JP6935351B2 - 半導体装置 - Google Patents

半導体装置 Download PDF

Info

Publication number
JP6935351B2
JP6935351B2 JP2018053338A JP2018053338A JP6935351B2 JP 6935351 B2 JP6935351 B2 JP 6935351B2 JP 2018053338 A JP2018053338 A JP 2018053338A JP 2018053338 A JP2018053338 A JP 2018053338A JP 6935351 B2 JP6935351 B2 JP 6935351B2
Authority
JP
Japan
Prior art keywords
semiconductor region
semiconductor
region
regions
conductive type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2018053338A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019165180A (ja
JP2019165180A5 (enExample
Inventor
朋宏 玉城
朋宏 玉城
中村　和敏
和敏 中村
亮平 下條
亮平 下條
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Electronic Devices and Storage Corp
Original Assignee
Toshiba Corp
Toshiba Electronic Devices and Storage Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Electronic Devices and Storage Corp filed Critical Toshiba Corp
Priority to JP2018053338A priority Critical patent/JP6935351B2/ja
Priority to CN201810844576.4A priority patent/CN110310990B/zh
Priority to US16/120,771 priority patent/US10700184B2/en
Publication of JP2019165180A publication Critical patent/JP2019165180A/ja
Publication of JP2019165180A5 publication Critical patent/JP2019165180A5/ja
Application granted granted Critical
Publication of JP6935351B2 publication Critical patent/JP6935351B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/137—Collector regions of BJTs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/535—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including internal interconnections, e.g. cross-under constructions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411—Insulated-gate bipolar transistors [IGBT]
    • H10D12/441—Vertical IGBTs
    • H10D12/461—Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions
    • H10D12/481—Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions having gate structures on slanted surfaces, on vertical surfaces, or in grooves, e.g. trench gate IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/105—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] 
    • H10D62/106—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]  having supplementary regions doped oppositely to or in rectifying contact with regions of the semiconductor bodies, e.g. guard rings with PN or Schottky junctions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126—Top-view geometrical layouts of the regions or the junctions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/128—Anode regions of diodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00—Diodes
    • H10D8/422—PN diodes having the PN junctions in mesas
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/611—Combinations of BJTs and one or more of diodes, resistors or capacitors
    • H10D84/613—Combinations of vertical BJTs and one or more of diodes, resistors or capacitors
    • H10D84/617—Combinations of vertical BJTs and only diodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/811—Combinations of field-effect devices and one or more diodes, capacitors or resistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H01L2224/0601—Structure
    • H01L2224/0603—Bonding areas having different sizes, e.g. different heights or widths
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126—Top-view geometrical layouts of the regions or the junctions
    • H10D62/127—Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/393—Body regions of DMOS transistors or IGBTs 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/111—Field plates
    • H10D64/117—Recessed field plates, e.g. trench field plates or buried field plates

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)
JP2018053338A 2018-03-20 2018-03-20 半導体装置 Active JP6935351B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2018053338A JP6935351B2 (ja) 2018-03-20 2018-03-20 半導体装置
CN201810844576.4A CN110310990B (zh) 2018-03-20 2018-07-27 半导体装置
US16/120,771 US10700184B2 (en) 2018-03-20 2018-09-04 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018053338A JP6935351B2 (ja) 2018-03-20 2018-03-20 半導体装置

Publications (3)

Publication Number Publication Date
JP2019165180A JP2019165180A (ja) 2019-09-26
JP2019165180A5 JP2019165180A5 (enExample) 2020-03-19
JP6935351B2 true JP6935351B2 (ja) 2021-09-15

Family

ID=67985526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018053338A Active JP6935351B2 (ja) 2018-03-20 2018-03-20 半導体装置

Country Status (3)

Country Link
US (1) US10700184B2 (enExample)
JP (1) JP6935351B2 (enExample)
CN (1) CN110310990B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109979935B (zh) * 2017-12-28 2025-04-22 富士电机株式会社 半导体装置及半导体装置的制造方法
JP7204544B2 (ja) * 2019-03-14 2023-01-16 株式会社東芝 半導体装置
JP2021128993A (ja) * 2020-02-13 2021-09-02 サンケン電気株式会社 半導体装置およびスイッチングシステム
JP7296907B2 (ja) * 2020-03-10 2023-06-23 株式会社東芝 半導体装置
CN111987089A (zh) * 2020-08-19 2020-11-24 株洲中车时代半导体有限公司 逆导型igbt功率集成模块
JP2023135082A (ja) * 2022-03-15 2023-09-28 富士電機株式会社 半導体装置
JP2024041096A (ja) * 2022-09-14 2024-03-27 株式会社東芝 半導体装置

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05152574A (ja) * 1991-11-29 1993-06-18 Fuji Electric Co Ltd 半導体装置
JP4156717B2 (ja) * 1998-01-13 2008-09-24 三菱電機株式会社 半導体装置
JP4070485B2 (ja) * 2001-05-09 2008-04-02 株式会社東芝 半導体装置
DE102006050338B4 (de) * 2006-10-25 2011-12-29 Infineon Technologies Austria Ag Halbleiterbauelement mit verbessertem Speicherladung zu Dioden-Softness Trade-off
JP5206541B2 (ja) * 2008-04-01 2013-06-12 株式会社デンソー 半導体装置およびその製造方法
US7932583B2 (en) * 2008-05-13 2011-04-26 Infineon Technologies Austria Ag Reduced free-charge carrier lifetime device
JP2010183018A (ja) * 2009-02-09 2010-08-19 Toshiba Corp 半導体装置
JP5515922B2 (ja) * 2010-03-24 2014-06-11 富士電機株式会社 半導体装置
JP5678469B2 (ja) * 2010-05-07 2015-03-04 株式会社デンソー 半導体装置
JP6301776B2 (ja) * 2010-05-26 2018-03-28 三菱電機株式会社 半導体装置
JP5582102B2 (ja) * 2010-07-01 2014-09-03 株式会社デンソー 半導体装置
US8384151B2 (en) * 2011-01-17 2013-02-26 Infineon Technologies Austria Ag Semiconductor device and a reverse conducting IGBT
WO2013014943A2 (en) * 2011-07-27 2013-01-31 Kabushiki Kaisha Toyota Chuo Kenkyusho Diode, semiconductor device, and mosfet
JP5742711B2 (ja) 2011-12-28 2015-07-01 株式会社デンソー 半導体装置
JP2013149761A (ja) * 2012-01-18 2013-08-01 Fuji Electric Co Ltd 半導体装置
DE112012007249B4 (de) * 2012-12-20 2021-02-04 Denso Corporation Halbleitervorrichtung
US9337270B2 (en) * 2013-12-19 2016-05-10 Infineon Technologies Ag Semiconductor device
JP2015170654A (ja) * 2014-03-05 2015-09-28 株式会社東芝 半導体装置
JP6158123B2 (ja) * 2014-03-14 2017-07-05 株式会社東芝 半導体装置
JP6197773B2 (ja) 2014-09-29 2017-09-20 トヨタ自動車株式会社 半導体装置
JP6392133B2 (ja) * 2015-01-28 2018-09-19 株式会社東芝 半導体装置
JP6274154B2 (ja) * 2015-05-27 2018-02-07 トヨタ自動車株式会社 逆導通ｉｇｂｔ
JP6445952B2 (ja) * 2015-10-19 2018-12-26 株式会社東芝 半導体装置
CN107086217B (zh) * 2016-02-16 2023-05-16 富士电机株式会社 半导体装置
JP2016195271A (ja) * 2016-07-04 2016-11-17 三菱電機株式会社 半導体装置
JP6652515B2 (ja) 2017-02-09 2020-02-26 株式会社東芝 半導体装置
US10439038B2 (en) * 2017-02-09 2019-10-08 Kabushiki Kaisha Toshiba Semiconductor device and electrical apparatus
JP2019145708A (ja) * 2018-02-22 2019-08-29 株式会社東芝 半導体装置
US10636898B2 (en) * 2018-08-15 2020-04-28 Kabushiki Kaisha Toshiba Semiconductor device

Also Published As

Publication number Publication date
JP2019165180A (ja) 2019-09-26
CN110310990B (zh) 2022-05-24
CN110310990A (zh) 2019-10-08
US10700184B2 (en) 2020-06-30
US20190296132A1 (en) 2019-09-26

Similar Documents

Publication Publication Date Title
JP6935351B2 (ja) 半導体装置
JP6652515B2 (ja) 半導体装置
JP5619758B2 (ja) 逆伝導半導体装置
US10727225B2 (en) IGBT semiconductor device
WO2017126167A1 (ja) 半導体装置
CN110462838A (zh) 半导体装置
JP7013668B2 (ja) 半導体装置
US10892351B2 (en) Semiconductor device
JP7204544B2 (ja) 半導体装置
US20250194175A1 (en) Semiconductor device
JP2018198266A (ja) 半導体装置
US11322585B2 (en) Semiconductor device
KR102430527B1 (ko) 전력 반도체 소자
JP5261893B2 (ja) トレンチ型絶縁ゲートバイポーラトランジスタ
JP7222758B2 (ja) 半導体装置
JP7243795B2 (ja) 半導体装置
US20250203972A1 (en) Semiconductor device
JP6445990B2 (ja) 半導体装置
US12336267B2 (en) Semiconductor device
JP2013069801A (ja) 半導体装置
JP2024136000A (ja) 半導体装置
JP2024135983A (ja) 半導体装置
KR20250146529A (ko) 전력 반도체 소자 및 전력 반도체 칩
CN117712139A (zh) 半导体装置
JP2022051294A (ja) 半導体装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200206

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20200206

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20210126

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210219

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210420

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20210730

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20210825

R150 Certificate of patent or registration of utility model

Ref document number: 6935351

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150