JP6339085B2 - 半導体装置及びその製造方法 - Google Patents
半導体装置及びその製造方法 Download PDFInfo
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Description
前述したように、従来の樹脂封止構造の半導体装置では、熱伝導性の良好な高性能樹脂等の絶縁材料を絶縁層として用いるとコストが高くなる問題点があった。そこで、特許文献1に開示の半導体モジュールのように、絶縁シート部を絶縁層と熱電性の高い金属層(金属箔)との積層構造で構成し、上記絶縁層として、比較的薄い膜厚で熱伝導性がよい絶縁材料を用いることにより、大きなコスト高を招くことなく、絶縁性確保と高放熱特性とを容易に両立させる積層構造絶縁方法が考えられている。
(構造)
図1はこの発明の実施の形態1である半導体装置51の構造を示す説明図である。同図(a) は断面構造を示す断面図であり、同図(b) が平面構造を示す平面図である。なお、図1(a),(b) にはそれぞれXYZ直交座標系を付している。
実施の形態1の半導体装置51は以下のステップ(a) 〜(c) からなる半導体装置の製造方法によって製造することができる。
(構造)
図4は実施の形態2である半導体装置52におけるヒートスプレッダ3の面取り部の周辺構造を模式的に示す説明図である。図4(a) で示す構造は図1で示した半導体装置51の着目領域A1に相当し、図4(b) で示す構造は図4(a)における着目領域A2の拡大図となる。
実施の形態2の半導体装置52は、以下のステップ(a) 〜(c) からなる半導体装置の製造方法によって製造することができる。
さらに、実施の形態2の半導体装置52は、ステップ(b) で加工前の絶縁シート部20(21)が準備された場合、加工後の絶縁シート部20を得るための以下の屈曲部形成処理が上記ステップ(c) に含まれるステップ(c-1)として実行される。
ステップ(b) の実行の初期段階において、ステップ(b-1)として、ヒートスプレッダ3の面取り部に対応した屈曲部20xを有する絶縁シート部20を予め準備する。第1の態様は、上述した屈曲部形成処理を実行することなく加工後の絶縁シート部20を得ている。
第2及び第3の態様では、ステップ(b) は、同一平面を有する平板構造の加工前の絶縁シート部20を用いて実行される。したがって、ステップ(c) に含まれるステップ(c-1)として以下で述べる屈曲部形成処理が実行される。
第4の態様では、ステップ(b) は、同一平面を有する平板構造の加工前の絶縁シート部21を用いて実行される。そして、ステップ(c) に含まれるステップ(c-1)として以下で述べる屈曲部形成処理が実行される。
第5の態様では、ステップ(b) は、同一平面を有する平板構造の加工前の絶縁シート部20を用いて実行される。そして、ステップ(c) に含まれるステップ(c-1)として以下で述べる屈曲部形成処理が実行される。
図11は第6の態様で設けられる絶縁シート部22とヒートスプレッダ3との関係を示す説明図である。同図(a) がヒートスプレッダ3と絶縁シート部22との関係を示す説明図であり、同図(b) がトランスファモールド処理時の内容を示す断面図である。
図12は実施の形態1の半導体装置51の応用例を示す断面図である。同図に示すように、半導体装置51においてモールド樹脂1から露出した金属箔2bの裏面がはんだ18を介して冷却フィン19に接合されている。
Claims (6)
- 半導体素子(4)が樹脂(1)によって被覆される構造の半導体装置(52)であって、
前記半導体素子を表面上に載置するヒートスプレッダ(3)と、
前記ヒートスプレッダの裏面上に形成される絶縁シート部(20)とを備え、
前記絶縁シート部は、
前記樹脂よりも熱伝導率が大きい絶縁層(20a)と金属層(20b)との積層構造を呈し、前記絶縁層が前記ヒートスプレッダの裏面上に密着され、
前記ヒートスプレッダは裏面の外周端部にR面取り加工あるいはC面取り加工による面取り部(9,29)を有し、
前記絶縁シート部(20〜22)は前記ヒートスプレッダの裏面に沿って同一平面を構成する本体部(20m〜22m)と、表面領域が前記本体部から屈曲して形成され、前記面取り部に密着する屈曲部(20x〜22x)とを有し、
前記本体部における前記金属層の裏面を除き、前記半導体素子、前記ヒートスプレッダ、及び前記絶縁シート部が前記樹脂によって被覆され、
前記絶縁シート部は、先端部が前記ヒートスプレッダからはみ出して形成され、
前記絶縁シート部は前記屈曲部を含めて膜厚が均一に形成されることを特徴とする、
半導体装置。 - 請求項1記載の半導体装置であって、
前記ヒートスプレッダは0.5mm〜5mmの厚みを有し、
前記面取り部はR面取り加工の場合はRが100μm以上に設定され、C面取り加工の場合はCが100μm以上に設定される、
半導体装置。 - 請求項1または請求項2に記載の半導体装置であって、
前記屈曲部は、前記絶縁層にクラックが発生しない範囲の角度で屈曲されることを特徴とする半導体装置。 - 請求項3記載の半導体装置であって、
前記面取り部はR面取り加工によって得られ、前記屈曲部は前記本体部に対し10〜15°の範囲で屈曲される、
半導体装置。 - 請求項3記載の半導体装置であって、
前記面取り部はC面取り加工によって得られ、前記屈曲部は前記本体部に対し45°の角度で屈曲される、
半導体装置。 - 半導体装置の製造方法であって、
前記半導体装置(52)は、
半導体素子(4)が樹脂(1)によって被覆される構造であって、
前記半導体素子を表面上に載置するヒートスプレッダ(3)と、
前記ヒートスプレッダの裏面上に形成される絶縁シート部(20)とを備え、
前記絶縁シート部は、
前記樹脂よりも熱伝導率が大きい絶縁層(20a)と金属層(20b)との積層構造を呈し、前記絶縁層が前記ヒートスプレッダの裏面上に密着され、
前記ヒートスプレッダは裏面の外周端部にR面取り加工あるいはC面取り加工による面取り部(9,29)を有し、
前記絶縁シート部(20〜22)は前記ヒートスプレッダの裏面に沿って同一平面を構成する本体部(20m〜22m)と、表面領域が前記本体部から屈曲して形成され、前記面取り部に密着する屈曲部(20x〜22x)とを有し、
前記本体部における前記金属層の裏面を除き、前記半導体素子、前記ヒートスプレッダ、及び前記絶縁シート部が前記樹脂によって被覆され、
前記絶縁シート部は、先端部が前記ヒートスプレッダからはみ出して形成され、
前記半導体装置の製造方法は、
(a) 前記半導体素子(4)を表面上に載置した前記ヒートスプレッダ(3)を準備するステップと、
(b) 全体が同一平面を有する加工前の前記絶縁シート部(20〜22)を準備するステップと、
(c) 前記本体部における前記金属層の裏面を除く前記絶縁シート部、前記ヒートスプレッダ、及び前記半導体素子を前記樹脂により被覆するトランスファモールド処理を実行するステップとを備え、
前記ステップ(a) は、
(a-1) 打抜き金型(10a,10b)を用いた破断加工処理を実行して、前記ヒートスプレッダの裏面の外周端部に前記面取り部(9,29)を形成するステップを含み、
前記ステップ(c)は、
(c-1) 加工前の前記絶縁シート部に対し前記面取り部に対応する領域を屈曲させることにより、前記屈曲部に前記面取り部を密着させる態様で、前記本体部及び前記屈曲部を設ける屈曲部形成処理を実行するステップを含む、
半導体装置の製造方法。
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