JPS6055611A - 真空室内クリ−ニング装置 - Google Patents

真空室内クリ−ニング装置

Info

Publication number
JPS6055611A
JPS6055611A JP16262483A JP16262483A JPS6055611A JP S6055611 A JPS6055611 A JP S6055611A JP 16262483 A JP16262483 A JP 16262483A JP 16262483 A JP16262483 A JP 16262483A JP S6055611 A JPS6055611 A JP S6055611A
Authority
JP
Japan
Prior art keywords
vacuum chamber
cleaning fluid
dust
cleaning liquid
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16262483A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0116309B2 (enrdf_load_stackoverflow
Inventor
Hirosane Takei
武井　宏真
Tsugio Chiba
千葉　次雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Ulvac Inc
Priority to JP16262483A priority Critical patent/JPS6055611A/ja
Publication of JPS6055611A publication Critical patent/JPS6055611A/ja
Publication of JPH0116309B2 publication Critical patent/JPH0116309B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Separation Of Particles Using Liquids (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP16262483A 1983-09-06 1983-09-06 真空室内クリ−ニング装置 Granted JPS6055611A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16262483A JPS6055611A (ja) 1983-09-06 1983-09-06 真空室内クリ−ニング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16262483A JPS6055611A (ja) 1983-09-06 1983-09-06 真空室内クリ−ニング装置

Publications (2)

Publication Number Publication Date
JPS6055611A true JPS6055611A (ja) 1985-03-30
JPH0116309B2 JPH0116309B2 (enrdf_load_stackoverflow) 1989-03-23

Family

ID=15758142

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16262483A Granted JPS6055611A (ja) 1983-09-06 1983-09-06 真空室内クリ−ニング装置

Country Status (1)

Country Link
JP (1) JPS6055611A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62196367A (ja) * 1986-02-25 1987-08-29 Ulvac Corp 真空処理槽のクリ−ニング装置
JPS62205268A (ja) * 1986-03-04 1987-09-09 Ulvac Corp 真空処理槽のクリ−ニング装置
JPH06272027A (ja) * 1993-03-17 1994-09-27 Fuji Photo Film Co Ltd 真空蒸着槽の自動洗浄方法及び装置
WO2012008455A1 (ja) * 2010-07-13 2012-01-19 株式会社アルバック 成膜装置及び成膜装置の洗浄方法
WO2016147443A1 (ja) * 2015-03-18 2016-09-22 株式会社東芝 ガス再利用装置、積層造形装置、及び積層造形方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS479567U (enrdf_load_stackoverflow) * 1971-02-26 1972-10-04

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS479567U (enrdf_load_stackoverflow) * 1971-02-26 1972-10-04

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62196367A (ja) * 1986-02-25 1987-08-29 Ulvac Corp 真空処理槽のクリ−ニング装置
JPS62205268A (ja) * 1986-03-04 1987-09-09 Ulvac Corp 真空処理槽のクリ−ニング装置
JPH06272027A (ja) * 1993-03-17 1994-09-27 Fuji Photo Film Co Ltd 真空蒸着槽の自動洗浄方法及び装置
WO2012008455A1 (ja) * 2010-07-13 2012-01-19 株式会社アルバック 成膜装置及び成膜装置の洗浄方法
JP5553898B2 (ja) * 2010-07-13 2014-07-16 株式会社アルバック 成膜装置及び成膜装置の洗浄方法
WO2016147443A1 (ja) * 2015-03-18 2016-09-22 株式会社東芝 ガス再利用装置、積層造形装置、及び積層造形方法
JP2016174990A (ja) * 2015-03-18 2016-10-06 株式会社東芝 ガス再利用装置、積層造形装置、及び積層造形方法
US10780495B2 (en) 2015-03-18 2020-09-22 Kabushiki Kaisha Toshiba Gas-recycling device, additive manufacturing apparatus, and additive manufacturing method

Also Published As

Publication number Publication date
JPH0116309B2 (enrdf_load_stackoverflow) 1989-03-23

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