JPH0116309B2 - - Google Patents

Info

Publication number
JPH0116309B2
JPH0116309B2 JP58162624A JP16262483A JPH0116309B2 JP H0116309 B2 JPH0116309 B2 JP H0116309B2 JP 58162624 A JP58162624 A JP 58162624A JP 16262483 A JP16262483 A JP 16262483A JP H0116309 B2 JPH0116309 B2 JP H0116309B2
Authority
JP
Japan
Prior art keywords
vacuum chamber
cleaning liquid
chamber
vacuum
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58162624A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6055611A (ja
Inventor
Hirosane Takei
Tsugio Chiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP16262483A priority Critical patent/JPS6055611A/ja
Publication of JPS6055611A publication Critical patent/JPS6055611A/ja
Publication of JPH0116309B2 publication Critical patent/JPH0116309B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Separation Of Particles Using Liquids (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP16262483A 1983-09-06 1983-09-06 真空室内クリ−ニング装置 Granted JPS6055611A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16262483A JPS6055611A (ja) 1983-09-06 1983-09-06 真空室内クリ−ニング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16262483A JPS6055611A (ja) 1983-09-06 1983-09-06 真空室内クリ−ニング装置

Publications (2)

Publication Number Publication Date
JPS6055611A JPS6055611A (ja) 1985-03-30
JPH0116309B2 true JPH0116309B2 (enrdf_load_stackoverflow) 1989-03-23

Family

ID=15758142

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16262483A Granted JPS6055611A (ja) 1983-09-06 1983-09-06 真空室内クリ−ニング装置

Country Status (1)

Country Link
JP (1) JPS6055611A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62196367A (ja) * 1986-02-25 1987-08-29 Ulvac Corp 真空処理槽のクリ−ニング装置
JPS62205268A (ja) * 1986-03-04 1987-09-09 Ulvac Corp 真空処理槽のクリ−ニング装置
JPH06272027A (ja) * 1993-03-17 1994-09-27 Fuji Photo Film Co Ltd 真空蒸着槽の自動洗浄方法及び装置
WO2012008455A1 (ja) * 2010-07-13 2012-01-19 株式会社アルバック 成膜装置及び成膜装置の洗浄方法
JP6325475B2 (ja) 2015-03-18 2018-05-16 株式会社東芝 ガス再利用装置、積層造形装置、及び積層造形方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS479567U (enrdf_load_stackoverflow) * 1971-02-26 1972-10-04

Also Published As

Publication number Publication date
JPS6055611A (ja) 1985-03-30

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