JP6232568B2 - 蛍光x線分析装置 - Google Patents
蛍光x線分析装置 Download PDFInfo
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- JP6232568B2 JP6232568B2 JP2017537853A JP2017537853A JP6232568B2 JP 6232568 B2 JP6232568 B2 JP 6232568B2 JP 2017537853 A JP2017537853 A JP 2017537853A JP 2017537853 A JP2017537853 A JP 2017537853A JP 6232568 B2 JP6232568 B2 JP 6232568B2
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
- G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2209—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using wavelength dispersive spectroscopy [WDS]
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
Description
3 1次X線
5 2次X線
13 定量分析条件設定手段
14 標準試料
Claims (3)
- 試料に1次X線を照射して発生する2次X線の強度を測定する走査型の蛍光X線分析装置であって、
分析対象試料に対応する検量線を作成するための複数の標準試料と、
定量分析条件として、あらかじめ、分析対象試料における分析対象元素ならびに標準試料における試料構成元素およびその含有率が設定される定量分析条件設定手段とを備え、
前記定量分析条件設定手段が、
標準試料について定性分析および定性分析結果に基づく定量分析である半定量分析を行い、あらかじめ設定された試料構成元素以外の元素を新規検出元素として検出し、
新規検出元素およびあらかじめ設定された試料構成元素についてファンダメンタルパラメーター法により蛍光X線の吸収励起に関する理論マトリックス補正係数を計算し、その理論マトリックス補正係数、新規検出元素の半定量分析値およびあらかじめ設定された試料構成元素の含有率に基づいて、分析対象元素の分析値に対する新規検出元素による蛍光X線の吸収励起の影響度を吸収励起影響度として計算して対応する所定の基準値と比較し、
あらかじめ記憶した重なり補正テーブルから分析対象元素の分析線に対する新規検出元素による妨害線の重なり補正係数を呼び出し、その重なり補正係数、新規検出元素の半定量分析値およびあらかじめ設定された試料構成元素の含有率に基づいて、分析対象元素の分析線に対する新規検出元素による妨害線の重なりの影響度を重なり影響度として計算して対応する所定の基準値と比較し、
前記吸収励起影響度および前記重なり影響度の少なくとも一方が、対応する所定の基準値よりも大きい場合に、定量分析条件として、当該新規検出元素を分析対象試料における分析対象元素として追加する蛍光X線分析装置。 - 請求項1に記載の蛍光X線分析装置において、
前記定量分析条件設定手段が、
新規検出元素の半定量分析値が所定の含有率よりも大きい場合に、定量分析条件として、当該新規検出元素を分析対象試料における分析対象元素として追加することなく、残分元素として設定する蛍光X線分析装置。 - 請求項1に記載の蛍光X線分析装置において、
前記定量分析条件設定手段が、
分析対象試料における分析対象元素として追加する新規検出元素については、定量分析条件として、あらかじめ記憶した装置感度定数を用いるファンダメンタルパラメーター法による定量演算条件を設定する蛍光X線分析装置。
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JP2015169543 | 2015-08-28 | ||
JP2015169543 | 2015-08-28 | ||
PCT/JP2016/075033 WO2017038701A1 (ja) | 2015-08-28 | 2016-08-26 | 蛍光x線分析装置 |
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JP6232568B2 true JP6232568B2 (ja) | 2017-11-22 |
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US (2) | US10082475B2 (ja) |
EP (2) | EP3239702B1 (ja) |
JP (2) | JP6340604B2 (ja) |
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CN110312928B (zh) * | 2017-03-15 | 2021-03-26 | 株式会社理学 | 荧光x射线分析方法以及荧光x射线分析装置 |
JP6797421B2 (ja) * | 2018-08-09 | 2020-12-09 | 株式会社リガク | 蛍光x線分析装置 |
JP6998608B2 (ja) * | 2019-09-20 | 2022-01-18 | 株式会社リガク | 定量分析方法、定量分析プログラム、及び、蛍光x線分析装置 |
JP6838754B1 (ja) * | 2019-09-26 | 2021-03-03 | 株式会社リガク | 蛍光x線分析装置 |
JP7190749B2 (ja) | 2020-05-18 | 2022-12-16 | 株式会社リガク | 蛍光x線分析装置 |
JP7190751B2 (ja) * | 2020-10-30 | 2022-12-16 | 株式会社リガク | 蛍光x線分析装置 |
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JP2853261B2 (ja) * | 1989-05-16 | 1999-02-03 | 三菱マテリアル株式会社 | 金属分析方法および分析装置 |
KR100233312B1 (ko) * | 1995-08-09 | 1999-12-01 | 야마모토 카즈모토 | 전반사 형광 x선 분석 장치 및 방법 |
JP2000310602A (ja) | 1999-02-23 | 2000-11-07 | Rigaku Industrial Co | 蛍光x線分析装置およびこれに使用する記録媒体 |
JP2004212406A (ja) | 1999-02-23 | 2004-07-29 | Rigaku Industrial Co | 蛍光x線分析装置およびこれに使用する記録媒体 |
JP3567177B2 (ja) | 2000-04-11 | 2004-09-22 | 理学電機工業株式会社 | 蛍光x線分析装置 |
JP2002340822A (ja) * | 2001-05-16 | 2002-11-27 | Rigaku Industrial Co | 蛍光x線分析装置 |
DE10159828B4 (de) * | 2001-12-06 | 2007-09-20 | Rigaku Industrial Corporation, Takatsuki | Röntgenfluoreszenzspektrometer |
AU2003243638A1 (en) | 2002-06-17 | 2003-12-31 | Edax Inc. | Scatter spectra method for x-ray fluorescent analysis with optical components |
JP4908119B2 (ja) * | 2005-10-19 | 2012-04-04 | 株式会社リガク | 蛍光x線分析装置 |
EP2333529B1 (en) | 2009-09-07 | 2013-10-16 | Rigaku Corporation | X-ray fluorescence analyzing method |
JP5874108B2 (ja) * | 2012-03-27 | 2016-03-02 | 株式会社リガク | 蛍光x線分析装置 |
JP6002890B2 (ja) * | 2014-09-18 | 2016-10-05 | 株式会社リガク | X線分析装置 |
US9784699B2 (en) | 2015-03-03 | 2017-10-10 | Panalytical B.V. | Quantitative X-ray analysis—matrix thickness correction |
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EP3239702A4 (en) | 2018-01-03 |
EP3343211B1 (en) | 2020-07-29 |
CN107209132B (zh) | 2019-06-21 |
EP3239702A1 (en) | 2017-11-01 |
EP3343211A4 (en) | 2019-08-07 |
WO2017038702A8 (ja) | 2018-02-01 |
WO2017038701A1 (ja) | 2017-03-09 |
US20180106736A1 (en) | 2018-04-19 |
US10161889B2 (en) | 2018-12-25 |
CN107923859A (zh) | 2018-04-17 |
EP3239702B1 (en) | 2019-03-27 |
CN107209132A (zh) | 2017-09-26 |
WO2017038701A8 (ja) | 2017-06-15 |
WO2017038702A1 (ja) | 2017-03-09 |
US20180180563A1 (en) | 2018-06-28 |
JPWO2017038701A1 (ja) | 2017-10-12 |
JP6340604B2 (ja) | 2018-06-13 |
CN107923859B (zh) | 2018-12-21 |
US10082475B2 (en) | 2018-09-25 |
EP3343211A1 (en) | 2018-07-04 |
JPWO2017038702A1 (ja) | 2018-06-07 |
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