JP7663074B2 - キレート剤含有水ガラス及びシリカゾルの製造方法 - Google Patents

キレート剤含有水ガラス及びシリカゾルの製造方法 Download PDF

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Publication number
JP7663074B2
JP7663074B2 JP2021527659A JP2021527659A JP7663074B2 JP 7663074 B2 JP7663074 B2 JP 7663074B2 JP 2021527659 A JP2021527659 A JP 2021527659A JP 2021527659 A JP2021527659 A JP 2021527659A JP 7663074 B2 JP7663074 B2 JP 7663074B2
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Prior art keywords
sodium silicate
acid
chelating agent
producing
silica sol
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Japanese (ja)
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JPWO2020262406A1 (https=
Inventor
雅紀 大岩本
欣也 小山
睦子 鈴木
和彰 敷井
朋之 松本
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Nissan Chemical Corp
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Nissan Chemical Corp
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141Preparation of hydrosols or aqueous dispersions
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/145Preparation of hydroorganosols, organosols or dispersions in an organic medium
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/20Silicates
    • C01B33/32Alkali metal silicates
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C229/00Compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C229/02Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
    • C07C229/04Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
    • C07C229/06Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton
    • C07C229/10Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C07C229/16Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of hydrocarbon radicals substituted by amino or carboxyl groups, e.g. ethylenediamine-tetra-acetic acid, iminodiacetic acids
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/01Saturated compounds having only one carboxyl group and containing hydroxy or O-metal groups
    • C07C59/10Polyhydroxy carboxylic acids
    • C07C59/105Polyhydroxy carboxylic acids having five or more carbon atoms, e.g. aldonic acids
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Silicon Compounds (AREA)
JP2021527659A 2019-06-24 2020-06-23 キレート剤含有水ガラス及びシリカゾルの製造方法 Active JP7663074B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019116288 2019-06-24
JP2019116288 2019-06-24
PCT/JP2020/024667 WO2020262406A1 (ja) 2019-06-24 2020-06-23 キレート剤含有水ガラス及びシリカゾルの製造方法

Publications (2)

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JPWO2020262406A1 JPWO2020262406A1 (https=) 2020-12-30
JP7663074B2 true JP7663074B2 (ja) 2025-04-16

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JP2021527659A Active JP7663074B2 (ja) 2019-06-24 2020-06-23 キレート剤含有水ガラス及びシリカゾルの製造方法

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JP (1) JP7663074B2 (https=)
CN (1) CN114007981A (https=)
TW (1) TWI888388B (https=)
WO (1) WO2020262406A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113149021B (zh) * 2021-04-14 2022-12-27 上海都进新材料科技有限公司 一种节能降耗生产硅溶胶的方法
CN113929102B (zh) * 2021-11-24 2023-06-20 航天特种材料及工艺技术研究所 一种利用螯合原理制备高纯硅酸的方法
CN116002691A (zh) * 2022-12-01 2023-04-25 航天特种材料及工艺技术研究所 一种去除硅酸中高价金属离子杂质的方法
CN121359626A (zh) * 2023-06-08 2026-01-16 日产化学株式会社 氧化镓基板用研磨剂及研磨方法
JPWO2025164297A1 (https=) * 2024-01-31 2025-08-07
CN118754131A (zh) * 2024-06-17 2024-10-11 山东金亿达新材料有限公司 一种水溶性原硅酸及其制备方法和应用

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000247625A (ja) 1999-03-04 2000-09-12 Nippon Chem Ind Co Ltd 高純度シリカゾル及びその製造方法
JP2005179159A (ja) 2003-12-24 2005-07-07 Dokai Chemical Industries Co Ltd 高純度シリカゲルの製造方法
JP3691047B1 (ja) 2004-07-30 2005-08-31 日本化学工業株式会社 高純度活性珪酸水溶液の製造方法
JP3691048B1 (ja) 2004-08-09 2005-08-31 日本化学工業株式会社 高純度コロイダルシリカの製造方法
JP2005289702A (ja) 2004-03-31 2005-10-20 Fuji Kagaku Kk ケイ酸ソーダ含有組成物及びその製造方法
JP2006036605A (ja) 2004-07-29 2006-02-09 Catalysts & Chem Ind Co Ltd 高純度水性シリカゾルの製造方法
JP2013032276A (ja) 2005-08-10 2013-02-14 Jgc Catalysts & Chemicals Ltd 異形シリカゾル

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61178414A (ja) * 1985-01-31 1986-08-11 Nippon Chem Ind Co Ltd:The 高純度シリカおよびその製造方法
JPS6212608A (ja) * 1985-07-11 1987-01-21 Nippon Chem Ind Co Ltd:The 高純度シリカ及びその製造方法
CN1155514A (zh) * 1996-01-25 1997-07-30 天津市化学试剂一厂 高纯度、高浓度、高均匀颗粒分布的大颗粒二氧化硅溶胶的制造方法
CA2203486C (en) * 1996-05-09 2003-06-17 Christopher P. Karwas Clear aqueous solutions of sodium silicate

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000247625A (ja) 1999-03-04 2000-09-12 Nippon Chem Ind Co Ltd 高純度シリカゾル及びその製造方法
JP2005179159A (ja) 2003-12-24 2005-07-07 Dokai Chemical Industries Co Ltd 高純度シリカゲルの製造方法
JP2005289702A (ja) 2004-03-31 2005-10-20 Fuji Kagaku Kk ケイ酸ソーダ含有組成物及びその製造方法
JP2006036605A (ja) 2004-07-29 2006-02-09 Catalysts & Chem Ind Co Ltd 高純度水性シリカゾルの製造方法
JP3691047B1 (ja) 2004-07-30 2005-08-31 日本化学工業株式会社 高純度活性珪酸水溶液の製造方法
JP3691048B1 (ja) 2004-08-09 2005-08-31 日本化学工業株式会社 高純度コロイダルシリカの製造方法
JP2013032276A (ja) 2005-08-10 2013-02-14 Jgc Catalysts & Chemicals Ltd 異形シリカゾル

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WO2020262406A1 (ja) 2020-12-30
CN114007981A (zh) 2022-02-01
TW202112666A (zh) 2021-04-01
TWI888388B (zh) 2025-07-01
JPWO2020262406A1 (https=) 2020-12-30

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