TWI888388B - 含螯合劑之水玻璃及二氧化矽溶膠之製造方法 - Google Patents
含螯合劑之水玻璃及二氧化矽溶膠之製造方法 Download PDFInfo
- Publication number
- TWI888388B TWI888388B TW109121413A TW109121413A TWI888388B TW I888388 B TWI888388 B TW I888388B TW 109121413 A TW109121413 A TW 109121413A TW 109121413 A TW109121413 A TW 109121413A TW I888388 B TWI888388 B TW I888388B
- Authority
- TW
- Taiwan
- Prior art keywords
- sodium silicate
- aqueous solution
- chelating agent
- acid
- silica sol
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/141—Preparation of hydrosols or aqueous dispersions
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/145—Preparation of hydroorganosols, organosols or dispersions in an organic medium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/20—Silicates
- C01B33/32—Alkali metal silicates
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
- C07C229/02—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C229/04—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C229/06—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton
- C07C229/10—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
- C07C229/16—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of hydrocarbon radicals substituted by amino or carboxyl groups, e.g. ethylenediamine-tetra-acetic acid, iminodiacetic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
- C07C59/01—Saturated compounds having only one carboxyl group and containing hydroxy or O-metal groups
- C07C59/10—Polyhydroxy carboxylic acids
- C07C59/105—Polyhydroxy carboxylic acids having five or more carbon atoms, e.g. aldonic acids
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Nanotechnology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019-116288 | 2019-06-24 | ||
| JP2019116288 | 2019-06-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202112666A TW202112666A (zh) | 2021-04-01 |
| TWI888388B true TWI888388B (zh) | 2025-07-01 |
Family
ID=74060614
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109121413A TWI888388B (zh) | 2019-06-24 | 2020-06-23 | 含螯合劑之水玻璃及二氧化矽溶膠之製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7663074B2 (https=) |
| CN (1) | CN114007981A (https=) |
| TW (1) | TWI888388B (https=) |
| WO (1) | WO2020262406A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113149021B (zh) * | 2021-04-14 | 2022-12-27 | 上海都进新材料科技有限公司 | 一种节能降耗生产硅溶胶的方法 |
| CN113929102B (zh) * | 2021-11-24 | 2023-06-20 | 航天特种材料及工艺技术研究所 | 一种利用螯合原理制备高纯硅酸的方法 |
| CN116002691A (zh) * | 2022-12-01 | 2023-04-25 | 航天特种材料及工艺技术研究所 | 一种去除硅酸中高价金属离子杂质的方法 |
| CN121359626A (zh) * | 2023-06-08 | 2026-01-16 | 日产化学株式会社 | 氧化镓基板用研磨剂及研磨方法 |
| JPWO2025164297A1 (https=) * | 2024-01-31 | 2025-08-07 | ||
| CN118754131A (zh) * | 2024-06-17 | 2024-10-11 | 山东金亿达新材料有限公司 | 一种水溶性原硅酸及其制备方法和应用 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0481526B2 (https=) * | 1985-07-11 | 1992-12-24 | Nippon Chemical Ind | |
| TWI372727B (https=) * | 2004-08-09 | 2012-09-21 | Nippon Chemical Ind |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61178414A (ja) * | 1985-01-31 | 1986-08-11 | Nippon Chem Ind Co Ltd:The | 高純度シリカおよびその製造方法 |
| CN1155514A (zh) * | 1996-01-25 | 1997-07-30 | 天津市化学试剂一厂 | 高纯度、高浓度、高均匀颗粒分布的大颗粒二氧化硅溶胶的制造方法 |
| CA2203486C (en) * | 1996-05-09 | 2003-06-17 | Christopher P. Karwas | Clear aqueous solutions of sodium silicate |
| JP4222582B2 (ja) * | 1999-03-04 | 2009-02-12 | 日本化学工業株式会社 | 高純度シリカゾルの製造方法 |
| JP4737930B2 (ja) | 2003-12-24 | 2011-08-03 | Agcエスアイテック株式会社 | 高純度シリカゲルの製造方法 |
| JP2005289702A (ja) | 2004-03-31 | 2005-10-20 | Fuji Kagaku Kk | ケイ酸ソーダ含有組成物及びその製造方法 |
| JP2006036605A (ja) * | 2004-07-29 | 2006-02-09 | Catalysts & Chem Ind Co Ltd | 高純度水性シリカゾルの製造方法 |
| JP3691047B1 (ja) * | 2004-07-30 | 2005-08-31 | 日本化学工業株式会社 | 高純度活性珪酸水溶液の製造方法 |
| JP5127452B2 (ja) | 2005-08-10 | 2013-01-23 | 日揮触媒化成株式会社 | 異形シリカゾルの製造方法 |
-
2020
- 2020-06-23 CN CN202080046166.0A patent/CN114007981A/zh active Pending
- 2020-06-23 JP JP2021527659A patent/JP7663074B2/ja active Active
- 2020-06-23 TW TW109121413A patent/TWI888388B/zh active
- 2020-06-23 WO PCT/JP2020/024667 patent/WO2020262406A1/ja not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0481526B2 (https=) * | 1985-07-11 | 1992-12-24 | Nippon Chemical Ind | |
| TWI372727B (https=) * | 2004-08-09 | 2012-09-21 | Nippon Chemical Ind |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020262406A1 (ja) | 2020-12-30 |
| CN114007981A (zh) | 2022-02-01 |
| TW202112666A (zh) | 2021-04-01 |
| JP7663074B2 (ja) | 2025-04-16 |
| JPWO2020262406A1 (https=) | 2020-12-30 |
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