JP6437751B2 - 半導体装置の作製方法 - Google Patents
半導体装置の作製方法 Download PDFInfo
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- JP6437751B2 JP6437751B2 JP2014146390A JP2014146390A JP6437751B2 JP 6437751 B2 JP6437751 B2 JP 6437751B2 JP 2014146390 A JP2014146390 A JP 2014146390A JP 2014146390 A JP2014146390 A JP 2014146390A JP 6437751 B2 JP6437751 B2 JP 6437751B2
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- oxide semiconductor
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- transistor
- oxide
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0466—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/10—Programming or data input circuits
- G11C16/20—Initialising; Data preset; Chip identification
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/401—Multistep manufacturing processes
- H01L29/4011—Multistep manufacturing processes for data storage electrodes
- H01L29/40117—Multistep manufacturing processes for data storage electrodes the electrodes comprising a charge-trapping insulator
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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Description
本実施の形態では、半導体層と電荷捕獲層とゲート電極とを有する半導体装置の構成および動作原理、および、それを応用する回路について説明する。図1(A)は、半導体層101と電荷捕獲層102とゲート電極103を有する半導体装置である。電荷捕獲層102はゲート絶縁層の一部または全部を兼ねることができる。
本実施の形態では、本明細書で開示する一態様の半導体装置について図面を用いて説明する。
本実施の形態では、実施の形態2で説明した図9に示すトランジスタ450の作製方法について、図12および図13を用いて説明する。
本実施の形態では、プレナー構造のトランジスタについて説明する。
本実施の形態では、本明細書で開示する一態様のトランジスタを利用した回路の一例について、図面を参照して説明する。
図16にメモリセル800aとメモリセル800bを示す。例えば、メモリセル800aはトランジスタ801、トランジスタ802、容量素子803、容量素子804、インバータ805、インバータ806、トランジスタ807、トランジスタ808を有する。なお、トランジスタ801とトランジスタ802は、上記の実施の形態で示した電荷捕獲層を有するトランジスタでしきい値の適正化を実施できる。メモリセル800bも同様な構成である。
本明細書で開示する一態様に係る半導体装置は、表示機器、パーソナルコンピュータ、記録媒体を備えた画像再生装置(代表的にはDVD:Digital Versatile Disc等の記録媒体を再生し、その画像を表示しうるディスプレイを有する装置)に用いることができる。その他に、本明細書で開示する一態様に係る半導体装置を用いることができる電子機器として、携帯電話、携帯型を含むゲーム機、携帯データ端末、電子書籍、ビデオカメラ、デジタルスチルカメラ等のカメラ、ゴーグル型ディスプレイ(ヘッドマウントディスプレイ)、ナビゲーションシステム、音響再生装置(カーオーディオ、デジタルオーディオプレイヤー等)、複写機、ファクシミリ、プリンタ、プリンタ複合機、現金自動預け入れ払い機(ATM)、自動販売機などが挙げられる。これら電子機器の具体例を図18に示す。
102 電荷捕獲層
102a 第1の絶縁層
102b 第2の絶縁層
102c 第3の絶縁層
102d 導電層
102e 絶縁体
103 ゲート電極
104 電荷捕獲準位
105 電子
108 曲線
109 曲線
110 トランジスタ
111 容量素子
121 トランジスタ
122 トランジスタ
123 容量素子
124 トランジスタ
125 容量素子
130 半導体チップ
131 ワード線ドライバ
132 ビット線ドライバ
133 ワード線
134 ビット線
135 メモリセルアレイ
136 メモリユニット
137 論理ユニット
138a パッド
138b パッド
138c パッド
138d パッド
138e パッド
138f パッド
139a 信号供給線
139b 信号供給線
139c 信号供給線
139d 信号供給線
140a 高電位供給線
140b 低電位供給線
140c 低電位供給線
140d 高電位供給線
140e 低電位供給線
140f 高電位供給線
400 基板
402 下地絶縁層
403c 酸化物半導体層
404 多層半導体層
404a 酸化物半導体層
404b 酸化物半導体層
404c 酸化物半導体層
406a ソース電極
406b ドレイン電極
407a 絶縁層
407b 絶縁層
408 ゲート絶縁層
408a 第1の絶縁層
408b 第2の絶縁層
409 導電層
410 ゲート電極
412 酸化物絶縁層
450 トランジスタ
470 トランジスタ
501 筐体
502 筐体
503 表示部
504 表示部
505 マイクロフォン
506 スピーカー
507 操作キー
508 スタイラス
511 筐体
512 筐体
513 表示部
514 表示部
515 接続部
516 操作キー
521 筐体
522 表示部
523 キーボード
524 ポインティングデバイス
531 筐体
532 冷蔵室用扉
533 冷凍室用扉
541 筐体
542 筐体
543 表示部
544 操作キー
545 レンズ
546 接続部
550 トランジスタ
551 車体
552 車輪
553 ダッシュボード
554 ライト
700 メモリセル
700a メモリセル
700b メモリセル
700c メモリセル
700d メモリセル
700e メモリセル
700f メモリセル
700g メモリセル
700h メモリセル
700i メモリセル
700j メモリセル
700k メモリセル
700l メモリセル
700m メモリセル
700n メモリセル
700o メモリセル
700p メモリセル
701 フリップフロップ回路
702 回路
703 スイッチ
704 スイッチ
706 論理素子
707 容量素子
708 容量素子
709 トランジスタ
710 トランジスタ
713 トランジスタ
714 トランジスタ
720 回路
730 ALU
740 WE信号出力回路
750a パッド
750b パッド
750c パッド
750d パッド
750e パッド
760 プロセッサ
800a メモリセル
800b メモリセル
800c メモリセル
800d メモリセル
800e メモリセル
800f メモリセル
800g メモリセル
800h メモリセル
800i メモリセル
800j メモリセル
800k メモリセル
800l メモリセル
801 トランジスタ
802 トランジスタ
803 容量素子
804 容量素子
805 インバータ
806 インバータ
807 トランジスタ
808 トランジスタ
810 メモリユニット
811 ワード線ドライバ
812 ビット線ドライバ
813 WE信号出力回路
814 メモリセルアレイ
815a パッド
815b パッド
815c パッド
815d パッド
815e パッド
816a 高電位供給線
816b 低電位供給線
816c 高電位供給線
816d 低電位供給線
816e 高電位供給線
816f 低電位供給線
816g 信号供給線
817 論理ユニット
818 半導体チップ
819 リードフレーム
819a リード
819b リード
819c リード
819d リード
820 ボンディングワイヤ
Claims (5)
- 第1の半導体と、前記第1の半導体に電気的に接するソース電極及びドレイン電極と、
ゲート電極と、前記ゲート電極と前記第1の半導体との間に設けられる、窒化シリコン、酸化ハフニウム、酸化アルミニウム、アルミニウムシリケートのいずれか一を含む層とを有するトランジスタを有し、
前記トランジスタの前記ゲート電極に信号を供給する第1の回路と、
前記トランジスタの前記ソース電極又は前記ドレイン電極に信号を供給する第2の回路と、
前記第1の回路に高電位を供給する配線と低電位を供給する配線と、
前記第2の回路に高電位を供給する配線と低電位を供給する配線と、
を有する半導体装置において、
前記第1の回路に低電位を供給する配線の電位を、前記第2の回路に低電位を供給する配線の電位よりも1V以上高い電位とし、
前記第1の回路から出力される配線のうち、少なくとも2本の電位は等しい電位とし、
前記第2の回路から出力される配線のうち、少なくとも2本の電位は等しい電位とし、
125℃以上450℃以下の加熱処理を行いながら、前記ゲート電極の電位を前記ソース電極又は前記ドレイン電極の電位より高い状態に1秒以上維持し、前記加熱処理前よりも前記トランジスタのしきい値を増大させることを特徴とする半導体装置の作製方法。 - 前記第1の半導体を挟む第2の半導体および第3の半導体を有し、
前記第2の半導体は、前記第1の半導体と前記窒化シリコン、酸化ハフニウム、酸化アルミニウム、アルミニウムシリケートのいずれか一を含む層の間にある請求項1に記載の半導体装置の作製方法。 - 前記ゲート電極に印加される電位は、前記半導体装置で使用される最高電位よりも低いことを特徴とする請求項1又は2に記載の半導体装置の作製方法。
- 前記第1の回路に高電位を供給する配線と低電位を供給する配線の電位が等しく、
前記第2の回路に高電位を供給する配線と低電位を供給する配線の電位が等しいことを特徴とする請求項1乃至3のいずれか一項に記載の半導体装置の作製方法。 - 前記第1の回路は、複数の出力端子を有し、
前記複数の出力端子は、それぞれ、一以上の前記トランジスタの前記ゲート電極に接続し、
前記第1の回路は、前記複数の出力端子のうち二以上の出力端子に、前記トランジスタをオンとするような信号を出力できないように設定されていることを特徴とする請求項1乃至4のいずれか一項に記載の半導体装置の作製方法。
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