JPH0234462B2 - - Google Patents

Info

Publication number
JPH0234462B2
JPH0234462B2 JP57165432A JP16543282A JPH0234462B2 JP H0234462 B2 JPH0234462 B2 JP H0234462B2 JP 57165432 A JP57165432 A JP 57165432A JP 16543282 A JP16543282 A JP 16543282A JP H0234462 B2 JPH0234462 B2 JP H0234462B2
Authority
JP
Japan
Prior art keywords
conductive pattern
capacitor
lead frame
package
chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57165432A
Other languages
English (en)
Other versions
JPS5954249A (ja
Inventor
Tetsushi Wakabayashi
Kyoshi Muratake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57165432A priority Critical patent/JPS5954249A/ja
Priority to US06/530,046 priority patent/US4598307A/en
Priority to EP83305397A priority patent/EP0104051B1/en
Priority to DE8383305397T priority patent/DE3377314D1/de
Publication of JPS5954249A publication Critical patent/JPS5954249A/ja
Publication of JPH0234462B2 publication Critical patent/JPH0234462B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49589Capacitor integral with or on the leadframe
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45117Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
    • H01L2224/45124Aluminium (Al) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49171Fan-out arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013Alloys
    • H01L2924/0132Binary Alloys
    • H01L2924/01322Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701Low temperature co-fired ceramic [LTCC]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19041Component type being a capacitor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30107Inductance

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Lead Frames For Integrated Circuits (AREA)
  • Load-Bearing And Curtain Walls (AREA)

Description

【発明の詳細な説明】 発明の技術分野 本発明は、サーデツプ型セラミツクパツケージ
を用いた半導体装置に関し、集積回路に電源、グ
ランド間のバイパスコンデンサを内蔵しようとす
るものである。
技術の背景 半導体集積回路(IC)の高速比、高集積化に
伴ない、電源、グランド間に接続される雑音防
止、誤動作、抑止用バイパスコンデンサの重要性
が益々高まつている。従来のバイパスコンデンサ
はICパツケージを実装するプリント基板上の電
源ラインとグランドライン間に接続されるのが一
般的である。これは外界のノイズが電源ラインに
のつてIC内に入りICが誤動作することを防止す
ることを主眼においているためである。ところ
が、ICが高速且つ高集積化されるにつれてICの
マージンが減り、またICと該コンデンサとの間
の電源ラインに分布するインダクタンス無視でき
なくなり、これによりIC自体の電流パルスが該
コンデンサで充分に吸収されることなく電圧ノイ
ズとなつてIC自身が誤動作する現象が確認され
ている。
発明の目的 本発明は、上記のバイパスコンデンサをICパ
ツケージ上に搭載して内外のノイズを効果的に吸
収しようとするものである。
発明の構成 本発明は、電源供給用の第1の導体パターン
と、グランド電位を有する第2の導電パターンと
の間に信号用導電パターンが配置されてなり、半
導体集積回路チツプが搭載されるベース部が該第
2の導体パターンに接続されるリードフレームを
有するサーデツプ型セラミツクパツケージにおい
て、該第1の導電パターンに隣接して該セラミツ
クパツケージの外部に導出されないフローテイン
グ状態の第3の導電パターンを有し、 該第3の導電パターンはリードフレームの該ベ
ース部に接続され、該セラミツクパツケージの一
部に切欠部を形成して該リードフレームの第1の
導電パターンと第3の導電パターンとを露出し、
該切欠部にバイパス用のチツプコンデンサを載置
し、該第1の導電パターンと第3の導電パターン
との間を当該チツプコンデンサによつて接続する
こと特徴とするが、以下図示の実施例を参照しな
がらこれを詳細に説明する。
発明の実施例 第1図は本発明の一実施例を示す斜視図で、1
はC/D(サーデツプ)型のセラミツクパツケー
ジ、2はそのシールガラス層、3はリード(端子
ピン)、4a,4bは導体パターン、5はバイパ
スコンデンサとして用いられる多層セラミツク型
のチツプコンデンサ(容量はICチツプによつて
異なるが概ね0.01〜5μF)である。C/D型のセ
ラミツクパツケージ1は2枚のセラミツク板1
a,1bの間に、メタルリードフレーム3(詳細
は第2図に示す)を挾持しガラス層2で融着した
構造で、4a,4bは長手方向端部がコ字状に切
欠された上層のセラミツク板1aの該切欠部Cに
露出する内部の導体パターン(リードフレームの
一部)である。本例ではこの切欠部にコンデンサ
5を搭載し、且つその両電極5a,5bを半田等
で導体パターン4a,4bに接着する。
C/D型のセラミツクパツケージ1ではコンデ
ンサ5を電源、グランド間に接続する配線はリー
ドフレームしかない。即ち端子ピン3の電源用ピ
ンとグランド用ピンは通常矩形状パツケージ1の
対角線上にあり、パツケージの上面又は下面にコ
ンデンサを取付けたのでは該端子ピンまでの長い
配線が必要である。また多層セラミツクパツケー
ジのようにパツケージの各層に配線が許容できる
訳ではなく、有り得る配線はリードフレーム1枚
であるから、これを利用するしかない。このリー
ドフレームは、予めエツチングまたはパンチング
でパターニングされた導体パターンを下層のセラ
ミツク板1b上にプリントされた下側ガラス層表
面に貼り付け、そのガラス層を450℃程度で溶融
することで該下側ガラス層に固着し、その後IC
チツプ6(第2図)を搭載し、所要とするワイヤ
ボンドをした後表面を同種の上側ガラス層をプリ
ントしたキヤツプ(上層のセラミツク板)1aで
封止する(電気炉で該ガラス層を溶融する)こと
で、第1図のガラス層2を中央部に挾持したパツ
ケージに一体化されたものである。このとき、予
めキヤツプ1aの端部(この部分はピン数が増す
につれより多く余る部分である)を図示の如く切
欠しておけばその部分に導体パターン4a,4b
が露出する。
第2図はこの導体パターン4a,4bの説明図
である。通常16ピンのパツケージでは対角線上
に位置する第8ピンが電源端子で、第16ピンがグ
ランド端子であるが、1ピンと9ピンが使用され
る場合もある。導体パターン4aがこ第8ピンに
つらなるものとすれば、第16ピンにつらなる導体
パターン4cの位置は離れている。4bは本発明
により17本目のパターン(ポスト)として導体パ
ターン4aの隣りに形成したフローテイング状態
の導体パターンである。このパターンは導体パタ
ーン4a等と共に形成されるが、後に切断線7で
カツトされてフローテイング状態となり、且つ
ICチツプ6を搭載するベース8がグランドレベ
ルであることから、そこへワイヤボンデイングす
ることでグランド電位とされる。但し、チツプの
背面がグランド電位でない場合はチツプをガラス
等の絶縁材で固定し、18ピンをベースにワイヤボ
ンドし、かつフローテイングパツドもベースにワ
イヤボンデイングする。なおこのリードフレーム
は1枚の導体板をエツチング又はパンチングして
作つた一体物であり、切断線7での切断により周
縁フレーム部(これは各部の支持用であつた)が
除かれ、個々のリードが分離される。
パターン4a,4bの一部はコンデンサ5の搭
載を容易にするため幅広にしておく。尚、キヤツ
プ1の封止時の熱でパターン4a,4bの表面は
酸化するのでその酸化膜をエツチングで除去し、
そこへ半田メツキを施こしておく。このようにす
るとコンデンサ5搭載の半田付け処理が容易にな
る。上層セラミツク板1aに設ける切欠部Cは第
3図に示すように周囲が閉じられた開口であつて
もよい。チツプコンデンサ5の厚みは上層セラミ
ツク板のそれと同程度なので、開口の大きさもチ
ツプコンデンサのそれと同程度とすると、チツプ
コンデンサは開口Cを埋め、パツケージ外観がよ
くなる。唯、コンデンサを半田付けした後フラツ
クスを洗浄、除去するが、この作業は第1図の1
辺開放型の第1図の切欠部Cの方がやり易い。
発明の効果 以上述べたように本発明によれば、サーデツク
型にICパツケージ上に電源、グランド間のバイ
パスコンデンサを実装してしまうので、該コンデ
ンサとIC間の距離が縮まり、内外のノイズによ
る誤動作の防止効果が一層確実になる。またバイ
パスコンデンサを搭載する部分はパツケージで通
常余つている領域であるから、該コンデンサをパ
ツケージ外部に外付けする場合より実装密度が高
まる。
【図面の簡単な説明】
第1図および第2図は本発明の一実施例を示す
斜視図および平面パターン図、第3図は変形例を
示す部分斜視図である。 図中、1はサーデツク型セラミツクパツケー
ジ、1aはそのキヤツプ、4aは電源用導体パタ
ーン、4bはフローテイング状態の導体パター
ン、5はバイパスコンデンサ、6はICチツプ、
8はベース部分である。

Claims (1)

  1. 【特許請求の範囲】 1 電源供給用の第1の導体パターンと、グラン
    ド電位を有する第2の導電パターンとの間に信号
    用導電パターンが配置されてなり、半導体集積回
    路チツプが搭載されるベース部が該第2の導体パ
    ターンに接続されるリードフレームを有するサー
    デツプ型セラミツクパツケージにおいて、 該第1の導電パターンに隣接して該セラミツク
    パツケージの外部に導出されないフローテイング
    状態の第3の導電パターンを有し、 該第3の導電パターンはリードフレームの該ベ
    ース部に接続され、 該セラミツクパツケージの一部に切欠部を形成
    して該リードフレームの第1の導電パターンと第
    3の導電パターンとを露出し、 該切欠部にバイパス用のチツプコンデンサを載
    置し、該第1の導電パターンと第3の導電パター
    ンとの間を当該チツプコンデンサによつて接続す
    ることを特徴とする半導体装置。
JP57165432A 1982-09-22 1982-09-22 半導体装置 Granted JPS5954249A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP57165432A JPS5954249A (ja) 1982-09-22 1982-09-22 半導体装置
US06/530,046 US4598307A (en) 1982-09-22 1983-09-07 Integrated circuit device having package with bypass capacitor
EP83305397A EP0104051B1 (en) 1982-09-22 1983-09-15 Noise protection for a packaged semiconductor device
DE8383305397T DE3377314D1 (en) 1982-09-22 1983-09-15 Noise protection for a packaged semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57165432A JPS5954249A (ja) 1982-09-22 1982-09-22 半導体装置

Publications (2)

Publication Number Publication Date
JPS5954249A JPS5954249A (ja) 1984-03-29
JPH0234462B2 true JPH0234462B2 (ja) 1990-08-03

Family

ID=15812311

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57165432A Granted JPS5954249A (ja) 1982-09-22 1982-09-22 半導体装置

Country Status (4)

Country Link
US (1) US4598307A (ja)
EP (1) EP0104051B1 (ja)
JP (1) JPS5954249A (ja)
DE (1) DE3377314D1 (ja)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4660069A (en) * 1983-12-08 1987-04-21 Motorola, Inc. Device with captivate chip capacitor devices and method of making the same
JPS613440A (ja) * 1984-06-18 1986-01-09 Nec Corp プラグインパツケ−ジ
JPS61136555U (ja) * 1985-02-14 1986-08-25
JPS61269345A (ja) * 1985-05-24 1986-11-28 Hitachi Ltd 半導体装置
US4714981A (en) * 1986-04-09 1987-12-22 Rca Corporation Cover for a semiconductor package
JPS62193729U (ja) * 1986-05-30 1987-12-09
FR2616963B1 (fr) * 1987-06-19 1991-02-08 Thomson Composants Militaires Boitier ceramique multicouches
JPH01112681A (ja) * 1987-07-31 1989-05-01 Toshiba Corp ハイブリッド化プリント基板
SE458004C (sv) * 1987-10-09 1991-10-07 Carmis Enterprises Sa Anordning foer elektrisk avkoppling av integrerade kretsar
US4903113A (en) * 1988-01-15 1990-02-20 International Business Machines Corporation Enhanced tab package
JP2708191B2 (ja) * 1988-09-20 1998-02-04 株式会社日立製作所 半導体装置
US4967258A (en) * 1989-03-02 1990-10-30 Ball Corporation Structure for use in self-biasing and source bypassing a packaged, field-effect transistor and method for making same
US5043533A (en) * 1989-05-08 1991-08-27 Honeywell Inc. Chip package capacitor cover
US5140109A (en) * 1989-08-25 1992-08-18 Kyocera Corporation Container package for semiconductor element
US5010445A (en) * 1990-01-25 1991-04-23 Weinold Christoffer S DIP switch with built-in active interfacing circuitry
US5115298A (en) * 1990-01-26 1992-05-19 Texas Instruments Incorporated Packaged integrated circuit with encapsulated electronic devices
US5049979A (en) * 1990-06-18 1991-09-17 Microelectronics And Computer Technology Corporation Combined flat capacitor and tab integrated circuit chip and method
US5270488A (en) * 1990-07-27 1993-12-14 Mitsubishi Denki Kabushiki Kaisha Shield construction for electrical devices
US5177595A (en) * 1990-10-29 1993-01-05 Hewlett-Packard Company Microchip with electrical element in sealed cavity
JPH0621321A (ja) * 1992-01-29 1994-01-28 Texas Instr Inc <Ti> 電気部品実装用支持体付きの集積回路装置
US5854094A (en) * 1992-07-28 1998-12-29 Shinko Electric Industries Co., Ltd. Process for manufacturing metal plane support for multi-layer lead frames
US5404265A (en) * 1992-08-28 1995-04-04 Fujitsu Limited Interconnect capacitors
US5498906A (en) * 1993-11-17 1996-03-12 Staktek Corporation Capacitive coupling configuration for an intergrated circuit package
EP0654866A3 (en) * 1993-11-23 1997-08-20 Motorola Inc Carrier for connecting a semiconductor cube and manufacturing method.
US5821457A (en) * 1994-03-11 1998-10-13 The Panda Project Semiconductor die carrier having a dielectric epoxy between adjacent leads
US6339191B1 (en) 1994-03-11 2002-01-15 Silicon Bandwidth Inc. Prefabricated semiconductor chip carrier
US5824950A (en) * 1994-03-11 1998-10-20 The Panda Project Low profile semiconductor die carrier
US5629240A (en) * 1994-12-09 1997-05-13 Sun Microsystems, Inc. Method for direct attachment of an on-chip bypass capacitor in an integrated circuit
AU6156996A (en) * 1995-06-07 1996-12-30 Panda Project, The High performance semiconductor die carrier
WO1997029512A1 (de) * 1996-02-09 1997-08-14 Mci Computer Gmbh Halbleiterelement mit einem kondensator
US6147857A (en) * 1997-10-07 2000-11-14 E. R. W. Optional on chip power supply bypass capacitor
US6869870B2 (en) * 1998-12-21 2005-03-22 Megic Corporation High performance system-on-chip discrete components using post passivation process
US7247932B1 (en) * 2000-05-19 2007-07-24 Megica Corporation Chip package with capacitor
US7061102B2 (en) * 2001-06-11 2006-06-13 Xilinx, Inc. High performance flipchip package that incorporates heat removal with minimal thermal mismatch
TW488054B (en) * 2001-06-22 2002-05-21 Advanced Semiconductor Eng Semiconductor package for integrating surface mount devices
JP3890947B2 (ja) * 2001-10-17 2007-03-07 松下電器産業株式会社 高周波半導体装置
TW525291B (en) * 2001-12-19 2003-03-21 Silicon Integrated Sys Corp Package with embedded capacitors in chip
US6744131B1 (en) 2003-04-22 2004-06-01 Xilinx, Inc. Flip chip integrated circuit packages accommodating exposed chip capacitors while providing structural rigidity
CN1901162B (zh) 2005-07-22 2011-04-20 米辑电子股份有限公司 连续电镀制作线路组件的方法及线路组件结构
DE102006012600A1 (de) * 2006-03-18 2007-09-20 Atmel Germany Gmbh Elektronisches Bauelement, elektronische Baugruppe sowie Verfahren zur Herstellung einer elektronischen Baugruppe
US20130285197A1 (en) * 2012-04-27 2013-10-31 Infineon Technologies Ag Semiconductor Devices and Methods of Manufacturing and Using Thereof
JP6434274B2 (ja) * 2014-10-27 2018-12-05 ローム株式会社 半導体装置
US11393775B2 (en) * 2020-12-04 2022-07-19 Advanced Semiconductor Engineering, Inc. Semiconductor device package

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1258870A (ja) * 1969-09-29 1971-12-30
US4137546A (en) * 1977-10-14 1979-01-30 Plessey Incorporated Stamped lead frame for semiconductor packages
JPS54126057U (ja) * 1978-02-23 1979-09-03
US4283839A (en) * 1978-07-26 1981-08-18 Western Electric Co., Inc. Method of bonding semiconductor devices to carrier tapes
US4249196A (en) * 1978-08-21 1981-02-03 Burroughs Corporation Integrated circuit module with integral capacitor
US4303934A (en) * 1979-08-30 1981-12-01 Burr-Brown Research Corp. Molded lead frame dual in line package including a hybrid circuit
US4413404A (en) * 1980-04-14 1983-11-08 National Semiconductor Corporation Process for manufacturing a tear strip planarization ring for gang bonded semiconductor device interconnect tape
JPS626698Y2 (ja) * 1980-04-30 1987-02-16
US4454529A (en) * 1981-01-12 1984-06-12 Avx Corporation Integrated circuit device having internal dampening for a plurality of power supplies
GB2091035B (en) * 1981-01-12 1985-01-09 Avx Corp Integrated circuit device and sub-assembly
US4527185A (en) * 1981-01-12 1985-07-02 Avx Corporation Integrated circuit device and subassembly
JPS57118661A (en) * 1981-01-14 1982-07-23 Fujitsu Ltd Integrated circuit for noise prevention
JPS58446U (ja) * 1981-06-25 1983-01-05 富士通株式会社 混成集積回路装置
US4451845A (en) * 1981-12-22 1984-05-29 Avx Corporation Lead frame device including ceramic encapsulated capacitor and IC chip
US4453176A (en) * 1981-12-31 1984-06-05 International Business Machines Corporation LSI Chip carrier with buried repairable capacitor with low inductance leads

Also Published As

Publication number Publication date
EP0104051A3 (en) 1985-09-18
EP0104051B1 (en) 1988-07-06
JPS5954249A (ja) 1984-03-29
US4598307A (en) 1986-07-01
EP0104051A2 (en) 1984-03-28
DE3377314D1 (en) 1988-08-11

Similar Documents

Publication Publication Date Title
JPH0234462B2 (ja)
EP1143514A2 (en) Resin-sealed power semiconductor device including substrate with all electronic components for control circuit mounted thereon
JPS5994441A (ja) 半導体装置の製造方法
US6683781B2 (en) Packaging structure with low switching noises
JPS5832785B2 (ja) 電子部品容器
JPH07142283A (ja) コンデンサ及びこれを用いた実装構造
JPS6220707B2 (ja)
JPH05259372A (ja) ハイブリッドic
JPS58159361A (ja) 多層混成集積回路装置
JPH11163197A (ja) 半導体実装用基板
JP2841825B2 (ja) 混成集積回路
JP2974819B2 (ja) 半導体装置およびその製造方法
JPH0645763A (ja) 印刷配線板
JPH06291246A (ja) マルチチップ半導体装置
JPH0438522Y2 (ja)
JP2863358B2 (ja) セラミック多層基板
JPH04269841A (ja) 半導体装置
JPH04139737A (ja) 半導体チップの実装方法
JPH0685010A (ja) マルチチップモジュール
JP2784209B2 (ja) 半導体装置
JP2599290Y2 (ja) ハイブリッドic
JPS59193054A (ja) 半導体装置
JPS61284951A (ja) 半導体装置
JPH0358465A (ja) 樹脂封止型半導体装置
JPH11135951A (ja) 多層配線基板