JPS5726163A - Mask for forming thin film and its manufacture - Google Patents

Mask for forming thin film and its manufacture

Info

Publication number
JPS5726163A
JPS5726163A JP9995680A JP9995680A JPS5726163A JP S5726163 A JPS5726163 A JP S5726163A JP 9995680 A JP9995680 A JP 9995680A JP 9995680 A JP9995680 A JP 9995680A JP S5726163 A JPS5726163 A JP S5726163A
Authority
JP
Japan
Prior art keywords
sheet
hole
mask
manufacture
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9995680A
Other languages
English (en)
Other versions
JPH0313304B2 (ja
Inventor
Minoru Tanaka
Hitoshi Kubota
Susumu Aiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9995680A priority Critical patent/JPS5726163A/ja
Publication of JPS5726163A publication Critical patent/JPS5726163A/ja
Publication of JPH0313304B2 publication Critical patent/JPH0313304B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP9995680A 1980-07-23 1980-07-23 Mask for forming thin film and its manufacture Granted JPS5726163A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9995680A JPS5726163A (en) 1980-07-23 1980-07-23 Mask for forming thin film and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9995680A JPS5726163A (en) 1980-07-23 1980-07-23 Mask for forming thin film and its manufacture

Publications (2)

Publication Number Publication Date
JPS5726163A true JPS5726163A (en) 1982-02-12
JPH0313304B2 JPH0313304B2 (ja) 1991-02-22

Family

ID=14261136

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9995680A Granted JPS5726163A (en) 1980-07-23 1980-07-23 Mask for forming thin film and its manufacture

Country Status (1)

Country Link
JP (1) JPS5726163A (ja)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58170074A (ja) * 1982-03-31 1983-10-06 Hoxan Corp 太陽電池のダイレクトマスキング方式による表面電極蒸着形成方法とその蒸着形成用具
JP2000129419A (ja) * 1998-10-22 2000-05-09 Hokuriku Electric Ind Co Ltd 蒸着マスク
JP2004006371A (ja) * 2002-05-31 2004-01-08 Samsung Nec Mobile Display Co Ltd 蒸着用マスク、蒸着用マスクフレーム組立体及びこれらの製造方法
JP2004039319A (ja) * 2002-07-01 2004-02-05 Hitachi Metals Ltd メタルマスク
JP2004235138A (ja) * 2003-01-09 2004-08-19 Hitachi Ltd 有機ｅｌパネルの製造方法および有機ｅｌパネル
JP2004232025A (ja) * 2003-01-30 2004-08-19 Ulvac Japan Ltd 蒸着用マスクおよびその製造方法
KR100469252B1 (ko) * 2002-04-12 2005-02-02 엘지전자 주식회사 쉐도우 마스크 및 그를 이용한 풀칼라 유기 ｅｌ 표시소자
JP2008041327A (ja) * 2006-08-02 2008-02-21 Showa Denko Kk マスクおよびマスクを使用した表示素子ならびにマスクを使用した表示素子の製造方法
JP2010216012A (ja) * 2010-02-24 2010-09-30 Ulvac Japan Ltd 蒸着用マスク
WO2011111134A1 (ja) * 2010-03-09 2011-09-15 シャープ株式会社 蒸着マスク、蒸着装置及び蒸着方法
JP2014133930A (ja) * 2013-01-11 2014-07-24 Dainippon Printing Co Ltd メタルマスクおよびメタルマスクの製造方法
JP2015163734A (ja) * 2014-01-31 2015-09-10 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク
JP2016113668A (ja) * 2014-12-15 2016-06-23 大日本印刷株式会社 蒸着マスクの製造方法、蒸着マスクを作製するために用いられる金属板および蒸着マスク
JP2018526537A (ja) * 2015-08-10 2018-09-13 エイピー系▲統▼股▲フン▼有限公司Ａｐ Ｓｙｓｔｅｍｓ Ｉｎｃ． 複合加工方法を用いたシャドウマスクの製造方法及びこれにより製造されたシャドウマスク
JP2019529707A (ja) * 2016-09-13 2019-10-17 エルジー イノテック カンパニー リミテッド 蒸着マスク用金属板、蒸着マスク及びその製造方法
JP2020105631A (ja) * 2018-12-25 2020-07-09 大日本印刷株式会社 蒸着マスク
US11773477B2 (en) 2018-12-25 2023-10-03 Dai Nippon Printing Co., Ltd. Deposition mask

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4313689Y1 (ja) * 1965-10-28 1968-06-11
JPS4727897U (ja) * 1971-04-15 1972-11-29

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4313689Y1 (ja) * 1965-10-28 1968-06-11
JPS4727897U (ja) * 1971-04-15 1972-11-29

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58170074A (ja) * 1982-03-31 1983-10-06 Hoxan Corp 太陽電池のダイレクトマスキング方式による表面電極蒸着形成方法とその蒸着形成用具
JP2000129419A (ja) * 1998-10-22 2000-05-09 Hokuriku Electric Ind Co Ltd 蒸着マスク
KR100469252B1 (ko) * 2002-04-12 2005-02-02 엘지전자 주식회사 쉐도우 마스크 및 그를 이용한 풀칼라 유기 ｅｌ 표시소자
JP2004006371A (ja) * 2002-05-31 2004-01-08 Samsung Nec Mobile Display Co Ltd 蒸着用マスク、蒸着用マスクフレーム組立体及びこれらの製造方法
JP2004039319A (ja) * 2002-07-01 2004-02-05 Hitachi Metals Ltd メタルマスク
JP2004235138A (ja) * 2003-01-09 2004-08-19 Hitachi Ltd 有機ｅｌパネルの製造方法および有機ｅｌパネル
JP2004232025A (ja) * 2003-01-30 2004-08-19 Ulvac Japan Ltd 蒸着用マスクおよびその製造方法
JP4547130B2 (ja) * 2003-01-30 2010-09-22 株式会社アルバック 蒸着マスクの製造方法
JP2008041327A (ja) * 2006-08-02 2008-02-21 Showa Denko Kk マスクおよびマスクを使用した表示素子ならびにマスクを使用した表示素子の製造方法
JP2010216012A (ja) * 2010-02-24 2010-09-30 Ulvac Japan Ltd 蒸着用マスク
WO2011111134A1 (ja) * 2010-03-09 2011-09-15 シャープ株式会社 蒸着マスク、蒸着装置及び蒸着方法
KR101442941B1 (ko) * 2010-03-09 2014-09-22 샤프 가부시키가이샤 증착 마스크, 증착장치 및 증착방법
US9246101B2 (en) 2010-03-09 2016-01-26 Sharp Kabushiki Kaisha Deposition mask, deposition apparatus, and deposition method
JP2014133930A (ja) * 2013-01-11 2014-07-24 Dainippon Printing Co Ltd メタルマスクおよびメタルマスクの製造方法
JP2015163734A (ja) * 2014-01-31 2015-09-10 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク
JP2019056182A (ja) * 2014-01-31 2019-04-11 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク
JP2016113668A (ja) * 2014-12-15 2016-06-23 大日本印刷株式会社 蒸着マスクの製造方法、蒸着マスクを作製するために用いられる金属板および蒸着マスク
JP2018526537A (ja) * 2015-08-10 2018-09-13 エイピー系▲統▼股▲フン▼有限公司Ａｐ Ｓｙｓｔｅｍｓ Ｉｎｃ． 複合加工方法を用いたシャドウマスクの製造方法及びこれにより製造されたシャドウマスク
TWI696880B (zh) * 2015-08-10 2020-06-21 南韓商Ａｐ系統股份有限公司 以混合製程製造陰影遮罩的方法及以該方法製造的陰影遮罩
JP2019529707A (ja) * 2016-09-13 2019-10-17 エルジー イノテック カンパニー リミテッド 蒸着マスク用金属板、蒸着マスク及びその製造方法
JP2020105631A (ja) * 2018-12-25 2020-07-09 大日本印刷株式会社 蒸着マスク
US11773477B2 (en) 2018-12-25 2023-10-03 Dai Nippon Printing Co., Ltd. Deposition mask

Also Published As

Publication number Publication date
JPH0313304B2 (ja) 1991-02-22

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