JP7014298B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP7014298B2 JP7014298B2 JP2020525335A JP2020525335A JP7014298B2 JP 7014298 B2 JP7014298 B2 JP 7014298B2 JP 2020525335 A JP2020525335 A JP 2020525335A JP 2020525335 A JP2020525335 A JP 2020525335A JP 7014298 B2 JP7014298 B2 JP 7014298B2
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- electrode
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Description
図1に示すように、本発明の実施形態に係る半導体装置100は、半導体チップ30及び金属配線板60を備える。半導体装置100は、冷却器10、積層基板11、ケース20および封止樹脂21を含んでよい。半導体チップ30は、半導体基板29(図7参照)に形成された、pn接合を含む活性領域によって主電流の流れを制御する機能を有する素子である。冷却器10の上面は積層基板11の下面に直接又は間接的に接する。ケース20の内部に積層基板11の上面、半導体チップ30及び金属配線板60等を封止する封止樹脂21が充填される。実施形態に係る半導体装置100は、例えばパワー半導体である半導体チップ30を用いて、入力された電力を所定の電力に変換する電力用半導体装置(パワーデバイス)である。実施形態において、理解を容易にするために、それぞれ1つの積層基板11、半導体チップ30及び金属配線板60を備える半導体装置100について説明する。半導体装置100は、複数の積層基板、半導体チップ及び金属配線板等を備え得る。また、外部と接続するための端子及び配線、並びに信号処理回路等については図示及び説明を省略する。
ΔεP×Nf b=c …(1)
但し、Nfは疲労寿命、b,cは材料による定数である。式(1)によれば、疲労寿命を延ばすためには、塑性ひずみ振幅を小さくすることが必要となる。
上記のように、本発明の実施形態を記載したが、この開示の一部をなす論述及び図面は本発明を限定するものであると理解すべきではない。この開示から当業者には様々な代替実施形態、実施例及び運用技術が明らかとなろう。
11 積層基板
13 絶縁基板
14 第1回路パターン層
15 第2回路パターン層
16 第3回路パターン層
20 ケース
21 封止樹脂
22~25 はんだ部
28 下面電極
29 半導体基板
30 半導体チップ
31,31-1,31-2 上面電極
32 配線層
33-1~33-6 鍍金層
34 絶縁膜
35 ガードリング
36-1~36-3 ゲートランナー
39 電極パッド
60 金属配線板
61 第1接合部
62 第1立ち上がり部
63 接続部
64 第2立ち上がり部
65 第2接合部
66-1~66-3 溝部
67-1~67-6 台地部
100 半導体装置
Claims (4)
- 上面を有する半導体基板、前記半導体基板の上面に配置された上面電極、前記上面電極の上面の端部を選択的に被覆する絶縁膜、および、前記絶縁膜の開口部に露出した前記上面電極の上面を被覆する鍍金層を含む半導体チップと、
前記絶縁膜及び前記鍍金層の上方に位置する接合部を含み、前記接合部の下面から前記上方に向かって溝部が設けられた金属配線板と、
前記溝部を満たし、前記鍍金層と前記接合部の下面とを接合するはんだ部と、
を備え、
平面視において、前記絶縁膜と前記鍍金層の境界線が前記溝部の内側に配置され、
前記はんだ部は、前記境界線上において、前記鍍金層上における厚さより厚く、
前記金属配線板は、前記溝部の縁部と前記絶縁膜との間の距離が0.5mm以上となるように配置された半導体装置。 - 前記半導体チップの上面に前記上面電極と離間して配置された配線層を更に備え、
前記絶縁膜は、前記配線層を被覆し、
平面視において、前記溝部は、前記配線層の位置を含むように設けられる請求項1に記載の半導体装置。 - 前記配線層は、前記半導体チップを構成する半導体素子の主電流を制御する制御電極の配線層である請求項2に記載の半導体装置。
- 前記半導体チップを搭載する絶縁基板と、
少なくとも、前記半導体チップ、前記金属配線板、前記はんだ部及び前記絶縁基板を封止する封止樹脂と、
を更に備える請求項1~3のいずれか1項に記載の半導体装置。
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001274206A (ja) | 2000-03-23 | 2001-10-05 | Nec Corp | 半導体パッケージ用接続導体、半導体パッケージ、及び半導体パッケージの組立方法 |
JP2013179229A (ja) | 2012-02-29 | 2013-09-09 | Rohm Co Ltd | パワーモジュール半導体装置 |
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US6841862B2 (en) * | 2000-06-30 | 2005-01-11 | Nec Corporation | Semiconductor package board using a metal base |
JP2006190728A (ja) | 2005-01-04 | 2006-07-20 | Mitsubishi Electric Corp | 電力用半導体装置 |
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US20090108436A1 (en) * | 2007-10-31 | 2009-04-30 | Toshio Fujii | Semiconductor package |
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JP2011066371A (ja) | 2009-08-18 | 2011-03-31 | Denso Corp | 半導体装置およびその製造方法 |
DE102010038933A1 (de) | 2009-08-18 | 2011-02-24 | Denso Corporation, Kariya-City | Halbleitervorrichtung mit Halbleiterchip und Metallplatte und Verfahren zu deren Fertigung |
US8987878B2 (en) * | 2010-10-29 | 2015-03-24 | Alpha And Omega Semiconductor Incorporated | Substrateless power device packages |
KR101585305B1 (ko) * | 2011-03-09 | 2016-01-13 | 히타치가세이가부시끼가이샤 | 반도체 소자 탑재용 패키지 기판의 제조 방법, 반도체 소자 탑재용 패키지 기판 및 반도체 패키지 |
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---|---|---|---|---|
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