 |
JP6468480B2 (ja) * | 2014-01-31 | 2019-02-13 | 大日本印刷株式会社 | 蒸着マスクの製造方法および蒸着マスク |
JP6515520B2 (ja) * | 2014-12-15 | 2019-05-22 | 大日本印刷株式会社 | 蒸着マスクの製造方法、蒸着マスクを作製するために用いられる金属板および蒸着マスク |
KR101674506B1 (ko) * | 2015-08-10 | 2016-11-10 | 에이피시스템 주식회사 | 복합 가공 방법을 이용한 섀도우 마스크의 제조방법 및 이에 의해 제조된 섀도우 마스크 |
US10727409B2 (en) * | 2016-09-13 | 2020-07-28 | Lg Innotek Co., Ltd. | Metal plate for deposition mask, and deposition mask and manufacturing method therefor |
US11773477B2 (en) | 2018-12-25 | 2023-10-03 | Dai Nippon Printing Co., Ltd. | Deposition mask |
JP7406717B2 (ja) * | 2018-12-25 | 2023-12-28 | 大日本印刷株式会社 | 蒸着マスク |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4313689Y1 (US20030199744A1-20031023-C00003.png) * | 1965-10-28 | 1968-06-11 | ||
JPS4727897U (US20030199744A1-20031023-C00003.png) * | 1971-04-15 | 1972-11-29 |
-
1980
- 1980-07-23 JP JP9995680A patent/JPS5726163A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4313689Y1 (US20030199744A1-20031023-C00003.png) * | 1965-10-28 | 1968-06-11 | ||
JPS4727897U (US20030199744A1-20031023-C00003.png) * | 1971-04-15 | 1972-11-29 |
Also Published As
Publication number | Publication date |
---|---|
JPS5726163A (en) | 1982-02-12 |
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