JP6689565B2 - 硫黄ドープ炭素ハードマスク - Google Patents
硫黄ドープ炭素ハードマスク Download PDFInfo
- Publication number
- JP6689565B2 JP6689565B2 JP2014193209A JP2014193209A JP6689565B2 JP 6689565 B2 JP6689565 B2 JP 6689565B2 JP 2014193209 A JP2014193209 A JP 2014193209A JP 2014193209 A JP2014193209 A JP 2014193209A JP 6689565 B2 JP6689565 B2 JP 6689565B2
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- JP
- Japan
- Prior art keywords
- sulfur
- doped
- carbon
- source
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/24—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using chemical vapour deposition [CVD]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
-
- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
- A47J31/00—Apparatus for making beverages
- A47J31/44—Parts or details or accessories of beverage-making apparatus
- A47J31/60—Cleaning devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D65/00—Wrappers or flexible covers; Packaging materials of special type or form
- B65D65/38—Packaging materials of special type or form
- B65D65/46—Applications of disintegrable, dissolvable or edible materials
- B65D65/466—Bio- or photodegradable packaging materials
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
- C11D17/04—Detergent materials or soaps characterised by their shape or physical properties combined with or containing other objects
- C11D17/041—Compositions releasably affixed on a substrate or incorporated into a dispensing means
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
- C11D17/04—Detergent materials or soaps characterised by their shape or physical properties combined with or containing other objects
- C11D17/041—Compositions releasably affixed on a substrate or incorporated into a dispensing means
- C11D17/046—Insoluble free body dispenser
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/39—Organic or inorganic per-compounds
- C11D3/3942—Inorganic per-compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/10—Salts
- C11D7/12—Carbonates bicarbonates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
-
- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
- A47J2203/00—Devices having filling level indicating means
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/20—Industrial or commercial equipment, e.g. reactors, tubes or engines
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Food Science & Technology (AREA)
- Biodiversity & Conservation Biology (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Vapour Deposition (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Drying Of Semiconductors (AREA)
- Formation Of Insulating Films (AREA)
- Apparatus For Making Beverages (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361884800P | 2013-09-30 | 2013-09-30 | |
| US61/884,800 | 2013-09-30 | ||
| US14/270,001 US9320387B2 (en) | 2013-09-30 | 2014-05-05 | Sulfur doped carbon hard masks |
| US14/270,001 | 2014-05-05 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015070270A JP2015070270A (ja) | 2015-04-13 |
| JP2015070270A5 JP2015070270A5 (https=) | 2015-05-21 |
| JP6689565B2 true JP6689565B2 (ja) | 2020-04-28 |
Family
ID=52738893
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014193209A Active JP6689565B2 (ja) | 2013-09-30 | 2014-09-24 | 硫黄ドープ炭素ハードマスク |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US9320387B2 (https=) |
| JP (1) | JP6689565B2 (https=) |
| KR (2) | KR102375870B1 (https=) |
| CN (1) | CN104517815B (https=) |
| TW (1) | TWI644361B (https=) |
Families Citing this family (36)
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| US12396588B2 (en) | 2007-07-13 | 2025-08-26 | Adrian Rivera Maynez Enterprises, Inc. | Brewing material container for a beverage brewer |
| US10071851B2 (en) | 2010-07-12 | 2018-09-11 | Robert Bao Vu | Apparatus and products for producing beverages, and methods for making and using same |
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| US20150327718A1 (en) | 2014-02-14 | 2015-11-19 | Remington Designs, Llc | Apparatuses and methods for solute extraction |
| US9948268B2 (en) | 2015-02-09 | 2018-04-17 | Samsung Electro-Mechanics Co., Ltd. | Multiband antenna having external conductor and electronic device including the same |
| US9385318B1 (en) | 2015-07-28 | 2016-07-05 | Lam Research Corporation | Method to integrate a halide-containing ALD film on sensitive materials |
| US12185867B2 (en) | 2015-10-30 | 2025-01-07 | Adrian Rivera | Beverage brewer spray apparatus having accommodation for multiple dispersion members |
| US11638499B2 (en) | 2020-05-27 | 2023-05-02 | Adrian Rivera | Beverage brewer spray apparatus having multiple dispersion members |
| US10702096B2 (en) * | 2015-10-30 | 2020-07-07 | Adrian Rivera | Brewing chamber cleaner |
| WO2017077510A1 (en) * | 2015-11-06 | 2017-05-11 | Cafetto Asia Pte. Ltd. | Cleaning arrangement for capsule based beverage dispensers |
| CN106706710A (zh) * | 2015-11-11 | 2017-05-24 | 中国科学院上海微系统与信息技术研究所 | 基于硫掺杂石墨烯的氮氧化物气体传感器及其制备方法 |
| DE102016100724A1 (de) * | 2016-01-18 | 2017-07-20 | Miele & Cie. Kg | Getränkeautomat mit automatischer Reinigungsvorrichtung |
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| US20170280929A1 (en) * | 2016-03-30 | 2017-10-05 | Eco 2, Llc | Descaling device for a beverage machine and method of descaling a beverage machine |
| US20230180963A1 (en) * | 2016-06-23 | 2023-06-15 | Adrian Rivera | Brewing Machine Cleaner |
| US9947558B2 (en) * | 2016-08-12 | 2018-04-17 | Lam Research Corporation | Method for conditioning silicon part |
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| KR102670420B1 (ko) * | 2018-04-24 | 2024-05-28 | 어플라이드 머티어리얼스, 인코포레이티드 | 카본 하드-마스크의 플라즈마-강화 화학 기상 증착 |
| US10985009B2 (en) * | 2018-04-27 | 2021-04-20 | Applied Materials, Inc. | Methods to deposit flowable (gap-fill) carbon containing films using various plasma sources |
| TWI804638B (zh) | 2018-06-22 | 2023-06-11 | 日商關東電化工業股份有限公司 | 使用含硫原子之氣體分子之電漿蝕刻方法 |
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| CN113710829B (zh) | 2019-03-25 | 2024-06-18 | 朗姆研究公司 | 高蚀刻选择性的低应力可灰化碳硬掩模 |
| US11837441B2 (en) | 2019-05-29 | 2023-12-05 | Lam Research Corporation | Depositing a carbon hardmask by high power pulsed low frequency RF |
| CN114342043A (zh) * | 2019-08-30 | 2022-04-12 | 朗姆研究公司 | 低压下的高密度、模量和硬度的非晶碳膜 |
| CN115039209A (zh) * | 2019-12-31 | 2022-09-09 | 玛特森技术公司 | 用于硬掩模去除的系统和方法 |
| JP7710474B2 (ja) * | 2020-06-29 | 2025-07-18 | アプライド マテリアルズ インコーポレイテッド | ハードマスク及びその他のパターニング応用のための高密度窒素ドープ炭素膜を製造するための方法 |
| US20230360922A1 (en) * | 2020-09-25 | 2023-11-09 | Lam Research Corporation | Robust ashable hard mask |
| KR20230078590A (ko) * | 2020-09-29 | 2023-06-02 | 램 리써치 코포레이션 | 순수 화학적 수단들에 의한 비정질 탄소 하드 마스크 막의 증착 속도 향상 |
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-
2014
- 2014-05-05 US US14/270,001 patent/US9320387B2/en active Active
- 2014-07-08 US US14/326,344 patent/US20150090300A1/en not_active Abandoned
- 2014-09-24 JP JP2014193209A patent/JP6689565B2/ja active Active
- 2014-09-29 CN CN201410513389.XA patent/CN104517815B/zh active Active
- 2014-09-29 TW TW103133764A patent/TWI644361B/zh active
- 2014-09-29 KR KR1020140130456A patent/KR102375870B1/ko active Active
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Also Published As
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|---|---|
| TWI644361B (zh) | 2018-12-11 |
| US20150093915A1 (en) | 2015-04-02 |
| JP2015070270A (ja) | 2015-04-13 |
| CN104517815B (zh) | 2017-08-22 |
| KR20220035900A (ko) | 2022-03-22 |
| TW201528374A (zh) | 2015-07-16 |
| KR102525779B1 (ko) | 2023-04-25 |
| CN104517815A (zh) | 2015-04-15 |
| US20150090300A1 (en) | 2015-04-02 |
| US9320387B2 (en) | 2016-04-26 |
| KR20150037641A (ko) | 2015-04-08 |
| KR102375870B1 (ko) | 2022-03-16 |
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