JP6380591B2 - 異方導電性フィルム及び接続構造体 - Google Patents
異方導電性フィルム及び接続構造体 Download PDFInfo
- Publication number
- JP6380591B2 JP6380591B2 JP2017063298A JP2017063298A JP6380591B2 JP 6380591 B2 JP6380591 B2 JP 6380591B2 JP 2017063298 A JP2017063298 A JP 2017063298A JP 2017063298 A JP2017063298 A JP 2017063298A JP 6380591 B2 JP6380591 B2 JP 6380591B2
- Authority
- JP
- Japan
- Prior art keywords
- conductive film
- electronic component
- anisotropic conductive
- center distance
- arrangement direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002245 particle Substances 0.000 claims description 227
- 239000012790 adhesive layer Substances 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 13
- 239000011521 glass Substances 0.000 claims description 12
- 230000001154 acute effect Effects 0.000 claims description 11
- 230000000052 comparative effect Effects 0.000 description 21
- 229920005989 resin Polymers 0.000 description 21
- 239000011347 resin Substances 0.000 description 21
- 238000011156 evaluation Methods 0.000 description 18
- 239000010410 layer Substances 0.000 description 11
- 239000011295 pitch Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 238000007373 indentation Methods 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 229910002012 Aerosil® Inorganic materials 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- -1 acrylate compound Chemical class 0.000 description 2
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 2
- 238000010538 cationic polymerization reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 239000007870 radical polymerization initiator Substances 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 244000126211 Hericium coralloides Species 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/16—Non-insulated conductors or conductive bodies characterised by their form comprising conductive material in insulating or poorly conductive material, e.g. conductive rubber
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/10—Adhesives in the form of films or foils without carriers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J9/00—Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
- C09J9/02—Electrically-conducting adhesives
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/27—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/73—Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L24/80 - H01L24/90
- H01L24/92—Specific sequence of method steps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R11/00—Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts
- H01R11/01—Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts characterised by the form or arrangement of the conductive interconnection between the connecting locations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/04—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation using electrically conductive adhesives
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
- H05K3/323—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/001—Conductive additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/08—Metals
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/314—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive layer and/or the carrier being conductive
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/408—Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the adhesive layer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2463/00—Presence of epoxy resin
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2467/00—Presence of polyester
- C09J2467/006—Presence of polyester in the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
- H01L2224/131—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/13138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/13144—Gold [Au] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/27—Manufacturing methods
- H01L2224/271—Manufacture and pre-treatment of the layer connector preform
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29199—Material of the matrix
- H01L2224/2929—Material of the matrix with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29338—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29339—Silver [Ag] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29338—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29344—Gold [Au] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29338—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29347—Copper [Cu] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29338—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29355—Nickel [Ni] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29338—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29357—Cobalt [Co] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29363—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
- H01L2224/29364—Palladium [Pd] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/29386—Base material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2224/29387—Ceramics, e.g. crystalline carbides, nitrides or oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/2939—Base material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29399—Coating material
- H01L2224/294—Coating material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29499—Shape or distribution of the fillers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/819—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector with the bump connector not providing any mechanical bonding
- H01L2224/81901—Pressing the bump connector against the bonding areas by means of another connector
- H01L2224/81903—Pressing the bump connector against the bonding areas by means of another connector by means of a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/831—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus
- H01L2224/83101—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus as prepeg comprising a layer connector, e.g. provided in an insulating plate member
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/832—Applying energy for connecting
- H01L2224/83201—Compression bonding
- H01L2224/83203—Thermocompression bonding, e.g. diffusion bonding, pressure joining, thermocompression welding or solid-state welding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
- H01L2224/83851—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester being an anisotropic conductive adhesive
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/921—Connecting a surface with connectors of different types
- H01L2224/9211—Parallel connecting processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L24/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L24/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2924/15788—Glasses, e.g. amorphous oxides, nitrides or fluorides
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0263—Details about a collection of particles
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Non-Insulated Conductors (AREA)
- Wire Bonding (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Conductive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Manufacturing Of Electrical Connectors (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
Description
任意の導電粒子と、該導電粒子に隣接する導電粒子との中心間距離につき、任意の導電粒子と最も短い距離を第1中心間距離とし、その次に短い距離を第2中心間距離とした場合に、
第1中心間距離及び第2中心間距離が、それぞれ導電粒子の粒子径の1.5〜5倍であり、
任意の導電粒子P0と、任意の導電粒子P0と第1中心間距離にある導電粒子P1と、任意の導電粒子P0と第1中心間距離又は第2中心間距離にある導電粒子P2で形成される鋭角三角形について、導電粒子P0、P1を通る直線の方向(以下、第1配列方向という)に対して直交する直線と、導電粒子P1、P2を通る直線の方向(以下、第2配列方向という)とがなす鋭角の角度α(以下、第2配列方向の傾斜角αともいう)が18〜35°である異方導電性フィルムを提供する。
ここで、略直交するとは、第1配列方向に厳密に直交する方向だけでなく、異方導電性フィルムを用いて電子部品を実装する際に生じるずれの範囲を含む。通常、第1配列方向に直交する方向に対して、±3°が含まれる。
図1は、本発明の一実施例の異方導電性フィルム1Aにおける導電粒子Pの配置図である。この異方導電性フィルム1Aは、絶縁接着剤層10と、絶縁接着剤層10に格子状の配置で固定された導電粒子Pを有する。
成物層の上に、貫通孔が所定の配置で形成されている部材を設け、その上から導電粒子P
を供給し、貫通孔を通過させるなどの方法でもよい。
異方導電性フィルムにおける導電粒子P(粒子径D=4μm)の配置について、第1中心間距離d1=第2中心間距離d2=10μmとし、表1に示すように傾斜角αを変えた場合に、電極サイズ15μm×100μmの狭小のバンプを異方導電性フィルムのパターンに重ねることによって、加熱加圧前のバンプが捕捉し得る導電粒子の最多粒子数と最少粒子数とを求めた。この場合、異方導電性フィルムの長手方向とバンプの短手方向を合わせた。また、バンプの縁端部に対してその面積の50%以上が外れている粒子は、バンプが捕捉し得る導電粒子としてカウントしなかった。
この結果から、傾斜角αとバンプの粒子捕捉性の傾向をみることができる。結果を表1に示す。
これに対し、傾斜角αが小さすぎると、捕捉数の差が大きくなる。これは傾斜角が小さすぎることにより、粒子配列の、バンプの端部へのかかり具合が捕捉数に直接影響するためである。逆に傾斜角αが大きすぎても同様な現象が生じ、バンプから外れる粒子が多くなる傾向がある。
次に、導電粒子の粒子間の距離と傾斜角αとの関係を具体的に検証するために、表2に示す樹脂を使用し、導電粒子(積水化学工業(株)、AUL704、粒径4μm)が表2に示す配置となる異方導電性フィルムを次のようにして製造した。即ち、表2に示す組成で熱可塑性樹脂、熱硬化性樹脂及び潜在性硬化剤を含む絶縁性樹脂の混合溶液を調製し、それを、フィルム厚さ50μmのPETフィルム上に塗布し、80℃のオーブンにて5分間乾燥させ、PETフィルム上に厚み20μmの粘着層を形成した。
導電粒子を表3に示した配置とする以外は、上述の実施例及び比較例と同様にして実施例9〜13、比較例6、7の異方導電性フィルムを製造した。
なお、比較例1、比較例6では導電粒子を、低沸点溶媒に分散し噴霧してランダムに同一平面上に配置した。
一方、比較例1、6は任意に導電粒子100個を選択し、各導電粒子の最近接粒子中心間距離を計測した。
各実施例及び比較例の異方導電性フィルムの(a)粒子捕捉数、(b)初期導通抵抗、(c)導通信頼性、(d)ショート発生率を、それぞれ次のように評価した。結果を表2、表3に示す。
(a-1)平均数
各実施例及び比較例の異方導電性フィルムを用いて15×100μmのバンプ100個とガラス基板とを加熱加圧(180℃、80MPa、5秒)して接続物を得た。この場合、異方導電性フィルムの長手方向とバンプの短手方向を合わせた。そして、各バンプにおける粒子捕捉数を計測し、バンプ1個当たりの平均粒子捕捉数を求めた。
(a-1)で計測した各バンプの粒子捕捉数のうち、最小数を求めた。
各実施例及び比較例の異方導電性フィルムを、初期導通および導通信頼性の評価用ICとガラス基板の間に挟み、加熱加圧(180℃、80MPa、5秒)して各評価用接続物を得た。この場合、異方導電性フィルムの長手方向とバンプの短手方向を合わせた。そして、評価用接続物の導通抵抗を測定した。
ここで、この各評価用ICとガラス基板は、それらの端子パターンが対応しており、サイズは次の通りである。
外径 0.7×20mm
厚み 0.2mm
バンプ仕様 金メッキ、高さ12μm、サイズ15×100μm、バンプ間距離15μm
ガラス材質 コーニング社製
外径 30×50mm
厚み 0.5mm
電極 ITO配線
(b)の評価用ICと各実施例及び比較例の異方導電性フィルムとの評価用接続物を温度85℃、湿度85%RHの恒温槽に500時間おいた後の導通抵抗を、(b)と同様に測定した。なお、この導通抵抗が5Ω以上であると、接続した電子部品の実用的な導通安定性の点から好ましくない。
ショート発生率の評価用ICとして次のIC(7.5μmスペースの櫛歯TEG(test element group))を用意した。
外径 1.5×13mm
厚み 0.5mm
バンプ仕様 金メッキ、高さ15μm、サイズ25×140μm、バンプ間距離7.5μm
各実施例及び比較例の異方導電性フィルムを、ショート発生率の評価用ICと、該評価用ICに対応したパターンのガラス基板との間に挟み、(b)と同様の接続条件で加熱加圧して接続物を得、その接続物のショート発生率を求めた。ショート発生率は、「ショートの発生数/7.5μmスペース総数」で算出される。ショート発生率が1ppm以上であると実用上の接続構造体を製造する点から好ましくない。
これに対し、比較例1では、粒子密度が過度に高いために絶縁性が悪く、また、比較例2〜比較例5では、傾斜角αが18〜35°の範囲を外れており、バンプにおける粒子捕捉数が少なく、導通信頼性に欠けることがわかる。
実施例3、9〜13において、導電粒子粒子径Dを4μmから3μmに変更し、隣接粒子間中心距離を6μm(即ち、(d-D)/D=1)、配置密度28000個/mm2として実施例14〜19の異方導電性フィルムを製造し、同様に評価した。その結果、これらについても、実施例3及び9〜13とほぼ同様の初期導通抵抗の低さと、導通信頼性の高さと、ショート発生率抑制効果が得られた。また、これらの評価用接続物におけるバンプの縁辺上にある導電粒子と、幅方向の中央部にある導電粒子の圧痕状態についても、実施例9〜13と同様であった。
実施例3、9〜13において、導電粒子粒子径Dを4μmのまま、隣接粒子間中心距離を7μm((d-D)/D=0.75、配置密度20000個/mm2)とした実施例20〜25の異方導電性フィルムを製造し、同様に評価した。その結果、これらについても、実施例3、9〜13とほぼ同様の初期導通抵抗の低さと、導通信頼性の高さと、ショート発生率の抑制効果が得られた。また、これらの評価用接続物におけるバンプの縁辺上にある導電粒子と、幅方向の中央部にある導電粒子の圧痕状態についても、実施例9〜13と同様であった。
実施例3、9〜13において、導電粒子粒子径Dを4μmのまま、隣接粒子間中心距離を16μm((d-D)/D=3、配置密度4000個/mm2)とした実施例26〜31の異方導電性フィルムを製造し、同様に評価した。その結果、これらについては、実施例3、9〜13よりも初期導通抵抗は高くなったが、実用上の問題はなかった。導通信頼性の高さとショート発生率の抑制効果は、実施例3、9〜13と同様であった。これは、実施例26〜31の異方導電性フィルムは、導電粒子の配置密度が低いためと考えられる。
評価用接続物におけるバンプの縁辺上にある導電粒子と、幅方向の中央部にある導電粒子の圧痕状態は、実施例9〜13と同様であった。
実施例5、7において絶縁性樹脂100質量部にシリカ微粒子フィラー(シリカ微粒子、アエロジルRY200、日本アエロジル株式会社)20質量部を加え、実施例5、7と同様にして異方導電性フィルムを製造し、評価した。その結果、実施例5、7と同様の初期導通抵抗の低さと、導通信頼性の高さと、ショート発生率抑制効果が得られた。
3 接続端子又はバンプ
10 絶縁接着剤層
L0 第1配列方向に直交する方向
L1 第1配列方向
L2 第2配列方向
L3 第3配列方向
Lf 異方導電性フィルムの長手方向
Lt 接続端子の長手方向
d1 第1中心間距離、ピッチ
d2 第2中心間距離、ピッチ
D 導電粒子の粒子径
P、P0、P1、P2、Pc、Pe 導電粒子
α 傾斜角
β 傾斜角
Claims (18)
- 絶縁接着剤層と、該絶縁接着剤層に格子状に配置された導電粒子を含む異方導電性フィルムであって、第1電子部品の接続端子と第2電子部品の接続端子とを、それらの接続端子の長手方向に直交する方向と異方性導電フィルムの長手方向とを合わせて異方導電性接続する異方導電性フィルムであり、
任意の導電粒子と、該導電粒子に隣接する導電粒子との中心間距離につき、任意の導電粒子と最も短い距離を第1中心間距離とし、その次に短い距離を第2中心間距離とした場合に、
第1中心間距離及び第2中心間距離が、それぞれ導電粒子の粒子径の1.5〜5倍であり、
任意の導電粒子P0と、任意の導電粒子P0と第1中心間距離にある導電粒子P1と、任意の導電粒子P0と第1中心間距離又は第2中心間距離にある導電粒子P2で形成される鋭角三角形について、導電粒子P0、P1を通る直線の方向を第1配列方向とし、導電粒子P1、P2を通る直線の方向を第2配列方向とし、導電粒子P0、P2を通る直線の方向を第3配列方向とした場合に、第1配列方向に対して直交する直線と第2配列方向とがなす鋭角の角度αが18〜35°であり、第1配列方向、第2配列方向及び第3配列方向が接続端子の長手方向に直交する方向に対して傾いており、
第1配列方向と接続端子の長手方向に直交する方向とがなす角度が、第2配列方向と接続端子の長手方向に直交する方向とがなす角度よりも小さい異方導電性フィルム。 - 第1中心間距離と第2中心間距離との差が導電粒子の粒子径の2倍未満である請求項1記載の異方導電性フィルム。
- 第1配列方向と接続端子の長手方向に直交する方向とのなす角度βが5〜25°である請求項1または2記載の異方導電性フィルム。
- 導電粒子の密度が2000〜250000個/mm2である請求項1〜3のいずれかに記載の異方導電性フィルム。
- 第1配列方向及び第2配列方向のそれぞれについて、導電粒子の連続した欠落数が6個以下である請求項1〜4のいずれかに記載の異方導電性フィルム。
- 絶縁接着剤層と、該絶縁接着剤層に格子状に配置された導電粒子を含む異方導電性フィルムであって、
任意の導電粒子と、該導電粒子に隣接する導電粒子との中心間距離につき、任意の導電粒子と最も短い距離を第1中心間距離とし、その次に短い距離を第2中心間距離とした場合に、
第1中心間距離及び第2中心間距離が、それぞれ導電粒子の粒子径の1.5〜5倍であり、
任意の導電粒子P0と、任意の導電粒子P0と第1中心間距離にある導電粒子P1と、任意の導電粒子P0と第1中心間距離又は第2中心間距離にある導電粒子P2で形成される鋭角三角形について、導電粒子P0、P1を通る直線の方向を第1配列方向とし、導電粒子P1、P2を通る直線の方向を第2配列方向とし、導電粒子P0、P2を通る直線の方向を第3配列方向とした場合に、第1配列方向に対して直交する直線と第2配列方向とがなす鋭角の角度αが18〜35°であり、第1配列方向、第2配列方向及び第3配列方向が接続端子の長手方向に直交する方向に対して傾いており、
第1配列方向と接続端子の長手方向に直交する方向とのなす角度βが5〜25°である異方導電性フィルム。 - 第1中心間距離と第2中心間距離との差が導電粒子の粒子径の2倍未満である請求項6記載の異方導電性フィルム。
- 導電粒子の密度が2000〜250000個/mm2である請求項6または7記載の異方導電性フィルム。
- 第1配列方向及び第2配列方向のそれぞれについて、導電粒子の連続した欠落数が6個以下である請求項6〜8のいずれかに記載の異方導電性フィルム。
- 請求項1〜9のいずれかに記載の異方導電性フィルムを用いて、第1電子部品の接続端子と第2電子部品の接続端子を異方導電性接続する接続方法であって、異方導電性フィルムの長手方向を第1電子部品又は第2電子部品の接続端子の長手方向に直交する方向に合わせ、異方導電性フィルムの第1配列方向に略直交する方向を第1電子部品又は第2電子部品の接続端子の長手方向に合わせる接続方法。
- 第1電子部品が、透明電極で接続端子が形成されたガラス基板であり、第2電子部品がICチップである請求項10記載の接続方法。
- 接続端子の接続面の大きさが、幅8〜60μm、長さ400μm以下である請求項10または11記載の接続方法。
- 請求項1〜9のいずれかに記載の異方導電性フィルムを介して第1電子部品の接続端子と第2電子部品の接続端子とが異方導電性接続されている接続構造体であって、
異方導電性フィルムの長手方向が第1電子部品又は第2電子部品の接続端子の長手方向と直交する方向に合わせてある接続構造体。 - 絶縁接着剤層と、該絶縁接着剤層に格子状に配置された導電粒子を含む異方導電性フィルムであって、第1電子部品の接続端子と第2電子部品の接続端子とを、それらの接続端子の長手方向に直交する方向と異方性導電フィルムの長手方向とを合わせて異方導電性接続する異方導電性フィルムであり、
任意の導電粒子と、該導電粒子に隣接する導電粒子との中心間距離につき、任意の導電粒子と最も短い距離を第1中心間距離とし、その次に短い距離を第2中心間距離とした場合に、
第1中心間距離及び第2中心間距離が、それぞれ導電粒子の粒子径の1.5〜5倍であり、
任意の導電粒子P0と、任意の導電粒子P0と第1中心間距離にある導電粒子P1と、任意の導電粒子P0と第1中心間距離又は第2中心間距離にある導電粒子P2で形成される鋭角三角形について、導電粒子P0、P1を通る直線の方向を第1配列方向とし、導電粒子P1、P2を通る直線の方向を第2配列方向とし、導電粒子P0、P2を通る直線の方向を第3配列方向とした場合に、第1配列方向に対して直交する直線と第2配列方向とがなす鋭角の角度αが18〜35°であり、第1配列方向、第2配列方向及び第3配列方向が接続端子の長手方向に直交する方向に対して傾いており、
異方導電性フィルムの長手方向に直交する方向の導電粒子Pの外接線が、該導電粒子Pに隣接する導電粒子を貫いている異方導電性フィルム。 - 請求項14記載の異方導電性フィルムを用いて、第1電子部品の接続端子と第2電子部品の接続端子を異方導電性接続する接続方法であって、異方導電性フィルムの長手方向を第1電子部品又は第2電子部品の接続端子の長手方向と直交する方向に合わせ、異方導電性フィルムの第1配列方向に略直交する方向を第1電子部品又は第2電子部品の接続端子の長手方向に合わせる接続方法。
- 第1電子部品が、透明電極で接続端子が形成されたガラス基板であり、第2電子部品がICチップである請求項15記載の接続方法。
- 接続端子の接続面の大きさが、幅8〜60μm、長さ400μm以下である請求項15または16記載の接続方法。
- 請求項14記載の異方導電性フィルムを介して第1電子部品の接続端子と第2電子部品の接続端子とが異方導電性接続されている接続構造体であって、
異方導電性フィルムの長手方向が第1電子部品又は第2電子部品の接続端子の長手方向と直交する方向に合わせてある接続構造体。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013239180 | 2013-11-19 | ||
JP2013239180 | 2013-11-19 | ||
JP2014193168 | 2014-09-22 | ||
JP2014193168 | 2014-09-22 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014219793A Division JP6119718B2 (ja) | 2013-11-19 | 2014-10-28 | 異方導電性フィルム及び接続構造体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017139233A JP2017139233A (ja) | 2017-08-10 |
JP6380591B2 true JP6380591B2 (ja) | 2018-08-29 |
Family
ID=55804233
Family Applications (6)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014219793A Active JP6119718B2 (ja) | 2013-11-19 | 2014-10-28 | 異方導電性フィルム及び接続構造体 |
JP2017063298A Active JP6380591B2 (ja) | 2013-11-19 | 2017-03-28 | 異方導電性フィルム及び接続構造体 |
JP2017063281A Active JP6640141B2 (ja) | 2013-11-19 | 2017-03-28 | 異方導電性フィルム及び接続構造体 |
JP2018134336A Active JP6932110B2 (ja) | 2013-11-19 | 2018-07-17 | 異方導電性フィルム及び接続構造体 |
JP2020078370A Pending JP2020129550A (ja) | 2013-11-19 | 2020-04-27 | 異方導電性フィルム及び接続構造体 |
JP2022098047A Pending JP2022133317A (ja) | 2013-11-19 | 2022-06-17 | 異方導電性フィルム及び接続構造体 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014219793A Active JP6119718B2 (ja) | 2013-11-19 | 2014-10-28 | 異方導電性フィルム及び接続構造体 |
Family Applications After (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017063281A Active JP6640141B2 (ja) | 2013-11-19 | 2017-03-28 | 異方導電性フィルム及び接続構造体 |
JP2018134336A Active JP6932110B2 (ja) | 2013-11-19 | 2018-07-17 | 異方導電性フィルム及び接続構造体 |
JP2020078370A Pending JP2020129550A (ja) | 2013-11-19 | 2020-04-27 | 異方導電性フィルム及び接続構造体 |
JP2022098047A Pending JP2022133317A (ja) | 2013-11-19 | 2022-06-17 | 異方導電性フィルム及び接続構造体 |
Country Status (6)
Country | Link |
---|---|
US (3) | US10522502B2 (ja) |
JP (6) | JP6119718B2 (ja) |
KR (4) | KR20160088294A (ja) |
CN (3) | CN108539440B (ja) |
HK (1) | HK1257883A1 (ja) |
TW (2) | TWI643417B (ja) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6119718B2 (ja) * | 2013-11-19 | 2017-04-26 | デクセリアルズ株式会社 | 異方導電性フィルム及び接続構造体 |
KR20240025047A (ko) | 2013-11-19 | 2024-02-26 | 데쿠세리아루즈 가부시키가이샤 | 이방 도전성 필름 및 접속 구조체 |
JP7052254B2 (ja) | 2016-11-04 | 2022-04-12 | デクセリアルズ株式会社 | フィラー含有フィルム |
KR101929951B1 (ko) * | 2015-01-13 | 2018-12-18 | 데쿠세리아루즈 가부시키가이샤 | 이방 도전성 필름 |
JP7095227B2 (ja) * | 2016-05-05 | 2022-07-05 | デクセリアルズ株式会社 | 異方性導電フィルム |
WO2017191772A1 (ja) * | 2016-05-05 | 2017-11-09 | デクセリアルズ株式会社 | フィラー配置フィルム |
KR102621211B1 (ko) * | 2016-05-05 | 2024-01-04 | 데쿠세리아루즈 가부시키가이샤 | 이방성 도전 필름 |
WO2017191779A1 (ja) | 2016-05-05 | 2017-11-09 | デクセリアルズ株式会社 | 異方性導電フィルム |
JP7274811B2 (ja) * | 2016-05-05 | 2023-05-17 | デクセリアルズ株式会社 | 異方性導電フィルム |
JP7274810B2 (ja) | 2016-05-05 | 2023-05-17 | デクセリアルズ株式会社 | 異方性導電フィルム |
CN113707361B (zh) * | 2016-05-05 | 2023-08-22 | 迪睿合株式会社 | 各向异性导电膜 |
US20170338204A1 (en) * | 2016-05-17 | 2017-11-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Device and Method for UBM/RDL Routing |
WO2018101105A1 (ja) | 2016-12-01 | 2018-06-07 | デクセリアルズ株式会社 | フィラー含有フィルム |
KR102423362B1 (ko) | 2016-12-01 | 2022-07-20 | 데쿠세리아루즈 가부시키가이샤 | 접속 구조체 |
JP7047282B2 (ja) | 2016-12-01 | 2022-04-05 | デクセリアルズ株式会社 | フィラー含有フィルム |
KR102002694B1 (ko) * | 2017-09-29 | 2019-07-23 | 주식회사 새한마이크로텍 | 전도성 접촉부 및 이를 포함하는 이방 전도성 시트 |
KR102519126B1 (ko) * | 2018-03-30 | 2023-04-06 | 삼성디스플레이 주식회사 | 표시 장치 |
TW202016232A (zh) | 2018-06-06 | 2020-05-01 | 日商迪睿合股份有限公司 | 連接體之製造方法、連接方法 |
TWI845515B (zh) | 2018-06-06 | 2024-06-21 | 日商迪睿合股份有限公司 | 連接體、連接體之製造方法、連接方法 |
WO2020032150A1 (ja) * | 2018-08-08 | 2020-02-13 | デクセリアルズ株式会社 | 異方性導電フィルム |
KR102570142B1 (ko) * | 2018-08-08 | 2023-08-23 | 데쿠세리아루즈 가부시키가이샤 | 이방성 도전 필름 |
JP2020095922A (ja) * | 2018-12-14 | 2020-06-18 | デクセリアルズ株式会社 | 異方性導電フィルム |
KR102404193B1 (ko) * | 2019-05-20 | 2022-05-30 | 타츠타 전선 주식회사 | 도전성 접착 시트 |
JP7537177B2 (ja) | 2020-08-18 | 2024-08-21 | セイコーエプソン株式会社 | 電気光学装置、及び電子機器 |
KR20230160223A (ko) | 2021-03-26 | 2023-11-23 | 데쿠세리아루즈 가부시키가이샤 | 표시 장치의 제조 방법 |
JP2024136131A (ja) * | 2023-03-23 | 2024-10-04 | デクセリアルズ株式会社 | フィラー含有フィルム、接合体及びその製造方法 |
Family Cites Families (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE794600A (fr) | 1972-01-28 | 1973-05-16 | Usel Hubert | Cartouche sans etui pour mise a feu electrique |
JP3472987B2 (ja) * | 1993-01-29 | 2003-12-02 | 日立化成工業株式会社 | 接続部材の製造法及びその製造装置 |
JPH09320345A (ja) * | 1996-05-31 | 1997-12-12 | Whitaker Corp:The | 異方導電性フィルム |
JP3624818B2 (ja) | 1999-10-12 | 2005-03-02 | ソニーケミカル株式会社 | 異方性導電接続材料、接続体、およびその製造方法 |
JP2001307555A (ja) | 2000-04-17 | 2001-11-02 | Sony Corp | 異方性導電フィルム及びこれを用いた実装方法ならびに配線用の基板 |
JP4190763B2 (ja) * | 2001-04-27 | 2008-12-03 | 旭化成株式会社 | 異方性を有する導電性接着シートおよびその製造方法 |
JP3886401B2 (ja) | 2002-03-25 | 2007-02-28 | ソニーケミカル&インフォメーションデバイス株式会社 | 接続構造体の製造方法 |
JP4130747B2 (ja) * | 2002-03-28 | 2008-08-06 | 旭化成エレクトロニクス株式会社 | 異方導電性接着シートおよびその製造方法 |
JP2009013416A (ja) * | 2003-01-07 | 2009-01-22 | Sekisui Chem Co Ltd | 硬化性樹脂組成物、接着性エポキシ樹脂ペースト、接着性エポキシ樹脂シート、導電接続ペースト、導電接続シート及び電子部品接合体 |
JP3849680B2 (ja) * | 2003-10-06 | 2006-11-22 | セイコーエプソン株式会社 | 基板接合体の製造方法、基板接合体、電気光学装置の製造方法、及び電気光学装置 |
JP4907840B2 (ja) * | 2003-11-12 | 2012-04-04 | 日立化成工業株式会社 | 異方導電フィルム及びこれを用いた回路板 |
JP2006233203A (ja) | 2005-01-31 | 2006-09-07 | Asahi Kasei Electronics Co Ltd | 異方導電性接着剤フィルム |
JP2007009176A (ja) * | 2005-01-31 | 2007-01-18 | Asahi Kasei Electronics Co Ltd | 異方導電性接着フィルム |
JP4887700B2 (ja) * | 2005-09-09 | 2012-02-29 | 住友ベークライト株式会社 | 異方導電性フィルムおよび電子・電機機器 |
KR100961417B1 (ko) * | 2005-09-29 | 2010-06-09 | 아사히 가세이 케미칼즈 가부시키가이샤 | 고-안정성 마이크로캡슐화 에폭시 수지용 경화제 및 에폭시수지 조성물 |
WO2009037964A1 (ja) | 2007-09-20 | 2009-03-26 | Sony Chemical & Information Device Corporation | 異方性導電膜及びその製造方法、並びに、該異方性導電膜を用いた接合体 |
EP2206756A1 (en) * | 2007-10-29 | 2010-07-14 | Hitachi Chemical Company, Ltd. | Circuit connecting material, connection structure and method for producing the same |
JP2009135388A (ja) * | 2007-10-30 | 2009-06-18 | Hitachi Chem Co Ltd | 回路接続方法 |
JP2009283431A (ja) | 2007-12-27 | 2009-12-03 | Fujifilm Corp | 微細構造体およびその製造方法 |
JP4862921B2 (ja) | 2008-07-01 | 2012-01-25 | 日立化成工業株式会社 | 回路接続材料、回路接続構造体及びその製造方法 |
JP5540559B2 (ja) * | 2009-05-11 | 2014-07-02 | デクセリアルズ株式会社 | 回路接続用フィルム接着剤の製造方法 |
JP5375374B2 (ja) | 2009-07-02 | 2013-12-25 | 日立化成株式会社 | 回路接続材料及び回路接続構造体 |
JP5516016B2 (ja) | 2010-04-23 | 2014-06-11 | デクセリアルズ株式会社 | 異方導電性接着フィルム及びその製造方法 |
JP5614135B2 (ja) * | 2010-07-06 | 2014-10-29 | デクセリアルズ株式会社 | 異方性導電接着剤、その製造方法、接続構造体及びその製造方法 |
JP5025825B2 (ja) * | 2010-07-28 | 2012-09-12 | 積水化学工業株式会社 | 絶縁性粒子付き導電性粒子、異方性導電材料及び接続構造体 |
JP5318840B2 (ja) * | 2010-11-08 | 2013-10-16 | デクセリアルズ株式会社 | 異方性導電フィルム、異方性導電フィルムの製造方法、電子部材間の接続方法及び接続構造体 |
JP5643623B2 (ja) * | 2010-12-02 | 2014-12-17 | デクセリアルズ株式会社 | 異方性導電材料及びその製造方法 |
CN102176337B (zh) * | 2011-01-06 | 2013-01-09 | 天津大学 | 各向异性导电胶膜用复合导电粒子及制备方法 |
JP2011102404A (ja) * | 2011-02-17 | 2011-05-26 | Sony Chemical & Information Device Corp | 異方性導電フィルム |
JP2011181525A (ja) | 2011-06-09 | 2011-09-15 | Sony Chemical & Information Device Corp | 異方性導電材料 |
WO2013024544A1 (ja) | 2011-08-18 | 2013-02-21 | 日立化成工業株式会社 | 接着材リール |
JP2013077557A (ja) * | 2011-09-13 | 2013-04-25 | Sekisui Chem Co Ltd | 異方性導電材料及び接続構造体 |
CN103258585A (zh) * | 2012-02-17 | 2013-08-21 | 鸿富锦精密工业(深圳)有限公司 | 各向异性导电膜、其制作装置及制作方法 |
JP2014219793A (ja) * | 2013-05-07 | 2014-11-20 | コニカミノルタ株式会社 | 手書き入力補正プログラム及び手書き入力補正方法並びに手書き入力装置 |
WO2015016207A1 (ja) * | 2013-07-31 | 2015-02-05 | デクセリアルズ株式会社 | 異方性導電フィルム及びその製造方法 |
JP6119718B2 (ja) * | 2013-11-19 | 2017-04-26 | デクセリアルズ株式会社 | 異方導電性フィルム及び接続構造体 |
-
2014
- 2014-10-28 JP JP2014219793A patent/JP6119718B2/ja active Active
- 2014-11-18 CN CN201810229524.6A patent/CN108539440B/zh active Active
- 2014-11-18 US US15/030,509 patent/US10522502B2/en active Active
- 2014-11-18 KR KR1020167010177A patent/KR20160088294A/ko active Search and Examination
- 2014-11-18 CN CN201710112148.8A patent/CN107123471A/zh active Pending
- 2014-11-18 CN CN201480057445.1A patent/CN105637712B/zh active Active
- 2014-11-18 KR KR1020207007393A patent/KR20200029640A/ko not_active IP Right Cessation
- 2014-11-18 KR KR1020197012986A patent/KR20190052161A/ko active Application Filing
- 2014-11-18 KR KR1020187010853A patent/KR20180041777A/ko not_active Application Discontinuation
- 2014-11-19 TW TW107110076A patent/TWI643417B/zh active
- 2014-11-19 TW TW107138270A patent/TWI699054B/zh active
-
2017
- 2017-03-28 JP JP2017063298A patent/JP6380591B2/ja active Active
- 2017-03-28 JP JP2017063281A patent/JP6640141B2/ja active Active
-
2018
- 2018-06-08 US US16/003,310 patent/US10510711B2/en active Active
- 2018-07-17 JP JP2018134336A patent/JP6932110B2/ja active Active
-
2019
- 2019-01-08 HK HK19100244.3A patent/HK1257883A1/zh unknown
- 2019-09-23 US US16/578,763 patent/US11139265B2/en active Active
-
2020
- 2020-04-27 JP JP2020078370A patent/JP2020129550A/ja active Pending
-
2022
- 2022-06-17 JP JP2022098047A patent/JP2022133317A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
US10510711B2 (en) | 2019-12-17 |
TWI643417B (zh) | 2018-12-01 |
JP2019009129A (ja) | 2019-01-17 |
JP6640141B2 (ja) | 2020-02-05 |
JP2020129550A (ja) | 2020-08-27 |
KR20200029640A (ko) | 2020-03-18 |
JP2017139233A (ja) | 2017-08-10 |
JP6119718B2 (ja) | 2017-04-26 |
CN108539440B (zh) | 2020-12-01 |
HK1257883A1 (zh) | 2019-11-01 |
US20200020664A1 (en) | 2020-01-16 |
JP2022133317A (ja) | 2022-09-13 |
US20180294246A1 (en) | 2018-10-11 |
US20160270225A1 (en) | 2016-09-15 |
JP6932110B2 (ja) | 2021-09-08 |
KR20180041777A (ko) | 2018-04-24 |
KR20160088294A (ko) | 2016-07-25 |
CN105637712B (zh) | 2019-08-20 |
CN108539440A (zh) | 2018-09-14 |
CN107123471A (zh) | 2017-09-01 |
TWI699054B (zh) | 2020-07-11 |
TW201826624A (zh) | 2018-07-16 |
CN105637712A (zh) | 2016-06-01 |
TW201909485A (zh) | 2019-03-01 |
JP2017188446A (ja) | 2017-10-12 |
KR20190052161A (ko) | 2019-05-15 |
JP2016066573A (ja) | 2016-04-28 |
US10522502B2 (en) | 2019-12-31 |
US11139265B2 (en) | 2021-10-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6380591B2 (ja) | 異方導電性フィルム及び接続構造体 | |
WO2015076234A1 (ja) | 異方導電性フィルム及び接続構造体 | |
JP6504307B1 (ja) | 異方導電性フィルム | |
TWI699788B (zh) | 異向導電性膜及連接構造體 | |
TW201717216A (zh) | 異向導電性膜及連接構造體 | |
WO2016067828A1 (ja) | 異方性導電フィルム及び接続構造体 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20171124 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20171205 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20180205 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180403 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180703 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180716 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6380591 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |