JP6692006B2 - 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 - Google Patents
研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 Download PDFInfo
- Publication number
- JP6692006B2 JP6692006B2 JP2019550479A JP2019550479A JP6692006B2 JP 6692006 B2 JP6692006 B2 JP 6692006B2 JP 2019550479 A JP2019550479 A JP 2019550479A JP 2019550479 A JP2019550479 A JP 2019550479A JP 6692006 B2 JP6692006 B2 JP 6692006B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- glass substrate
- particle size
- magnetic disk
- polishing liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005498 polishing Methods 0.000 title claims description 230
- 239000011521 glass Substances 0.000 title claims description 186
- 239000000758 substrate Substances 0.000 title claims description 153
- 239000007788 liquid Substances 0.000 title claims description 81
- 238000004519 manufacturing process Methods 0.000 title claims description 32
- 239000002245 particle Substances 0.000 claims description 165
- 238000009826 distribution Methods 0.000 claims description 69
- 239000006061 abrasive grain Substances 0.000 claims description 55
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 53
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 53
- 238000007517 polishing process Methods 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 21
- 230000008569 process Effects 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 230000001186 cumulative effect Effects 0.000 claims description 7
- 239000010419 fine particle Substances 0.000 claims description 7
- 238000007561 laser diffraction method Methods 0.000 claims description 6
- 238000000790 scattering method Methods 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 description 21
- 230000008859 change Effects 0.000 description 18
- 230000007547 defect Effects 0.000 description 14
- 230000007423 decrease Effects 0.000 description 9
- 238000003426 chemical strengthening reaction Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000000465 moulding Methods 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000003082 abrasive agent Substances 0.000 description 3
- 239000002612 dispersion medium Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000005354 aluminosilicate glass Substances 0.000 description 2
- -1 polybutylene terephthalate Polymers 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229920005830 Polyurethane Foam Polymers 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- UNJPQTDTZAKTFK-UHFFFAOYSA-K cerium(iii) hydroxide Chemical compound [OH-].[OH-].[OH-].[Ce+3] UNJPQTDTZAKTFK-UHFFFAOYSA-K 0.000 description 1
- 239000005345 chemically strengthened glass Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000005340 laminated glass Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000011496 polyurethane foam Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
- B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass
- B24B7/245—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass discontinuous
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/02—Lapping machines or devices; Accessories designed for working surfaces of revolution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
- B24B7/241—Methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73921—Glass or ceramic substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Magnetic Record Carriers (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017210817 | 2017-10-31 | ||
| JP2017210817 | 2017-10-31 | ||
| PCT/JP2018/040610 WO2019088209A1 (ja) | 2017-10-31 | 2018-10-31 | 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020071965A Division JP7201639B2 (ja) | 2017-10-31 | 2020-04-13 | 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP6692006B2 true JP6692006B2 (ja) | 2020-05-13 |
| JPWO2019088209A1 JPWO2019088209A1 (ja) | 2020-06-11 |
Family
ID=66331926
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019550479A Active JP6692006B2 (ja) | 2017-10-31 | 2018-10-31 | 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 |
| JP2020071965A Active JP7201639B2 (ja) | 2017-10-31 | 2020-04-13 | 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 |
| JP2022205494A Active JP7547449B2 (ja) | 2017-10-31 | 2022-12-22 | 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020071965A Active JP7201639B2 (ja) | 2017-10-31 | 2020-04-13 | 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 |
| JP2022205494A Active JP7547449B2 (ja) | 2017-10-31 | 2022-12-22 | 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US11214713B2 (enExample) |
| JP (3) | JP6692006B2 (enExample) |
| CN (2) | CN111094502B (enExample) |
| SG (1) | SG11202001636RA (enExample) |
| WO (1) | WO2019088209A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019088209A1 (ja) * | 2017-10-31 | 2019-05-09 | Hoya株式会社 | 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 |
| CN112266729A (zh) * | 2020-11-17 | 2021-01-26 | 云南光电辅料有限公司 | 一种超低色散玻璃镜片用抛光液及其制备方法 |
| CN114800055A (zh) * | 2022-04-28 | 2022-07-29 | 浙江美迪凯光学半导体有限公司 | 一种方形片的抛光工艺 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1177012C (zh) | 2000-10-02 | 2004-11-24 | 三井金属鉱业株式会社 | 铈基磨料和铈基磨料的制造方法 |
| JP4807905B2 (ja) * | 2001-04-05 | 2011-11-02 | 昭和電工株式会社 | 研磨材スラリー及び研磨微粉 |
| JP4885352B2 (ja) * | 2000-12-12 | 2012-02-29 | 昭和電工株式会社 | 研磨材スラリー及び研磨微粉 |
| JP2002371267A (ja) * | 2001-06-15 | 2002-12-26 | Mitsui Mining & Smelting Co Ltd | セリウム系研摩材粒子の製造方法及びセリウム系研摩材粒子 |
| JP4033440B2 (ja) * | 2001-09-17 | 2008-01-16 | 三井金属鉱業株式会社 | セリウム系研摩材スラリー及びセリウム系研摩材スラリーの製造方法 |
| JP5256832B2 (ja) | 2007-04-17 | 2013-08-07 | 日立化成株式会社 | 研磨剤及びその製造方法 |
| GB2478250B (en) * | 2008-12-22 | 2014-09-03 | Kao Corp | Polishing liquid composition for magnetic-disk substrate |
| CN101486879A (zh) * | 2009-02-20 | 2009-07-22 | 包头迅博新材料有限公司 | 一种稀土精细抛光材料及其制造工艺 |
| JP2011110637A (ja) * | 2009-11-25 | 2011-06-09 | Asahi Glass Co Ltd | 磁気ディスク用ガラス基板の製造方法 |
| CN102079950A (zh) * | 2009-11-27 | 2011-06-01 | 东莞市卓越研磨材料有限公司 | 单分散稀土抛光粉制备方法 |
| CA2788991C (en) * | 2010-02-10 | 2016-06-28 | Saint-Gobain Ceramics & Plastics, Inc. | Ceramic particles and methods for making the same |
| JP5736681B2 (ja) * | 2010-07-15 | 2015-06-17 | 旭硝子株式会社 | 研磨液及び磁気ディスク用ガラス基板の製造方法 |
| WO2012043214A1 (ja) * | 2010-09-30 | 2012-04-05 | コニカミノルタオプト株式会社 | 情報記録媒体用ガラス基板の製造方法および情報記録媒体 |
| US8421536B2 (en) * | 2011-09-21 | 2013-04-16 | Analog Devices, Inc. | Apparatus and methods for electronic amplification |
| JPWO2013069720A1 (ja) * | 2011-11-09 | 2015-04-02 | Ｄｏｗａエコシステム株式会社 | 研磨剤リサイクル方法 |
| WO2013146090A1 (ja) * | 2012-03-30 | 2013-10-03 | Hoya株式会社 | 磁気ディスク用ガラス基板の製造方法 |
| US9564166B2 (en) * | 2012-08-29 | 2017-02-07 | Hoya Corporation | Magnetic-disk glass substrate and magnetic disk |
| SG11201507820WA (en) | 2013-04-09 | 2015-10-29 | Dowa Eco System Co Ltd | Method for manufacturing regenerated cerium oxide-based abrasive particles, and regenerated particles |
| US20160239913A1 (en) | 2013-08-13 | 2016-08-18 | Cfph, Llc | Foreign exchange trading |
| JP6063611B2 (ja) * | 2014-06-30 | 2017-01-18 | Hoya株式会社 | 磁気ディスク用ガラス基板の製造方法 |
| SG11201705419RA (en) | 2015-01-12 | 2017-07-28 | Versum Mat Us Llc | Composite abrasive particles for chemical mechanical planarization composition and method of use thereof |
| CN106479371A (zh) * | 2016-08-15 | 2017-03-08 | 惠州市米特仑科技有限公司 | 一种高精度复合抛光液及其制备方法 |
| WO2019088209A1 (ja) * | 2017-10-31 | 2019-05-09 | Hoya株式会社 | 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 |
-
2018
- 2018-10-31 WO PCT/JP2018/040610 patent/WO2019088209A1/ja not_active Ceased
- 2018-10-31 SG SG11202001636RA patent/SG11202001636RA/en unknown
- 2018-10-31 JP JP2019550479A patent/JP6692006B2/ja active Active
- 2018-10-31 CN CN201880060448.9A patent/CN111094502B/zh active Active
- 2018-10-31 US US16/641,185 patent/US11214713B2/en active Active
- 2018-10-31 CN CN202111254736.8A patent/CN113913156B/zh active Active
-
2020
- 2020-04-13 JP JP2020071965A patent/JP7201639B2/ja active Active
-
2021
- 2021-12-30 US US17/566,200 patent/US11680187B2/en active Active
-
2022
- 2022-12-22 JP JP2022205494A patent/JP7547449B2/ja active Active
-
2023
- 2023-05-22 US US18/321,385 patent/US12252633B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2019088209A1 (ja) | 2019-05-09 |
| US20220119680A1 (en) | 2022-04-21 |
| JPWO2019088209A1 (ja) | 2020-06-11 |
| JP2023052035A (ja) | 2023-04-11 |
| US11214713B2 (en) | 2022-01-04 |
| JP7201639B2 (ja) | 2023-01-10 |
| CN113913156A (zh) | 2022-01-11 |
| US11680187B2 (en) | 2023-06-20 |
| JP2020128539A (ja) | 2020-08-27 |
| CN111094502B (zh) | 2021-11-16 |
| JP7547449B2 (ja) | 2024-09-09 |
| US20230287244A1 (en) | 2023-09-14 |
| CN113913156B (zh) | 2022-06-24 |
| US12252633B2 (en) | 2025-03-18 |
| CN111094502A (zh) | 2020-05-01 |
| US20200208015A1 (en) | 2020-07-02 |
| SG11202001636RA (en) | 2020-03-30 |
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