JPS56133736A - Photomask - Google Patents

Photomask

Info

Publication number
JPS56133736A
JPS56133736A JP3806880A JP3806880A JPS56133736A JP S56133736 A JPS56133736 A JP S56133736A JP 3806880 A JP3806880 A JP 3806880A JP 3806880 A JP3806880 A JP 3806880A JP S56133736 A JPS56133736 A JP S56133736A
Authority
JP
Japan
Prior art keywords
metallic
oxide
photomask
film
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3806880A
Other languages
Japanese (ja)
Inventor
Shinya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3806880A priority Critical patent/JPS56133736A/en
Publication of JPS56133736A publication Critical patent/JPS56133736A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To obtain a photomask fit for the manufacture of an integrated circuit, etc. by alternately laminating many layes of metallic Cr and Cr oxide or forming a layer of a mixture of them and smoothening the edge part of a mask pattern to prevent the formation of a protrusion. CONSTITUTION:Metallic Cr film 12' of <=100Angstrom thickness, Cr oxide film 13' of <=100Angstrom thickness and similar films 12, 13 of <=100Angstrom are laminated in order on transparent plate 1 of glass or the like so as to adjust the total thickness of the metallic Cr films to 600Angstrom and that of the Cr oxide films to 300Angstrom . A resist film is coated, exposed and developed to form resist mask 14. Etching is then carried out with a mixed soln. of perchloric acid and ammonium cerium nitrate to manufacture a photomask having a smooth edge part free from a visor-shaped protrusion and giving a pattern with accuracy. Film 15 of a mixture of metallic Cr and Cr oxide may be formed by simultaneously vapor depositing them to similarly obtain a photomask of high accuracy.
JP3806880A 1980-03-25 1980-03-25 Photomask Pending JPS56133736A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3806880A JPS56133736A (en) 1980-03-25 1980-03-25 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3806880A JPS56133736A (en) 1980-03-25 1980-03-25 Photomask

Publications (1)

Publication Number Publication Date
JPS56133736A true JPS56133736A (en) 1981-10-20

Family

ID=12515167

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3806880A Pending JPS56133736A (en) 1980-03-25 1980-03-25 Photomask

Country Status (1)

Country Link
JP (1) JPS56133736A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020086087A (en) * 2018-11-22 2020-06-04 アルバック成膜株式会社 Mask blank and mask

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5323277A (en) * 1976-08-14 1978-03-03 Konishiroku Photo Ind Co Ltd Photomasking material and photomask
JPS5451831A (en) * 1977-09-30 1979-04-24 Konishiroku Photo Ind Co Ltd Photomask material

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5323277A (en) * 1976-08-14 1978-03-03 Konishiroku Photo Ind Co Ltd Photomasking material and photomask
JPS5451831A (en) * 1977-09-30 1979-04-24 Konishiroku Photo Ind Co Ltd Photomask material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020086087A (en) * 2018-11-22 2020-06-04 アルバック成膜株式会社 Mask blank and mask

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