JP6808067B2 - 電力用半導体装置および電力用半導体装置の製造方法 - Google Patents
電力用半導体装置および電力用半導体装置の製造方法 Download PDFInfo
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- JP6808067B2 JP6808067B2 JP2019551239A JP2019551239A JP6808067B2 JP 6808067 B2 JP6808067 B2 JP 6808067B2 JP 2019551239 A JP2019551239 A JP 2019551239A JP 2019551239 A JP2019551239 A JP 2019551239A JP 6808067 B2 JP6808067 B2 JP 6808067B2
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- H01L2924/1304—Transistor
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- H01L2924/13055—Insulated gate bipolar transistor [IGBT]
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Description
特許文献1の図1に記載の接合構造は、接合部材の表面粗さを増やすことで、接合時に印加する加圧力が、両サイドに比べて中央部分が高くなり、不均一になる。このため、加圧力が弱い部分の接合部寿命が低下する。特許文献1の図3にも示されているように、粗さを増やすことでクラック面積率の増加が速くなっている。
本発明に係る電力用半導体装置の製造方法は、基板の第1面上に焼結性金属接合材を用いて接合された半導体素子を有する電力用半導体装置の製造方法であって、平面視において、基板の第1面上における半導体素子のガードリングよりも内側の領域である発熱部の直下よりも外側に、レーザー加工により0.5μm〜10μmの表面粗さのディンプルを複数個形成する第1工程と、第1面上の半導体素子の発熱部の直下領域の表面にある酸化被膜をレーザーにより除去し、新生面を露出させる第2工程と、ディンプルと新生面を形成した後の基板の上に、焼結性金属接合材を供給する第3工程と、焼結性金属接合材の上に半導体素子を供給する第4工程と、焼結性金属接合材の上の半導体素子に加熱と加圧を加えることで、第1面上に半導体素子を焼結性金属接合により接合させる第5工程とを有するものである。
図1は、本発明の実施の形態1におけるパワーモジュールを一部抜粋した模式図である。また、図2は、図1におけるA−A’断面図である。パワーモジュール5は、基板1上に焼結性金属接合材料2を用いて半導体素子3が接合されている。また、基板1の表面は、アンカー効果を発揮するディンプル4を有している。
金属微粒子にAu、AgまたはCuを用いた焼結における各種条件の一例を、次に示す。
<乾燥条件>
温度:80℃〜200℃
時間:1min〜60min
<仮固定条件>
温度:25℃〜200℃
加圧:0.01MPa〜5MPa
時間:0min〜1min
<接合条件>
温度:250℃〜350℃
加圧:0.1MPa〜50MPa
接合時間:1min〜60min
<ステップ1>形状作成工程
基板1の表面に、レーザーを用いて、アンカー効果を発揮するディンプル4を形成する。
焼結性金属接合材料2を、基板1に、30μm〜200μmの厚さで印刷する。
<ステップ3>乾燥工程
上述した条件に従って、焼結性金属接合材料2を乾燥させる。
上述した条件に従って、焼結性金属接合材料2上に半導体素子3をマウントし、仮固定する。
<ステップ5>本接合工程
上述した条件に従って、焼結性金属接合材料2を用いて基板1と半導体素子3を接合する。なお、本実施の形態では、焼結性金属材料2を印刷により供給したが、他の供給方法でもよい。
パワーモジュール5に用いる基板1において、接合する最表面の材料としては、Ag、Auなどの貴金属でも問題はない。ただし、本実施の形態2では、最表面の材料としてCuを選定する場合について説明する。
図14は、本発明の実施の形態3におけるパワーモジュールを一部抜粋した模式図である。パワーモジュール5は、基板1上に焼結性金属接合材料2を用いて半導体素子3が接合されている。また、基板1の表面は、領域によって表面粗度が異なっており、基板1上の半導体素子3の発熱部直下領域6は、表面粗度が小さく、その周囲のディンプル4により、表面粗度が大きい構造となっている。
<ステップ1>形状作成工程
基板1における半導体素子3の発熱部直下領域6と、その周囲のディンプル4の領域とで、異なる表面粗度を同時に形成する。
焼結性金属接合材料2を、基板1に、30μm〜200μmの厚さで印刷する。
<ステップ3>乾燥工程
上述した条件に従って、焼結性金属接合材料2を乾燥させる。
上述した条件に従って、焼結性金属接合材料2上に半導体素子3をマウントし、仮固定する。
<ステップ5>本接合工程
上述した条件に従って、焼結性金属接合材料2を用いて基板1と半導体素子3を接合する。
Claims (10)
- 基板と、
前記基板の第1面上に焼結性金属接合材を用いて接合された半導体素子と、
を備え、
前記基板は、前記第1面上において、平面視で、前記半導体素子のガードリングよりも内側の領域である発熱部の直下の第1領域と、前記第1面上において、前記半導体素子の直下であって前記第1領域より外側の領域および前記半導体素子の端部よりも外側の領域からなる第2領域を有し、前記第2領域はレーザー加工によりディンプルが形成され、前記第1領域は前記第2領域よりも表面粗さが小さくなるように前記レーザー加工により粗面化された電力用半導体装置。 - 前記ディンプルは、前記第1面において、前記基板と前記半導体素子との接合領域よりも外側まで形成されている
請求項1に記載の電力用半導体装置。 - 前記ディンプルは、前記半導体素子の外形に平行なライン状に配列されて形成されている
請求項1または2に記載の電力用半導体装置。 - 前記半導体素子は、材質としてシリコンが用いられている
請求項1から3のいずれか1項に記載の電力用半導体装置。 - 前記基板の前記第1領域は、粗さが0.5μm以下の面である請求項1から4のいずれか1項に記載の電力用半導体装置。
- 基板の第1面上に焼結性金属接合材を用いて接合された半導体素子を有する電力用半導体装置の製造方法であって、
前記基板の前記第1面上において、平面視で、前記半導体素子のガードリングよりも内側の領域である発熱部の直下を第1領域とし、前記半導体素子の直下であって前記第1領域より外側の領域および前記半導体素子の端部よりも外側の領域を第2領域としたとき、レーザー加工により、前記第1領域の表面粗さを前記第2領域の表面粗さよりも小さくなるように粗面化するとともに、前記レーザー加工により、前記第2領域を0.5μm〜10μmの表面粗さのディンプルを複数個形成する第1工程と、
前記ディンプルを形成した後の前記基板の上に、焼結性金属接合材を供給する第2工程と、
前記焼結性金属接合材の上に前記半導体素子を供給する第3工程と、
前記焼結性金属接合材の上の前記半導体素子に加熱と加圧を加えることで、前記第1面上に前記半導体素子を焼結性金属接合により接合させる第4工程と、
を有する電力用半導体装置の製造方法。 - 前記第1工程の後、前記第2工程を実行するまでの時間は、10000秒以内である
請求項6に記載の電力用半導体装置の製造方法。 - 基板の第1面上に焼結性金属接合材を用いて接合された半導体素子を有する電力用半導体装置の製造方法であって、
平面視において、前記基板の前記第1面上における前記半導体素子のガードリングよりも内側の領域である発熱部の直下よりも外側に、レーザー加工により0.5μm〜10μmの表面粗さのディンプルを複数個形成する第1工程と、
前記第1面上の前記半導体素子の発熱部の直下領域の表面にある酸化被膜をレーザーにより除去し、新生面を露出させる第2工程と、
前記ディンプルと前記新生面を形成した後の前記基板の上に、焼結性金属接合材を供給する第3工程と、
前記焼結性金属接合材の上に前記半導体素子を供給する第4工程と、
前記焼結性金属接合材の上の前記半導体素子に加熱と加圧を加えることで、前記第1面上に前記半導体素子を焼結性金属接合により接合させる第5工程と、
を有する電力用半導体装置の製造方法。 - 前記第1工程と前記第2工程とは、同一工程により実行される
請求項8に記載の電力用半導体装置の製造方法。 - 前記第1工程が完了した後、または前記第2工程が完了した後から、前記焼結性金属接合材を供給するまでの時間は、10000秒以内である
請求項8または9に記載の電力用半導体装置の製造方法。
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DE112019008007T5 (de) * | 2019-12-26 | 2022-10-27 | Mitsubishi Electric Corporation | Leistungsmodul und leistungswandlereinheit |
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US11776871B2 (en) * | 2020-12-15 | 2023-10-03 | Semiconductor Components Industries, Llc | Module with substrate recess for conductive-bonding component |
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JP7424347B2 (ja) * | 2021-05-27 | 2024-01-30 | 株式会社デンソー | 半導体装置 |
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Family Cites Families (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5271887A (en) * | 1980-08-04 | 1993-12-21 | Witec Cayman Patents, Ltd. | Method of fabricating complex micro-circuit boards, substrates and microcircuits and the substrates and microcircuits |
JP3417013B2 (ja) * | 1993-10-18 | 2003-06-16 | 株式会社デンソー | 絶縁ゲート型バイポーラトランジスタ |
DE4315272A1 (de) * | 1993-05-07 | 1994-11-10 | Siemens Ag | Leistungshalbleiterbauelement mit Pufferschicht |
US5602720A (en) * | 1993-06-25 | 1997-02-11 | Sumitomo Electric Industries, Ltd. | Mounting structure for semiconductor device having low thermal resistance |
JP3124224B2 (ja) | 1996-04-01 | 2001-01-15 | 富士通株式会社 | はんだバンプ形成方法 |
US6670222B1 (en) * | 1997-06-14 | 2003-12-30 | Jds Uniphase Corporation | Texturing of a die pad surface for enhancing bonding strength in the surface attachment |
US6608375B2 (en) * | 2001-04-06 | 2003-08-19 | Oki Electric Industry Co., Ltd. | Semiconductor apparatus with decoupling capacitor |
JP2003163315A (ja) * | 2001-11-29 | 2003-06-06 | Denki Kagaku Kogyo Kk | モジュール |
WO2008078746A1 (ja) * | 2006-12-26 | 2008-07-03 | Panasonic Corporation | 半導体素子の実装構造体及び半導体素子の実装方法 |
JP2008294280A (ja) * | 2007-05-25 | 2008-12-04 | Showa Denko Kk | 半導体装置 |
JP5115318B2 (ja) * | 2007-09-14 | 2013-01-09 | 日産自動車株式会社 | 半導体装置 |
JP5473407B2 (ja) * | 2008-06-27 | 2014-04-16 | 京セラ株式会社 | セラミック基板、放熱基板および電子装置 |
DE102010044709B4 (de) * | 2010-09-08 | 2015-07-02 | Vincotech Holdings S.à.r.l. | Leistungshalbleitermodul mit Metallsinterverbindungen sowie Herstellungsverfahren |
JP2011155286A (ja) * | 2011-03-22 | 2011-08-11 | Rohm Co Ltd | 半導体装置 |
US8466548B2 (en) * | 2011-05-31 | 2013-06-18 | Infineon Technologies Ag | Semiconductor device including excess solder |
US8569109B2 (en) * | 2011-06-30 | 2013-10-29 | Infineon Technologies Ag | Method for attaching a metal surface to a carrier, a method for attaching a chip to a chip carrier, a chip-packaging module and a packaging module |
JP2013165117A (ja) | 2012-02-09 | 2013-08-22 | Fuji Electric Co Ltd | 半導体装置 |
JP6045356B2 (ja) | 2013-01-16 | 2016-12-14 | 三菱電機株式会社 | 半導体装置の製造方法 |
JP6214273B2 (ja) | 2013-08-08 | 2017-10-18 | 三菱電機株式会社 | 金属ナノ粒子を用いた接合構造および金属ナノ粒子を用いた接合方法 |
EP3176817B1 (en) * | 2014-07-30 | 2020-08-12 | KYOCERA Corporation | Package for housing an electronic component and electronic device comprising such a package |
WO2016072517A1 (ja) * | 2014-11-07 | 2016-05-12 | 新日鐵住金株式会社 | 電子部品の導電性接合体及びこれを用いた半導体装置、並びに導電性接合体の製造方法 |
HUE055979T2 (hu) * | 2015-05-27 | 2022-01-28 | Ngk Electronics Devices Inc | Szubsztrát teljesítménymodulokhoz, szubsztrátegység teljesítménymodulokhoz, valamint eljárás szubsztrát gyártására teljesítménymodulokhoz |
JP6430007B2 (ja) * | 2015-07-01 | 2018-11-28 | 三菱電機株式会社 | 半導体装置および半導体装置の製造方法 |
JP2017092168A (ja) | 2015-11-06 | 2017-05-25 | 株式会社日立製作所 | 半導体モジュール及び電力変換装置 |
US10418295B2 (en) * | 2016-01-28 | 2019-09-17 | Mitsubishi Electric Corporation | Power module |
US20190164869A1 (en) * | 2016-08-03 | 2019-05-30 | Soliduv, Inc. | Strain-Tolerant Die Attach with Improved Thermal Conductivity, and Method of Fabrication |
DE102016118784A1 (de) * | 2016-10-04 | 2018-04-05 | Infineon Technologies Ag | Chipträger, konfiguriert zur delaminierungsfreien Kapselung und stabilen Sinterung |
JP6726821B2 (ja) * | 2017-01-10 | 2020-07-22 | 株式会社デンソー | 半導体装置の製造方法 |
JP6366766B2 (ja) | 2017-03-24 | 2018-08-01 | 三菱電機株式会社 | 半導体装置 |
WO2018220819A1 (ja) * | 2017-06-02 | 2018-12-06 | 三菱電機株式会社 | 半導体素子接合用基板、半導体装置および電力変換装置 |
DE102017119344A1 (de) * | 2017-08-24 | 2019-02-28 | Osram Opto Semiconductors Gmbh | Träger und Bauteil mit Pufferschicht sowie Verfahren zur Herstellung eines Bauteils |
TWI746883B (zh) * | 2017-09-29 | 2021-11-21 | 韓商Jmj韓國有限公司 | 形成有陰刻圖案的半導體封裝用夾具、引線框架、基板及包括其的半導體封裝體 |
DE112018005713T5 (de) | 2017-10-30 | 2020-07-16 | Mitsubishi Electric Corporation | Leistungshalbleitereinheit und herstellungsverfahren für eine leistungshalbleitereinheit |
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