JP6976972B2 - マイクロデバイスのマスクレス並列ピックアンドプレース移載 - Google Patents
マイクロデバイスのマスクレス並列ピックアンドプレース移載 Download PDFInfo
- Publication number
- JP6976972B2 JP6976972B2 JP2018564747A JP2018564747A JP6976972B2 JP 6976972 B2 JP6976972 B2 JP 6976972B2 JP 2018564747 A JP2018564747 A JP 2018564747A JP 2018564747 A JP2018564747 A JP 2018564747A JP 6976972 B2 JP6976972 B2 JP 6976972B2
- Authority
- JP
- Japan
- Prior art keywords
- transfer
- microdevices
- adhesive layer
- substrate
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
- H10H29/14—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00 comprising multiple light-emitting semiconductor components
- H10H29/142—Two-dimensional arrangements, e.g. asymmetric LED layout
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/0015—Orientation; Alignment; Positioning
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/0061—Tools for holding the circuit boards during processing; handling transport of printed circuit boards
- H05K13/0069—Holders for printed circuit boards
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/04—Mounting of components, e.g. of leadless components
- H05K13/046—Surface mounting
- H05K13/0469—Surface mounting by applying a glue or viscous material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistors
- H05K3/303—Assembling printed circuits with electric components, e.g. with resistors with surface mounted components
- H05K3/305—Affixing by adhesive
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/018—Bonding of wafers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/855—Optical field-shaping means, e.g. lenses
- H10H20/856—Reflecting means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0446—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7402—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/036—Manufacture or treatment of packages
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0442—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7412—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support the auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
- H10P72/7414—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support the auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support the auxiliary support including means facilitating the selective separation of some of a plurality of devices from the auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7434—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used in a transfer process involving at least two transfer steps, i.e. including an intermediate handle substrate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/744—Details of chemical or physical process used for separating the auxiliary support from a device or a wafer
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Environmental & Geological Engineering (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Electroluminescent Light Sources (AREA)
- Led Device Packages (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Liquid Crystal (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Die Bonding (AREA)
- Specific Conveyance Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662348691P | 2016-06-10 | 2016-06-10 | |
| US62/348,691 | 2016-06-10 | ||
| PCT/US2017/036804 WO2017214540A1 (en) | 2016-06-10 | 2017-06-09 | Maskless parallel pick-and-place transfer of micro-devices |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019530201A JP2019530201A (ja) | 2019-10-17 |
| JP2019530201A5 JP2019530201A5 (https=) | 2020-07-16 |
| JP6976972B2 true JP6976972B2 (ja) | 2021-12-08 |
Family
ID=60573075
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018564747A Active JP6976972B2 (ja) | 2016-06-10 | 2017-06-09 | マイクロデバイスのマスクレス並列ピックアンドプレース移載 |
Country Status (7)
| Country | Link |
|---|---|
| US (5) | US10153325B2 (https=) |
| EP (1) | EP3469424A4 (https=) |
| JP (1) | JP6976972B2 (https=) |
| KR (1) | KR102427231B1 (https=) |
| CN (2) | CN109196424A (https=) |
| TW (2) | TWI778528B (https=) |
| WO (1) | WO2017214540A1 (https=) |
Families Citing this family (59)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6231432B2 (ja) * | 2014-05-02 | 2017-11-15 | 富士フイルム株式会社 | 導電性フイルム、それを備える表示装置及び導電性フイルムの評価方法 |
| US11776989B2 (en) | 2016-06-10 | 2023-10-03 | Applied Materials, Inc. | Methods of parallel transfer of micro-devices using treatment |
| EP3469424A4 (en) | 2016-06-10 | 2020-01-15 | Applied Materials, Inc. | MASKLESS PARALLEL ASSEMBLY TRANSMISSION OF MICRO COMPONENTS |
| US11756982B2 (en) | 2016-06-10 | 2023-09-12 | Applied Materials, Inc. | Methods of parallel transfer of micro-devices using mask layer |
| CN106098697B (zh) * | 2016-06-15 | 2019-04-02 | 深圳市华星光电技术有限公司 | 微发光二极管显示面板及其制作方法 |
| US10978530B2 (en) * | 2016-11-25 | 2021-04-13 | Vuereal Inc. | Integration of microdevices into system substrate |
| TWI661533B (zh) * | 2017-06-07 | 2019-06-01 | Asti Global Inc., Taiwan | 晶片安裝系統以及晶片安裝方法 |
| US20190058081A1 (en) * | 2017-08-18 | 2019-02-21 | Khaled Ahmed | Micro light-emitting diode (led) display and assembly apparatus |
| US10511554B2 (en) | 2017-12-05 | 2019-12-17 | International Business Machines Corporation | Maintaining tribal knowledge for accelerated compliance control deployment |
| CN110120186A (zh) * | 2018-02-06 | 2019-08-13 | 南京瀚宇彩欣科技有限责任公司 | 显示模块 |
| US10593581B2 (en) * | 2018-02-26 | 2020-03-17 | Mikro Mesa Technology Co., Ltd. | Transfer head and method for transferring micro devices |
| US11637093B2 (en) * | 2018-05-24 | 2023-04-25 | Intel Corporation | Micro light-emitting diode display fabrication and assembly |
| US10985046B2 (en) * | 2018-06-22 | 2021-04-20 | Veeco Instruments Inc. | Micro-LED transfer methods using light-based debonding |
| WO2019246366A1 (en) * | 2018-06-22 | 2019-12-26 | Veeco Instruments Inc. | Micro-led transfer methods using light-based debonding |
| KR102782924B1 (ko) * | 2018-07-23 | 2025-03-19 | 삼성전자주식회사 | Led 전송 장치를 포함하는 전자 장치 및 그 제어 방법 |
| TW202008558A (zh) * | 2018-07-23 | 2020-02-16 | 飛傳科技股份有限公司 | 晶片轉移之方法及其晶片轉移系統 |
| US10761430B2 (en) * | 2018-09-13 | 2020-09-01 | Applied Materials, Inc. | Method to enhance the resolution of maskless lithography while maintaining a high image contrast |
| US10573544B1 (en) * | 2018-10-17 | 2020-02-25 | X-Celeprint Limited | Micro-transfer printing with selective component removal |
| US10796938B2 (en) | 2018-10-17 | 2020-10-06 | X Display Company Technology Limited | Micro-transfer printing with selective component removal |
| CN111129057B (zh) * | 2018-10-31 | 2023-06-20 | 成都辰显光电有限公司 | 微发光二极管阵列器件、制作方法及转移方法 |
| CN109524512B (zh) * | 2018-11-15 | 2020-07-03 | 华中科技大学 | 基于可控微反射镜阵列的微型发光二极管巨量转移方法 |
| KR102652723B1 (ko) * | 2018-11-20 | 2024-04-01 | 삼성전자주식회사 | 마이크로 led 전사 장치 및 이를 이용한 마이크로 led 전사 방법 |
| JP6911003B2 (ja) * | 2018-12-14 | 2021-07-28 | Tdk株式会社 | 素子アレイの製造方法と特定素子の除去方法 |
| JP7319044B2 (ja) * | 2018-12-14 | 2023-08-01 | Tdk株式会社 | 素子アレイの製造装置と特定素子の除去装置 |
| US11127720B2 (en) * | 2019-01-21 | 2021-09-21 | Nanosys, Inc. | Pixel repair method for a direct view display device |
| KR102895805B1 (ko) * | 2019-01-22 | 2025-12-04 | 삼성전자주식회사 | 음성 입력과 관련된 비주얼 정보를 표시하는 방법 및 이를 지원하는 전자 장치 |
| CN110088920B (zh) * | 2019-03-19 | 2022-07-22 | 京东方科技集团股份有限公司 | 转印方法和转印装置 |
| EP3742477A1 (en) * | 2019-05-21 | 2020-11-25 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk Onderzoek TNO | Light induced selective transfer of components using a jet of melted adhesive |
| KR20200135069A (ko) * | 2019-05-24 | 2020-12-02 | (주)포인트엔지니어링 | 마이크로 led 디스플레이 제작 방법 및 이를 이용한 마이크로 led 디스플레이 |
| US10964582B2 (en) | 2019-06-24 | 2021-03-30 | Palo Alto Research Center Incorporated | Transfer substrate utilizing selectable surface adhesion transfer elements |
| KR20210023375A (ko) * | 2019-08-23 | 2021-03-04 | 삼성전자주식회사 | 레이저 전사 장치 및 이를 이용한 전사 방법 |
| USD966207S1 (en) * | 2019-09-23 | 2022-10-11 | Star Co Scientific Technologies Advanced Research Co, Llc | Light-emitting diode array |
| CN112701076A (zh) * | 2019-10-23 | 2021-04-23 | 北京小米移动软件有限公司 | 显示屏的制作方法及系统 |
| US11302561B2 (en) | 2019-11-12 | 2022-04-12 | Palo Alto Research Center Incorporated | Transfer elements that selectably hold and release objects based on changes in stiffness |
| WO2021109010A1 (zh) * | 2019-12-03 | 2021-06-10 | 重庆康佳光电技术研究院有限公司 | 一种半导体装置巨量转移方法和系统 |
| CN110993749B (zh) * | 2019-12-09 | 2021-02-23 | 深圳市华星光电半导体显示技术有限公司 | 微型发光二极管的巨量转移方法及显示面板 |
| EP3840030A1 (en) * | 2019-12-16 | 2021-06-23 | FRAUNHOFER-GESELLSCHAFT zur Förderung der angewandten Forschung e.V. | Massive parallel assembly method |
| KR102820198B1 (ko) | 2019-12-26 | 2025-06-13 | 삼성전자주식회사 | 엘이디 전사시스템 및 이의 제어 방법 |
| CN111128813B (zh) * | 2020-01-20 | 2022-10-28 | 福州大学 | 一种μLED巨量转移方法 |
| WO2021164855A1 (de) * | 2020-02-18 | 2021-08-26 | Ev Group E. Thallner Gmbh | Verfahren und vorrichtung zur übertragung von bauteilen |
| US11348905B2 (en) * | 2020-03-02 | 2022-05-31 | Palo Alto Research Center Incorporated | Method and system for assembly of micro-LEDs onto a substrate |
| CN114902388A (zh) * | 2020-03-09 | 2022-08-12 | 积水化学工业株式会社 | 电子部件的制造方法、及显示装置的制造方法 |
| KR102754349B1 (ko) * | 2020-03-20 | 2025-01-14 | 삼성전자주식회사 | 디스플레이 모듈 및 디스플레이 모듈의 리페어 방법 |
| TWI872235B (zh) * | 2020-03-30 | 2025-02-11 | 加拿大商弗瑞爾公司 | 微裝置轉移中之偏移對齊及修復 |
| US11199774B2 (en) * | 2020-03-30 | 2021-12-14 | Canon Kabushiki Kaisha | Method and apparatus to improve frame cure imaging resolution for extrusion control |
| WO2021239253A1 (de) * | 2020-05-29 | 2021-12-02 | Erich Thallner | Verfahren zum bonden und debonden zweier substrate |
| US11343888B1 (en) * | 2020-12-15 | 2022-05-24 | Lumileds Llc | MicroLED power considering outlier pixel dynamic resistance |
| CN112768399B (zh) * | 2021-01-11 | 2022-10-04 | 深圳市华星光电半导体显示技术有限公司 | 转移基板及转移装置 |
| CN112968084A (zh) * | 2021-02-04 | 2021-06-15 | 深圳市华星光电半导体显示技术有限公司 | 显示面板及其制作方法 |
| JP7387666B2 (ja) * | 2021-03-15 | 2023-11-28 | 東レエンジニアリング株式会社 | チップ部品除去装置 |
| WO2023044257A1 (en) * | 2021-09-20 | 2023-03-23 | Applied Materials, Inc. | Methods of parallel transfer of micro-devices using mask layer |
| WO2023044256A1 (en) * | 2021-09-20 | 2023-03-23 | Applied Materials, Inc. | Methods of parallel transfer of micro-devices using treatment |
| WO2023086403A1 (en) * | 2021-11-11 | 2023-05-19 | Terecircuits Corporation | Photochemical and thermal release layer processes and uses in device manufacturing |
| CN114170922A (zh) * | 2021-12-08 | 2022-03-11 | Tcl华星光电技术有限公司 | 显示面板及其制造方法 |
| WO2023108450A1 (zh) * | 2021-12-15 | 2023-06-22 | 厦门市芯颖显示科技有限公司 | 寻址转移设备 |
| US20240036364A1 (en) * | 2022-07-28 | 2024-02-01 | Palo Alto Research Center Incorporated | Optically activated object mass transfer system |
| US20240036363A1 (en) * | 2022-07-28 | 2024-02-01 | Palo Alto Research Center Incorporated | Optically activated object mass transfer apparatus |
| CN115356794A (zh) * | 2022-09-15 | 2022-11-18 | 苏州晶方光电科技有限公司 | 晶圆级微透镜阵列的压印固化设备、制造方法及应用 |
| JP2025099629A (ja) | 2023-12-22 | 2025-07-03 | エルジー ディスプレイ カンパニー リミテッド | 表示装置および表示装置の製造方法 |
Family Cites Families (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5467146A (en) * | 1994-03-31 | 1995-11-14 | Texas Instruments Incorporated | Illumination control unit for display system with spatial light modulator |
| JP2001305664A (ja) * | 2000-04-20 | 2001-11-02 | Fuji Photo Film Co Ltd | プリンタ |
| JP4491948B2 (ja) * | 2000-10-06 | 2010-06-30 | ソニー株式会社 | 素子実装方法および画像表示装置の製造方法 |
| JP2003005100A (ja) * | 2001-06-26 | 2003-01-08 | Canon Inc | 光変調器およびそれを用いた投射装置 |
| JP2003077940A (ja) * | 2001-09-06 | 2003-03-14 | Sony Corp | 素子の転写方法及びこれを用いた素子の配列方法、画像表示装置の製造方法 |
| JP2004299814A (ja) * | 2003-03-28 | 2004-10-28 | Takasago Thermal Eng Co Ltd | 除電された絶縁体基板の製造方法及び製造装置 |
| JP4463537B2 (ja) * | 2003-12-12 | 2010-05-19 | 財団法人国際科学振興財団 | パターン露光装置 |
| US7744770B2 (en) * | 2004-06-23 | 2010-06-29 | Sony Corporation | Device transfer method |
| JP4588428B2 (ja) * | 2004-12-09 | 2010-12-01 | 富士フイルム株式会社 | 画像露光方法および装置 |
| JP4686753B2 (ja) * | 2004-12-14 | 2011-05-25 | 独立行政法人産業技術総合研究所 | 露光方法及び露光装置 |
| ITMO20040332A1 (it) * | 2004-12-16 | 2005-03-16 | Windinglab S R L | Sistema per il rilevo multiplo di microchip da un wafer costituito da una pluralita' di microchip. |
| JP5964005B2 (ja) * | 2005-04-08 | 2016-08-03 | パック テック−パッケージング テクノロジーズ ゲーエムベーハー | チップを接触基板に移送する方法及び装置 |
| JP2007025085A (ja) * | 2005-07-14 | 2007-02-01 | Nikon Corp | 露光装置、光学素子アレー及びマルチスポットビームジェネレータ、並びにデバイス製造方法 |
| CN1963672A (zh) * | 2005-11-07 | 2007-05-16 | 中芯国际集成电路制造(上海)有限公司 | 利用微机电系统制造集成电路的可重构掩模的方法和器件 |
| US20080122119A1 (en) * | 2006-08-31 | 2008-05-29 | Avery Dennison Corporation | Method and apparatus for creating rfid devices using masking techniques |
| JP2008122681A (ja) * | 2006-11-13 | 2008-05-29 | Sony Corp | 物品の実装方法、発光ダイオード表示装置の製造方法、及び、物品中間物の仮固定用基板への仮固定方法 |
| JP2010014797A (ja) * | 2008-07-01 | 2010-01-21 | Nsk Ltd | マスクレス露光装置 |
| KR101736722B1 (ko) * | 2008-11-19 | 2017-05-17 | 셈프리어스 아이엔씨. | 전단-보조 탄성 스탬프 전사에 의한 프린팅 반도체 소자 |
| WO2010113357A1 (ja) | 2009-04-03 | 2010-10-07 | シャープ株式会社 | ドナー基板、転写膜の製造方法、及び、有機電界発光素子の製造方法 |
| JP2010251360A (ja) * | 2009-04-10 | 2010-11-04 | Sony Corp | 表示装置の製造方法および表示装置 |
| JP5444798B2 (ja) * | 2009-04-10 | 2014-03-19 | ソニー株式会社 | 素子の移載方法 |
| TWI592996B (zh) * | 2009-05-12 | 2017-07-21 | 美國伊利諾大學理事會 | 用於可變形及半透明顯示器之超薄微刻度無機發光二極體之印刷總成 |
| WO2012142177A2 (en) * | 2011-04-11 | 2012-10-18 | Ndsu Research Foundation | Selective laser-assisted transfer of discrete components |
| WO2013010113A1 (en) | 2011-07-14 | 2013-01-17 | The Board Of Trustees Of The University Of Illinois | Non-contact transfer printing |
| US20130207544A1 (en) | 2011-09-30 | 2013-08-15 | Pinebrook Imaging Technology, Ltd. | Illumination system |
| US8518204B2 (en) * | 2011-11-18 | 2013-08-27 | LuxVue Technology Corporation | Method of fabricating and transferring a micro device and an array of micro devices utilizing an intermediate electrically conductive bonding layer |
| EP2830492B1 (en) * | 2012-03-30 | 2021-05-19 | The Board of Trustees of the University of Illinois | Appendage mountable electronic devices conformable to surfaces and method of making the same |
| US9250509B2 (en) * | 2012-06-04 | 2016-02-02 | Applied Materials, Inc. | Optical projection array exposure system |
| US9331230B2 (en) * | 2012-10-30 | 2016-05-03 | Cbrite Inc. | LED die dispersal in displays and light panels with preserving neighboring relationship |
| EP3925761A1 (en) | 2012-11-08 | 2021-12-22 | DDM Systems, Inc. | Systems and methods for fabricating three-dimensional objects |
| CN113035851B (zh) * | 2014-06-18 | 2022-03-29 | 艾克斯展示公司技术有限公司 | 微组装led显示器 |
| US9927723B2 (en) | 2015-03-24 | 2018-03-27 | Applied Materials, Inc. | Apparatus and methods for on-the-fly digital exposure image data modification |
| JP6375063B2 (ja) * | 2015-05-21 | 2018-08-15 | ゴルテック.インク | マイクロ発光ダイオードの搬送方法、製造方法、装置及び電子機器 |
| GB2544335A (en) * | 2015-11-13 | 2017-05-17 | Oculus Vr Llc | A method and apparatus for use in the manufacture of a display element |
| EP3469424A4 (en) * | 2016-06-10 | 2020-01-15 | Applied Materials, Inc. | MASKLESS PARALLEL ASSEMBLY TRANSMISSION OF MICRO COMPONENTS |
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| US20170358478A1 (en) | 2017-12-14 |
| TWI778528B (zh) | 2022-09-21 |
| WO2017214540A1 (en) | 2017-12-14 |
| TW202129960A (zh) | 2021-08-01 |
| CN109196424A (zh) | 2019-01-11 |
| KR20190008423A (ko) | 2019-01-23 |
| CN116047871A (zh) | 2023-05-02 |
| US10580826B2 (en) | 2020-03-03 |
| EP3469424A1 (en) | 2019-04-17 |
| EP3469424A4 (en) | 2020-01-15 |
| KR102427231B1 (ko) | 2022-07-28 |
| US10319782B2 (en) | 2019-06-11 |
| US20170358623A1 (en) | 2017-12-14 |
| US20200203423A1 (en) | 2020-06-25 |
| US20190103439A1 (en) | 2019-04-04 |
| US11127781B2 (en) | 2021-09-21 |
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