WO2017038701A8 - 蛍光ｘ線分析装置 - Google Patents

蛍光ｘ線分析装置 Download PDF

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Publication number
WO2017038701A8
WO2017038701A8 PCT/JP2016/075033 JP2016075033W WO2017038701A8 WO 2017038701 A8 WO2017038701 A8 WO 2017038701A8 JP 2016075033 W JP2016075033 W JP 2016075033W WO 2017038701 A8 WO2017038701 A8 WO 2017038701A8
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WIPO (PCT)
Prior art keywords
ray fluorescence
analyzed
elements
fluorescence spectrometer
impact
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PCT/JP2016/075033
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English (en)
French (fr)
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WO2017038701A1 (ja
Inventor
真也 原
松尾　尚
山田　康治郎
寿 本間
片岡　由行
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株式会社リガク
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Publication date
Application filed by 株式会社リガク filed Critical 株式会社リガク
Priority to EP16841733.5A priority Critical patent/EP3239702B1/en
Priority to US15/544,896 priority patent/US10082475B2/en
Priority to JP2017537853A priority patent/JP6232568B2/ja
Priority to CN201680006771.9A priority patent/CN107209132B/zh
Publication of WO2017038701A1 publication Critical patent/WO2017038701A1/ja
Publication of WO2017038701A8 publication Critical patent/WO2017038701A8/ja

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2209—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using wavelength dispersive spectroscopy [WDS]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Dispersion Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

本発明の走査型の蛍光Ｘ線分析装置は、標準試料（１４）の定性分析結果および半定量分析結果に基づいて、あらかじめ設定された試料構成元素以外の新規検出元素について、分析対象元素の分析値に対する蛍光Ｘ線の吸収励起影響度と、分析対象元素の分析線に対する妨害線の重なり影響度とから、分析対象元素として追加すべきか否かを判定する定量分析条件設定手段（１３）を備える。
PCT/JP2016/075033 2015-08-28 2016-08-26 蛍光ｘ線分析装置 WO2017038701A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP16841733.5A EP3239702B1 (en) 2015-08-28 2016-08-26 X-ray fluorescence spectrometer
US15/544,896 US10082475B2 (en) 2015-08-28 2016-08-26 X-ray fluorescence spectrometer
JP2017537853A JP6232568B2 (ja) 2015-08-28 2016-08-26 蛍光ｘ線分析装置
CN201680006771.9A CN107209132B (zh) 2015-08-28 2016-08-26 荧光x射线分析装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015-169543 2015-08-28
JP2015169543 2015-08-28

Publications (2)

Publication Number Publication Date
WO2017038701A1 WO2017038701A1 (ja) 2017-03-09
WO2017038701A8 true WO2017038701A8 (ja) 2017-06-15

Family

ID=58187491

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PCT/JP2016/075033 WO2017038701A1 (ja) 2015-08-28 2016-08-26 蛍光ｘ線分析装置
PCT/JP2016/075034 WO2017038702A1 (ja) 2015-08-28 2016-08-26 蛍光ｘ線分析装置

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PCT/JP2016/075034 WO2017038702A1 (ja) 2015-08-28 2016-08-26 蛍光ｘ線分析装置

Country Status (5)

Country Link
US (2) US10082475B2 (ja)
EP (2) EP3239702B1 (ja)
JP (2) JP6232568B2 (ja)
CN (2) CN107209132B (ja)
WO (2) WO2017038701A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6614740B2 (ja) * 2017-03-15 2019-12-04 株式会社リガク 蛍光ｘ線分析方法、蛍光ｘ線分析プログラムおよび蛍光ｘ線分析装置
JP6797421B2 (ja) * 2018-08-09 2020-12-09 株式会社リガク 蛍光ｘ線分析装置
JP6998608B2 (ja) * 2019-09-20 2022-01-18 株式会社リガク 定量分析方法、定量分析プログラム、及び、蛍光ｘ線分析装置
JP6838754B1 (ja) * 2019-09-26 2021-03-03 株式会社リガク 蛍光ｘ線分析装置
JP7190749B2 (ja) 2020-05-18 2022-12-16 株式会社リガク 蛍光ｘ線分析装置
JP7190751B2 (ja) * 2020-10-30 2022-12-16 株式会社リガク 蛍光ｘ線分析装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2853261B2 (ja) 1989-05-16 1999-02-03 三菱マテリアル株式会社 金属分析方法および分析装置
KR100233312B1 (ko) * 1995-08-09 1999-12-01 야마모토 카즈모토 전반사 형광 x선 분석 장치 및 방법
JP2000310602A (ja) * 1999-02-23 2000-11-07 Rigaku Industrial Co 蛍光ｘ線分析装置およびこれに使用する記録媒体
JP2004212406A (ja) * 1999-02-23 2004-07-29 Rigaku Industrial Co 蛍光ｘ線分析装置およびこれに使用する記録媒体
JP3567177B2 (ja) * 2000-04-11 2004-09-22 理学電機工業株式会社 蛍光ｘ線分析装置
JP2002340822A (ja) * 2001-05-16 2002-11-27 Rigaku Industrial Co 蛍光ｘ線分析装置
DE10159828B4 (de) * 2001-12-06 2007-09-20 Rigaku Industrial Corporation, Takatsuki Röntgenfluoreszenzspektrometer
US6845147B2 (en) 2002-06-17 2005-01-18 Edax Inc. Scatter spectra method for x-ray fluorescent analysis with optical components
JP4908119B2 (ja) * 2005-10-19 2012-04-04 株式会社リガク 蛍光ｘ線分析装置
WO2011027613A1 (ja) * 2009-09-07 2011-03-10 株式会社リガク 蛍光ｘ線分析方法
JP5874108B2 (ja) * 2012-03-27 2016-03-02 株式会社リガク 蛍光ｘ線分析装置
JP6002890B2 (ja) * 2014-09-18 2016-10-05 株式会社リガク Ｘ線分析装置
US9784699B2 (en) * 2015-03-03 2017-10-10 Panalytical B.V. Quantitative X-ray analysis—matrix thickness correction

Also Published As

Publication number Publication date
WO2017038701A1 (ja) 2017-03-09
CN107209132B (zh) 2019-06-21
WO2017038702A1 (ja) 2017-03-09
WO2017038702A8 (ja) 2018-02-01
US10082475B2 (en) 2018-09-25
EP3343211A1 (en) 2018-07-04
CN107923859B (zh) 2018-12-21
EP3343211B1 (en) 2020-07-29
CN107209132A (zh) 2017-09-26
EP3239702B1 (en) 2019-03-27
US20180180563A1 (en) 2018-06-28
JP6232568B2 (ja) 2017-11-22
CN107923859A (zh) 2018-04-17
US20180106736A1 (en) 2018-04-19
US10161889B2 (en) 2018-12-25
JPWO2017038702A1 (ja) 2018-06-07
JP6340604B2 (ja) 2018-06-13
JPWO2017038701A1 (ja) 2017-10-12
EP3239702A1 (en) 2017-11-01
EP3343211A4 (en) 2019-08-07
EP3239702A4 (en) 2018-01-03

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