JP6490409B2 - 塗布装置、塗布方法、及びディスプレイ用部材の製造方法 - Google Patents

塗布装置、塗布方法、及びディスプレイ用部材の製造方法 Download PDF

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Publication number
JP6490409B2
JP6490409B2 JP2014241749A JP2014241749A JP6490409B2 JP 6490409 B2 JP6490409 B2 JP 6490409B2 JP 2014241749 A JP2014241749 A JP 2014241749A JP 2014241749 A JP2014241749 A JP 2014241749A JP 6490409 B2 JP6490409 B2 JP 6490409B2
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Japan
Prior art keywords
nozzle
coating
coating liquid
valve
supply
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JP2014241749A
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English (en)
Japanese (ja)
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JP2015192987A (ja
Inventor
善章 冨永
善章 冨永
諭 圓崎
諭 圓崎
和幸 獅野
和幸 獅野
阿部　哲也
哲也 阿部
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Toray Engineering Co Ltd
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Toray Engineering Co Ltd
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Publication date
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Priority to JP2014241749A priority Critical patent/JP6490409B2/ja
Priority to PCT/JP2015/056887 priority patent/WO2015141513A1/ja
Priority to CN201580027268.7A priority patent/CN106413915B/zh
Priority to TW104108511A priority patent/TWI673110B/zh
Publication of JP2015192987A publication Critical patent/JP2015192987A/ja
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Publication of JP6490409B2 publication Critical patent/JP6490409B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1047—Apparatus or installations for supplying liquid or other fluent material comprising a buffer container or an accumulator between the supply source and the applicator
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1039—Recovery of excess liquid or other fluent material; Controlling means therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Optics & Photonics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2014241749A 2014-03-19 2014-11-28 塗布装置、塗布方法、及びディスプレイ用部材の製造方法 Active JP6490409B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2014241749A JP6490409B2 (ja) 2014-03-19 2014-11-28 塗布装置、塗布方法、及びディスプレイ用部材の製造方法
PCT/JP2015/056887 WO2015141513A1 (ja) 2014-03-19 2015-03-10 塗布装置、塗布方法、及びディスプレイ用部材の製造方法
CN201580027268.7A CN106413915B (zh) 2014-03-19 2015-03-10 涂布方法
TW104108511A TWI673110B (zh) 2014-03-19 2015-03-17 塗佈裝置、塗佈方法、及顯示器用構件之製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014056712 2014-03-19
JP2014056712 2014-03-19
JP2014241749A JP6490409B2 (ja) 2014-03-19 2014-11-28 塗布装置、塗布方法、及びディスプレイ用部材の製造方法

Publications (2)

Publication Number Publication Date
JP2015192987A JP2015192987A (ja) 2015-11-05
JP6490409B2 true JP6490409B2 (ja) 2019-03-27

Family

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JP2014241749A Active JP6490409B2 (ja) 2014-03-19 2014-11-28 塗布装置、塗布方法、及びディスプレイ用部材の製造方法

Country Status (4)

Country Link
JP (1) JP6490409B2 (zh)
CN (1) CN106413915B (zh)
TW (1) TWI673110B (zh)
WO (1) WO2015141513A1 (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101791872B1 (ko) * 2015-12-29 2017-11-21 세메스 주식회사 액 공급 유닛 및 이를 가지는 기판 처리 장치
JP6804850B2 (ja) * 2016-02-26 2020-12-23 東レ株式会社 塗布装置及び塗布方法
JP6901616B2 (ja) * 2016-02-26 2021-07-14 東レ株式会社 塗布装置及び塗布方法
JP6780294B2 (ja) * 2016-05-26 2020-11-04 大日本印刷株式会社 加熱電極装置、通電加熱パネル、乗物、及び加熱電極装置の製造方法
CN117894718A (zh) * 2016-06-30 2024-04-16 株式会社国际电气 衬底处理装置、半导体器件的制造方法及记录介质
JP6779682B2 (ja) * 2016-07-06 2020-11-04 東レ株式会社 塗布装置及び塗布方法
JP2018008206A (ja) * 2016-07-13 2018-01-18 東レエンジニアリング株式会社 塗布前処理方法
JP6817861B2 (ja) * 2017-03-23 2021-01-20 株式会社Ｓｃｒｅｅｎホールディングス 塗布装置および塗布方法
JP7217475B2 (ja) * 2018-12-18 2023-02-03 パナソニックＩｐマネジメント株式会社 間欠塗工装置
JP6892466B2 (ja) 2019-02-26 2021-06-23 ファナック株式会社 吐出装置及び産業用ロボット
JP7399737B2 (ja) * 2020-02-13 2023-12-18 株式会社安川電機 塗料供給装置、ロボット、吐出制御システム、吐出制御方法、および吐出制御プログラム
CN112663392B (zh) * 2020-12-22 2023-05-02 山东纳美欣生物科技有限公司 一种纤维涂布古籍加固的装置及方法
JP2024127644A (ja) * 2023-03-09 2024-09-20 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02127891U (zh) * 1989-03-30 1990-10-22
JPH0712679U (ja) * 1993-08-05 1995-03-03 株式会社イナックス セラミックディスク式バルブ
JPH0712697U (ja) * 1993-08-06 1995-03-03 大成建設株式会社 固定式管継手
JP2000343015A (ja) * 1999-06-08 2000-12-12 Dainippon Screen Mfg Co Ltd 塗布装置
JP3811812B2 (ja) * 2000-11-21 2006-08-23 株式会社ヒラノテクシード 塗工装置
JP3676263B2 (ja) * 2001-06-06 2005-07-27 東京エレクトロン株式会社 塗布膜形成装置及び塗布膜形成方法
JP2003340340A (ja) * 2002-05-29 2003-12-02 Canon Inc 塗布装置
TWI396593B (zh) * 2006-03-31 2013-05-21 Toray Industries 塗布方法與塗布裝置以及顯示用構件之製造方法與製造裝置
JP2008161741A (ja) * 2006-12-27 2008-07-17 Chugai Ro Co Ltd 塗布装置及び塗布方法
JP2008182268A (ja) * 2008-04-04 2008-08-07 Dainippon Screen Mfg Co Ltd 送液装置
JP2011031128A (ja) * 2009-07-30 2011-02-17 Dainippon Screen Mfg Co Ltd インクジェットヘッドへの塗布液充填方法および塗布液充填装置
JP2011210889A (ja) * 2010-03-29 2011-10-20 Hoya Corp レジスト塗布方法およびレジスト塗布装置、並びに該レジスト塗布方法を用いたフォトマスクブランクおよびフォトマスクの製造方法
JP2013071044A (ja) * 2011-09-27 2013-04-22 Toppan Printing Co Ltd 塗工装置および塗工方法

Also Published As

Publication number Publication date
TW201538232A (zh) 2015-10-16
CN106413915B (zh) 2019-12-24
JP2015192987A (ja) 2015-11-05
CN106413915A (zh) 2017-02-15
TWI673110B (zh) 2019-10-01
WO2015141513A1 (ja) 2015-09-24

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