JPH0131933B2 - - Google Patents

Info

Publication number
JPH0131933B2
JPH0131933B2 JP56060683A JP6068381A JPH0131933B2 JP H0131933 B2 JPH0131933 B2 JP H0131933B2 JP 56060683 A JP56060683 A JP 56060683A JP 6068381 A JP6068381 A JP 6068381A JP H0131933 B2 JPH0131933 B2 JP H0131933B2
Authority
JP
Japan
Prior art keywords
powder
plasma
container
plasma processing
cylindrical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56060683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57177342A (en
Inventor
Yoshimi Akai
Takashi Anami
Akira Taya
Masahiko Hirose
Tadashi Ido
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP56060683A priority Critical patent/JPS57177342A/ja
Publication of JPS57177342A publication Critical patent/JPS57177342A/ja
Publication of JPH0131933B2 publication Critical patent/JPH0131933B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/126—Microwaves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Compounds Of Iron (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Hard Magnetic Materials (AREA)
JP56060683A 1981-04-23 1981-04-23 Plasma treating apparatus of powder Granted JPS57177342A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56060683A JPS57177342A (en) 1981-04-23 1981-04-23 Plasma treating apparatus of powder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56060683A JPS57177342A (en) 1981-04-23 1981-04-23 Plasma treating apparatus of powder

Publications (2)

Publication Number Publication Date
JPS57177342A JPS57177342A (en) 1982-11-01
JPH0131933B2 true JPH0131933B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-06-28

Family

ID=13149346

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56060683A Granted JPS57177342A (en) 1981-04-23 1981-04-23 Plasma treating apparatus of powder

Country Status (1)

Country Link
JP (1) JPS57177342A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62238721A (ja) * 1986-04-10 1987-10-19 Seiko Epson Corp 射出成形サブストレ−ト
JPS62194433U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1986-05-30 1987-12-10
DE19654603C2 (de) * 1996-12-20 2003-05-22 Iveco Gmbh & Co Kg Anlage zur Niederdruck-Plasmabehandlung
JP3587071B2 (ja) * 1998-12-22 2004-11-10 日立電線株式会社 粉体状架橋フッ素樹脂の製造方法
JP3587072B2 (ja) * 1998-12-22 2004-11-10 日立電線株式会社 粉体状架橋フッ素樹脂の製造方法
KR20060021385A (ko) * 2003-06-20 2006-03-07 가부시키가이샤 호소카와 훈타이 기쥬쓰켄큐쇼 파우더 처리 방법, 파우더 처리 장치, 및 다공질 과립의제조 방법
WO2006028140A1 (ja) * 2004-09-07 2006-03-16 Nisshin Seifun Group Inc. 微粒子の製造方法および装置
JP4640961B2 (ja) * 2005-07-27 2011-03-02 株式会社日清製粉グループ本社 微粒子の製造方法および装置
CN103476878B (zh) 2010-12-08 2015-09-16 黑达乐格瑞菲工业有限公司 颗粒材料、包括颗粒材料的复合材料的制备及其应用
JP6024066B2 (ja) * 2012-09-25 2016-11-09 日本化学機械製造株式会社 低エネルギー電磁波反応装置
US20220161221A1 (en) * 2019-04-05 2022-05-26 Pyrowave Inc. Internally cooled impedance tuner for microwave pyrolysis systems
JP6749028B1 (ja) * 2019-09-12 2020-09-02 株式会社ニッシン プラズマ処理装置及びプラズマ処理方法
JP6809745B1 (ja) * 2020-08-03 2021-01-06 株式会社ニッシン プラズマ処理装置
JP7479611B2 (ja) * 2021-02-22 2024-05-09 エステック株式会社 プラズマ処理方法及び装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5684462A (en) * 1979-12-10 1981-07-09 Shunpei Yamazaki Plasma nitriding method

Also Published As

Publication number Publication date
JPS57177342A (en) 1982-11-01

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