JP6811053B2 - 赤外線吸収ガラス板及びその製造方法、並びに固体撮像素子デバイス - Google Patents

赤外線吸収ガラス板及びその製造方法、並びに固体撮像素子デバイス Download PDF

Info

Publication number
JP6811053B2
JP6811053B2 JP2016153687A JP2016153687A JP6811053B2 JP 6811053 B2 JP6811053 B2 JP 6811053B2 JP 2016153687 A JP2016153687 A JP 2016153687A JP 2016153687 A JP2016153687 A JP 2016153687A JP 6811053 B2 JP6811053 B2 JP 6811053B2
Authority
JP
Japan
Prior art keywords
infrared absorbing
absorbing glass
glass plate
base material
plate according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016153687A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017190282A (ja
Inventor
宏亮 中堀
宏亮 中堀
武志 乾
武志 乾
辰夫 笹井
辰夫 笹井
敦史 東郷
敦史 東郷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Electric Glass Co Ltd
New Manpower Service Co Ltd
Original Assignee
Nippon Electric Glass Co Ltd
New Manpower Service Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Glass Co Ltd, New Manpower Service Co Ltd filed Critical Nippon Electric Glass Co Ltd
Priority to PCT/JP2017/005266 priority Critical patent/WO2017179283A1/ja
Priority to CN201780004742.3A priority patent/CN108367966B/zh
Priority to KR1020187014209A priority patent/KR102657651B1/ko
Priority to TW106105878A priority patent/TWI753884B/zh
Publication of JP2017190282A publication Critical patent/JP2017190282A/ja
Application granted granted Critical
Publication of JP6811053B2 publication Critical patent/JP6811053B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/08—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/12—Silica-free oxide glass compositions
    • C03C3/16—Silica-free oxide glass compositions containing phosphorus
    • C03C3/17—Silica-free oxide glass compositions containing phosphorus containing aluminium or beryllium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
JP2016153687A 2016-04-11 2016-08-04 赤外線吸収ガラス板及びその製造方法、並びに固体撮像素子デバイス Active JP6811053B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
PCT/JP2017/005266 WO2017179283A1 (ja) 2016-04-11 2017-02-14 赤外線吸収ガラス板及びその製造方法、並びに固体撮像素子デバイス
CN201780004742.3A CN108367966B (zh) 2016-04-11 2017-02-14 红外线吸收玻璃板及其制造方法、以及固体摄像元件设备
KR1020187014209A KR102657651B1 (ko) 2016-04-11 2017-02-14 적외선 흡수 유리판 및 그 제조 방법, 그리고 고체 촬상 소자 디바이스
TW106105878A TWI753884B (zh) 2016-04-11 2017-02-22 紅外線吸收玻璃板及其製造方法、以及固體攝像元件裝置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016078768 2016-04-11
JP2016078768 2016-04-11

Publications (2)

Publication Number Publication Date
JP2017190282A JP2017190282A (ja) 2017-10-19
JP6811053B2 true JP6811053B2 (ja) 2021-01-13

Family

ID=60084453

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016153687A Active JP6811053B2 (ja) 2016-04-11 2016-08-04 赤外線吸収ガラス板及びその製造方法、並びに固体撮像素子デバイス

Country Status (3)

Country Link
JP (1) JP6811053B2 (zh)
KR (1) KR102657651B1 (zh)
CN (1) CN108367966B (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019055889A (ja) * 2017-09-20 2019-04-11 日本電気硝子株式会社 赤外線吸収ガラス板及びその製造方法、並びに固体撮像素子デバイス
WO2020059431A1 (ja) * 2018-09-20 2020-03-26 日本電気硝子株式会社 赤外線吸収ガラスの製造方法
JP7445189B2 (ja) 2019-03-22 2024-03-07 日本電気硝子株式会社 ガラス板及びその製造方法
WO2020195438A1 (ja) * 2019-03-22 2020-10-01 日本電気硝子株式会社 ガラス板及びその製造方法
CN113511813B (zh) * 2021-06-28 2022-03-04 成都光明光电有限责任公司 一种用于激光玻璃的包边玻璃及其制备方法和应用

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5126111B2 (zh) * 1971-10-29 1976-08-04
JPS6049142B2 (ja) * 1978-04-17 1985-10-31 株式会社保谷硝子 カラ−・テレビジョン・カメラ用近赤外吸収フイルタ−
JPH0578148A (ja) * 1991-02-28 1993-03-30 Asahi Glass Co Ltd 近赤外カツトフイルターガラス
JP4034056B2 (ja) * 2000-09-13 2008-01-16 日本板硝子株式会社 非晶質材料の加工方法
JP2006248850A (ja) * 2005-03-11 2006-09-21 Sumita Optical Glass Inc 近赤外吸収フィルタ用ガラス
JP2007317719A (ja) * 2006-05-23 2007-12-06 Fujitsu Ltd 撮像装置及びその製造方法
JP5439903B2 (ja) * 2008-03-31 2014-03-12 旭硝子株式会社 板状光学ガラス及び板状光学ガラスの端面処理方法
JP5126111B2 (ja) * 2009-02-24 2013-01-23 旭硝子株式会社 近赤外線カットフィルタガラスおよびその製造方法
JP5609090B2 (ja) * 2009-12-08 2014-10-22 旭硝子株式会社 近赤外線カットフィルタガラス
JP5445197B2 (ja) * 2010-02-12 2014-03-19 旭硝子株式会社 近赤外線カットフィルタガラスおよび近赤外線カットフィルタガラスの製造方法
JP5659499B2 (ja) * 2010-02-19 2015-01-28 旭硝子株式会社 近赤外線カットフィルタガラス
JPWO2011132786A1 (ja) * 2010-04-23 2013-07-18 旭硝子株式会社 紫外線透過型近赤外線カットフィルタガラス
US20120052302A1 (en) * 2010-08-24 2012-03-01 Matusick Joseph M Method of strengthening edge of glass article
JP2012083659A (ja) * 2010-10-14 2012-04-26 Nsc:Kk 電子装置用ガラス基板の製造方法
DE102012103077B4 (de) * 2012-04-10 2017-06-22 Schott Ag Infrarot-absorbierender Glas-Wafer und Verfahren zu dessen Herstellung
DE102012210552B4 (de) * 2012-06-22 2014-06-05 Schott Ag Farbgläser, Verfahren zu ihrer Herstellung und Verwendung
JP6210270B2 (ja) * 2013-05-14 2017-10-11 株式会社ニコン ガラス基板の表面処理方法およびフォトマスクの再生方法
JP6256857B2 (ja) * 2013-11-05 2018-01-10 日本電気硝子株式会社 近赤外線吸収ガラス
JP6551404B2 (ja) * 2014-05-29 2019-07-31 Ａｇｃ株式会社 光学ガラスおよびガラス基板の切断方法

Also Published As

Publication number Publication date
KR102657651B1 (ko) 2024-04-15
CN108367966A (zh) 2018-08-03
JP2017190282A (ja) 2017-10-19
KR20180132597A (ko) 2018-12-12
CN108367966B (zh) 2021-07-27

Similar Documents

Publication Publication Date Title
JP6811053B2 (ja) 赤外線吸収ガラス板及びその製造方法、並びに固体撮像素子デバイス
CN107207324A (zh) 光选择透射型玻璃和层叠基板
TWI753884B (zh) 紅外線吸收玻璃板及其製造方法、以及固體攝像元件裝置
WO2019058858A1 (ja) 赤外線吸収ガラス板及びその製造方法、並びに固体撮像素子デバイス
KR102144324B1 (ko) 유리 기판의 절단 방법, 유리 기판, 근적외선 커트 필터 유리, 유리 기판의 제조 방법
JP5407490B2 (ja) 固体撮像素子パッケージ用窓ガラス
JP2013216568A (ja) 赤外吸収ガラスウェハ及びそれを作製する方法
JP7054066B2 (ja) 光学膜付きガラス板及びその製造方法
KR102555595B1 (ko) 유리판 및 그 제조 방법
JP2011037694A (ja) 光学用カバーガラスの製造方法及び光学用カバーガラス
JP4447393B2 (ja) 光学多層膜付きガラス部材、及び該ガラス部材を用いた光学素子
JP7445189B2 (ja) ガラス板及びその製造方法
JP5994686B2 (ja) 光学ガラス
JP6406263B2 (ja) 光学ガラス
WO2020195438A1 (ja) ガラス板及びその製造方法
WO2020179516A1 (ja) 近赤外線吸収ガラス板

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20190212

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20200121

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200312

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20200901

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20201007

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20201208

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20201214

R150 Certificate of patent or registration of utility model

Ref document number: 6811053

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150