JP6817895B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP6817895B2 JP6817895B2 JP2017102560A JP2017102560A JP6817895B2 JP 6817895 B2 JP6817895 B2 JP 6817895B2 JP 2017102560 A JP2017102560 A JP 2017102560A JP 2017102560 A JP2017102560 A JP 2017102560A JP 6817895 B2 JP6817895 B2 JP 6817895B2
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- insulating film
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- 239000004065 semiconductor Substances 0.000 title claims description 231
- 239000010408 film Substances 0.000 claims description 189
- 239000013039 cover film Substances 0.000 claims description 37
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 14
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 9
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 9
- 239000011800 void material Substances 0.000 claims description 5
- 238000009413 insulation Methods 0.000 claims 2
- 239000012535 impurity Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 12
- 239000011229 interlayer Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 9
- 239000010410 layer Substances 0.000 description 8
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000005380 borophosphosilicate glass Substances 0.000 description 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000000137 annealing Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
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- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
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Description
なお、図面は模式的または概念的なものであり、各部分の厚みと幅との関係、部分間の大きさの比率などは、必ずしも現実のものと同一とは限らない。また、同じ部分を表す場合であっても、図面により互いの寸法や比率が異なって表される場合もある。
なお、本願明細書と各図において、既出の図に関して前述したものと同様の要素には同一の符号を付して詳細な説明は適宜省略する。
なお、以下で説明する各実施形態について、各半導体領域のp形とn形を反転させて各実施形態を実施しても良い。
図1は、本実施形態に係る半導体装置を示す斜視図である。
図2は、本実施形態に係る半導体装置を示す断面図である。
図3(a)及び図3(b)は、図2の領域A及び領域Bの拡大図である。
図1及び図2は、半導体装置100の斜視図及び断面図をそれぞれ示している。図2は、図1の半導体装置100の一部を拡大して示している。なお、図1において、ソース電極11及び柱状部60の図示が省略されている。
半導体装置100は、例えば、MOSFETである。
ドレイン領域1の導電形は、例えばn+形である。
半導体領域3は、半導体領域2上に複数設けられ、その導電形は、例えばn形である。半導体領域3は、例えば、nピラー領域である。複数の半導体領域3は、半導体領域2上に選択的に位置する。複数の半導体領域3は、X方向に延びており、Y方向に互いに離間して配置されている。
複数のゲート電極8は、X方向に延びており、Y方向で隣り合う半導体領域5の間に位置するようにY方向に互いに離間して配置されている。また、複数のゲート電極8は、Y方向で隣り合う半導体領域6の間に位置するようにY方向に互いに離間して配置されている。つまり、コンタクト領域7及びゲート電極8は、半導体領域6を介してY方向に交互に配置されている。
ゲート電極8は、例えば、n形不純物を含有した多結晶シリコンを含む。
ドレイン電極10は、ドレイン領域1の下面1b上に設けられている。ドレイン電極10は、ドレイン領域1に電気的に接続される。ドレイン電極10は、例えば、金属材料によって形成される。
ゲート電極8上、及び、ゲート絶縁膜20上には、層間絶縁膜21が設けられている。例えば、層間絶縁膜21は、膜21a及び膜21bの2層構造を有する。膜21aは、例えばシリコン酸化物を含む。膜21bは、膜21a上に設けられ、例えばBPSG(Boro-phospho silicate glass)を含む。
トレンチT内であって、空隙部V上にはカバー膜35が設けられている。カバー膜35は、例えばBPSGを含む。カバー膜35は、例えば、トレンチTにおけるキャップ膜として機能する。絶縁部30は、カバー膜35と、半導体領域4の一部及び半導体領域5との間に位置する。
絶縁部30及びカバー膜35は、内部に空隙部Vが形成された柱状部60を構成する。
絶縁膜30aは、例えば、シリコン酸化物(SiO)を含む。絶縁膜30bは、引張応力を有する材料、例えば、シリコン窒化物(SiN)を含む。絶縁膜30cは、例えば、シリコン酸化物(SiO)を含む。
絶縁膜30a、絶縁膜30b及び絶縁膜30cの形状は、例えば、底を有する筒状である。また、半導体領域4の形状は、例えば、底を有する筒状である。
絶縁膜30aと絶縁膜30cの合計膜厚は、絶縁膜30bの膜厚の0.5倍以上であって4倍以下である。絶縁膜30aと絶縁膜30cの合計膜厚は、絶縁膜30bの膜厚の1倍以上(または同等以上)であって4倍以下であれば、さらに望ましい。絶縁膜30aと絶縁膜30cが、例えばシリコン酸化物(SiO)を含み、絶縁膜30bが、例えばシリコン窒化物(SiN)を含む場合、絶縁膜30aと絶縁膜30cの合計膜厚は、絶縁膜30bの膜厚の1.8倍程度であることが望ましい。
ソース電極11上には、層間絶縁膜22が設けられている。層間絶縁膜22は、例えば、シリコン酸化物を含む。
図4〜図9は、半導体装置100の製造方法を示す断面図である。
なお、図4〜図9に示された領域は、図2に示された領域の一部に相当する。なお、図4〜図9においては、柱状部60より上の部分、及び、半導体領域2より下の部分は示されていない。
まず、図4に示すように、第1導電形の半導体基板40上に、第1導電形の半導体層41をエピタキシャル成長させる。
n形半導体領域とp形半導体領域とがトレンチを介して交互に設けられたスーパージャンクション構造を有するMOSFETでは、セルのピッチの微細化に伴って高アスペクト比のトレンチが形成され易い。トレンチの内面上及び上部上には、p形半導体領域及びカバー膜がそれぞれ形成され、トレンチの一部(p形半導体領域及びカバー膜で囲まれた部分)には空隙部が形成される場合がある。
本実施形態によれば、信頼性が向上した半導体装置及びその製造方法を提供することができる。
図10は、本実施形態に係る半導体装置を示す斜視図である。
図10は、半導体装置200を示す斜視図である。図10に示された領域は、図1に示された領域に相当する。なお、図10において、ソース電極11及び柱状部60の図示が省略されている。
本実施形態において、半導体領域3及び半導体領域4より上の構成が第1実施形態と異なる。よって、これ以外の構成の詳細な説明は省略する。
半導体領域6は、半導体領域5上に複数設けられている。複数の半導体領域6は、X−Y平面を島状に配置されている。
半導体領域5、半導体領域6及びコンタクト領域7をそれぞれ有する複数の領域50は、X−Y平面を島状に配置されている。
ゲートコンタクト9は、ゲート電極8上に設けられている。
本実施形態の効果は、前述の第1実施形態と同じである。
図11は、本実施形態に係る半導体装置を示す断面図である。
図12は、図11の領域Cの拡大図である。
図11に示すように、半導体装置300には、ドレイン領域1と、半導体領域2と、半導体領域3と、半導体領域4と、半導体領域5と、半導体領域6と、ゲート電極8と、ドレイン電極10と、ソース電極11と、ゲート絶縁膜20と、層間絶縁膜21と、絶縁部30と、カバー膜35と、が設けられている。層間絶縁膜21は、膜21a及び膜21bを有する。
半導体領域3は、半導体領域2上に複数設けられている。複数の半導体領域3は、X方向に延びており、Y方向に互いに離間して配置されている。
半導体領域4は、半導体領域2上に複数設けられている。複数の半導体領域4は、X方向に延びており、Y方向で隣り合う半導体領域3の間に位置するようにY方向に互いに離間して配置されている。
半導体領域6は、半導体領域5上に複数設けられている。複数の半導体領域6は、Y方向に互いに離間して配置されている。
ドレイン電極10は、ドレイン領域1の下面1b上に設けられている。
ソース電極11は、半導体領域5の一部上と、半導体領域6の一部上と、層間絶縁膜21上と、絶縁部30上と、カバー膜35上とに設けられている。
絶縁膜30aは、半導体領域51の側面上、及び、半導体領域52の側面上に位置する。また、絶縁膜30aは、トレンチT1の底面上であって半導体領域2上に位置する。
絶縁膜30bは、絶縁膜30aの側面上及び底面上に位置する。
絶縁膜30cは、絶縁膜30bの側面上及び底面上に位置する。
つまり、絶縁部30は、カバー膜35の側面と、空隙部Vの側面及び底面とを覆っており、絶縁膜30c、30b、30aがこれらの側面及び底面から離れる方向にこの順で位置する。絶縁膜30a、絶縁膜30b及び絶縁膜30cの形状は、例えば、底を有する筒状である。
本実施形態の効果は、前述の第1実施形態と同じである。
Claims (4)
- 第1方向に延びる第1導電形の第1半導体領域と、
前記第1方向に延び、前記第1方向に交差する第2方向に前記第1半導体領域と配置され、空隙を囲む第2導電形の第2半導体領域と、
前記空隙と、前記第2半導体領域との間に設けられ、シリコン酸化物を含む第1絶縁膜と、シリコン窒化物を含む第2絶縁膜と、シリコン酸化物を含む第3絶縁膜とを有する絶縁部と、
を備え、
前記第1絶縁膜、前記第2絶縁膜及び前記第3絶縁膜は、前記第2半導体領域から前記空隙に向かって順に位置し、
前記第1絶縁膜と前記第3絶縁膜の厚さの合計は、前記第2絶縁膜の厚さの0.5倍以上であって4倍以下である半導体装置。 - 前記第1絶縁膜は、前記第2半導体領域の側面上及び底面上に位置し、
前記第2絶縁膜は、前記第1絶縁膜の側面上及び底面上に位置し、
前記第3絶縁膜は、前記第2絶縁膜の側面上及び底面上に位置する請求項1記載の半導体装置。 - 前記第1半導体領域及び前記第2半導体領域上に設けられた第2導電形の第3半導体領域と、
前記空隙上に設けられ、前記第3半導体領域との間で前記絶縁部が位置するカバー膜と、
をさらに備えた請求項1または2に記載の半導体装置。 - 第1方向に延びる第1導電形の第1半導体領域と、
前記第1方向に延び、前記第1方向に交差する第2方向に空隙を介して前記第1半導体領域と配置される第2導電形の第2半導体領域と、
前記空隙と、前記第1半導体領域及び前記第2半導体領域との間に設けられ、シリコン酸化物を含む第1絶縁膜と、シリコン窒化物を含む第2絶縁膜と、シリコン酸化物を含む第3絶縁膜とを有する絶縁部と、
を備えた半導体装置。
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