JP6818520B2 - 中性スズめっき液を用いたバレルめっきまたは高速回転めっき方法 - Google Patents
中性スズめっき液を用いたバレルめっきまたは高速回転めっき方法 Download PDFInfo
- Publication number
- JP6818520B2 JP6818520B2 JP2016220435A JP2016220435A JP6818520B2 JP 6818520 B2 JP6818520 B2 JP 6818520B2 JP 2016220435 A JP2016220435 A JP 2016220435A JP 2016220435 A JP2016220435 A JP 2016220435A JP 6818520 B2 JP6818520 B2 JP 6818520B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- barrel
- plating solution
- acid
- speed rotary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000007747 plating Methods 0.000 title claims description 157
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 title claims description 30
- 238000000034 method Methods 0.000 title claims description 23
- 230000007935 neutral effect Effects 0.000 title claims description 15
- 150000003839 salts Chemical class 0.000 claims description 25
- 239000002253 acid Substances 0.000 claims description 17
- 150000004985 diamines Chemical class 0.000 claims description 16
- 239000008139 complexing agent Substances 0.000 claims description 12
- 125000002947 alkylene group Chemical group 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- IUTCEZPPWBHGIX-UHFFFAOYSA-N tin(2+) Chemical compound [Sn+2] IUTCEZPPWBHGIX-UHFFFAOYSA-N 0.000 claims description 10
- 239000003990 capacitor Substances 0.000 claims description 5
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- 238000012360 testing method Methods 0.000 description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- -1 for example Chemical compound 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical class Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 229940098779 methanesulfonic acid Drugs 0.000 description 6
- 150000007522 mineralic acids Chemical class 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 150000007524 organic acids Chemical class 0.000 description 6
- 229910001432 tin ion Inorganic materials 0.000 description 6
- 239000003963 antioxidant agent Substances 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 238000005187 foaming Methods 0.000 description 4
- SUMDYPCJJOFFON-UHFFFAOYSA-N isethionic acid Chemical compound OCCS(O)(=O)=O SUMDYPCJJOFFON-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 4
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 230000003078 antioxidant effect Effects 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- KDKIWFRRJZZYRP-UHFFFAOYSA-N 1-hydroxypropane-2-sulfonic acid Chemical compound OCC(C)S(O)(=O)=O KDKIWFRRJZZYRP-UHFFFAOYSA-N 0.000 description 2
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 230000005587 bubbling Effects 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 2
- 239000000174 gluconic acid Substances 0.000 description 2
- 235000012208 gluconic acid Nutrition 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000003002 pH adjusting agent Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 239000000176 sodium gluconate Substances 0.000 description 2
- 229940005574 sodium gluconate Drugs 0.000 description 2
- 235000012207 sodium gluconate Nutrition 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- IKQCSJBQLWJEPU-UHFFFAOYSA-N 2,5-dihydroxybenzenesulfonic acid Chemical compound OC1=CC=C(O)C(S(O)(=O)=O)=C1 IKQCSJBQLWJEPU-UHFFFAOYSA-N 0.000 description 1
- XPALGXXLALUMLE-UHFFFAOYSA-N 2-(dimethylamino)tetradecanoic acid Chemical compound CCCCCCCCCCCCC(N(C)C)C(O)=O XPALGXXLALUMLE-UHFFFAOYSA-N 0.000 description 1
- HSXUNHYXJWDLDK-UHFFFAOYSA-N 2-hydroxypropane-1-sulfonic acid Chemical compound CC(O)CS(O)(=O)=O HSXUNHYXJWDLDK-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000004520 agglutination Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-N ethanesulfonic acid Chemical compound CCS(O)(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- DVEKCXOJTLDBFE-UHFFFAOYSA-N n-dodecyl-n,n-dimethylglycinate Chemical compound CCCCCCCCCCCC[N+](C)(C)CC([O-])=O DVEKCXOJTLDBFE-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 239000004320 sodium erythorbate Substances 0.000 description 1
- 235000010352 sodium erythorbate Nutrition 0.000 description 1
- RBWSWDPRDBEWCR-RKJRWTFHSA-N sodium;(2r)-2-[(2r)-3,4-dihydroxy-5-oxo-2h-furan-2-yl]-2-hydroxyethanolate Chemical compound [Na+].[O-]C[C@@H](O)[C@H]1OC(=O)C(O)=C1O RBWSWDPRDBEWCR-RKJRWTFHSA-N 0.000 description 1
- KKVTYAVXTDIPAP-UHFFFAOYSA-M sodium;methanesulfonate Chemical compound [Na+].CS([O-])(=O)=O KKVTYAVXTDIPAP-UHFFFAOYSA-M 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- RCIVOBGSMSSVTR-UHFFFAOYSA-L stannous sulfate Chemical compound [SnH2+2].[O-]S([O-])(=O)=O RCIVOBGSMSSVTR-UHFFFAOYSA-L 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 229910000375 tin(II) sulfate Inorganic materials 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
- C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
- C25D17/18—Apparatus for electrolytic coating of small objects in bulk having closed containers
- C25D17/20—Horizontal barrels
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016220435A JP6818520B2 (ja) | 2016-11-11 | 2016-11-11 | 中性スズめっき液を用いたバレルめっきまたは高速回転めっき方法 |
| US15/730,244 US20180135195A1 (en) | 2016-11-11 | 2017-10-11 | Barrel plating or high-speed rotary plating using a neutral tin plating solution |
| TW106137168A TWI659130B (zh) | 2016-11-11 | 2017-10-27 | 使用中性鍍錫液之滾鍍或高速旋轉電鍍 |
| CN201711057609.2A CN108070885B (zh) | 2016-11-11 | 2017-11-01 | 使用中性镀锡液的滚镀或高速旋转电镀 |
| KR1020170145250A KR102097996B1 (ko) | 2016-11-11 | 2017-11-02 | 중성 주석 도금액을 사용한 바렐 도금 또는 고속 회전식 도금 |
| EP17200630.6A EP3321396B1 (de) | 2016-11-11 | 2017-11-08 | Trommelplattierung oder hochgeschwindigkeitsdrehplattierung mit einer neutralen zinnplattierungslösung |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016220435A JP6818520B2 (ja) | 2016-11-11 | 2016-11-11 | 中性スズめっき液を用いたバレルめっきまたは高速回転めっき方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2018076570A JP2018076570A (ja) | 2018-05-17 |
| JP6818520B2 true JP6818520B2 (ja) | 2021-01-20 |
Family
ID=60480138
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016220435A Active JP6818520B2 (ja) | 2016-11-11 | 2016-11-11 | 中性スズめっき液を用いたバレルめっきまたは高速回転めっき方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20180135195A1 (de) |
| EP (1) | EP3321396B1 (de) |
| JP (1) | JP6818520B2 (de) |
| KR (1) | KR102097996B1 (de) |
| CN (1) | CN108070885B (de) |
| TW (1) | TWI659130B (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111918998A (zh) | 2018-04-12 | 2020-11-10 | 东丽株式会社 | 片状物及其制造方法 |
| CN109338420A (zh) * | 2018-12-14 | 2019-02-15 | 江苏艾森半导体材料股份有限公司 | 一种环保中性电镀锡电解液 |
| JP2022059731A (ja) * | 2020-10-02 | 2022-04-14 | メルテックス株式会社 | バレルめっき用スズめっき液 |
| CN113930812B (zh) * | 2021-11-15 | 2023-10-31 | 广东羚光新材料股份有限公司 | 片式电子元器件镀锡液和锡电镀方法 |
| CN114351232A (zh) * | 2022-01-14 | 2022-04-15 | 张家港扬子江冷轧板有限公司 | 一种电镀锡预电镀漂洗水循环系统及循环方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5282954A (en) * | 1991-12-30 | 1994-02-01 | Atotech Usa, Inc. | Alkoxylated diamine surfactants in high-speed tin plating |
| JP4249292B2 (ja) * | 1998-07-10 | 2009-04-02 | 株式会社大和化成研究所 | 錫及び錫合金メッキ浴 |
| JP3910028B2 (ja) * | 2001-09-13 | 2007-04-25 | 株式会社村田製作所 | チップ型セラミックス電子部品の電極形成法 |
| JP3858241B2 (ja) | 2002-04-09 | 2006-12-13 | 石原薬品株式会社 | 中性スズメッキ浴を用いたバレルメッキ方法 |
| JP4441726B2 (ja) * | 2003-01-24 | 2010-03-31 | 石原薬品株式会社 | スズ又はスズ合金の脂肪族スルホン酸メッキ浴の製造方法 |
| JP2005060822A (ja) * | 2003-08-08 | 2005-03-10 | Rohm & Haas Electronic Materials Llc | 複合基体の電気メッキ |
| JP4812365B2 (ja) * | 2005-08-19 | 2011-11-09 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 錫電気めっき液および錫電気めっき方法 |
| JP5337352B2 (ja) * | 2007-04-24 | 2013-11-06 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 錫または錫合金電気めっき液 |
| JP5583894B2 (ja) | 2008-06-12 | 2014-09-03 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 電気錫めっき液および電気錫めっき方法 |
| JP5622360B2 (ja) * | 2009-01-16 | 2014-11-12 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 電気錫めっき液および電気錫めっき方法 |
| US20150122661A1 (en) * | 2013-11-05 | 2015-05-07 | Rohm And Haas Electronic Materials Llc | Plating bath and method |
-
2016
- 2016-11-11 JP JP2016220435A patent/JP6818520B2/ja active Active
-
2017
- 2017-10-11 US US15/730,244 patent/US20180135195A1/en not_active Abandoned
- 2017-10-27 TW TW106137168A patent/TWI659130B/zh active
- 2017-11-01 CN CN201711057609.2A patent/CN108070885B/zh active Active
- 2017-11-02 KR KR1020170145250A patent/KR102097996B1/ko active IP Right Grant
- 2017-11-08 EP EP17200630.6A patent/EP3321396B1/de active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN108070885A (zh) | 2018-05-25 |
| JP2018076570A (ja) | 2018-05-17 |
| EP3321396A1 (de) | 2018-05-16 |
| CN108070885B (zh) | 2020-09-15 |
| EP3321396B1 (de) | 2021-07-07 |
| TWI659130B (zh) | 2019-05-11 |
| KR20180053229A (ko) | 2018-05-21 |
| TW201817921A (zh) | 2018-05-16 |
| KR102097996B1 (ko) | 2020-04-07 |
| US20180135195A1 (en) | 2018-05-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6818520B2 (ja) | 中性スズめっき液を用いたバレルめっきまたは高速回転めっき方法 | |
| KR101319863B1 (ko) | 주석 전기도금액 및 주석 전기도금 방법 | |
| JP6175245B2 (ja) | めっき浴および方法 | |
| EP2141261B1 (de) | Elektrolytische Zinnbeschichtungslösung und elektrolytisches Zinnbeschichtungsverfahren | |
| KR20170045211A (ko) | 팔라듐 도금액 및 그것을 사용하여 얻어진 팔라듐 피막 | |
| JP5731802B2 (ja) | 金めっき液 | |
| TWI400366B (zh) | 電解錫電鍍溶液及電解錫電鍍方法 | |
| JP2010070838A (ja) | 金属表面処理水溶液および金属表面のウィスカ抑制方法 | |
| JPWO2005085498A1 (ja) | 金属の表面処理剤 | |
| KR101194541B1 (ko) | 주석 또는 주석 합금 도금의 변색 방지제, 및 이를 이용한 회로 기판 및 그 제조방법 | |
| JP2003328182A (ja) | ラックレスめっき用スズ−銀合金めっき浴 | |
| JP6621169B2 (ja) | めっき品の製造方法 | |
| JP4728462B2 (ja) | 錫電気めっき液及びめっき方法 | |
| JP2020020041A (ja) | 錫めっき液及び錫合金めっき液 | |
| US20170327702A1 (en) | Water-based organic solderability preservative, and electronic board and surface treatment method using the same | |
| JP6715246B2 (ja) | 電解硬質金めっき液用置換防止剤及びそれを含む電解硬質金めっき液 | |
| KR101860468B1 (ko) | 무전해 도금용 이온성 액체 전해질 조성물 | |
| JP2006118001A (ja) | Ｓｎ−Ａｇ−Ｃｕ三元合金薄膜を形成する方法 | |
| JP2006213996A (ja) | Ｓｎ−Ａｇ−Ｃｕ三元合金薄膜を形成する方法 | |
| JPS59193296A (ja) | 塩酸酸性電気はんだめつき浴 | |
| JPH01290775A (ja) | 化学的めつき法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190819 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20200529 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200612 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200709 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20201204 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20201228 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6818520 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |