JPH0227748A - 静電チャック装置及びその作成方法 - Google Patents

静電チャック装置及びその作成方法

Info

Publication number
JPH0227748A
JPH0227748A JP63176232A JP17623288A JPH0227748A JP H0227748 A JPH0227748 A JP H0227748A JP 63176232 A JP63176232 A JP 63176232A JP 17623288 A JP17623288 A JP 17623288A JP H0227748 A JPH0227748 A JP H0227748A
Authority
JP
Japan
Prior art keywords
electrostatic chuck
layer
adhesive layer
sheet
adhesive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63176232A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0587177B2 (enrdf_load_stackoverflow
Inventor
Tadao Matsunaga
松永　忠生
Atsushi Koshimura
淳 越村
Yukinori Sakumoto
作本　征則
Masaki Tsushima
津島　正企
Akihiro Shibuya
渋谷　章広
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tomoegawa Co Ltd
Original Assignee
Tomoegawa Paper Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tomoegawa Paper Co Ltd filed Critical Tomoegawa Paper Co Ltd
Priority to JP63176232A priority Critical patent/JPH0227748A/ja
Publication of JPH0227748A publication Critical patent/JPH0227748A/ja
Publication of JPH0587177B2 publication Critical patent/JPH0587177B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Jigs For Machine Tools (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP63176232A 1988-07-16 1988-07-16 静電チャック装置及びその作成方法 Granted JPH0227748A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63176232A JPH0227748A (ja) 1988-07-16 1988-07-16 静電チャック装置及びその作成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63176232A JPH0227748A (ja) 1988-07-16 1988-07-16 静電チャック装置及びその作成方法

Publications (2)

Publication Number Publication Date
JPH0227748A true JPH0227748A (ja) 1990-01-30
JPH0587177B2 JPH0587177B2 (enrdf_load_stackoverflow) 1993-12-15

Family

ID=16009945

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63176232A Granted JPH0227748A (ja) 1988-07-16 1988-07-16 静電チャック装置及びその作成方法

Country Status (1)

Country Link
JP (1) JPH0227748A (enrdf_load_stackoverflow)

Cited By (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0513558A (ja) * 1990-12-25 1993-01-22 Ngk Insulators Ltd ウエハー加熱装置及びその製造方法
JPH06225556A (ja) * 1992-12-03 1994-08-12 Abisare:Kk 静電吸着装置
US5528451A (en) * 1994-11-02 1996-06-18 Applied Materials, Inc Erosion resistant electrostatic chuck
US5539179A (en) * 1990-11-17 1996-07-23 Tokyo Electron Limited Electrostatic chuck having a multilayer structure for attracting an object
US5560780A (en) * 1993-04-22 1996-10-01 Applied Materials, Inc. Protective coating for dielectric material on wafer support used in integrated circuit processing apparatus and method of forming same
US5592358A (en) * 1994-07-18 1997-01-07 Applied Materials, Inc. Electrostatic chuck for magnetic flux processing
US5606485A (en) * 1994-07-18 1997-02-25 Applied Materials, Inc. Electrostatic chuck having improved erosion resistance
US5631803A (en) * 1995-01-06 1997-05-20 Applied Materials, Inc. Erosion resistant electrostatic chuck with improved cooling system
US5646814A (en) * 1994-07-15 1997-07-08 Applied Materials, Inc. Multi-electrode electrostatic chuck
US5729423A (en) * 1994-01-31 1998-03-17 Applied Materials, Inc. Puncture resistant electrostatic chuck
US5745331A (en) * 1994-01-31 1998-04-28 Applied Materials, Inc. Electrostatic chuck with conformal insulator film
US5792562A (en) * 1995-01-12 1998-08-11 Applied Materials, Inc. Electrostatic chuck with polymeric impregnation and method of making
US5801915A (en) * 1994-01-31 1998-09-01 Applied Materials, Inc. Electrostatic chuck having a unidirectionally conducting coupler layer
US5870271A (en) * 1997-02-19 1999-02-09 Applied Materials, Inc. Pressure actuated sealing diaphragm for chucks
US5880924A (en) * 1997-12-01 1999-03-09 Applied Materials, Inc. Electrostatic chuck capable of rapidly dechucking a substrate
US6008481A (en) * 1997-07-15 1999-12-28 Honda Giken Kogyo Kabushiki Kaisha Method and apparatus for deciding heated state of metal billet
US6023405A (en) * 1994-02-22 2000-02-08 Applied Materials, Inc. Electrostatic chuck with improved erosion resistance
US6263829B1 (en) 1999-01-22 2001-07-24 Applied Materials, Inc. Process chamber having improved gas distributor and method of manufacture
US6278600B1 (en) 1994-01-31 2001-08-21 Applied Materials, Inc. Electrostatic chuck with improved temperature control and puncture resistance
US6414834B1 (en) 1996-04-26 2002-07-02 Applied Materials, Inc. Dielectric covered electrostatic chuck
JP2003077994A (ja) * 2001-08-30 2003-03-14 Kyocera Corp 静電チャック及びその製造方法
US6581275B2 (en) 2001-01-22 2003-06-24 Applied Materials Inc. Fabricating an electrostatic chuck having plasma resistant gas conduits
US6598559B1 (en) 2000-03-24 2003-07-29 Applied Materials, Inc. Temperature controlled chamber
EP1180793A3 (en) * 2000-08-16 2004-06-16 Creative Technology Corporation Electrostatic chuck and manufacturing method thereof
JP2005064105A (ja) * 2003-08-08 2005-03-10 Tomoegawa Paper Co Ltd 静電チャック装置用電極シート、静電チャック装置および吸着方法
JP2008305912A (ja) * 2007-06-06 2008-12-18 Tomoegawa Paper Co Ltd 静電チャック装置
US7667943B2 (en) 2006-04-28 2010-02-23 Shin-Etsu Chemical Co., Ltd. Electrostatic chuck
JP2012527125A (ja) * 2009-05-15 2012-11-01 インテグリス・インコーポレーテッド ポリマー突起を有する静電チャック
US8449786B2 (en) 2007-12-19 2013-05-28 Lam Research Corporation Film adhesive for semiconductor vacuum processing apparatus
US8861170B2 (en) 2009-05-15 2014-10-14 Entegris, Inc. Electrostatic chuck with photo-patternable soft protrusion contact surface
US9025305B2 (en) 2010-05-28 2015-05-05 Entegris, Inc. High surface resistivity electrostatic chuck
US9543187B2 (en) 2008-05-19 2017-01-10 Entegris, Inc. Electrostatic chuck
JP2019047019A (ja) * 2017-09-05 2019-03-22 日本特殊陶業株式会社 保持装置
WO2019107271A1 (ja) * 2017-11-29 2019-06-06 株式会社巴川製紙所 耐プラズマ性を有する樹脂組成物、及び、それを用いた静電チャック装置
US10347475B2 (en) 2005-10-31 2019-07-09 Applied Materials, Inc. Holding assembly for substrate processing chamber

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4013386B2 (ja) * 1998-03-02 2007-11-28 住友電気工業株式会社 半導体製造用保持体およびその製造方法
JP4948337B2 (ja) * 2007-09-13 2012-06-06 株式会社巴川製紙所 静電チャック装置用接着シート、および静電チャック装置
JP5343802B2 (ja) * 2009-09-30 2013-11-13 住友大阪セメント株式会社 静電チャック装置
JP2014138164A (ja) 2013-01-18 2014-07-28 Sumitomo Osaka Cement Co Ltd 静電チャック装置
KR101986266B1 (ko) 2013-03-29 2019-06-07 스미토모 오사카 세멘토 가부시키가이샤 정전 척 장치

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5848421A (ja) * 1981-09-17 1983-03-22 Toshiba Corp ドライエツチング装置
JPS58123381A (ja) * 1982-01-13 1983-07-22 Toshiba Corp 静電チヤツクとその製造方法
JPS58190037A (ja) * 1982-04-28 1983-11-05 Toshiba Corp 静電チヤツク装置およびその製造方法
JPS5913641A (ja) * 1982-07-09 1984-01-24 Nippon Telegr & Teleph Corp <Ntt> 光フアイバの製造方法
JPS5928354A (ja) * 1982-08-10 1984-02-15 Toshiba Corp 静電チヤツク用薄膜
JPS5964245A (ja) * 1982-09-30 1984-04-12 Fujitsu Ltd 静電チヤツク
JPS622632A (ja) * 1985-06-28 1987-01-08 Fujitsu Ltd 静電吸着装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5848421A (ja) * 1981-09-17 1983-03-22 Toshiba Corp ドライエツチング装置
JPS58123381A (ja) * 1982-01-13 1983-07-22 Toshiba Corp 静電チヤツクとその製造方法
JPS58190037A (ja) * 1982-04-28 1983-11-05 Toshiba Corp 静電チヤツク装置およびその製造方法
JPS5913641A (ja) * 1982-07-09 1984-01-24 Nippon Telegr & Teleph Corp <Ntt> 光フアイバの製造方法
JPS5928354A (ja) * 1982-08-10 1984-02-15 Toshiba Corp 静電チヤツク用薄膜
JPS5964245A (ja) * 1982-09-30 1984-04-12 Fujitsu Ltd 静電チヤツク
JPS622632A (ja) * 1985-06-28 1987-01-08 Fujitsu Ltd 静電吸着装置

Cited By (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5539179A (en) * 1990-11-17 1996-07-23 Tokyo Electron Limited Electrostatic chuck having a multilayer structure for attracting an object
JPH0513558A (ja) * 1990-12-25 1993-01-22 Ngk Insulators Ltd ウエハー加熱装置及びその製造方法
JPH06225556A (ja) * 1992-12-03 1994-08-12 Abisare:Kk 静電吸着装置
US5560780A (en) * 1993-04-22 1996-10-01 Applied Materials, Inc. Protective coating for dielectric material on wafer support used in integrated circuit processing apparatus and method of forming same
US6278600B1 (en) 1994-01-31 2001-08-21 Applied Materials, Inc. Electrostatic chuck with improved temperature control and puncture resistance
US5729423A (en) * 1994-01-31 1998-03-17 Applied Materials, Inc. Puncture resistant electrostatic chuck
US5745331A (en) * 1994-01-31 1998-04-28 Applied Materials, Inc. Electrostatic chuck with conformal insulator film
US5753132A (en) * 1994-01-31 1998-05-19 Applied Materials, Inc. Method of making electrostatic chuck with conformal insulator film
US5986875A (en) * 1994-01-31 1999-11-16 Applied Materials, Inc. Puncture resistant electrostatic chuck
US5801915A (en) * 1994-01-31 1998-09-01 Applied Materials, Inc. Electrostatic chuck having a unidirectionally conducting coupler layer
US6557248B1 (en) * 1994-02-22 2003-05-06 Applied Materials Inc. Method of fabricating an electrostatic chuck
US6023405A (en) * 1994-02-22 2000-02-08 Applied Materials, Inc. Electrostatic chuck with improved erosion resistance
US5646814A (en) * 1994-07-15 1997-07-08 Applied Materials, Inc. Multi-electrode electrostatic chuck
US5592358A (en) * 1994-07-18 1997-01-07 Applied Materials, Inc. Electrostatic chuck for magnetic flux processing
US5606485A (en) * 1994-07-18 1997-02-25 Applied Materials, Inc. Electrostatic chuck having improved erosion resistance
US5996218A (en) * 1994-07-18 1999-12-07 Applied Materials Inc. Method of forming an electrostatic chuck suitable for magnetic flux processing
US5528451A (en) * 1994-11-02 1996-06-18 Applied Materials, Inc Erosion resistant electrostatic chuck
US5631803A (en) * 1995-01-06 1997-05-20 Applied Materials, Inc. Erosion resistant electrostatic chuck with improved cooling system
US5800871A (en) * 1995-01-12 1998-09-01 Applied Materials, Inc. Electrostatic chuck with polymeric impregnation and method of making
US5792562A (en) * 1995-01-12 1998-08-11 Applied Materials, Inc. Electrostatic chuck with polymeric impregnation and method of making
US6414834B1 (en) 1996-04-26 2002-07-02 Applied Materials, Inc. Dielectric covered electrostatic chuck
US6721162B2 (en) 1996-04-26 2004-04-13 Applied Materials Inc. Electrostatic chuck having composite dielectric layer and method of manufacture
US5870271A (en) * 1997-02-19 1999-02-09 Applied Materials, Inc. Pressure actuated sealing diaphragm for chucks
US6008481A (en) * 1997-07-15 1999-12-28 Honda Giken Kogyo Kabushiki Kaisha Method and apparatus for deciding heated state of metal billet
US5880924A (en) * 1997-12-01 1999-03-09 Applied Materials, Inc. Electrostatic chuck capable of rapidly dechucking a substrate
US6263829B1 (en) 1999-01-22 2001-07-24 Applied Materials, Inc. Process chamber having improved gas distributor and method of manufacture
US6598559B1 (en) 2000-03-24 2003-07-29 Applied Materials, Inc. Temperature controlled chamber
US6813134B2 (en) 2000-08-16 2004-11-02 Creative Technology Corporation Electrostatic chucking device and manufacturing method thereof
EP1180793A3 (en) * 2000-08-16 2004-06-16 Creative Technology Corporation Electrostatic chuck and manufacturing method thereof
US6581275B2 (en) 2001-01-22 2003-06-24 Applied Materials Inc. Fabricating an electrostatic chuck having plasma resistant gas conduits
JP2003077994A (ja) * 2001-08-30 2003-03-14 Kyocera Corp 静電チャック及びその製造方法
JP2005064105A (ja) * 2003-08-08 2005-03-10 Tomoegawa Paper Co Ltd 静電チャック装置用電極シート、静電チャック装置および吸着方法
US11658016B2 (en) 2005-10-31 2023-05-23 Applied Materials, Inc. Shield for a substrate processing chamber
US10347475B2 (en) 2005-10-31 2019-07-09 Applied Materials, Inc. Holding assembly for substrate processing chamber
US7667943B2 (en) 2006-04-28 2010-02-23 Shin-Etsu Chemical Co., Ltd. Electrostatic chuck
JP2008305912A (ja) * 2007-06-06 2008-12-18 Tomoegawa Paper Co Ltd 静電チャック装置
US9028646B2 (en) 2007-12-19 2015-05-12 Lam Research Corporation Film adhesive for semiconductor vacuum processing apparatus
US8449786B2 (en) 2007-12-19 2013-05-28 Lam Research Corporation Film adhesive for semiconductor vacuum processing apparatus
US9543187B2 (en) 2008-05-19 2017-01-10 Entegris, Inc. Electrostatic chuck
US10395963B2 (en) 2008-05-19 2019-08-27 Entegris, Inc. Electrostatic chuck
US8879233B2 (en) 2009-05-15 2014-11-04 Entegris, Inc. Electrostatic chuck with polymer protrusions
US8861170B2 (en) 2009-05-15 2014-10-14 Entegris, Inc. Electrostatic chuck with photo-patternable soft protrusion contact surface
US9721821B2 (en) 2009-05-15 2017-08-01 Entegris, Inc. Electrostatic chuck with photo-patternable soft protrusion contact surface
JP2012527125A (ja) * 2009-05-15 2012-11-01 インテグリス・インコーポレーテッド ポリマー突起を有する静電チャック
US9025305B2 (en) 2010-05-28 2015-05-05 Entegris, Inc. High surface resistivity electrostatic chuck
JP2019047019A (ja) * 2017-09-05 2019-03-22 日本特殊陶業株式会社 保持装置
WO2019107271A1 (ja) * 2017-11-29 2019-06-06 株式会社巴川製紙所 耐プラズマ性を有する樹脂組成物、及び、それを用いた静電チャック装置
JPWO2019107271A1 (ja) * 2017-11-29 2020-12-03 株式会社巴川製紙所 耐プラズマ性を有する樹脂組成物、及び、それを用いた静電チャック装置

Also Published As

Publication number Publication date
JPH0587177B2 (enrdf_load_stackoverflow) 1993-12-15

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